Surface Reactions after the Etching of CeO$_2$ Thin films using Inductively Coupled C1$_2$ /CF$_4$ /Ar Plasmas
(유도결합 C1$_2$ /CF$_4$ /Ar 플라즈마를 이용한 CeO$_2$ 박막 식각후 표면반응)
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- Journal of the Microelectronics and Packaging Society
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- v.9 no.2
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- pp.27-31
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- 2002