• 제목/요약/키워드: X-ray source arrangement

검색결과 2건 처리시간 0.015초

s-IGDT 시스템의 X-선원 배열 형태 및 투영상 개수에 따른 영상 화질 평가에 관한 연구 (Image Quality Evaluation according to X-ray Source Arrangement Type and the Number of Projections in a s-IGDT System)

  • 이다혜;남기복;이승완
    • 대한방사선기술학회지:방사선기술과학
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    • 제45권2호
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    • pp.117-125
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    • 2022
  • Although stationary inverse-geometry digital tomosynthesis (s-IGDT) is able to reduce motion artifacts, image acquisition time and radiation dose, the image quality of the s-IGDT is degraded due to the truncations arisen in projections. Therefore, the effects of geometric and image acquisition conditions in the s-IGDT should be analyzed for improving the image quality and clinical applicability of the s-IGDT system. In this study, the s-IGDT images were obtained with the various X-ray source arrangement types and the various number of projections. The resolution and noise characteristics of the obtained s-IGDT images were evaluated, and the characteristics were compared with those of the conventional DT images. The s-IGDT system using linear X-ray source arrangement and 40 projections maximized the image characteristics of resolution and noise, and the corresponding system was superior to the conventional DT system in terms of image resolution. In conclusion, we expect that the s-IGDT system can be used for providing medical images in diagnosis.

고속 스퍼터링 소스를 이용한 구리 후막 제조 및 특성 평가 (Characteristics of Cu Thick Films Deposited by High Rate Magnetron Sputtering Source)

  • 정재인;양지훈
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2008년도 추계학술대회 초록집
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    • pp.13-14
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    • 2008
  • A high rate magnetron sputtering source (HRMSS) was employed to deposit thick copper films. The HRMSS was manufactured by changing the magnet size, arrangement, and field intensity. For the preparation of thick copper films, the copper sputtering conditions using HRMSS were characterized based on the deposition parameters such as discharge characteristics, I-V characteristics of the source, and change of deposition rate. The deposition rate of copper turned out to be more than 5 times than that of conventional magnetron sputtering source. Thick copper films having thickness of more than $20{\mu}m$ were prepared by using HRMSS. The morphology and orientation of the films were investigated by scanning electron microscopy and x-ray diffraction.

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