• Journal of the Korean institute of surface engineering
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• v.44 no.3
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• pp.95-104
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• 2011

Ti based nanocomposite films including V, Si and Nb (Ti-Me-N, Me=V, Si and Nb) were fabricated by hybrid physical vapor deposition (PVD) method consisting of unbalanced magnetron (UBM) sputtering and arc ion plating (AIP). The pure Ti target was used for arc ion plating and other metal targets (V, Si and Nb) were used for sputtering process at a gas mixture of Ar/$N_2$ atmosphere. Mostly all of the films were grown with textured TiN (111) plane except the Si doped Ti-Si-N film which has strong (200) peak. The microhardness of each film was measured using the nanoindentation method. The minimum value of removal rate ($0.5{\times}10^{-15}\;m^2/N$) was found at Nb doped Ti-Nb-N film which was composed of Ti-N and Nb-N nanoparticles with small amount of amorphous phases.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2000.05a
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• pp.1-1
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• 2000

The results of the modification of metal materials treated by high temperature pulst:d plasma fluxes (HTlPPF) with a specific power of incident flux changing in the $(3...100)10^5{]\;}W/cm^2$ range and a pulse duration lying from 15 to $50{\;}\mu\textrm{s}$ have been presented. The results of HTPPF action were studied on the stainless steels of 18Cr-l0Ni, 16Cr- 15Ni, 13Cr-2Mo types; on the structural carbon steels of (13...35)Cr, St. 3, St. 20, St. 45 types; on the tool steels of U8, 65G, ShHI5 types, and others; on nickel and high nickel alloy of 20Cr-45Ni type; on zirconium- and vanadium-base alloys and other materials. The microstructure and properties (mechanical, tribological, erosion, and other properties) of modified materials and surface alloying of metals exposed to HTPPF action have been investigated. It was found that the modification of materials by HTPPF resulted in a simultaneous increase of several properties of the treated articles: microhardness of the surface and layers of 40...60 $\mu\textrm{m}$ in depth, tribological characteristics (friction coefficient, wear resistance), mechanical properties ({\sigma_y}, {\;}{\sigma_{0.2}}.{\;}{\sigma_r}) on retention of the initial plasticity ($\delta$), corrosion resistance, radistanation erosion under ion irradiation, and others. The determining factor of the changes observed is the structural-phase modification of the near-surface layers, in particular, the formation of the fine cellular structure in the near-surface layers at a depth of $20{\;}{\mu\textrm{m}}$ with dimension of cells changing in the range from 0.1 to $1., 5{\;}\mu\textrm{m}$, depending on the kind of material, its preliminary treatment, and the parameters of plasma fluxes. The remits obtained have shown the possibility of purposeful surface alloying of metals exposed to HTPPF action over a depth up to 20...45 $\mu\textrm{m}$ and the concentration of alloying element (Ni, Cr, V) up to 20 wt.%. Possible industrial brunches for using the treatment have been also considered, as well as some results on modifying the serial industrial articles by HTPPF.

• Korean Journal of Materials Research
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• v.1 no.4
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• pp.221-228
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• 1991

In this study we have investigated the sealing characteristics of glasses suitable for producing the magnetic gap of the ferrite head cores which have been widely used for VTR and computer magnetic heads. $PbO-B_2O_3$ g1asses were evaluated by measuring microhardness, thermal expansion coefficient and sliding wear resistance. Concentration distribution of elements at the interface was observed by WDS. wettability was measured by high temperature microscopy. The results were as follows ; 1. In sealing glasses of $PbO-B_2O_3$ system, thermal expansion coefficient and wear volume were increased with increasing PbO content, and were decreased with increasing $B_2O_3$ content. 2. The contact angle of $PbO-B_2O_3$ Systems was mainly influenced by PbO content. 3. The sealing temperature showed a tendency to decrease proportionally with the increase of the coefficient of thermal expansion. 4. The diffusion at the interface between Mn-Zn single crystal ferrite and sealing glasses of $PbO-B_2O_3$ system was dominated by small amount of diffusion of ferrite content into glass part, which was very little affected by sealing heat treatment time.

• Journal of the korean academy of Pediatric Dentistry
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• v.31 no.4
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• pp.555-563
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• 2004

The pH of beverages is known to be low and have, therefore, been implicated in the increasing incidence of erosion. Erosion is believed to be the predominant cause of teeth wear in children and young adults, although there will always be a contribution from attrition and abrasion. The aim of the present study was to evaluate the effect of yogurt on the progression of erosive demineralization in human enamel using demineralization model in vitro. In 4 yogurts, available on the market, pH, buffering capacity and the concentrations of calcium, phosphate and fluoride were determined. The buffering effect was determined by titration with NaOH. 50 milliliters of each drink was then titrated with 1M sodium hydroxide, added in 0.5 milliliters increments, until the pH reached about 7. Human deciduous enamel(n=40) samples were divided into four groups and exposed to 80ml of the yogurt for 30,60, 90 and 120min. Enamel surface microhardness(VHN) was examined before and after each exposure. 1. The average PH of fermented milk was 3.77 and this pH value was acidic enough to cause tooth erosion. 2. All of the fermented milks were found to be erosive(p<0.05) 3. The teeth exposed to the fermented milk all showed erosion like lesions and microhardness measurements showed that enamel surface hardness decreased proportionately with increased time of immersion in all tooth specimen groups. 4. After immersion for 30 and 60 minutes, reduction rate of microhardness values was not significantly different between the groups(p>0.05). However, after 90 and 120 minutes, reduction rate of each group was significantly different(p<0.05).

• Journal of the Microelectronics and Packaging Society
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• v.18 no.4
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• pp.39-42
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• 2011

The composite electroplating is accomplished by adding inert materials during the electroplating. Permalloy is the term for Ni-Fe alloy and it is used for industrial applications due to its high magnetic permeability, surface wear resistance, corrosion protection. Microhardness for microdevices is enhanced after composite coating and it increases the life cycle. However, the hydroxyl group on the silica makes their surface susceptible to moisture and it causes the silica nanoparticles to be agglomerated in the aqueous solution. The agglomeration problem causes poor dispersion which eventually interrupts uniform deposition of silica nanoparticles. In this study, the dispersion of silica nanoparticles in the permalloy electroplated layer is reported with variation of additives and current densities. The optimum current density was 20 $mA/cm^2$ and the silica content was 9 at% at $50^{\circ}C$. The amount of silica nanopowder codeposition and surface morphologies were influenced with variation of additives. In the bath, smooth surface morphology and relatively high contents of silica nanopowder codeposition were obtained with addition of sodium lauryl sulfate.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.211-211
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• 1999

Titanium nitride (TiN) thin films have useful properties including high hardness, good electrical conductivity, high melting point, and chemical inertness. The applications have included wear-resistant hard coatings on machine tools and bearings, decorative coating making use of the golden color, thermal control coatings for widows, and erosion resistant coatings for spacecraft plasma probes. For all these applications as feature sizes shrink and aspect ratios grow, the issue of good step coverage becomes increasingly important. It is therefore essential to manufacture conformal coatings of TiN. The growth of TiN thin films by chemical vapor deposition (CVD) is of great interest for achieving conformal deposition. The most widely used precursor for TiN is TiCl4 and NH3. However, chlorine impurity in the as-grown films and relatively high deposition temperature (>$600^{\circ}C$) are considered major drawbacks from actual device fabrication. To overcome these problems, recently, MOCVD processes including plasma assisted have been suggested. In this study, therefore, we have doposited Ti(C, N) thin films on Si(100) and D2 steel substrates in the temperature range of 150-30$0^{\circ}C$ using tetrakis diethylamido titanium (TDEAT) and titanium isopropoxide (TIP) by pulsed DC plamsa enhanced metal-organic chemical vapor deposition (PEMOCVD) method. Polycrystalline Ti(C, N) thin films were successfully grown on either D2 steel or Si(100) surfaces at temperature as low as 15$0^{\circ}C$. Compositions of the as-grown films were determined with XPS and RBS. From XPS analysis, thin films of Ti(C, N) with low oxygen concentration were obtained. RBS data were also confirmed the changes of stoichiometry and microhardness of our films. Radical formation and ionization behaviors in plasma are analyzed by optical emission spectroscopy (OES) at various pulsed bias and gases conditions. H2 and He+H2 gases are used as carrier gases to compare plasma parameter and the effect of N2 and NH3 gases as reactive gas is also evaluated in reduction of C content of the films. In this study, we fond that He and H2 mixture gas is very effective in enhancing ionization of radicals, especially N resulting is high hardness. The higher hardness of film is obtained to be ca. 1700 HK 0.01 but it depends on gas species and bias voltage. The proper process is evident for H and N2 gas atmosphere and bias voltage of 600V. However, NH3 gas highly reduces formation of CN radical, thereby decreasing C content of Ti(C, N) thin films in a great deal. Compared to PVD TiN films, the Ti(C, N) film grown by PEMOCVD has very good conformability; the step coverage exceeds 85% with an aspect ratio of more than 3.