• 산업공학
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• 제11권3호
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• pp.219-225
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• 1998

Presented in this paper is a state-of-the-art review of VM(Virtual Manufacturing). To survive on a global competition, manufacturers must shorten the time to market for their products. To achieve this goal, many manufacturers have implmented CIM systems. VM is a new direction in the CIM system development having emphasis on enhancing the decision-making capability. VM can be defined an integrated, synthetic manufacturing environment exercised to enhance all levels of decision and control. Also, VM is the use of computer models and simulations of manufacturing processes to aid in the design and production of manufactured products. Currently, VP(Virtual Prototyping) and VF(Virtual Factory) are main theme to develop a VM. In this paper, the concept and current status of VP and VF are explained.

• 한국CDE학회지
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• 제9권2호
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• pp.28-37
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• 2003

가상제조(VM)기술은 21세기 변화된 기업환경에서 제조경쟁력 강화를 위한 핵심기술 중에 하나로써, 형상 모델링과 시스템 이론으로 포함하여 다양한 분야로 이루어진 복합기술이다. VM 기술은 e-manufacturing의 한 분야로써 CAD/CAM 기술 발전과 궤를 같이하는데 그 적용 대상이나 방법에 따라서 digital manufacturing, virtual manufacturing, e-factory 등 다양한 이름으로 불리고 있다. 본 논문에서는 VM 기술의 개념을 정리하고, 가상제조의 국내 적용현황 및 향후 발전전망에 대하여 고찰하고자 한다.

• 대한산업공학회지
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• 제38권1호
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• pp.46-56
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• 2012

The purpose of virtual metrology (VM) in semiconductor manufacturing is to predict every wafer's metrological values based on its process equipment data without an actual metrology. In this paper, we propose novelty detection-based reliability estimation models for VM in order to support flexible utilization of VM results. Because the proposed model can not only estimate the reliability of VM, but also identify suspicious process variables lowering the reliability, quality control actions can be taken selectively based on the reliance level and its causes. Based on the preliminary experimental results with actual semiconductor manufacturing process data, our models can successfully give a high reliance level to the wafers with small prediction errors and a low reliance level to the wafers with large prediction errors. In addition, our proposed model can give more detailed information by identifying the critical process variables and their relative impacts on the low reliability.

• 산업공학
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• 제23권3호
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• pp.229-238
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• 2010

Virtual metrology (VM), a critical component of semiconductor manufacturing, is an efficient way of assessing the quality of wafers not actually measured. This is done based on a model between equipment sensor data (obtained for all wafers) and the quality characteristics of wafers actually measured. This paper considers principal component regression (PCR), partial least squares regression (PLSR), kernel PCR (KPCR), and kernel PLSR (KPLSR) as VM models. For each regression model, two cases are considered. One utilizes all explanatory variables in developing a model, and the other selects significant variables using the genetic algorithm (GA). The prediction performances of 8 regression models are compared for the short- and long-term etch process data. It is found among others that the GA-KPLSR model performs best for both types of data. Especially, its prediction ability is within the requirement for the short-term data implying that it can be used to implement VM for real etch processes.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 1997년도 추계학술대회 논문집
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• pp.201-205
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• 1997

As manufacturing system have become complex and globalized, rapid development and production of products are essentially requisites for competitiveness. The importance of agility in manufacturing is being emphasized and a new paradigm is necessary for reduction of the time and expenses related to planning, product development and production. To meet such requirements, virtual manufacturing (VM) environment was suggested. In this paper, Multi-agent system is adopted into VM operating system. Because our system is flexible due to agent technology, agents can be added or deleted with ease. VM unit modules which were defined as DEVS models execute independent simulation of other modules in unit level and compose one VM system with other modules. They also execute simulation in system level. This research can contribute to usefulness of VM environment due to flexibility and extensibility of this system.

• 소성∙가공
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• 제12권2호
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• pp.110-115
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• 2003

This paper is concerned with the compression test and forming process of flange by using virtual reality and analysis(simulation) program. This virtual manufacturing can be carried out one personal computer without any expensive devices for experiment. The virtual manufacturing composed of three modules such as the imput, calculation and the output modules on internet. Internet user can give the material's property and process parameters to the sever computer at the input module. On the calculation module, a simulator computes the virtual manufacturing process by analysis program and stores the data as a file. The output module is the program in which internet user can confirm virtual manufacturing results by showing tables, graphs, and 3D animation. This programs is designed by an internet language such as HTML, CGI, VRML and JAVA ,while analysis programs use the finite increasing, the virtual manufacturing technique will substitute many real experiments in the future.

• 대한인간공학회:학술대회논문집
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• 대한인간공학회 1996년도 춘계학술대회논문집
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• pp.151-151
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• 1996

컴퓨터 기술의 급격한 발전은 현실세계의 각종 현장을 컴퓨터 가상공간 내에서 시험할 수 있도록 하고 있다. 최근들어급격한 발전이 이루어지고 있는 가상현실(Virtual Reality) 기술과 인간의 감성을 중시한 감성공학적 접근방법 론의 활용은 그 적용범위가 점차 확대되어 가고 있는 상황으로, 제조기업에서 사용되고 있는 통합생산 정보시스템 (Computer Integrated Manufacturing)과의 접목으로 가상공장(Virtual Factory) 시스템을 구현할 수가 있다. 가상공장시스 템은 제조기업의 Businiss를 Design & Engineering, Production Planning & Control, Manufacturing의 3가지 프로세스로 분류한다. 그리고 각 프로세스별로 현재의 CIM시스템에 대한 하부시스템을 검토하고, 인간 중심의 가상기업시스템을 구현 하는데 보완이 되어야 할 사항과 이에 대한 해결 대안으로 Design & Engineering Process에서는 Virtual Engineering(VE) Sub-system, Manufacturing Process에서는 Virtual Manufacturing(VM) Sub-system으로 분류하여 각 Sub-system별 구성모듈을 설계하고 상호간의 Interface 사항을 설계하므로서 가상공장시스템 구현을 위한 기본 요구사항과 조건을 제시하고자 한다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.464-464
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• 2010

A few years ago, for maintaining high stability and production yield of production equipment in a semiconductor fab, on-line monitoring of wafers is required, so that semiconductor manufacturers are investigating a software based process controlling scheme known as virtual metrology (VM). As semiconductor technology develops, the cost of fabrication tool/facility has reached its budget limit, and reducing metrology cost can obviously help to keep semiconductor manufacturing cost. By virtue of prediction, VM enables wafer-level control (or even down to site level), reduces within-lot variability, and increases process capability, $C_{pk}$. In this research, we have practiced VM on $SiO_2$ etch rate with optical emission spectroscopy(OES) data acquired in-situ while the process parameters are simultaneously correlated. To build process model of $SiO_2$ via, we first performed a series of etch runs according to the statistically designed experiment, called design of experiments (DOE). OES data are automatically logged with etch rate, and some OES spectra that correlated with $SiO_2$ etch rate is selected. Once the feature of OES data is selected, the preprocessed OES spectra is then used for in-situ sensor based VM modeling. ICP-RIE using 葰.56MHz, manufactured by Plasmart, Ltd. is employed in this experiment, and single fiber-optic attached for in-situ OES data acquisition. Before applying statistical feature selection, empirical feature selection of OES data is initially performed in order not to fall in a statistical misleading, which causes from random noise or large variation of insignificantly correlated responses with process itself. The accuracy of the proposed VM is still need to be developed in order to successfully replace the existing metrology, but it is no doubt that VM can support engineering decision of "go or not go" in the consecutive processing step.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 춘계학술대회
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• pp.1166-1172
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• 2003

The extremely strong competition among the world automobile industries has introduced the concept of PLM in the total production activities, one of whose major components is VM(Virtual Manufacturing). If the production lines are equipped with robots, the application of OLP in the virtual space is fully mature. However, in the point of the investment's and the maintenance's view, there are always some activities, which can not be automated: for example, typically the manual welding for prefixing in the automobile body shop and the material loading. Process planning for these activities, therefore, are decided mainly by experiences, which caused many repeated rework of the processes and the inconvenience of the workers, and resulted consequently in the reduction of the productivity and the safety of the workers. In this paper, the optimal dimension of the welding gun and its handle position and the optimal working path is simulated and decided by use of DELIMN/IGRIP and DELMIA/Ergo and the working area modelized in the virtual workcell of DELMIA.

• 한국경영과학회:학술대회논문집
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• 대한산업공학회/한국경영과학회 2004년도 춘계공동학술대회 논문집
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• pp.52-55
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• 2004

VMS (virtual manufacturing system) may be defined as a transparent interface/control mechanism to support human decision-making via simulation and monitoring of real operating situation through modeling of all activities in RMS (real manufacturing system). The three main layers in VMS are business process layer, manufacturing execution layer, and facility operation layer, and each layer is represented by a specific software system having its own input modeler module. The current version of these input modelers has been implemented based on its own 'local' framework, and as a result, there are no information sharing mechanism, nor a common user view among them. Proposed in this paper is a unified modeler framework covering the three VMS layers, in which the concept of PPR (product-process-resource) model is employed as a common semantics framework and a 2D graphic network model is used as a syntax framework. For this purpose, abstract class PPRObject and GraphicObject are defined and then a subclass is inherited from the abstract class for each application layer. This feature would make it easier to develop and maintain the individual software systems. For information sharing, XML is used as a common data format.