• Proceedings of the Korean Vacuum Society Conference
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• 1994.06a
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• pp.158.1-158
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• 1994

Totally dry lithography is studying with using plasma polymerized resist for almost 15 years. Recently organo-silicon ITlOnOmer was proposed as a new resist. When the plasma polymerized resist was irradiated through a mask in oxygen gas, the resist was oxidized and a fine pattern of submicron was successfully developed by $Cl_2$ gas plasma.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.421-421
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• 2012

Graphene has drawn enormous attention owing to its outstanding properties, such as high charge mobility, excellent transparence and mechanical property. Synthesis of Graphene by chemical vapor deposition (CVD) is an attractive way to produce large-scale Graphene on various substrates. However the fatal limitation of CVD process is high temperature requirement(around $1,000^{\circ}C$), at which many substrates such as Al substrate cannot endure. Therefore, we propose plasma enhanced CVD (PECVD) and decrease the temperature to $400^{\circ}C$. Fig. 1 shows the typical structure of RF-PECVD instrument. The quality of Graphene is affected by several variables. Such as plasma power, distance between substrate and electronic coil, flow rate of source gas and growth time. In this study, we investigate the influence of these factors on Graphene synthesis in vacuum condition. And the results were checked by Raman spectra and conductivity measurement.

• Journal of Korean Vacuum Science & Technology
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• v.7 no.2
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• pp.45-56
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• 2003

A high flux metal plasma pulse ion source, which can simultaneously perform ion implantation and deposition, was developed and tested to evaluate its performance using the prototype. Flux of ion source was measured to be 5 A and bi-polar pulse power supply with a peak voltage of 250 V, repetition of 20 Hz and width of 100 ${\mu}\textrm{s}$ has an output current of 2 kA and average power of 2 kW. Trigger power supply is a high voltage pulse generator producing a peak voltage of 12 kV, peak current of 50 A and repetition rate of 20 Hz. The acceleration column for providing target energy up to ion implantation is carefully designed and compatible with UHV (ultra high vacuum) application. Prototype systems including various ion sources are fabricated for the performance test in the vacuum and evaluated to be more competitive than the existing equipments through repeated deposition experiments.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.95-95
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• 2010

An apparatus for generating flames and more particularly the microwave plasma burner for generating high-temperature large-volume plasma flame was presented. The plasma burner was composed of micvrowave transmission lines, a field applicator, discharge tube, coal and gas supply systems, and a reactor. The plasma burner is operated by injecting coal powders into a 2.45 GHz microwave plasma torch and by mixing the resultant gaseous hydrogen and carbon compounds with plasma-forming gas. We in this work used air, oxygen, steam, and their mixtures as a discharge gas or oxidant gas. The microwave plasma torch can instantaneously vaporize and decompose the hydrogen and carbon containing fuels. It was observed that the flame volume of the burner was more than 50 times that of the torch plasma. The preliminary experiments were carried out by measuring the temperature profiles of flames along the radial and axial directions. We also investigated the characteristics for coal combustion and gasification by analyzing the byproducts from the exit of reactor. As expected, various byproducts such as hydrogen, carbon monoxide, carbon dioxide, hydrogen sulfide, etc. were detected. It is expected that such burner cab be applied to coal gasification, hydrocarbon reforming, industrial boiler of power plants, etc.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.253.1-253.1
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• 2014

Plasma technology has been widely used for decontamination, differentiation, and disease treatment. Recently, studies show that plasma has effects on increasing seed germination and plant growth. In spite of increasing number of studies about plasma effects, the interaction between plasma and plants has been rarely informed. In this study, we have analyzed the effects of nonthermal atmospheric pressure plasma on seed germination and growth of coriander (Coriandum sativum), a medicinal plant. We used to Ar, air, and N2 plasma on seed as feeding gases. Plasma was discharged at 0.62 kV, 200 mA, 9.2 W. Seed germination was increased over time when treated with N2 based DBD plasma for exposure times of 30 seconds and 1 minute, everyday. After 7 days, about 80~100% of seeds were germinated in the treatment with N2 based DBD plasma, compared to control (about 40%, only gas treated seeds). In order to elucidate the mechanism of increased germination, we have analyzed characteristics of changes in plant hormones and seed surface structure by SEM.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.211.1-211.1
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• 2016

Several reports have demonstrated the wide range of nonthermal plasma applications in biomedical field including cancers, diabetics, wound healing and cosmetics. Recently, it has been shown that plasma is able to modulate the p38 MAPK and JUN level in cells which has a crucial role in melanin synthesis and skin pigmentation. Therefore we investigated the effect of plasma on melanogenesis in-vitro using melanoma (B16F10) cells and in-vivo using mouse and zebra fish. To investigate the mechanism of plasma action, plasma device characteristics were measured, reactive species inside and outside the cells were detected, and western blot was performed to find the signaling pathway involved in melanin activation in-vitro and in-vivo. This is the first report presenting the role of nonthermal plasma for melanogenesis which provides a new perspective of plasma in the field of dermatology.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.185.2-185.2
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• 2016

The plasma density is an essential plasma parameter describing plasma physics. Furthermore, it affects the throughput and uniformity of plasma processing (etching, deposition, ashing, etc). Therefore, a novel technique for plasma density measurement has been attracting considerable attention. Microwave probe is a promising diagnostic technique. Various type of cutoff, hairpin, impedance, transmission, and absorption probes have been developed and investigated. Recently, based on the basic type of probes, modified flat probe (curling and multipole probes), have been developing for in situ processing plasma monitoring. There is a need for comparative study between the probes. It can give some hints on choosing the reliable probe and application of the probes. In this presentation, we make attempt of numerical study of different kinds of microwave probes. Characteristics of frequency spectrum from probes were analyzed by using three-dimensional electromagnetic simulation. The plasma density, obtained from the spectrum, was compared with simulation input plasma density. The different microwave probe behavior with changes of plasma density, sheath and pressure were found. To confirm the result experimentally, we performed the comparative experiment between cutoff and hairpin probes. The sheath and collision effects are corrected for each probe. The results were reasonably interpreted based on the above simulation.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.56.2-56.2
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• 2015

Nonthermal Atmospheric Pressure Plasmas and their Applications to Plasma Bioscience and Medicines have been introduced for next generation human healthcare's quantum developments. Various kinds of nonthermal atmospheric pressure plasmas have been introduced and their electron temperature and plasma densities along with reactive oxygen and nitrogen species have been diagnosed and analyzed for biological cell interactions, especially, used in Plasma Bioscience Research Center (PBRC), Korea. Herein, we have also introduced the plasma-initiated ultraviolet photolysis, which might be a generation mechanism for the reactive oxygen and nitrogen species (RONS) intracellular and extracellular regions inside the liquid when the plasma has been bombarded onto the water. Finally we have investigated the interactions of these RONS with the various cancer cells resulting in apoptotic cell death.

• Journal of the Korean Vacuum Society
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• v.10 no.4
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• pp.411-415
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• 2001

Using the plasma that we developed to generate a low-temperature plasma at atmospheric pressure, we have investigated the etching possibility of tin oxide $(SnO_2)$ thin films. Hydrogen and methane radicals generated from the plasma were observed and their intensity was found to be dependent on the cathode material by an analysis with optical emission spectroscopy as well as by the plasma impedance. The etching ability of this plasma was evaluated by an emission intensity as well as by the evaluation of impedance using a plasma I-V curve.

• Proceedings of the Korean Vacuum Society Conference
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• 2003.02a
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• pp.230-230
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• 2003