• 한국재료학회지
• /
• 제5권5호
• /
• pp.568-574
• /
• 1995

We investigated the effects of B-doping on the growth mechanism of ZnO films. The B-doped ZnO films, which were widely applied for transparent conducting electrode, were deposited by plasma enhanced chemcial vapor depostion(PECVD) using diethylzinc(DEZ), No.sub 2/. and B$_{2}$H$_{6}$. The deposition conditions were a sbustrate temperature of 30$0^{\circ}C$, an rf power of 200, and a chamber pressure of 1 torr. At the given depostion condition, the growth rate of B-doped ZnO thin films was higher than that of undoped ones, but didn't change even with further increasing B$_{2}$H$_{6}$ flow rate and the interplanar distance between(0002) planes was reduced as B atoms substituted Zn sites.s.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2006년도 추계학술대회 논문집 전기물성,응용부문
• /
• pp.53-54
• /
• 2006

Arsenic doped p-type ZnO thin films have been realized on intrinsic (100) GaAs substrate by RF magnetron sputtering and thermal annealing treatment. p-Type ZnO exhibits the hole concentration of $9.684{\times}10^{19}cm^3$, resistivity of $2.54{\times}10^{-3}{\Omega}cm$, and mobility of $25.37\;cm^2/Vs$. Photoluminescence (PL) spectra of As doped p-type ZnO thin films reveal neutral acceptor bound exciton ($A^{0}X$) of 3.3437 eV and a transition between free electrons and acceptor levels (FA) of 3.2924 eV. Calculated acceptor binding energy ($E_A$) is about 0.1455 eV. Thermal activation and doping mechanism of this film have been suggested by using X-ray photoelectron spectroscopy (XPS). p-Type formation mechanism of As doped ZnO thin film is more related to the complex model, namely, $As_{Zn}-2V_{Zn}$, in which the As substitutes on the Zn site, rather than simple model, Aso, in which the As substitutes on the O site. ZnO-based p-n junction was fabricated by the deposition of an undoped n-type ZnO layer on an As doped p-type ZnO layer.

• 한국세라믹학회지
• /
• 제38권4호
• /
• pp.308-313
• /
• 2001

We report the effects of the V$_2$O$_{5}$ additive on the sintering behavior and microwave dielectric properties of ZnNb$_2$O$_{6}$ ceramics. Densification temperatures of V$_2$O$_{5}$-doped ZnNb$_2$O$_{6}$ samples are lowered to the range of 875-9$25^{\circ}C$ because of the liquid phase sintering. Doped samples are composed of a Zn(Nb,V)$_2$O$_{6}$ solid solution and second phases. Up to 5 wt% V$_2$O$_{5}$ is the only second phase, however, V$_2$O$_{5}$ also exists as the second phase for 10 wt% V$_2$O$_{5}$ addition. In comparison with reported values of undoped ZnNb$_2$O$_{6}$ ceramics, microwave properties of V$_2$O$_{5}$-doped ZnNb$_2$O$_{6}$ samples are seriously degraded, which is confirmed to originate from the second phases. The optimum microwave properties (Q$\times$f=13,800, $\varepsilon$$_{r}$=23, $\tau$$_{f}$=-66ppm/$^{\circ}C$) are obtained from ZnNb$_2$O$_{6}$ with the addition of 5 wt% V$_2$O$_{5}$ sintered at 90$0^{\circ}C$.90$0^{\circ}C$.EX>.

• Advances in nano research
• /
• 제5권3호
• /
• pp.193-201
• /
• 2017

ZnO, ZnO: Cu, Ga, and ZnO: Cu, Ga, Ag thin films were obtained by oxidization of ZnS and ZnS: Cu, Ga films deposited onto glass substrates by electron-beam evaporation from ZnS and ZnS: Cu, Ga targets and from ZnS: Cu, Ga film additionally doped with Ag by the closed space sublimation technique at atmospheric pressure. The film thickness was about $1{\mu}m$. The oxidation was carried out at $600-650^{\circ}C$ in air or in an atmosphere containing water vapor. Structural characteristics were investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM). Photoluminescence (PL) spectra of the films were measured at 30-300 K using the excitation wavelengths of 337, 405 and 457.9 nm. As-deposited ZnS and ZnS: Cu, Ga films had cubic structure. The oxidation of the doped films in air or in water vapors led to complete ZnO phase transition. XRD and AFM studies showed that the grain sizes of oxidized films at wet annealing were larger than of the films after dry annealing. As-deposited doped and undoped ZnS thin films did not emit PL. Shape and intensity of the PL emission depended on doping and oxidation conditions. Emission intensity of the films annealed in water vapors was higher than of the films annealed in the air. PL of ZnO: Cu, Ga films excited by 337 nm wavelength exhibits UV (380 nm) and green emission (500 nm). PL spectra at 300 and 30 K excited by 457.9 and 405 nm wavelengths consisted of two bands - the green band at 500 nm and the red band at 650 nm. Location and intensities ratio depended on the preparation conditions.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
• /
• pp.302-303
• /
• 2008

Nominally undoped (intrinsic) ZnO thin films were deposited by magnetron sputtering system with utilization of substrate bias on silicon at $450^{\circ}C$. Oxygen gas was selected as sputtering gas. The deposited thins were evaluated with X-ray diffraction (XRD) for their microstructure analysis and Hall effect in Van der Pauw configuration for their electrical property. The XRD shows that the magnitude and polarity of substrate bias significantly influence the microstructure and electrical properties.

• 한국전기전자재료학회논문지
• /
• 제11권8호
• /
• pp.601-606
• /
• 1998

ZnO thin film had been deposited on the glass by sputtering method, and the electrical and structural properties were investigated. When the rf power was 180W and sputtering was 10 m Torr at room temperature, Al-doped ZnO thin film had the lowest resistivity(1$\times10^{-4}\Omega\cdot{cm}$) and then carrier concentration and Hall mobility were $6.27\times10^{20} cm^{-3} and 22.04 cm^2/V\cdot$s, respectively. The undoped ZnO thin film had about 10$\times10^{14}\Omega\cdot cm$ resistivity when oxygen content was 10% or more at room temperature. When the oxygen content was 50% and below and sputtering pressure was 1.0$\times$1.0 \ulcorner Torr, the surface morphology of thin film observed by SEM was overall uniform.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
• /
• pp.421-422
• /
• 2013

Recently, ZnO has received attentionbecause of its applications in optoelectronics and spintronics. In order to investigate deep level defects in ZnO, we used N-doped ZnO with various of the N-doping concentration. which are reference samples (undoped ZnO), 27%, 49%, and 88%-doped ZnO. Photoinduced current transient spectroscopy (PICTS) measurement was carried out to find deep level traps in high resistive ZnO:N. In reference ZnO sample, a deep trap was found to located at 0.31 (as denoted as the CO trap) eV below conduction band edge. And the CN1 and CN2 traps were located at 0.09, at 0.17 eV below conduction band edge, respectively. In the case of both annealed samples at 200 and $300^{\circ}C$, the defect density of the CO trap increases and then decreases with an increase of N-doping concentration. On the other hands, the density of CN traps has little change according to an increase of N-doping concentration in the annealed sample at $300^{\circ}C$. According to the result of PICTS measurement for different N-doping concentration, we suggest that the CO trap could be controled by N-doping and the CN traps be stabilized by thermal annealing at $300^{\circ}C$.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
• /
• pp.204.1-204.1
• /
• 2013

Fluorine, the radius of which is close to that of oxygen, could be an appropriate anion doping candidate. A lower lattice distortion could be expected for F doping, compared with Al, Ga, and In doping. F-doped ZnO (FZO) and undoped ZnO nanorods were grown onto glass substrate by the hydrothemal method. The doping level in the solution, designated by F/Zn atomic ratio of was varied from 0.0 to 10.0 in 2.0 steps. To investigate the effects of the structure and optical properties of FZO nanorods were investigated using X-ray diffraction, UV-visible spectroscopy and photoluminescence (PL). For the PL spectra, the maximum peak position of NBE moves to higher energy, from 0 to 4 at.%. As the doping concentration increases, the maximum peak position of NBE gradually moves to lover energy, from 4 to 10 at.%.

• 한국결정성장학회:학술대회논문집
• /
• 한국결정성장학회 1997년도 Proceedings of the 13th KACG Technical Meeting `97 Industrial Crystallization Symposium(ICS)-Doosan Resort, Chunchon, October 30-31, 1997
• /
• pp.129-133
• /
• 1997

본 연구에서는 LiNbO$_3$ 단결정 소재의 광손상에 대한 저항성을 향상시키는 첨가물로 잘 알려져 이쓴 MgO 및 ZnO를 첨가하여 육성한 조화용융조성(congruent melting composition)의 LiNbO$_3$ 단결정의 domain 구조는 이들 dopants를 첨가함에 따라 single domain에서 ring 형태의 주기적인 domains으로 변화함을 확인하였고, 첨가된 이온이 domain 형성에 미치는 영향을 전자현미경(SEM-WDS)으로 관찰하였다. 또한, 육성한 [Li1-5xNb5(x-y)Mg(or Zn)5y]Nb1-4x+3yO3 단결정들의 유전율(전이온도) 변화 및 광학적 특성[광투과율, 굴절률]을 측정하여 undoped LiNbO$_3$단결정과 비교하였다. 첨가물을 첨가함에 따라 전이온도는 약 20~3$0^{\circ}C$정도 증가하였으며, 10-3 order의 굴절률 변동치를 나타내었다. 또한, 육성된 결정들의 투과율은 대체로 70~80%를 나타내었고, 첨가물을 첨가함에 따라 흡수단과 OH- 흡수 band는 단파장쪽으로 각각 약 5~10nm, 40nm이동됨을 확인하였다. 이는 LiNbO$_3$단결정의 광손상 저항성이 향상되었음을 간접적으로 보여주는 결과이다.

• Transactions on Electrical and Electronic Materials
• /
• 제8권6호
• /
• pp.234-240
• /
• 2007

The electrical properties and dc aging behavior for specified stress state of system, which is composed of quaternary Zn-Pr-Co-Cr, were investigated for different $Dy_2O_3$ addition doping level. As $Dy_2O_3$ doping level increased, the density decreased in the range of 5.51-4.90 $g/cm^3$, reaching maximum at 0.5 mol% and the average ZnO grain size decreased in the range of 17.7-6.0 ${\mu}m$. The incorporation of $Dy_2O_3$ significantly improved the non-ohmic properties, above 30 in non-ohmic coefficient, compared with that of undoped samples. The samples with the best performance of non-ohmic properties were obtained for $Dy_2O_3$ doping level of 1.0 mol%, with 49 in non-ohmic coefficient and 2.6 ${\mu}A/cm^2$ in leakage current. The samples with the highest stability were obtained for $Dy_2O_3$ doping level of 0.5 mol%.