• 제목/요약/키워드: Ultra Violet

검색결과 408건 처리시간 0.036초

자외선조사에 의한 Cation화 면직물의 문양염색 (Pattern Dyeing of Cationized Cotton Fabrics by Ultra Violet Rays Irradiation)

  • 김인희;이인석;남성우
    • 한국염색가공학회지
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    • 제14권2호
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    • pp.77-77
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    • 2002
  • Cotton fabrics dipped in cationic agent(3-chloro-2-hydroxypropyl trimethyl ammonium chloride) were irradiated with deep Ultra Violet Rays(UV), in the region of UV-C using the low pressure mercury lamp. The chemical changes of cationized cotton fabric surfaces were investigated by FT-IR analysis. The dyeabilities of the irradiated portions were investigated by dyeing with acid dyes. Deep UV(UV-C) irradiation broke O-H bonds in cotton fiber and oxidized the fibers. The dyeability of the UV irradiated portion were different from that of the portion not irradiated. Various pattern were gained from one bath dig dyeing by pattern mask. The tensile strengths of cotton fabrics were decreased in the UV irradiated portion. Washing fastness of cotton dyeings were good about 3∼4 grade and light fastness were fair about 2∼3 grade.

자외선조사에 의한 Cation화 면직물의 문양염색 (Pattern Dyeing of Cationized Cotton Fabrics by Ultra Violet Rays Irradiation)

  • 김인회;이인석;남성우
    • 한국염색가공학회지
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    • 제14권2호
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    • pp.1-8
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    • 2002
  • Cotton fabrics dipped in cationic agent(3-chloro-2-hydroxypropyl trimethyl ammonium chloride) were irradiated with deep Ultra Violet Rays(UV), in the region of UV-C using the low pressure mercury lamp. The chemical changes of cationized cotton fabric surfaces were investigated by FT-IR analysis. The dyeabilities of the irradiated portions were investigated by dyeing with acid dyes. Deep UV(UV-C) irradiation broke O-H bonds in cotton fiber and oxidized the fibers. The dyeability of the UV irradiated portion were different from that of the portion not irradiated. Various pattern were gained from one bath dig dyeing by pattern mask. The tensile strengths of cotton fabrics were decreased in the UV irradiated portion. Washing fastness of cotton dyeings were good about 3∼4 grade and light fastness were fair about 2∼3 grade.

나노임프린트 리소그래피와 유연 PVA 템플릿을 이용한 렌즈 표면 moth-eye 패턴 형성에 관한 연구 (Fabrication of Moth-Eye Pattern on a Lens Using Nano Imprint Lithography and PVA Template)

  • 배병주;홍성훈;곽신웅;이헌
    • 한국표면공학회지
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    • 제42권2호
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    • pp.59-62
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    • 2009
  • Antireflection pattern, moth-eye structure, was fabricated on lens using Ultra Violet nanoimprint lithography and flexible template. Ni template with conical shaped structure was used as a master template to molding. The flexible poly vinyl alcohol template was fabricated by molding. This poly vinyl alcohol template was used as an imprint template of imprint at lens. Using Ultra Violet nanoimprint lithography and poly vinyl alcohol template, polymer based moth-eye structure was formed on lens and its transmittance was increased up to 94% from 92% at 550 nm wavelength.

근 지구 우주환경이 위성에 미치는 영향

  • 이창호;한동인
    • 항공우주기술
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    • 제3권1호
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    • pp.86-96
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    • 2004
  • 우주 환경은 두꺼운 대기층에 의해 보호되는 지표 환경에서는 경험할 수 없는 여러 가지 위험 요소가 있다. 근 지구 궤도에서는 플라스마 대기 및 원자 산소 등에 의해 부식이 발생할 수 있으며, 강한 자외선과 입자 복사 등에 의해 위성을 구성하고 있는 재료나 전자 부품 등이 손상을 입을 수 있다. 따라서 위성의 설계 시에는 운용궤도에서 예상되는 환경요인을 적절히 예측하여 이에 대응하는 설계가 이루어지도록 해야 한다.

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Focused Ion Beam을 이용한 EUVL Mask Defect Isolation 및 Repair (EUVL Mask Defect Isolation and Repair using Focused Ion Beam)

  • 김석구;백운규;박재근
    • 반도체디스플레이기술학회지
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    • 제3권2호
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    • pp.5-9
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    • 2004
  • Microcircuit fabrication requires precise control of impurities in tiny regions of the silicon. These regions must be interconnected to create components and VLSI circuits. The patterns to define such regions are created by lithographic processes. In order to image features smaller than 70 nm, it is necessary to employ non-optical technology (or next generation lithography: NGL). One such NGL is extreme ultra-violet lithography (EUVL). EUVL transmits the pattern on the wafer surface after reflecting ultra-violet through mask pattern. If particles exist on the blank mask, it can't transmit the accurate pattern on the wafer and decrease the reflectivity. It is important to care the blank mask. We removed the particles on the wafer using focused ion beam (FIB). During removal, FIB beam caused damage the multi layer mask and it decreased the reflectivity. The relationship between particle removal and reflectivity is examined: i) transmission electron microscope (TEM) observation after particle removal, ii) reflectivity simulation. It is found that the image mode of FIB is more effective for particle removal than spot and bar mode.

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Electrical and Optical Properties in Transparent Conducting Oxides: Effect of Ultra Violet Irradiation

  • So, Byung-Soo;Hwang, Jin-Ha
    • 반도체디스플레이기술학회지
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    • 제6권1호
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    • pp.65-69
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    • 2007
  • A design of experiments was applied in order to investigate the effect of processing variables in UV irradiation on the electrical/optical properties in indium-zinc oxide thin films, The processing variables, equivalently input variables are listed as UV irradiation time, oxygen flow rate, and chamber pressure. The statistical significance of Ultra Violet (UV) treatment was confirmed using a paired-t test. The full factorial $2^3$ design was employed to determine significant main and interaction effects in UV irradiation process. The chamber pressure and the interaction between UV irradiation time and $O_2$ flow rate were found to be statistically significant at the significance level of 0.1. Furthermore, the optimized approach was proposed in achieving the improved conductivity after UV irradiation.

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An overview of new oxidation methods for polyacrylonitrile-based carbon fibers

  • Shin, Hye Kyoung;Park, Mira;Kim, Hak-Yong;Park, Soo-Jin
    • Carbon letters
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    • 제16권1호
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    • pp.11-18
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    • 2015
  • The process of oxidizing polyacrylonitrile (PAN)-based carbon fibers converts them into an infusible and non-flammable state prior to carbonization. This represents one of the most important stages in determining the mechanical properties of the final carbon fibers, but the most commonly used methods, such as thermal treatment ($200^{\circ}C$ to $300^{\circ}C$), tend to waste a great deal of process time, money, and energy. There is therefore a need to develop more advanced oxidation methods for PAN precursor fibers. In this review, we assess the viability of electron beam, gamma-ray, ultra-violet, and plasma treatments with a view to advancing these areas of research and their industrial application.

공조시스템에서 UV Ray의 조사 및 표면살균성능에 관한 실험적 연구 (Experimental Study on the Irradiation and Surface Sterilization Effect of Ultra Violet Ray in Air Conditioning System)

  • 홍진관
    • 설비공학논문집
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    • 제16권3호
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    • pp.250-257
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    • 2004
  • Recently, the use of UVC lamps inside building air-conditioning system has been increasing in both medical and nonmedical buildings for the control of environmental microorganisms. In the present study, irradiance performance test of UVC lamp was carried out and surface sterilization effect of UV ray was investigated by using UV ray irradiation experimental chamber and pilot system. Experimental results show that the effective irradiance of UVC lamp is strongly dependent on air velocity and temperature with exception of relative huminity in air-conditioning system. An individual microbiological kill effectiveness experiment also shows that the fractional kill of two microbiological samples such as E. Coli and Legionella is roughly the same as the estimated fractional kill in the case of chamber test and pilot system test.