• Journal of Microbiology and Biotechnology
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• 제31권7호
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• pp.912-920
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• 2021

SOS response is a conserved response to DNA damage in prokaryotes and is negatively regulated by LexA protein, which recognizes specifically an "SOS-box" motif present in the promoter region of SOS genes. Myxococcus xanthus DK1622 possesses a lexA gene, and while the deletion of lexA had no significant effect on either bacterial morphology, UV-C resistance, or sporulation, it did delay growth. UV-C radiation resulted in 651 upregulated genes in M. xanthus, including the typical SOS genes lexA, recA, uvrA, recN and so on, mostly enriched in the pathways of DNA replication and repair, secondary metabolism, and signal transduction. The UV-irradiated lexA mutant also showed the induced expression of SOS genes and these SOS genes enriched into a similar pathway profile to that of wild-type strain. Without irradiation treatment, the absence of LexA enhanced the expression of 122 genes that were not enriched in any pathway. Further analysis of the promoter sequence revealed that in the 122 genes, only the promoters of recA2, lexA and an operon composed of three genes (pafB, pafC and cyaA) had SOS box sequence to which the LexA protein is bound directly. These results update our current understanding of SOS response in M. xanthus and show that UV induces more genes involved in secondary metabolism and signal transduction in addition to DNA replication and repair; and while the canonical LexA-dependent regulation on SOS response has shrunk, only 5 SOS genes are directly repressed by LexA.

• 약학회지
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• 제36권5호
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• pp.449-454
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• 1992

The effect of radioprotective ginseng protein fraction on DNA repair capacity was determined by measuring the amount of $^{3}H-thymidine$ incorporated into DNA in the process of repair synthesis for UV damaged DNA. CHO-Kl cells were prepared whose semiconservative replication was inhibited by trimethylpsoralen plus near-UV(PUVA) treatment. When the cells were exposed to UV light alone, the DNA repair capacity was increased at first and then decreased as UV dose increased. However, when the ginseng fraction was treated to the cells, the DNA repair capacity was kept increasing regardless of UV dose increment. When the concentration of protein contained in the added fraction was increased gradually, the repair capacity was also increased almost linearly showing dose-response relationship of the effect. These results suggest that the enhancement of DNA repair capacity of the cell can be one of the mechanisms of radioprotection by the ginseng fraction.

• 한국동물학회지
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• 제23권4호
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• pp.203-218
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• 1980

DNA회복합성과 염색체이상, 자매염색분체 교환 및 복제억제 현상과의 연관성을 추구하기 위해서 $HF_1$, CHO 및 $HeLa S_3$ 세포를 재료로 자외선 또는 MMS를 처리하기전 또는 후에 ara-C를 처리하여 그 효과를 비교 검토하였다. (1) Ara-C는 자외선 및 MMS에 의한 DNA회복합성을 억제하였으며 이 억제효과는 ara-C를 후 처리한 경우 더욱 현저하였다. (2) Ara-C는 자외선이나 MMS에 의한 염색체 이상율을 증가시켰다. 특히 MMS 처리후 ara-C를 처리한 실험군에서는 염색체이상율이 상승효과를 보였는데 이는 염색분체 절단이 증가된 때문이었다. (3) Ara-C는 염색체이상에서와는 달리 자외선이나 MMS에 의한 자매염색분체 교환율을 증가시키지 않았다. 이는 특히 MMS군에서 전처리한 경우에 뚜렷하였다. (4) Ara-C를 처리하면 DNA합성율이 즉시 감소했다가 회복되었다. 그러나 ara-C와 자외선 EH는 MMS를 복합처리하면 DNA 합성양상이 처음에는 ara-C의 영향처럼 보이다가 뒤에는 자외선 또는 MMS에 의한 반응과 같이 나타났다. 이같은 결과들은 ara-C가 DNA 상해요인이 아님에도 염색체이상 또는 염색체분체교환 유발요인으로 작용함을 나타내며, DNA 회복기작이 염색체이상, 자매염색분체교환 및 복제억제 현상과 직접적인 상관성이 없음을 시사하는 것이다.

• 자연과학논문집
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• 제9권1호
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• pp.45-52
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• 1997

저농도의 MNNG가 Aspergillus nidulans의 생존도 및 돌연변이 유발에 끼치는 영향을 조사하였다. Nontoxic하고 submutagenic한 농도의 MNNG 선 처리는 높은 농도로 처리 시의 치사율 및 돌연변이 유발을 낮추지 못했다. 이러한 결과는 Aspergillus nidulans에는 MNNG 에 의한 adaptive response가 일어나지 않는다는 것을 시사하고 있다. 발아 과정의 첫 번째 체세포 분열에서, 시간별로 MNNG에 대한 치사율을 조사하고 UV에 의한 생존도와 비교하였다. UV나 MNNG 처리 시 치사율은 S 세포 시기 직전까지 증가하였다가, DNA 복제 시에는 감소함을 나타내었다. MNNG 처리 시는 UV와 달리 G2세포시기에 치사율이 가장 높았다.

• Archives of Pharmacal Research
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• 제11권2호
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• pp.93-98
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• 1988

To elucidate the reaction mechanism of ginseng protein on its antiradiation activity, its effects were studied on sister chromatid exchanges (SCE) induced by UV irradiation in CHO-KI cells. When cells were irradiated with 254 nm UV light at the dose of 0 to 8erg$\textrm{mm}^2$, the frequencies of CSE were increased more than two fold. However, when radio protective ginseng protein was added to the cells before the after UV irradiation, SCE frequencies were decreased significantly at all UV doses in both cases with no significant differences. As the amount of ginseng protein was varied from 100 to 500 .mu.g/ml, with UV irradiation at 60 erg$\textrm{mm}^2$, SCE frequencies dropped sharply at the first two concentrations and then reached a sort of plateau in both cases of pre-and post-treatment. When the ginseng protein was treated alone without UV irradiation, there were no changes in SCE frequencies no matter when the protein was added. There results suggest that the ginseng protein could reduced DNA damages, which may play an important role in the reaction mechanism of radioprotective activity of the protein.

• BMB Reports
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• 제32권6호
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• pp.554-560
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• 1999

TTD1BI cells are non-hypersensitive to UV irradiation and perform normal genome repair of pyrimidine dimers but fail to excise 6-4 photoproducts and, concomitantly, are unable to restore RNA synthesis levels following UV irradiation. This pointed to a detect in gene-specific repair and this study was undertaken to examine repair of 6-4 photoproducts at the gene-level. The results indicated a defect in gene-specific repair of 6-4 photoproducts in active genes, although strand-specificity of 6-4 photoproduct removal was essentially similar to that of normal cells. These findings indicate that the near normal UV resistance of TTD1BI cells may be due to the inability of these cells to remove DNA lesions preferentially, as well as to the cells opting out of the cell cycle to repair damage before resuming replication.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2005년도 춘계학술대회 논문집
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• pp.47-50
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• 2005

In this study, micro mirror array for small form factor optical pick-up was replicated by micro UV-molding. First, mold for micro mirror array was fabricated using micromachining. Also, to analyze the characteristics of the surface quality, flatness of replicated mirror surface were measured by white light scanning inteferometry system. The results show that the micro mirror array with a sufficient surface quality can be obtained by polymer replication process.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2007년도 춘계학술발표대회 및 제12회 신소재 심포지엄
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• pp.38.1-38.1
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• 2007

• 소성∙가공
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• 제20권1호
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• pp.11-16
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• 2011

Recently, according to the rapid development of display, many display applications, such as, cellular phone, navigation, monitor and LCD TV have been changed from CRT type to LCD type. BLU(Back Light Unit) is one of main parts in LCD unit and generally, it consists of a light source, a reflective sheet, a LGP(Light Guide Plate), a diffuser sheet, and two prism sheets. The most important component of BLU is a light guide plate, which diffuses the input light to the TFT-LCD module uniformly. The LGP is usually made by injection molding process, and it has numerous optical micro patterns on the surface. In the present study the micro-patterned stamper which has cylindrical shape was fabricated by using the UV-LiGA process. And the replication characteristics have been compared among three different kinds of injection molding process; general injection molding, injection/compression molding and RHCM(Rapid Heating and Cooling Molding). Average replication ratios of CIM and ICM were 19.1% and 64.6%, respectively. On the other hand, the average replication ratio of RHCM process showed the higher value of 98.4% among these. It show that maintaining the mold surface above $T_g$ could increase the replication ratio of micro patterns substantially.

• 대한기계학회논문집A
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• 제29권9호
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• pp.1169-1174
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• 2005

Imprint lithography is a promising method for high-resolution and high-throughput lithography using low-cost equipment. In particular, ultraviolet-nanoimprint lithography (UV-NIL) is applicable to large area imprint easily. We have proposed a new UV-NIL process using an elementwise patterned stamp (EPS), which consists of a number of elements, each of which is separated by channel. Experiments on UV-NIL are performed on an EVG620-NIL using the EPS with 3mm channel width. The replication of uniform sub 70 nm lines using the EPS is demonstrated. We investigate the nonuniformity of residual layer caused by wafer deformation in experiment with varying wafer thickness. Severely deformed wafer works as an obstacle in spreading of dropped resin, which causes nonuniformity of thickness of residual layer. Numerical simulations are conducted to analyze aforementioned phenomenon. Wafer deformation in the process is simulated by using a simplified model, which is a good agreement with experiments.