• 공업화학
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• 제17권2호
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• pp.158-162
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• 2006

새로운 극자외선 리소그래피용 화학증폭형 레지스트의 매트릭스 수지로 poly[4-hydroxystyrene-co-2-(4-methoxybutyl)-2-adamantyl methacrylate]를 합성하고 평가하였다. 이 중합체로 제조된 레지스트로 KrF 엑시머 레이저 노광장비를 사용하여 선폭 120 nm (피치 240 nm)를 구현할 수 있었다. 극자외선 리소그래피 장비를 이용하여 평가한 결과 선폭 50 nm (피치 180 nm)의 포지형 패턴을 얻었다. $CF_{4}$ 플라즈마를 이용한 건식에칭내성 평가 결과 기존 원자외선 레지스트용 매트릭스 수지인 poly(4-hydroxystyrene)보다 약 10% 향상되었다.

• 폴리머
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• 제32권4호
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• pp.313-321
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• 2008

UV개시에 의해 광경화형 아크릴 공중합체를 합성하고 제조된 아크릴 점착제(PSA)의 박리 에너지와 물리적 특성을 조사하였다. 이때 acrylic acid(AA)의 함량을 변화시켜 점착제의 물성을 변화시켰으며, 피착제의 표면 거칠기, 표면 요철방향, 점착제의 두께를 변화시킴으로써 박리 에너지의 변화 추이를 조사하였다. 공단량체인 acrylic acid의 함량이 증가함에 따라 표면 거칠기가 낮은 피착제가 높은 박리 에너지를 보였으며 점착제의 두께가 두꺼워 질수록 증가하였다. 또한 피착제 표면의 요철방향이 박리방향과 수평일 때 특히 높은 박리 에너지를 갖는 것으로 나타났다. 이것은 점착제의 두께 감소와 피착제 표면 거칠기의 증가가 wetting의 감소를 초래하지만 박리 시 저항력은 오히려 증가하는 경향을 나타내기 때문일 것이라는 예상과도 잘 일치한다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.1625-1628
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• 2006

Two different negative-type photosensitive polyimides were synthesized and characterized for an application as an interdielectric layer in TFTLCD array. In the case of photocurable polyimides, the photosensitive moiety, 2-HHSP, was synthesized through 3 step reaction, and then was incorporated into side chains of polyimide precursor by post reaction. Optimum compositions of negative-type photocurable polyimde were also formulated. For photopolymerizable polyimides, two novel UV monomers containing imide linkages were prepared. An aqueous alkaline developable polymer matrix was synthesized by free radical copolymerization. A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. It was found that viaholes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 영호남학술대회 논문집
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• pp.47-50
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• 2000

The optical characteristics of merocyanine dyes have been investigated widely due to their possible application to the high efficiency photo-electric devices. The optical systems are mostly fabricated using vacuum evaporation, casting and Langmuir-Blodgett method and the arrangement and orientation of dye molecules is one of the most important factors in the study on the optical characteristics. In this study, we fabricated the molecular systems through the LB techniques and investigated the optical characteristics of merocyanine dye LB film using the oscillation characteristics of quartz crystal. It was quite interesting behavior that the resistance and frequency shift at the parallel resonance under the UV irradiation.

• 한국결정성장학회지
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• 제9권5호
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• pp.459-462
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• 1999

Recent advances in NLO Borate Crystals for UV Generation are reviewed with the particular emphasis on the technique to improve the life time of UV optics. The laser-damage resistance of CLBO and fused silica surfaces was successfully improved after removing polishing compound by ion beam etching. The polishing compound embedded in the CLBO and fused silica surfaces were to a depth of less than 100nm. We were able to remove polishing compound without degrading the surface condition when the applied ion beam voltage was less than 200 V. The laser-induced surface damage threshold of CLBO was improved up to 15J/$\textrm{cm}^2$(wavelength: 355 nm, pulse width: 0.85 ns)as compared with that of the as-polished surface (11 J/$\textrm{cm}^2$). The laser-induced surface damage of fused silica also increased from 7.5J/$\textrm{cm}^2$ to 15J/$\textrm{cm}^2$. For the irradiation of a 266 nm high-intensity and high-repetition laser light, the surface lifetime of CLBO and fused silica could be more doubled compared with that of the as-polished surface.

• 한국인쇄학회지
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• 제26권2호
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• pp.45-54
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• 2008

We have manufactured a photoresist which has excellent dispersity and good applying property due to 330 cps of viscosity for environment-friendly and economical maskless screen plate making. And the photoresist applied on the screen stretched was exposed with mask by UV-LED light source so we could manufacture the photoresist which proper for the UV light source. And it was developed by air spray with $1.7\;kgf/cm^2$ of injection pressure. Because of the excellence of power and resolution of the UV-LED light sourse, the pencil hardness and solvent resistance of curing photoresist film were excellent as those of conventional photoresist film. Moreover the $100{\mu}m$-width stripe image which has sharp edges was formed. So we confirmed a possibility of dry development process by air spray method.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 춘계학술대회 논문집 디스플레이 광소자 분야
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• pp.185-188
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• 2005

We synthesized the two types of photoalignment material of high thermal resistance with hydroxyl aromatic polyimide, and studied the liquid crystal (LC) aligning capabilities on the photopolymer layers. Also, electro-optical (EO) performances for the twisted-nematic (TN)-liquid crystal display (LCD) photoaligned with linearly polarized UV exposure were investigated. A good LC alignment with UV exposure on the two types of photopolymer surface can be obtained. The Voltage-transmittance (V-T) curve in the photoaligned TN cell with UV exposure was different from two type. The response time of photoaligned TN cell was measured about 21 ms in two alkyl chain and about 15ms in four alkyl chain.

• 공업화학
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• 제5권4호
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• pp.698-705
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• 1994

Linseed oil fatty acid(LOFA), phthalic anhydride(PAA) 및 maleic anhydride(MA), trimethylol propane(TMP)을 사용하여 기본적인 유장(oil length) 50%의 중유성 기본 알키드를 합성하고 trimethylol propane triacrylate(TMPTA)를 그라프트 공중합시켜 MA/TMPTA 변성 알키드 수지를 제조하였다. 수지의 산가는 MA 첨가량으로 제어하였으며, 수용화에는 N,N-dimethylethanol amine(DMEA)를 사용하였다. TMPTA의 첨가량 변화에 의한 분자량, 유리 전이온도, 수용화 후의 점성도 및 그라프트율을 측정하였으며, 가교도막의 경화온도별 겔분율 변화를 조사하였다. 또한 멜라민 수지 경화 도막의 내열성, 내자외선성, 내수성 및 저장 안정성을 측정하고, TMA/TMPTA 변성 알키드 수지의 물성과 비교하였다. TMPTA의 첨가량이 증가할수록 수용화 후의 점성도, 겔분율, 그라프트율 및 분자량이 증가하였으며, 유리 전이온도(Tg)는 감소하였다. 고형분 함량에 따른 점성도 변화는 고형분 30%일 때보다 40%일 때가 더 낮게 나타났으며, 중화도에 따른 점성도 변화는 중화도가 높을수록 낮은 점성도를 나타내썼다. 내열성, 내자외선성, 내수성은 MA/TMPTA 변성 알키드 수지가 TMA/TMPTA 변성 알키드 수지보다 우수하였으나, 저장 안정성은 TMA/TMPTA 변성 알키드 수지가 우수함을 알 수 있었다.

• International Journal of Industrial Entomology and Biomaterials
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• 제24권1호
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• pp.1-5
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• 2012

A newly developed silkworm variety, GoldenSilk makes bright yellow cocoon. In this article, the basic characteristics of GoldenSilk cocoon were examined through color analysis, degumming characteristics and UV spectrophotometer. The colorant of GoldenSilk cocoon was not distributed evenly throughout the cocoon layer but existed in the outer layer of the cocoon. The colorant has not good resistance against sunlight. The degumming loss percentage of GoldenSilk cocoon was 29.2%, which is relatively higher than that of the authorized one. UV spectrophotometer showed specific absorption band around 400 to 500 nm, which is the specific yellow colorant of the GoldenSilk cocoon extracted to the degumming solution during the degumming process.

• 한국인쇄학회지
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• 제28권1호
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• pp.65-75
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• 2010

Environmentally friendly, stencil and screen printing for cost-effective for maskless. In this study, UV -LED light source for the dispersion characteristics and high competence photoresist coating was prepared. Wavelength of 365nm UV-LED exposure device using the maskless lithography, 1.7kgf/$cm^2$ $2600mmH_2O$ the injection pressure and the suction pressure by using a dry photoconductor symptoms were dry emulsion on the market as a result, curing properties and adhesion, hardness, solvent resistance and excellent reproduction of fine patterns and ecological stencil technology was available and could be confirmed as a possibility.