• 제목/요약/키워드: UV resin

검색결과 229건 처리시간 0.041초

자외선 안정제 첨가에 따른 문화재 보존처리용 에폭시계수지의 노화특성 연구 (A study on aging characteristics of epoxy resins for conservation treatment of cultural heritage by adding UV stabilizer)

  • 정세리;조남철
    • 분석과학
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    • 제24권5호
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    • pp.336-344
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    • 2011
  • 문화재 보존처리 시 사용되는 에폭시계수지에 플라스틱 첨가제 중 하나인 자외선 안정제를 첨가함으로써 수지의 광노화를 예방하는데 효과가 있는지 알아보고자 하였다. 문화재 접합 및 복원 과정에서 많이 사용되는 3가지 에폭시계수지에 HALS계와 UVA계 자외선 안정제를 농도별로 첨가하여 시편을 제작하였으며, 자외선 노화 실험을 실시하여 색도 변화, SEM 관찰, 접촉각, FT-IR 분석을 하였다. 또한 인장 전단 접착 강도 시험을 통해 자외선 안정제 첨가 유무에 따른 에폭시계수지의 물성 변화를 확인하였다. 분석 결과, 자외선 안정제를 첨가하여도 화학 구조상의 분해를 방지할 수 없지만 에폭시 R과 에폭시 A는 UVA계 자외선 안정제를 0.1% 이하 첨가함으로써 에폭시계수지의 접착 강도에 크게 영향을 미치지 않고 황변현상이나 균열과 같은 광노화로부터 최소화 할 수 있음을 확인하였다. 이를 통해 문화재접합 및 복원에 사용되는 에폭시계수지의 광노화 문제점을 보완하고 접합 및 복원재로서의 수명을 연장시킬 수 있을 것으로 기대된다.

Feasibility study on developing productivity and quality improved three dimensional printing process

  • Lee, Won-Hee;Kim, Dong-Soo;Lee, Taik-Min;Lee, Min-Cheol
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 2005년도 ICCAS
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    • pp.2160-2163
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    • 2005
  • Solid freeform fabrication (SFF) technology plays a major role in industry and represents a reasonable percentage of industrial rapid prototyping/tooling/manufacturing (RP/RT/RM) development applications. However, SFF technology still has long way to progress to achieve satisfactory process speed, surface finish and overall quality improvement of its application. Today, three dimensional printing (3DP) technique that is one of SFF technology is receiving many interests, and is applied by various fields. It can fabricate three dimensional objects of solid freeform with high speed and low cost using ink jet printing technology. However, need long curing time after manufacture completion. And it must do post-processing process necessarily to heighten strength of objects because strength of fabricated objects is very weak. Therefore, in this study, we proposed an improved 3DP process that can solve problems of conventional 3DP process. The general 3DP process is method to spout binder simply through printer head on powder, but proposed process is method to cure jetted UV resin by UV lamp after jet UV resin using printhead on powder. The hardening of resin is achieved strongly at early time by UV lamp in proposed method. So, the proposed process can fabricate three dimensional objects with high speed without any post-processing.

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UV경화수지의 고형상비 미세패턴 이형에 관한 연구 (A study on releasing high aspect ratio micro features formed with a UV curable resin)

  • 권기환;유영은;김창완;박영우;제태진;최두선
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2008년도 추계학술대회A
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    • pp.1833-1836
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    • 2008
  • Recently as the micro surface features become higher and diverse in their shapes, the releasing of the molded features becomes more crucial for manufacturing of the micro patterned products. The higher aspect ratio of the features or more complex shape of the features results in larger releasing force, elongation or cohesive failure of the features during the releasing. Another issue would be the uniformity of the released surface features after molding, especially for applications with large area surface. The micro patterned optical film, one of typical applications for micro surface features, consists of two layers, the thermoplastic base film and the micro formed UV resin layer. Therefore two interfaces are typically involved during the forming of this micro featured film; one is between the base film and the UV resin and another is between the resin and the pattern master. To improve the releasing of the molded surface features, the adhesive characteristic was investigated at these two interfaces. A PET film was used as a base film and two UV curable resins with different surface energy were prepared for different adhesiveness. Also the two different pattern masters were employed; one is made from brass-copper alloy and fabricated with PMMA. The adhesiveness at each interface was measured for some combinations of these base film, UV resins and the masters and the effect of this adhesiveness on the releasing was investigated.

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다중양각스탬프를 사용하는 UV 나노임프린트 리소그래피공정에서 웨이퍼 미소변형의 영향 (The effect of micro/nano-scale wafer deformation on UV-nanoimprint lithography using an elementwise patterned stamp)

  • 정준호;심영석;최대근;김기돈;신영재;이응숙;손현기;방영매;이상찬
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 추계학술대회 논문집
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    • pp.1119-1122
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    • 2004
  • In the UV-NIL process using an elementwise patterned stamp (EPS), which includes channels formed to separate each element with patterns, low-viscosity resin droplets with a nano-liter volume are dispensed on all elements of the EPS. Following pressing of the EPS, the EPS is illuminated with UV light to cure the resin; and then the EPS is separated from several thin patterned elements on a wafer. Experiments on UV-NIL were performed on an EVG620-NIL. 50 - 70 nm features of the EPS were successfully transferred to 4 in. wafers. Especially, the wafer deformation during imprint was analyzed using the finite element method (FEM) in order to study the effect of the wafer deformation on the UV-NIL using EPS.

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레진의 경화 반응을 고려한 UV-NIL공정의 열특성에 관한 실험 및 수치해석 연구 (Experiment and Numerical Study on Thermal Characteristics of UV-NIL Process Considering the Cure Kinetics of Photo-polymer)

  • 김우송;박경서;남진현;임흥재;장시열;이기성;정재일;임시형;신동훈
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2008년도 추계학술대회A
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    • pp.1847-1850
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    • 2008
  • The process conditions during ultraviolet nanoimprint lithography (UV-NIL) process such as temperature, stamping pressure, UV irradiation, etc. are effective factors for successful imprinting of complex and fine patterns. In this study, the effects of aluminum mold on the thermal characteristics of UV-NIL process were investigated through imprinting experiments and numerical simulations. The temperature of polymer resin on mold was measured to study thermal characteristics during UV curing. From the experimental and numerical results, the importance of curing reaction control for UV-NIL process was discussed for deformation characteristics.

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UV경화형 아크릴 수지와 콜로이드 실리카로 합성된 코팅막의 특성 (Properties of Coating Films Synthesized from Colloidal Silica and UV-curable Acrylate resin)

  • 강영택;강동필;한동희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.551-552
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    • 2007
  • Coating films were prepared from silane-terminated Colloidal silaca(CS) and UV-curable acrylate resin. The silane-terminated CSs were synthesized from CS and methyltrimethoxysilane(MTMS) and then treated with 3-methacryloxypropyltrimethoxysilane(MAPTMS)/3-glycidoxypropyltrimethoxysilane( GPTMS)/vinyltrimethoxysilane(VTMS) by sol-gel process, respectively. The silane-terminated CS and acrylate resin were hybridized using UV-curing system. Thin films of hybrid material were prepared using spin coater on the glass. Their hardness, contact angle and transmittance improved with the addition of silane-terminated CS.

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Synthesis, Curing and Properties of Silicone-Epoxies

  • Huang, Wei;Yuan, Youxue;Yu, Yunzhao
    • 접착 및 계면
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    • 제7권4호
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    • pp.39-44
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    • 2006
  • A new kind of silicone-epoxy composite is reported in this research. The silicone-epoxy resin was synthesized by the hydrosilylation of tetramethycyclotetrasiloxane and 4-vinyl-1-cyclohexene 1,2-epoxy with a high reaction yield. It was found that the obtained silicone-epoxy resin shows a high reactive activity to the aluminum complex-silanol catalyst. The resin could be cured under the catalysis of $(Al(acac)_3/Ph_2Si(OH)_2$ at a concentration below 0.1 wt% to give a hard cured resin showing excellent optical clarity, UV resistance and thermal stability. It was also found that the Si-H groups facilitated the curing reaction and the silicone-epoxy resin bearing Si-H group could be cured effectively even if $Ph_2Si(OH)_2h$ was absent. Moreover, the UV resistance and thermal stability were improved significantly by the introduction of Si-H groups. This is possibly due to the reductive property of Si-H groups which can annihilate radical and peroxide effectively. This kind of silicone-containing epoxy composite might have very promising applications as optical resin, optical adhesive and encapsulation materials for electronic devices.

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UV 나노임프린트 공정에서의 수지 액적 증발 거동 분석 (Analysis of the Evaporation Behavior of Resin Droplets in UV-Nanoimprint Process)

  • 최두순;김기돈
    • 소성∙가공
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    • 제18권3호
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    • pp.268-273
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    • 2009
  • Ultraviolet nanoimprint lithography (UV-NIL), which is performed at a low pressure and at room temperature, is known as a low cost method for the fabrication of nano-scale patterns. In the patterning process, maintaining the uniformity of the residual layer is critical as the pattern transfer of features to the substrate must include the timed etch of the residual layer prior to the etching of the transfer layer. In pursuit of a thin and uniform residual layer thickness, the initial volume and the position of each droplet both need to be optimized. However, the monomer mixtures of resin had a tendency to evaporate. The evaporation rate depends on not only time, but also the initial volume of the monomer droplet. In order to decide the initial volume of each droplet, the accurate prediction of evaporation behavior is required. In this study, the theoretical model of the evaporation behavior of resin droplets was developed and compared with the available experimental data in the literature. It is confirmed that the evaporation rate of a droplet is not proportional to the area of its free surface, but to the length of its contact line. Finally, the parameter of the developed theoretical model was calculated by curve fitting to decide the initial volume of resin droplets.