• Title/Summary/Keyword: UV replication

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The Regulation of LexA on UV-Induced SOS Response in Myxococcus xanthus Based on Transcriptome Analysis

  • Sheng, Duo-hong;Wang, Ye;Wu, Shu-ge;Duan, Rui-qin;Li, Yue-zhong
    • Journal of Microbiology and Biotechnology
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    • v.31 no.7
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    • pp.912-920
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    • 2021
  • SOS response is a conserved response to DNA damage in prokaryotes and is negatively regulated by LexA protein, which recognizes specifically an "SOS-box" motif present in the promoter region of SOS genes. Myxococcus xanthus DK1622 possesses a lexA gene, and while the deletion of lexA had no significant effect on either bacterial morphology, UV-C resistance, or sporulation, it did delay growth. UV-C radiation resulted in 651 upregulated genes in M. xanthus, including the typical SOS genes lexA, recA, uvrA, recN and so on, mostly enriched in the pathways of DNA replication and repair, secondary metabolism, and signal transduction. The UV-irradiated lexA mutant also showed the induced expression of SOS genes and these SOS genes enriched into a similar pathway profile to that of wild-type strain. Without irradiation treatment, the absence of LexA enhanced the expression of 122 genes that were not enriched in any pathway. Further analysis of the promoter sequence revealed that in the 122 genes, only the promoters of recA2, lexA and an operon composed of three genes (pafB, pafC and cyaA) had SOS box sequence to which the LexA protein is bound directly. These results update our current understanding of SOS response in M. xanthus and show that UV induces more genes involved in secondary metabolism and signal transduction in addition to DNA replication and repair; and while the canonical LexA-dependent regulation on SOS response has shrunk, only 5 SOS genes are directly repressed by LexA.

DNA Repair Enhancement by Radioprotective Ginseng Protein Fraction (항 방사선 인삼단백분획의 DNA수복능력 증진효과)

  • Kim, Choon-Mi;Choi, Mi-Kyung
    • YAKHAK HOEJI
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    • v.36 no.5
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    • pp.449-454
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    • 1992
  • The effect of radioprotective ginseng protein fraction on DNA repair capacity was determined by measuring the amount of $^{3}H-thymidine$ incorporated into DNA in the process of repair synthesis for UV damaged DNA. CHO-Kl cells were prepared whose semiconservative replication was inhibited by trimethylpsoralen plus near-UV(PUVA) treatment. When the cells were exposed to UV light alone, the DNA repair capacity was increased at first and then decreased as UV dose increased. However, when the ginseng fraction was treated to the cells, the DNA repair capacity was kept increasing regardless of UV dose increment. When the concentration of protein contained in the added fraction was increased gradually, the repair capacity was also increased almost linearly showing dose-response relationship of the effect. These results suggest that the enhancement of DNA repair capacity of the cell can be one of the mechanisms of radioprotection by the ginseng fraction.

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Effects of Ara-C on UV and MMS-induced Excision Repair, Chromosome Aberrations, Sister Chromatid Exchanges and Replication Inhibition (자외선과 MMS에 의한 절제회복, 염색체이상, 자매염색분체 교환 및 복제억제 현상에 미치는 Ara-C의 영향)

  • Park, Kyung-Hee;Park, Sang-Dai
    • The Korean Journal of Zoology
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    • v.23 no.4
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    • pp.203-218
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    • 1980
  • Unscheduled DNA synthesis, chromosome aberrations, sister chromatid exchanges and DNA replication inhibition induced by the combined treatments with ara-C and UV-light or MMS in $HF_1$, CHO and $HelaS_3$ cells were studied, and the results obtained were as follows: (1) Ara-C was found to inhibit UV-or MMS-induced unscheduled DNA synthesis and the inhibitory effect of ara-C was more remarkable in its post-treatment. (2) Ara-C enhanced the rate of chromosome aberrations induced by MMS or UV-light. Post-treatment with ara-C exhibited the synergistic effect on MMS-induced chromosome aberrations mainly by increases of chromatid deletions. (3) Contrarily, ara-C did not increase the rate of sister chromatid exchanges, particularly in the pre-treatment with MMS, although it was found to induce sister chromatid exchanges. (4) The rate of DNA synthesis was declined immediately after are-C treatment and then recovered. The combined treatments with ara-C and UV-light or MMS showed that the initial response on replication inhibition was similar to that of ara-C, but later responses were similar to that of UV-light or MMS treated group.

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Adaptive Responses on Survival and Mutagenesis during MNNG Pretreatmeat and Lethality to UV MNNG at Different Cell Stages in Aspergillus nidulans (Aspergillus nidulans에서 MNNG 선 처리시의 생존도와 돌연변이 유발에 대한 Adaptive response 및 Cell stage 따른 UV와 MNNG에 대한 치사율 조사)

  • Chae, Suhn-Kee
    • The Journal of Natural Sciences
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    • v.9 no.1
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    • pp.45-52
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    • 1997
  • We have examined the effects of low concentrations of MNNG, alkylating agent, in survival and mutagenesis in Aspergillus nidulans. Pretreatments of cells with nontoxic and submutagenic doses of MNNG did not reduce the cytotoxic and mutagenic effects of exposure to a high concentration of drug. The results imply that adaptive responses on survival and mutagenesis for MNNG treatments do not occur in Aspergillus nidulans. In the first mitotic cell cycle during germination, the sensitivity to MNNG has been investigated at hourly time interval, and compared with that for UV irradiation. In both UV and MNNG treatments, the sensitivity increased till S cell stage, and decreased while DNA replication continued. Different from that show for UV irradiation, lethality to MNNG reached to the maximum at G2 cell stage.

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Effects of Radioprotective Ginseng on Protein UV induced Sister Chromatid Exchanges

  • Kim, Choon-Mi;Choi, Jeong-Eun
    • Archives of Pharmacal Research
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    • v.11 no.2
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    • pp.93-98
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    • 1988
  • To elucidate the reaction mechanism of ginseng protein on its antiradiation activity, its effects were studied on sister chromatid exchanges (SCE) induced by UV irradiation in CHO-KI cells. When cells were irradiated with 254 nm UV light at the dose of 0 to 8erg$\textrm{mm}^2$, the frequencies of CSE were increased more than two fold. However, when radio protective ginseng protein was added to the cells before the after UV irradiation, SCE frequencies were decreased significantly at all UV doses in both cases with no significant differences. As the amount of ginseng protein was varied from 100 to 500 .mu.g/ml, with UV irradiation at 60 erg$\textrm{mm}^2$, SCE frequencies dropped sharply at the first two concentrations and then reached a sort of plateau in both cases of pre-and post-treatment. When the ginseng protein was treated alone without UV irradiation, there were no changes in SCE frequencies no matter when the protein was added. There results suggest that the ginseng protein could reduced DNA damages, which may play an important role in the reaction mechanism of radioprotective activity of the protein.

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Gene-Specific Repair of 6-4 Photoproducts in Trichothiodystrophy Cells

  • Nathan, Sheila;Van Hoffen, Anneke;Mullenders, Leon H.F.;Mayne, Lynne V.
    • BMB Reports
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    • v.32 no.6
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    • pp.554-560
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    • 1999
  • TTD1BI cells are non-hypersensitive to UV irradiation and perform normal genome repair of pyrimidine dimers but fail to excise 6-4 photoproducts and, concomitantly, are unable to restore RNA synthesis levels following UV irradiation. This pointed to a detect in gene-specific repair and this study was undertaken to examine repair of 6-4 photoproducts at the gene-level. The results indicated a defect in gene-specific repair of 6-4 photoproducts in active genes, although strand-specificity of 6-4 photoproduct removal was essentially similar to that of normal cells. These findings indicate that the near normal UV resistance of TTD1BI cells may be due to the inability of these cells to remove DNA lesions preferentially, as well as to the cells opting out of the cell cycle to repair damage before resuming replication.

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Fabrication of micro mirror array for small form factor optical pick-up by micro UV-molding (마이크로 UV 성형을 통한 초소형 광픽업용 마이크로 미러 어레이 제작)

  • Choi Yong;Lim Jiseok;Kim Seokmin;Sohn Jin-Seung;Kim Hae-Sung;Kang Shinill
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.05a
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    • pp.47-50
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    • 2005
  • In this study, micro mirror array for small form factor optical pick-up was replicated by micro UV-molding. First, mold for micro mirror array was fabricated using micromachining. Also, to analyze the characteristics of the surface quality, flatness of replicated mirror surface were measured by white light scanning inteferometry system. The results show that the micro mirror array with a sufficient surface quality can be obtained by polymer replication process.

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An Experimental Study on the Replication Ratio of Micro Patterns of 7 inch LGP using Injection/Compression and RHCM (사출/압축 및 RHCM 기술이 7인치 도광판 마이크로 패턴 전사성에 미치는 영향에 대한 실험적 연구)

  • Cho, S.W.;Kim, J.S.;Hwang, C.J.;Yoon, K.H.;Kang, J.J.
    • Transactions of Materials Processing
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    • v.20 no.1
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    • pp.11-16
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    • 2011
  • Recently, according to the rapid development of display, many display applications, such as, cellular phone, navigation, monitor and LCD TV have been changed from CRT type to LCD type. BLU(Back Light Unit) is one of main parts in LCD unit and generally, it consists of a light source, a reflective sheet, a LGP(Light Guide Plate), a diffuser sheet, and two prism sheets. The most important component of BLU is a light guide plate, which diffuses the input light to the TFT-LCD module uniformly. The LGP is usually made by injection molding process, and it has numerous optical micro patterns on the surface. In the present study the micro-patterned stamper which has cylindrical shape was fabricated by using the UV-LiGA process. And the replication characteristics have been compared among three different kinds of injection molding process; general injection molding, injection/compression molding and RHCM(Rapid Heating and Cooling Molding). Average replication ratios of CIM and ICM were 19.1% and 64.6%, respectively. On the other hand, the average replication ratio of RHCM process showed the higher value of 98.4% among these. It show that maintaining the mold surface above $T_g$ could increase the replication ratio of micro patterns substantially.

Analysis of Nonniformity of Residual Layer Thickness on UV-Nanoimprint Using an EPS(Elementwise Patterned Stamp) (EPS(Elementwise Patterned Stamp)를 이용한 UV 나노임프린트 공정에서 웨이퍼 변형에 따른 잔류층 분석)

  • Kim Ki-Don;Sim Young-Suk;Sohn Hyonkee;Lee Eung-Sug;Lee Sang-Chan;Fang Lingmei;Jeong Jun-Ho
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.29 no.9 s.240
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    • pp.1169-1174
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    • 2005
  • Imprint lithography is a promising method for high-resolution and high-throughput lithography using low-cost equipment. In particular, ultraviolet-nanoimprint lithography (UV-NIL) is applicable to large area imprint easily. We have proposed a new UV-NIL process using an elementwise patterned stamp (EPS), which consists of a number of elements, each of which is separated by channel. Experiments on UV-NIL are performed on an EVG620-NIL using the EPS with 3mm channel width. The replication of uniform sub 70 nm lines using the EPS is demonstrated. We investigate the nonuniformity of residual layer caused by wafer deformation in experiment with varying wafer thickness. Severely deformed wafer works as an obstacle in spreading of dropped resin, which causes nonuniformity of thickness of residual layer. Numerical simulations are conducted to analyze aforementioned phenomenon. Wafer deformation in the process is simulated by using a simplified model, which is a good agreement with experiments.