• Transactions on Electrical and Electronic Materials
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• v.10 no.1
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• pp.16-19
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• 2009

We have studied the liquid crystal alignment properties for various alignment methods on the homogeneous polyimide surface. Suitable liquid crystal alignment for one-side alignment cell on the polyimide surface by all alignment method was observed. Highly pre-tilt angle of the NLC for both-side rubbing cell was measured. But, low pre-tilt angle of the NLC for one-side ion beam and UV irradiation cell was observed. We consider that the pre-tilt angle of NLC for one-side ion beam and UV irradiation on the PI surface is lower than that of the PI surface with rubbing. Also, the suitable transmittance-voltage curves for the one-side rubbing TN-LCD on the PI surface with one-side UV irradiation were measured. Also, good response time characteristics of the one-side rubbing TN-LCD on the polyimide surface with one-side UV irradiation can be measured.

• 프린팅코리아
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• s.43
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• pp.144-147
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• 2006

인쇄업체들에게 고품질 인쇄와 빠른 작업전환을 제공하는 UV(Ultra Violet) 및 EB(Electron Beam) 경화 잉크는 꾸준하게 성장하고 있으며 향후에도 지속적인 기술발전 및 시장확대가 기대된다.

• Journal of Radiation Industry
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• v.7 no.1
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• pp.23-28
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• 2013

In this study, we fabricated high density polyethylene (HDPE) composites filled with antioxidants and UV stabilizers. The electron beam irradiation on the fabricated composites was carried out over a range of absorbed doses from 50 to 200 kGy to confirm the changes of discoloration. The changes of discoloration were characterized using a color difference meter and FT-IR for confirming the changes of the color difference and structural change. It was observed that the color difference of IRGANOX 1010-, IRGAFOS 168-, and TINUVIN 328- added HDPE was higher than that of the control HDPE by electron beam irradiation. The melting temperature of UV stabilizer-added HDPE was not significantly changed by electron beam irradiation. However, the melting temperature of phenol-containing antioxidant-added HDPE was increased with increasing the absorbed dose. And the melting temperature of phosphorus-containing antioxidant-added composite was decreased with increasing the absorbed dose.

• Laser Solutions
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• v.16 no.3
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• pp.27-31
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• 2013

To engrave high-density circuit-line patterns in IC substrates, we applied a projection ablation technique in which a dielectric ($ZrO_2/SiO_2$) mask, a DPSS UV laser instead of an excimer laser, a refractive beam shaping optics and a galvo scanner are used. The line/space dimension of line patterns of the dielectric mask is $10{\mu}m/10{\mu}m$. Using a ${\pi}$ -shaper and a square aperture, the Gaussian beam from the laser is shaped into a square flap-top beam; and a telecentric f-${\theta}$ lens focuses it to a $115{\mu}m{\times}105{\mu}m$ flat-top beam on the mask. The galvo scanner before the f-${\theta}$ lens moves the beam across the scan area of $40mm{\times}40mm$. An 1:1 projection lens was used. Experiments showed that the widths of the engraved patterns in a buildup film ranges from $8.1{\mu}m$ to $10.2{\mu}m$ and the depths from $8.8{\mu}m$ to $11.7{\mu}m$. Results indicates that it is required to increase the projection ratio to enhance profiles of the engraved patterns.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.05a
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• pp.13-13
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• 2004

나노테크놀러지 중의 한 가지인 나노임프린트 리소그래피 기술은 수 ∼ 수십 나노 급의 선폭을 가지는 스탬프(stamp)를 전자빔 리소그래피(electron beam lithography)를 이용하여 제작한 후 스탬프에 형성된 패턴과 동일한 형상을 원하는 곳에 모사하는 기술이다. 이 기술은 크게 열을 가하는 방식과 UV 경화성 수지를 이용한 방식으로 나뉜다. 열을 가하는 나노임프린트 리소그래피 방식의 경우는 열 경화성 수지를 이용하여 고온 조건에서 스탬프를 고압으로 눌러 원래의 형상을 모사하며, UV 나노임프린트는 광경화 반응을 이용하여 수지를 경화 시켜 모사하는 차이점이 있다.(중략)

• Polymer(Korea)
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• v.37 no.4
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• pp.431-436
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• 2013

Polycarbonate (PC) films have been irradiated with various kinds of ions according to energy and dose. Change of the optical transmittance and chemical characteristics were confirmed by UV-VIS and FTIR (ATR) spectroscopy respectively. These UV-A block in 400 nm was variable from 10 to 100% according to energy and doses. Surface electrical resistance of PC film irradiated by ion beam was $10^6-10^{13}{\Omega}/cm^2$, which reveal variation of conduction. Contact angle of film irradiated by ion beam was decreased than the pristine film. Polymer surface morphology was examined by means of atomic force microscopy (AFM). As expected, degradation of polymer film was higher after irradiation with heavier Xe ions but the roughness in the polymer surface morphology were more pronounced for Ar ions. This observed effect can be explained by stronger compaction of polymer surface layer in the case of Xe irradiation, connected with a reduction of free volume available.

• Applied Chemistry for Engineering
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• v.16 no.3
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• pp.449-455
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• 2005

Electron beam (EB) and ultraviolet (UV) curable monomers (AF-1 with mono functionality and AF-2 with tetra functionality) containing hydroxy and acrylate group for anti-fogging coating were synthesized and applied to EB and UV-curable coating systems. The synthesized reactive AF-1 and AF-2 monomers were first formulated into UV-curable system and the optimization of film properties for anti-fogging coating was investigated. The 5:17.5 ratio for AF-1 and AF-2 was found to be the best optimized formulation for anti-fogging coating without destroying the other essential properties such as hardness, solvent resistance, and adhesion. The optimized formulation was applied to the EB-curable system, and EB and UV-curable systems were compared. The results demonstrated that both EB and UV-cured films coated on PC sheet showed excellent anti-fogging properties; however, the EB-cured film exhibited better hardness, adhesion, and water repellent properties than the UV-cured film.

• Laser Solutions
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• v.15 no.3
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• pp.7-10
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• 2012

Dimensions (line/space) of circuits in IC substrates for high-end chips (e.g. CPU, etc.) are anticipated to decrease as small as $10{\mu}m/10{\mu}m$ in 2014. Since current etch-based circuit-patterning processes are not able to address the urgent requirement from industry, laser-based circuit patterning processes are under active research in which UV laser is used to engrave embedded circuits patterns into IC substrates. In this paper, we used a nanosecond UV laser to directly fabricate embedded circuit patterns into IC substrates with/without ceramic powders. In experiments, we engraved embedded circuit patterns with dimensions (width/depth) of abut $10{\mu}m/10{\mu}m$ and $6{\mu}m/6{\mu}m$ into the IC substrates. Due to the recoil pressure occurring during ablation, the circuit patterning of the IC substrates with ceramic powders showed the higher ablation rate.

• Laser Solutions
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• v.17 no.3
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• pp.19-23
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• 2014

To directly engrave circuit-line patterns as wide as $6{\mu}m$ in a buildup film to be used as an IC substrate, we applied a projection ablation technique in which an 8 inch dielectric ($ZrO_2/SiO_2$) mask, a DPSS 355nm laser instead of an excimer laser, a ${\pi}$-shaper and a galvo scanner are used. With the ${\pi}$-shaper and a square aperture, the Gaussian beam from the laser is shaped into a square flap-top beam. The galvo scanner before the $f-{\theta}$ lens moves the flat-top beam ($115{\mu}m{\times}105{\mu}m$) across the 8 inch dielectric mask whose patterned area is $120mm{\times}120mm$. Based on the results of the previous research by the authors, the projection ratio was set at 3:1. Experiments showed that the average width and depth of the engraved patterns are $5.41{\mu}m$ and $7.30{\mu}m$, respectively.

• Journal of Environmental Science International
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• v.8 no.6
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• pp.699-704
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• 1999

The Photodegradation efficient of total organic compounds in the drinking water has been studied using the methods of photocatalytic reaction and laser beam irradation. The results are summarized as follows; 1. The photodegradation efficiency of total organic compounds shows as $50\%\;to\;80\%$ as within one hour and after this the efficiency is decreased slowly. 2. The photodegradation efficiency of total organic compounds shows as 65 to $90\%$ within 3.3min. when Nd : YAG beam is irradiated to the water layer. 3. An excellent observation of the organic compound removal efficiency gives revealed in that case of the longest wavelength of 532nm is irradiated among the three kinds of laser beam sources of 532nm, 355nm and 266nm. 4. The organic compound removal efficiency shows high in the case of UV beam irradiation in the thin layer of water. However the efficiency is not depended on the thickness of water layer severely. 5. The removal efficiency of the organic compounds in the direct irradiation shows higher than the indirect irradiation in the case of UV beam, but the efficiency is not depended on the direction of irradiation in the case of Nd : YAG beam irradiation.