• 제목/요약/키워드: UV Intensity

검색결과 513건 처리시간 0.022초

UV/Ozone 복합 살균기의 살균력 개선 연구 (Improvement of a UV/Ozone Duplex Sterilizer)

  • 지정은;양원균;박은철;김강석;주정훈
    • 한국표면공학회지
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    • 제41권2호
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    • pp.76-82
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    • 2008
  • We investigated sterilization characteristics of UV lights by counting the number of bacteria units with varying sterilization time and distance from the light source. We focused on an idea that UV light of 184.9 nm could generate ozone and developed a new sterilizer. The UV-ozone duplex system sterilized bacteria faster than UV-only sterilizers. To reduce shadowing effects by target objects, we used UV transparent quartz plate as a support and put a reflecting plate. Distribution of UV irradiation intensity and ozone supply were analyzed by a 3D model and measured by a semiconductor UV sensor. But even with an Al reflector, multi-layered pens could not be treated properly from UV irradiation only. Ozone generating lamp could treat more uniformly multi-layered pens with a stirring fan by supplying ozone to shadowed surfaces.

전산유체역학을 활용한 개수로형 UV소독장비의 해석기법 연구 (Study on CFD Methodology for a Open Channel Type UV Reactor)

  • 황우철;박정규;김현수;이경혁;조진수
    • 한국유체기계학회 논문집
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    • 제18권2호
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    • pp.54-59
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    • 2015
  • The performance of UV reactor which is used in water treatment is strongly affected by UV fluence rate and water flow in the UV reactor. Therefore, CFD tools are widely used in designing process of UV reactors. This paper describes the development of a computational fluid dynamics (CFD) methodology that can be used to calculate the performance of open channel type UV reactor used in wastewater treatment plant. All computations were performed using commercial CFD code, CFX, by considering three dimensional, steady, incompressible flow. The Eulerian-Eulerian multi-phase method were used to capture the water-air interface. The MSSS model, provided by UVCalc3D, was used to calculate the UV intensity field. The numerical predictions and calculated UV Dose were compared with experimental dataset to validate the CFD methodology. The reactor performance based on MS2 log reduction was well matched with measurements within 6%.

충전층 반응기와 고정화 TiO2/UV를 이용한 Rhodamine B의 광촉매 탈색 (Photocatalytic Decolorization of Dye Using Packed-bed Reactor and Immobilized TiO2/UV System)

  • 김동석;박영식
    • 한국환경과학회지
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    • 제16권3호
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    • pp.255-260
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    • 2007
  • The photocatalytic decolorization of Rhodamine B (RhB) was studied using packed-bed reactor and immobilized $TiO_2/UV$ System. The 20 W UV-A, UV-B and UV-C lamps were employed as the light source. The effect of shape and surface polishing extent of reflector, distance between the reactor and reflector, reactor material were investigated. The results showed that the order of the initial reaction constant with reflector shape was round > polygon > W > rhombus. The optimum distance between the reactor and reflector was 2 cm. The initial reaction constant of quartz reactor was 1.46 times higher than that of tile PVDF reactor.

UV-B 강도 변화가 오이(Cucumis sativus L.)의 생장, 광합성 및 색소에 미치는 영향 (Effects of different UV-8 levels on the growth, photosynthesis and pigments in cucumber(Cucumis sativus L.))

  • 김학윤;이인중;신동현;김길웅
    • 생명과학회지
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    • 제8권3호
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    • pp.272-278
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    • 1998
  • UV-B 강도 변화가 식물의 생장에 미치는 영향을 조사하기 위하여, 오이를 이용하여 3주간 3단계의 UV-B[일일 평균 UV-$B^{BE}$; 무처리(0.03), 저UV-B(6.40), 고UV-B(11.32) kJ $m^{-2}$]조사 실험을 수행하였다. 3주간의 UV-B 조사에 의해 건물중 및 엽면적은 고UV-B 처리와 저UV-B 처리에서 각각 60%와 40% 정도의 감소를 보였으나, 엽중비는 증가하였다. UV-B에 의해 고UV-B 처리에서 약 45%, 저UV-B 처리에서 약 37%의 광합성속도의 감소를 나타내었으나 증산속도의 변환느 나타나지 않았다. 총 엽록소 함량은 UV-B 강도의 증가에 따라 감소하였으며, UV-흡수물질인 flavonoid의 함량은 고UV-B 처리에서 약 19% 저UV-B처리에서 약 14%의 증가를 보였다. 이상의 결과로 볼 때 UV-B조사는 오이 식물에 극심한 생육 저해를 나타내었으며, 그 피해는 UV-B 강도에 따라 증가하였다. 따라서 현재 지구에 도달하는 태양UV-B에 의해서도 오이식물은 영향을 받고 있는 것으로 사료되며, 장래 예상되는 오존층 감소에 의해서도 생육장해를 나타낼 것으로 사료된다.

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초음파와 UV에 의한 페놀 분해 특성에 관한 연구 (A Study on the Characteristics of Sonication Combined with UV in the Degradation of Phenol)

  • 김성근;손현석;임종권;김지형;조경덕
    • 대한환경공학회지
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    • 제32권7호
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    • pp.649-655
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    • 2010
  • 본 연구에서는 난분해성 물질인 페놀을 초음파와 자외선 광선(UV-C)을 이용하여 분해를 알아본 연구이다. 초음파, 자외선, 그리고 초음파와 자외선의 결합반응에서 주파수, 온도, 용액의 pH, 아르곤 가스 purging, 그리고 자외선 세기의 효과를 조사하였다. 초음파 단독 반응의 경우 pH 4, $5^{\circ}C$, 35kHz에서 360분 동안 30%의 페놀의 최적 분해효율을 보였다. 자외선(UV-C) 단독 반응의 경우 $19.3\;mW/cm^2$의 자외선 세기와 pH 4, $5^{\circ}C$에서 60분에 100%의 페놀 분해 효율을 보였다. 이에 반하여 초음파와 자외선의 결합반응에서는 동일 조건에서 45분 동안 페놀이 모두 제거되었다. 초음파와 자외선의 결합 반응에서 페놀은 자외선 강도가 $7.6\;mW/cm^2$일 때 360분 안에 $19.3\;mW/cm^2$일 때는 45분 안에 완전히 분해되었고, 각각의 분해 속도 상수는 $17.3{\times}10^{-3}\;min^{-1}$$138.1{\times}10^{-3}\;min^{-1}$이었다. 페놀의 분해반응에서 OH 라디칼의 scavenger로 작용하는 메탄올을 첨가하는 실험을 한 결과 초음파와 자외선 광선의 조합반응에서 페놀 분해의 주요인자는 OH 라디칼이라는 것을 확인할 수 있었다. 페놀 분해의 반응효율 비교는 초음파 + 광반응 조합반응 > 자외선 광선 단독 반응 > 초음파 단독 반응과 같이 확인되었다.

나노 구조의 패턴을 갖는 n-type GaN 기판을 이용한 380 nm UV-LED의 광 추출 효율 개선 (Improvement in Light Extraction Efficiency of 380 nm UV-LED Using Nano-patterned n-type Gan Substrate)

  • 백광선;조민성;이영곤;;송영호;김승환;김재관;전성란;이준기
    • 한국재료학회지
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    • 제21권5호
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    • pp.273-276
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    • 2011
  • Ultraviolet (UV) light emitting diodes (LEDs) were grown on a patterned n-type GaN substrate (PNS) with 200 nm silicon-di-oxide (SiO2) nano pattern diameter to improve the light output efficiency of the diodes. Wet etched self assembled indium tin oxide (ITO) nano clusters serve as a dry etching mask for converting the SiO2 layer grown on the n-GaN template into SiO2 nano patterns by inductively coupled plasma etching. PNS is obtained by n-GaN regrowth on the SiO2 nano patterns and UV-LEDs were fabricated using PNS as a template. Two UV-LEDs, a reference LED without PNS and a 200 nm PNS UV-LEDs were fabricated. Scanning Electron microscopy (SEM), Transmission Electron Microscopy (TEM), X-Ray Diffraction (XRD), Photoluminescence (PL) and Light output intensity- Input current- Voltage (L-I-V) characteristics were used to evaluate the ITO-$SiO_2$ nanopattern surface morphology, threading dislocation propagation, PNS crystalline property, PNS optical property and UVLED device performance respectively. The light out put intensity was enhanced by 1.6times@100mA for the LED grown on PNS compared to the reference LED with out PNS.

태양광/광촉매를 이용한 오폐수 살균특성 (Disinfection Characteristic of Sewage Wastewater Treatment Using Solar Light/TiO2 Film System)

  • 조일형;이내현;안상우;김영규;이승목
    • 한국환경과학회지
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    • 제15권7호
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    • pp.677-688
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    • 2006
  • Currently, the application of $TiO_2$ photocatalyst has been focused on purification and treatment of wastewater. However, the use of conventional $TiO_2$ slurry photocatalyst results in disadvantage of stirring during the reaction and of separation after the reaction. And the usage of artificial UV lamp has made the cost of photocatalyst treatment system high. Consequently, we studied that solar light/$TiO_2$ film system was designed and developed in order to examine disinfection characteristics of sewage wastewater treatment. The optimum conditions for disinfection such as solar light intensity, characteristic of sewage wastewater, amounts of $TiO_2$ and comparison of solar ligth/$TiO_2$ systems with UV light/$TiO_2$ system was examined. The results are as follows: (1) photocatalytic disinfection process with solar light in the presence of $TiO_2$ film more effectively killed total coliform (TC) than solar light or $TiO_2$ film absorption only. (2) The survival ratio of TC and residual ratio of organic material (BOD, CODcr) decreased with remain resistant material. (3) The survival ratio of TC and residual ratio of organic material (BOD, CODcr) decreased with the increase of amounts of $TiO_2$. (4) TC survival ratio decreased linearly with increasing UV light intensity. (5) The disinfection effect of solar light/$TiO_2$ slurry system decreased more than UV light/$TiO_2$ film systems. (6) The disinfection reaction followed first-order kinetics. We suggest that solar light instead of using artificial UV light was conducted to investigate the applicability of alternative energy source in the disinfection of TC and the degradation of organic material.

UV/TiO2 광촉매반응에 의한 페놀의 분해 특성 (Characteristics of Phenol Degradation by using UV/TiO2 Photocatalysis)

  • 신인수;최봉종;이승목
    • 한국물환경학회지
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    • 제20권5호
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    • pp.488-493
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    • 2004
  • The effects were examined from several conditions of $TiO_2$ photocatalysis reaction to phenols degradation by changing it's reacting conditions such as phenol concentration, pH, $TiO_2$ concentration, $H_2O_2$ concentration, flow rate, and intensity of ultraviolet rays. Phenol degradation was more efficient in low concentration of phenol, neutral pH. Phenol degradation appeared to increase as concentration of $TiO_2$ photocatalyst, that of $H_2O_2$ and intensity of ultraviolet rays increased. As $TiO_2$ dosage increased, initial rate constant k linearly increased. When $H_2O_2$ was injected more than optimum, phenol removal rate didn't increase in proportional to the change of $H_2O_2$ concentration as OH radicals was being consumed. When flow rate is less than $4.75m^3/m^2$ day, phenol removal efficiency appeared to decrease as ultraviolet rays transmission rate becomes low by $TiO_2$ suspension coated in photo reaction column. Meanwhile, initial rate constant according to light intensity change in less than $25mW/cm^2$ appeared to be in proportion to light intensity ($mW/cm^2$) Removal efficiency decreased about 12% after 180 minutes of reaction time while showed stable removal efficiency of 100% after 300 minutes when using regenerated $TiO_2$.

UV 화염감지기의 감지성능에 대한 분진분위기의 영향 (Influence of Dust Environment on the Detection Capability of Ultraviolet Flame Detector)

  • 김홍;호예
    • 한국가스학회지
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    • 제1권1호
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    • pp.113-119
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    • 1997
  • UV 화염감기의 분진분위기에서의 성능저하를 고찰하기 위하여 세제분말, 탄진 및 분말 소화약제의 분진운을 형성하였고 LPG 및 가솔린 화염을 사용하여 UV 화염감지기의 감지성능을 고찰하였다. 분진 분위기 하에서의 UV 화염감지기의 성능을 분진의 농도와 분진층의 거리가 증가함에 따라 뚜렷한 증가를 보였으며, 분진의 화학적, 물리적 특성에 커다란 영향을 받았다. 따라서 UV 화염감지기를 분진 분위기에서 사용한 경우 특별한 주의를 기울일 필요가 있는 것으로 사려된다.

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광학모델을 이용한 자외선 접촉조 최적 설계에 관한 연구 (A Study on Optimal Design of UV Contactor using an Optical Radiation Model)

  • 최영균;김두일;김성홍
    • 한국물환경학회지
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    • 제25권4호
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    • pp.547-552
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    • 2009
  • Because of refractory property of light, the travel path of UV light becomes longer than the straight line and shorter solely in water as UV light passes sequentially through air, quartz and water. Note that water significantly absorbs UV light. Hence, UV intensity shall be estimated to be lower when refraction is neglected than it is considered. Reflection is also critical for the design of UV radiation system. While the reflection at the interface of air and quartz is low enough to ignore, it is too high to be ignored at the interface of quartz and water. Assuming constant power, smaller length to width ratio of UV reactor is beneficial and single-lamp system is preferred to multi-lamps. Under the given cross section, optimal lamp positions could be decided. For example of an elliptical reactor with dual lamps, the optimal lamp locations shall be the 1/3 and 2/3 position of the longer axis.