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Liquid Crystal Alignment Effect using in-situ Photoalignment on Flexible TN cell (In-situ 광배향법을 이용한 Flexible TN 셀의 액정배향 효과)

  • Nam, Ki-Hyung;Hwang, Jeoung-Yeon;Lee, Whee-Won;Choi, Myung-Gil;Suh, Dong-Hack;Kim, Young-Hwan;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11a
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    • pp.506-509
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    • 2004
  • We have investigated the generation of pretilt angle for a nematic liquid crystal (NLC) alignment with in-situ photoalignment method on polyimide (PI) surfaces using thin plastic substrates. The LC aligning capabilities and pretilt angle of the thin plastic substrates by in-situ photoalignment method were better than that of the glass substrate by general photoalignment. Also, the LC pretilt angle increased with increasing heating temperature and exposure time. And EO characteristics of photoaligned TN-LCDs using in-situ photodissociation method on glass substrate and on plastic substrate are also excellent.

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The electrical properties of ZnO transparent conducting films by doping amounts of $Al_2O_3$ (ZnO 투명전도막의 $Al_2O_3$의 도핑농도에 따른 전기적 특성)

  • Kim, Byung-Sub;Lee, Sung-Wook;Lee, Soo-Ho;Lim, Dong-Gun;Lee, Se-Jong;Park, Min-Woo;Kwak, Dong-Joo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.969-972
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    • 2004
  • Al doped Zinc Oxide(ZnO:Al) films, which is widely used as a transparent conductor in optoelectronic devices such as solar cell, liquid crystal display, plasma display panel, thermal heater, and other sensors, were prepared by using the capacitively coupled DC magnetron sputtering method. In this paper the effect of doping amounts of $Al_2O_3$ on the electrical, optical and morphological properties were investigated experimentally, The results show that the structural and electrical properties of the film are highly affected by the doping. The optimum growth conditions were obtained for films doped with 2 wt% of Al203 which exhibit a resistivity of $8.5{\times}10^{-4}{\Omega}-cm$ associated with a transmittance of 91.7 % for 840 nm in film thickness in the wavelength range of the visible spectrum.

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Quench characteristic of flux-lock type HTSC FCL (자속구속형 고온초전도 전류제한기의 퀜치특성)

  • Lim, Sung-Hun;Han, Tae-Hee;Park, Hyoung-Min;Cho, Yong-Sun;Lee, Na-Young;Hwang, Jong-Sun;Choi, Hyo-Sang;Han, Byoung-Sung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.05a
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    • pp.146-148
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    • 2006
  • The quench characteristics of flux-lock type high-Tc superconducting fault current limiters(SFCL) was investigated, $YBa_2Cu_3O_{7-x}$(YBCO) thin film was used as the current limiting elements of the flux-lock type SFCL. The quench characteristics of current limiting elements consisting of the flux-lock type SFCL was more improved than that of the resistive type SFCL.

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Characteristics under the Iron Core Conditions of the Flux-lock Reactor (자속구속리액터의 철심조건에 따른 특성)

  • Lee, Na-Young;Choi, Hyo-Sang;Park, Hyoung-Min;Cho, Yong-Sun;Nam, Gueng-Hyun;Han, Tae-Hee;Lim, Sung-Hun
    • Proceedings of the KIEE Conference
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    • 2006.07b
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    • pp.875-876
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    • 2006
  • Superconducting fault currents(SFCLs) are expected to improve not only reliability but also stability of power systems. The analysis on current limiting operations of the flux-lock type SFCL, which consists of a flux-lock reactor wound an iron core and a YBCO thin film, was compared the open-loop with the closed-loop iron core of the subtractive polarity winding. In the SFCL, operation characteristics could be controlled by adjusting the inductances and the winding directions of the coils, then magnetic field induced in the iron core. The current limiting characteristics under the same experimental conditions were generated regardless of the iron core conditions. We confirmed that capacity of the SFCL was increased effectively by the closed-loop iron core. However, the power burden of the system could be lowered by the open-loop iron core.

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The Analysis of Operation Characteristics of Flux-Lock Type High-Tc Superconducting Fault Currents Limiter (자속 구속형 고온초전도 전류제한기의 동작특성 분석)

  • Park Chung-Ryul;Lim Sung-hun;Park Hyoung-Min;Lee Jong-Hwa;Ko Seokcheol;Choi Hyo-Sang;Han Byoung-Sung;Hyun Ok-Bae;Chung Dong-Chul
    • Proceedings of the KIEE Conference
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    • summer
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    • pp.1130-1132
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    • 2004
  • In this paper, we investigated the operational characteristics of the fault current limiting in the The flux-lock type high-Tc superconducting fault current limiter. The flux-lock type high-Tc superconducting fault current limiter was consisted of primary and secondary copper coils that flux was locked on iron core and YBCO thin film. The operational characteristic of a flux-lock type SFCL dependent on winding direction of coil 1 and coil 2, and the number of turns of coil 1 and coil 2, inductances of the coils, saturation in iron core, the properties of superconducting element etc. In this cases, we investigated the fault currents limiting characteristics of the flux-lock type SFCL when winding direction of coil 1 and coil 2 was subtractive polarity winding.

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Electrical Properties of SBT Capacitor with top electrodes (상부전극에 따른 SBT 커패시터의 전기적 특성)

  • Jo, Chun-Nam;O, Yong-Cheol;Kim, Jin-Sa;Sin, Cheol-Gi;Choe, Un-Sik;Kim, Chung-Hyeok;Park, Yong-Pil;Hong, Jin-Ung;Lee, Jun-Ung
    • Proceedings of the KIEE Conference
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    • 2003.07c
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    • pp.1499-1501
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    • 2003
  • The A $Sr_{0.7}Bi_{2.6}Ta_2O_9$(SBT)thin films are deposited on Pt-coated electrode(Pt/$TiO_2/SiO_2$/Si) using RF magnetron sputtering method. The electrical properties of SBT capacitors with top electrodes were studied. In the XRD pattern, the SBT thin films in all annealing temperatures had (105) orientation. In the SEM images, Bi-layered perovskite phase was crystallized at $750^{\circ}C$ and grains largely grew in oxygen annealing atmosphere. The electrical properties of SBT capacitor with top electrodes represents a favorable properties in Pt electrode. The maxim urn remanent polarization and the coercive electric field with Pt electrode are $12.40C/cm^2$and 30kV/cm respectively. The dielectric constant and leakage current density with Pt electrode is 340 and $6.8110^{-10}A/cm^2$ respectively.

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A study on properties of ZnO:Al films on PC substrate for solar cell applications (태양전지 응용을 위한 PC 기판상의 ZnO:Al 박막 특성에 관한 연구)

  • Na, Young-Il;Kim, Young-Dong;Lee, Jae-Heong;Jung, Hak-Kee;Lee, Jong-In;Lim, Dong-Gun;Yang, Kea-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.357-360
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    • 2004
  • Al doped ZnO thin films have been were properties of excellent optical transmittance, low resistivity and wide bandgap where be widely used transparent electrode on solar cell. In this paper, ZnO:Al thin films on PC substrate were prepared by RF magnetron sputtering method using ceramic taget with diffrent deposition conditions. In addition, the electrical, structural, optical properties were investigated. we investigated sample properties of Sputter powers and pressures change in $25{\sim}125W,\;2{\times}10^{-2}{\sim}2{\times}10^{-3}Torr$.

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Anaysis of resistance variance of Resistive type high-Tc superconducting fault current limiter (저항형 고온 초전도 전류제한기의 저항변화 분석)

  • Park, Hyoung-Min;Choi, Hyo-Sang;Lim, Sung-Hun;Park, Chung-Ryul;Han, Byoung-Sung;Chung, Hun-Sang;Choi, Chang-Joo;Hyun, Ok-Bae;Chung, Dong-Chul
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.547-550
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    • 2004
  • Superconducting fault current limiter(SFCL) is expected to be introduced into electric power system in future as an effective countermeasure for the increase of the short-circuit current due to the growth of the electric power system. SFCL has a merit that the fault current can be limited by the resistance generated when a superconductor transits from a superconducting state to a normal state without additional detecting device. In this paper, we investigated the resistance variance of resistive type SFCL and the fault current limiting characteristics due to the amplitude of source voltage. We could obtain the more effective fault current limiting characteristics of SFCL as the source voltage increased.

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Residual DC characteristic on Twisted Nematic Liquid Display on the Polyimide Surface by the Thermal Stress (열적 stress에 의한 폴리이미드 표면에서의 TN-LCD의 잔류DC 특성)

  • Bae, Yu-Han;Hwang, Jeoung-Yeon;Kim, Jong-Hwan;Mun, Hyun-Chan;Han, Jung-Min;Kim, Young-Hwan;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11a
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    • pp.498-501
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    • 2004
  • In this study, the threshold voltage and the response time of thermal stressed TN-LCDs showed the same performances on no thermal stressed TN-LCDs. There was little change of value in TN cells. Also, the transmittances of TN-LCDs on the rubbed PI surface were almost same while increasing thermal stress time. However, the thermal stability of TN cell was decreased by the high thermal stress for the long duration. Residual DC was decreased as the thermal stress increases. Especially, when TN cell was stressed more and more by heating, residual DC was changed a lot. As a result, the residual DC property of LCD in projection TV is affected very much by heating.

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Effect of discharge power on the electrical properties of ZnO:Al transparent conducting films by RF magnetron sputtering (RF 마그네트론 스퍼터법에 의한 ZnO:Al 투명전도막 특성에 미치는 방전전력의 영향)

  • Lee, Sung-Wook;Kim, Byung-Sub;Lee, Soo-Ho;Lim, Dong-Gun;Park, Min-Woo;Lee, Se-Jong;Kwak, Dong-Joo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.939-942
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    • 2004
  • Al doped Zinc Oxide(ZnO:Al) films, which is widely used as a transparent conductor in optoelectronic devices such as solar cell, liquid crystal display, plasma display panel, thermal heater, and other sensors were Prepared by using the capacitively coupled RF magnetron sputtering method. In this paper the effect of RF discharge power on the electrical, optical and structural properties were investigated experimentally. The results show that the structural and electrical properties of the film are highly affected by the variation of RF discharge power. The optimum growth conditions were obtained for films doped with 2 wt% of $Al_2O_3$ and 200 W in RF discharge power, which exhibit a resistivity of $10.4{\times}10^{-4}{\Omega}-cm$ associated with a transmittance of 89.66 % for 1000nm in films thickness in the wavelength range of the visible spectrum.

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