• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.253-253
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• 2012

Low temperature SiOx film process has being required for both silicon and oxide (IGZO) based low temperature thin film transistor (TFT) for application of flexible display. In recent decades, from low density and high pressure such as capacitively coupled plasma (CCP) type plasma enhanced chemical vapor deposition (PECVD) to the high density plasma and low pressure such as inductively coupled plasma (ICP) and electron cyclotron resonance (ECR) have been used to researching to obtain high quality silicon oxide (SiOx) thin film at low temperature. However, these plasma deposition devices have limitation of controllability of process condition because process parameters of plasma deposition such as RF power, working pressure and gas ratio influence each other on plasma conditions which non-leanly influence depositing thin film. In compared to these plasma deposition devices, neutral beam assisted chemical vapor deposition (NBaCVD) has advantage of independence of control parameters. The energy of neutral beam (NB) can be controlled independently of other process conditions. In this manner, we obtained NB dependent high crystallized intrinsic and doped silicon thin film at low temperature in our another papers. We examine the properties of the low temperature processed silicon oxide thin films which are fabricated by the NBaCVD. NBaCVD deposition system consists of the internal inductively coupled plasma (ICP) antenna and the reflector. Internal ICP antenna generates high density plasma and reflector generates NB by auger recombination of ions at the surface of metal reflector. During deposition of silicon oxide thin film by using the NBaCVD process with a tungsten reflector, the energetic Neutral Beam (NB) that controlled by the reflector bias believed to help surface reaction. Electrical and structural properties of the silicon oxide are changed by the reflector bias, effectively. We measured the breakdown field and structure property of the Si oxide thin film by analysis of I-V, C-V and FTIR measurement.

• Proceedings of the KIEE Conference
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• 1995.07c
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• pp.1220-1222
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• 1995

In the design of a complementary electrochromic windows based on $WO_3/Li^+$ conducting electrolyte/$V_2O_5$ system, a characterization of electrochromic properties of $WO_3/V_2O_5$ complementary devices as a function of thickness combinations is necessary in order to predict such as the safe operating voltage, the optical modulation range and the optical switching response. In this paper, the effects of $WO_3\;and\;V_2O_5$ thin films thickness combinations on device performance were systematically investigated.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1994.11a
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• pp.179-182
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• 1994

We have investigated the optical and electrochromic properties of molybdenum oxide(MoO$_3$) films by thermal evaporation. The MoO$_3$films deposited at substrate temperatures below 200$^{\circ}C$ are found to be amorphous and annealed films at temperature 300$^{\circ}C$ for 1 hour in air are crystalline. The optical energy gap calculated from the transmittance and reflectance spectra of MoO$_3$ films is near 2.75 eV and 3.25 eV for amorphous films and crystalline films, respectively. The MoO$_3$ thin films exhibit light blue to dark blue optical modulation on lithium intercalation and have a uniform transmittance modulation over a wavelength range of 300∼1100 nmcompared to tungsten oxide films.

• Journal of the Korean institute of surface engineering
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• v.43 no.1
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• pp.31-35
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• 2010

Coatings of Ni-17 at.%W were electroplated on a steel substrate, and their corrosion behavior was investigated between 600 and $800^{\circ}C$ in an Ar-0.2%$SO_2$ atmosphere. They delayed the corrosion of the steel substrate. They were corroded into an outer NiO-rich layer, and an inner ($WO_3+NiO+NiWO_4$)-mixed oxide layer. Below these oxide layers, a sulfide layer gradually formed.

• Journal of Powder Materials
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• v.11 no.2
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• pp.111-117
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• 2004

The oxidation behavior of 91 WC-9Co hardmetal in weight percentage has been studied in the present work as a part of the development of recycling process. The morphological and compositional changes of the WC-Co hardmetal with oxidation time at 90$0^{\circ}C$ were analyzed by using surface observation and X-ray diffraction. respective]y. As the oxidation time increased, the WC-Co hardmetal was continuously expanded to form porous oxide mixtures of $CoWO_4$ and $WO_3$. The morphology of porous oxide mixture was basically dependent on initial shape of the WC-Co hardmetal. From thermo-gravimetric (TG) analysis, it was found that the oxidation rate was increased with increasing oxidation temperature and oxygen content in the flowing atmospheric gas. The fraction of oxidation versus time curves showed S-curve relationship at a given of oxidation temperature. These oxidation behaviors of the WC-Co hardmetal were discussed in terms of previously proposed kinetic models.

• Journal of Industrial and Engineering Chemistry
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• v.67
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• pp.437-447
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• 2018

Visible-light-driven wide bandgap semiconductor photocatalysts were commonly developed via doping or coupling with another narrow bandgap metal oxide. However, these approaches required extra processing. The aim of study was to evaluate the photocatalytic performance of narrow bandgap $WO_x$ nanoparticles. A mixture of $WO_2$ and $WO_3$ nanoparticles were synthesized using solution precipitation technique. The photodegradation of RhB by these nanoparticles more effective in UV light than in visible light. In antibacterial susceptibility assay, $WO_x$ nanoparticles demonstrated good antibacterial against Gram-positive bacteria. The cell wall of bacterial was the main determinant in antibacterial effect other than $W^{4+}/W^{6+}$ ions and ROS.

• Journal of the Korean Chemical Society
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• v.39 no.3
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• pp.157-162
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• 1995

The x values and electrical conductivities of the nonstoichiometric compounds $WO_{3-x}$ have been measured in the temperature range from 350 to 700$^{\circ}C$ under oxygen partial pressure of $2{\times}10_{-1}\;to\;1{\times}10_{-5}$ atm. The enthalpy of the defect formation shows an endothermic process, and the oxygen pressure dependence of the defect formation or 1/n varies from -1/5.2 to -1/5.9. The activation energy and 1/n value for the electrical conductivity are 0.24~0.29 eV and -1/4.3~-1/7.6, respectively. The Tungsten Oxide as a n-type semiconductor has predominently defect model of singly charged oxygen vacancy at low temperature, and of doubly charged oxygen vacancy at high temperature.

• Bulletin of the Korean Chemical Society
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• v.35 no.3
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• pp.913-918
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• 2014

Five mol % tungsten-doped tin oxide ($W_{0.05}Sn_{0.95}O_2$, TTO5) was prepared by co-precipitation of $SnCl_4{\cdot}5H_2O$ and $WCl_4$, followed by calcination at $1000^{\circ}C$. The as-prepared TTO5 was in the pure cassiterite phase with a particle size of ~50 nm and optical bandgap of 2.51 eV. Herein it was applied for the formation of TTO5/$TiO_2$ heterojunctions by covering the TTO5 surface with $TiO_2$ by sol-gel method. Under visible-light irradiation (${\lambda}{\geq}420$ nm), TTO5/$TiO_2$ showed a significantly high photocatalytic activity in removing gaseous 2-propanol (IP) and evolving $CO_2$. It is deduced that its high visible-light activity is caused by inter-semiconductor holetransfer between the valence band (VB) of TTO5 and $TiO_2$, since the TTO5 nanoparticle (NP) exhibits the absorption edge at ~450 nm and its VB level is located more positive side than that of $TiO_2$. The evidence for the hole-transport mechanism between TTO5 and $TiO_2$ was also investigated by monitoring the holescavenging reaction with 1,4-terephthalic acid (TA).

• Korean Journal of Materials Research
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• v.13 no.10
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• pp.691-696
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• 2003

To improve the photocatalyticactivity of $TiO_2$-coated coal fly ash, tungsten hydroxide was doped by impregnation method and was oxidized by heat treatment in temperature ranges of $WO^{\circ}C$ for 2 hrs. The changes of crystal structure and crystal size of $TiO_2$and $WO_3$on coal fly ash were investigated by X-ray diffraction analysis. The crystal structure of titanium dioxide showed only anatase type and $TiO_2$-$WO_3$ compounds appeared in the heat treatment temperature ranges of $500∼600^{\circ}C$. By adding $V_3$in $TiO_2$coated on fly ash, the growth of crystal size of anatase was restrained and the anatase phase was stabilized in temperature ranges of TEX>$500∼<800^{\circ}C$. And $WO_3$acted as a trap site of electrons excited from anatase by irradiating UV. The maximum removal efficiency of NO gas for $TiO_2$/$WO_3$-coated coal fly ash was 84% and appeared when the ammonium tungstate of $1.3${\times}$10^{-3}$ M was doped and then heated at $600^{\circ}C$ for 2 hrs.

• Journal of the Korean Electrochemical Society
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• v.14 no.3
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• pp.125-130
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• 2011

We describe that the surface and thickness of nanoporous $WO_3$ fabricated by both light-induced and light-absent anodization are affected by pre-annealing process from $200^{\circ}C$ to $600^{\circ}C$. As a result, the nanoporous $WO_3$ with a thickness of $1.83{\mu}m$ can be achieved by anodization for 6 hours after pre-annealing at $400^{\circ}C$ without illumination of light. Moreover, the thickness of nanoporous $WO_3$ fabricated by pre-annealing is thicker than that of $WO_3$ prepared by non-annealing process. However, the light illumination during anodization leads to convert the crystalline structure obtained by pre-annealing, which interfere the growth of nanoporous $WO_3$. In this paper, we discuss about the growth mechanism of these different nanoporous $WO_3$ films.