• Title/Summary/Keyword: Transparent thin film

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Conservation of Iron Dagger & Scabbard Excavated in Daho-ri, Changwon (다호리 출토 칠초철검(漆鞘鐵劍)의 보존)

  • Sim, Myungbo;Lim, Jihyun;Ma, Daewan;Kim, Midori
    • Conservation Science in Museum
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    • v.12
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    • pp.19-24
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    • 2011
  • This study presents an investigation into the conservation process of an iron dagger and scabbard, which are a lacquered scabbard and a dagger inserted in it, excavated in the Daho-ri relic of Changwon by Gimhae National Museum. The bronze dagger whose condition was poor due to corrosion was coated with Incralac, an intensifier, to reveal the surface patterns through a microscope. The lacquered scabbard was removed of foreign substances on the surface and coated with HPC 2%(in water) to protect the film. Applied onto the surface from which foreign substances were removed was Caparol Binder 5%(in water) two to three times to form a protective film and then faced with Korean paper. Once it was fixed in a polyurethane foam in a stable manner, it was turned over to receive the same process on the back. Three layers of Korean paper were attached to the back of the scabbard to support the thin artifact. HPC 2%(in water), which was applied to the scabbard, was also applied to the iron dagger inside for cementing effect. After all the processes were completed, the artifact was put in a transparent acrylic box for future display.

Enhancement of Crystallinity in ZnO:Al Films Using a Two-Step Process Involving the Control of the Oxygen Pressure (산소 압력의 조절과 함께 두 번의 증착 과정을 이용한 ZnO:Al 박막에 결정성의 향상)

  • Moon, Tae-Ho;Yoon, Won-Ki;Lee, Seung-Yoon;Ji, Kwang-Sun;Eo, Young-Joo;Ahn, Seh-Won;Lee, Heon-Min
    • Journal of the Korean Vacuum Society
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    • v.19 no.2
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    • pp.128-133
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    • 2010
  • ZnO:Al films were deposited by DC-pulsed magnetron sputtering using a two-step process involving the control of the oxygen pressure. The seed layers were prepared with various Ar to oxygen flow ratios and the bulk layers were deposited under pure Ar. As the oxygen pressure during the deposition of the seed layer increased, the crystallinity and degree of (002) texturing increased. The resistivity gradually decreased with increasing crystallinity from $4.7\times10^4\Omega{\cdot}cm$ (no seed) to $3.7\times10^4\Omega{\cdot}cm$ (Ar/$O_2$ = 9/1). The etched surface showed a crater-like structure and an abrupt morphology change appeared as the crystallinity was increased. The sample deposited at an Ar/$O_2$ flow ratio of 9/1 showed a very high haze value of 88% at 500 nm, which was explained by the large feature size of the craters, as shown in the AFM image.

Reaction Gas Composition Dependence on the Properties of SnO2 Films on PET Substrate by ECR-MOCVD (반응가스조성이 PET기판위에 ECR 화학증착법에 의해 제조된 SnO2 박막특성에 미치는 영향)

  • Kim, Yun-Seok;Lee, Joong-Kee
    • Journal of the Korean Electrochemical Society
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    • v.8 no.3
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    • pp.139-145
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    • 2005
  • [ $SnO_x$ ] films on the flexible substrate of PET film were prepared at ambient temperature under a $(CH_3)_4Sn(TMT: tetra-methyl tin)-H_2-O_2$ atmosphere in order to obtain transparent conductive polymer by using ECR-MOCVD(Electro Cyclotron Resonance Metal Organic Chemical Yfpor Deposition) system. The prepared $SnO_x$ thin films show generally over $90\%$ of optical transmittance at wavelength range of 380-780nm and about $1\times10^{-2\~3}ohm{\cdot}cm$ of electrical resistivity. In the present study, effects of $O_2/TMT\;and\;H_2/TMT$ mole ratio on the properties of $SnO_x$ films are investigated and the other process parameters such as microwave power, magnetic current power, substrate distance and working pressure are fixed. Based on our experimental results, the $SnO_x$ film composition ratio of Sn and O directly influences on the electrical and optical properties of the films prepared. The $SnO_x$ film with low electric resistivity and high transmittance could be obtained by controlling the process parameters such as $O_2/TMT\;and\;H_2/TMT$ mole ratio, which play an important role to change the composition ratio between Sn and O. An increase of $O_2/TMT$ mole ratio brought on the increases 0 content in the $SnO_x$ film. On the other hand, an increase of $H_2/TMT$ mole ratio lead to decreases the oxygen content in the film. The optimized composition ratio of oxygen : tin Is determined as 2.4: 1 at $O_2/TMT$ of 80 and $H_2/TMT$ of 40 mole ratio, respectively.

Development of CNT Coating Process using Argon Atmospheric Plasma (아르곤 상압플라즈마를 이용한 CNT 코팅 공정 기술 개발)

  • Kim, Kyoung-Bo;Lee, Jongpil;Kim, Moojin
    • Journal of Industrial Convergence
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    • v.20 no.10
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    • pp.33-38
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    • 2022
  • In this paper, a simple method of forming a solution-based carbon nanotube (CNT) for use as a conductive material for electronic devices was studied. The CNT thin film coating was performed on the glass by applying the spin coating method and the argon atmospheric pressure plasma process. In order to observe changes in electrical and physical properties according to the number of coatings, samples formed in the same manner from times 1 to 5 were prepared, and surface shape, reflectance, transmittance, absorbance, and sheet resistance were measured for each sample. As the number of coatings increased, the transmittance decreased, and the reflectance and absorptivity increased in the entire measurement wavelength range. Also, as the wavelength decreases, the transmittance decreases, and the reflectance and absorption increase. In the case of electrical properties, it was confirmed that the conductivity was significantly improved when the second coating was applied. In conclusion, in order to replace CNT with a transparent electrode, it is necessary to consider the number of coatings in consideration of reflectivity and electrical conductivity together, and it can be seen that 2 times is optimal.

Enhancements of Crystallization and Opto-Electrical performance of ZnO/Ti/ZnO Thin Films (ZnO/Ti/ZnO 박막의 결정성 및 전기광학적 완성도 개선 연구)

  • Jin-Kyu Jang;Yu-Sung Kim;Yeon-Hak Lee;Jin-Young Choi;In-Sik Lee;Dae-Wook Kim;Byung-Chul Cha;Young-Min Kong;Daeil Kim
    • Journal of the Korean institute of surface engineering
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    • v.56 no.2
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    • pp.147-151
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    • 2023
  • Transparent ZnO (100 nm thick) and ZnO/Ti/ZnO (ZTZ) films were prepared with radio frequency (RF) and direct current (DC) magnetron sputtering on the glass substrate at room temperature. During the ZTZ film deposition, the thickness of the Ti interlayer was varied, such as 6, 9, 12, and 15 nm, while the thickness of ZnO films was kept at 50 nm to investigate the effect of the Ti interlayer on the crystallization and opto-electrical performance of the films. From the XRD pattern, it is concluded that the 9 nm thick Ti interlayer showed some characteristic peaks of Ti (200) and (220), and the grain size of the ZnO (002) enlarged from 13.32 to 15.28 nm as Ti interlayer thickness increased. In an opto-electrical performance observation, ZnO single-layer films show a figure of merit of 1.4×10-11 Ω-1, while ZTZ films with a 9 nm-thick Ti interlayer show a higher figure of merit of 2.0×10-5 Ω-1.