• Applied Science and Convergence Technology
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• v.26 no.3
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• pp.43-46
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• 2017

Aluminum-doped ZnO (AZO) thin films were deposited by atomic layer deposition (ALD) with respect to the Al doping concentrations. In order to explain the chemical stability and electrical properties of the AZO thin films after hydrogen peroxide ($H_2O_2$) solution immersion treatment at room temperature, we investigated correlations between the electrical resistivity and the electronic structure, such as chemical bonding state, conduction band, band edge state below conduction band, and band alignment. Al-doped at ~ 10 at % showed not only a dramatic improvement of the electrical resistivity but also excellent chemical stability, both of which are strongly associated with changes of chemical bonding states and band edge states below the conduction band.

• Journal of the Korean Ceramic Society
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• v.29 no.9
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• pp.739-749
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• 1992

The sols prepared by dialyzing solutions, in which the hydrolyzed precipitates of TEOT or directly Ti(OC3H7)4 were resolved, were the nanoparticulate sol with the average particle size less than 7 nm and the anatase crystal phase. In the pH range of 1.5 to 2.9, the particle size of the nanoparticulate TiO2 sols (0.09 mol/ι) increased gradually upto 15 nm~26nm with the increase of pH in the initial aging state but the sols were transparent all the time, and stable without growin any more after 30 days. When the slipcasted porous alumina tubes were coated by the sol-gel dipping method, the minimum particle size and the aging time for forming the coated gel layer at the given pH were optimized. For obtaining the very thin crack-free and reproducible membrane coating, the use of a nanoparticulate TiO2 sol (0.09 mol/ι) aged for about 30 dyas at pH=2.0 was found to be the best.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.218-221
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• 2008

Bottom-gate microcrystalline silicon thin film transistors (${\mu}c$-Si:H TFTs) were fabricated on glass and transparent polyimide substrates by conventional 13.56 MHz RF plasma enhanced chemical vapor deposition at $200^{\circ}C$. The deposition rate of the ${\mu}c$-Si:H film is 24 nm/min and the amorphous incubation layer near the ${\mu}c$-Si:H/silicon nitride interface is unobvious. The threshold voltage of ${\mu}c$-Si:H TFTs can be improved by $H_2$ or $NH_3$ plasma pretreatment silicon nitride film.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.828-831
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• 2005

Producing high transparency dielectric is still one of the most important subjects in the PDP process for improving luminous efficiency. It has been reported by many workers that transparency is improved by controlling the composition of the frit, the frit size and distribution, and the firing atmosphere. To understand the mechanism of discoloration of frit, $Bi_2O_3$ and $B_2O_3$ glasses were used for a leaching test using water and alcohol solution in milling. As a result, the frit prepared by wet milling had lower chemical durability than that prepared by dry milling. The leached layer around the frit showed high stability for heat treatment because the frit surface was covered with hydroxides or hydrates which was resulted from a reaction between the frit and the solution during milling.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.924-927
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• 2003

Aluminium-doped ZnO (ZnO:Al) films were grown by atomic layer-controlled deposition on glass substrates at temperature of 200 $^{\circ}C$ using diethylzinc($Zn(C_{2}H_{2})_{2}$; DEtZn), water($H_{2}O$) and trimethylaluminium ($Al(CH_{3})_{3}$; TMA) as precursors. As the cycle ratio of TMA to DEZn(TMA/DEZn) increased, the resistivity of the films decreased and the roughness increased. In the case of TMA/DEZn pulse ratio of 1 to 10, the film had a resistivity of $9.7{\times}l0^{-4}{\Omega}{\cdot}cm$ and a roughness of 2.25nm(rms), while in the case of only DEZ injection the film had a resistivity of $3.5{\times}10^{-3}{\Omega}{\cdot}cm$ and a roughness of 1.07nm(rms)

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.51 no.11
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• pp.546-550
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• 2002

In this paper, Heterojunction phototransistors(HPT's) with an optically transparent ITO emitter contacts were fabricated. The ITO ohmic contacts were realized by employing thin imdium layer between the ITO and $n^+$-InP layers. The ITO contact was annealed at $250^{\circ}C$. The specific contact resistance of about $6.6{\times}10^{-4}{\Omega}cm^2$ was measured by use of the transmission line model (TLM). Heterojunction bipolar transistors (HBTs) having the same device layout were fabricated to compare with HPTs. The DC characteristics of the InP/InGaAs HPT showed the similar electrical characteristics of the HBT. Emitter contact resistance($R_E$) of about $6.4{\Omega}$ was extracted, which was very similar to that of the HBT. The optical characteristics of HPT's were generated by illuminating the device with light from $1.3{\mu}m$ light. It showed that HPT's can be controlled optically.

• The Korean Journal of Ceramics
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• v.5 no.1
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• pp.50-54
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• 1999

$(Pb_xLa_{1-x}) (Zr_yTi_{1-y})O_3$ (PLZT) thin films with electrooptic effect are promising for the optical application such as display or light shutter. However, it is difficult to use inexpensive and transparent glass substrates because the conventional process for preparation of PLZT requires temperatures above $600^{\circ}C$. In order to deposit a perovskite PLZT thin films at low processing temperatures through alkoxide route, we have offered several seeding processes which reduce the activation energy for crystallization. In this study, we optimized the stacking structure of multilayered PLZT for obtaining single phase perovskite at lower temperatures. As a result, ferroelectric PLZT thin films with different compositions were successfully prepared at a temperature as low at $500^{\circ}C$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.06a
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• pp.277-277
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• 2010

We present facile chemical route stabilizing dispersion of carboxylated single-Walled carbon nanotubes (SWCNTs) in ZnOsol prepared by using diethanolamine as a stabilizer. The dispersion was stabilized via capping of carboxyl groups on the SWCNT surface by a titania layer. We also demonstrated that the conductivity of the films prepared P3/$TiO_2$/ZnO as enhanced by therml treatment, and the thermal stbility of the film improved hybridization with ZnO sol pristine P3, P3/$SiO_2$ and P3/$TiO_2$ hybrid films.

• 제어로봇시스템학회:학술대회논문집
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• 2001.10a
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• pp.118.3-118
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• 2001

CLED (Contact Light Emitting Device) has three layers consisting of a transparent electrode, a light emitting layer and a substrate. When the substrate of the CLED comes in contact with a fingerprint under AC input voltage, it makes an electric field between the fingerprint and the device. Due to the electric field, the light is emitted along the ridgeline of the fingerprint. The intensity along the ridge on the surface of the CLED increase in proportion to the electric field. To achieve uniform performance of fingerprint verification devices, inspection system of CLED for quality control were required. In this research, we proposed the factors for quality controls such as dimensions of the CLED, uniformity ...

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1992.11a
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• pp.67-72
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• 1992

In this paper, We prepared the thin film Cu-doped CdS Photovoltaic Cell, varying deposition condition by E-beam process and investigated its properties. After the Cu/CdS films were deposited on transparent ITO glass. We heat-treated to diffuse Cu atoms to CdS fi1m at 350[$^{\circ}C$]. With deposited Cu-doped CdS film. We investigated the electrical. optical. X-ray diffraction and junction property. We studied how to prepare the High conversion efficiency Solar cell window layer.