• 멤브레인
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• 제29권1호
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• pp.30-36
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• 2019

본 연구에서는 titanium nitride (TiN) 나노 섬유와 poly(3,4-ethylenedioxythiophene) polystyrene sulfonate (PEDOT-PSS) 전도성 고분자로 이루어진 전극과 poly(vinyl alcohol) (PVA) 기반 고분자 전해질 분리막을 이용하여 슈퍼 캐퍼시터를 제조하였다. TiN 나노 섬유의 경우 높은 전기 전도도와 이차원적 구조로 인한 스케폴드 효과를 기대할 수 있다는 점에서 전극 물질로 사용되었다. PEDOT-PSS 전도성 고분자는 수소 이온과 산화-환원 반응을 통해 보다 높은 정전용량을 나타낼 수 있으며 용액상에 분산이 용이해 유무기 복합제를 형성하기에 적합하였다. PVA 기반의 고분자 전해질 분리막은 기존의 액상의 전해질의 문제인 외부 충격에 대한 안정성을 확보할 수 있으며 염으로 사용된 $H_3PO_4$의 경우 수소 이온은 빠른 확산으로 인해 캐퍼시터의 충방전 효율에 이점이 있다. 본 연구에서 보고된 PEDOT-PSS/TiN 슈퍼캐퍼시터의 정전용량은 약 75 F/g으로 기존의 탄소기반 캐퍼시터에 비해 큰 폭으로 증가한 값이다.

• 열처리공학회지
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• 제4권4호
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• pp.1-14
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• 1991

In PECVD(Plasma-Enhanced Chemical Vapor Deposition) process, titanium nitride is thin and its adhesion is poor for the protective coatings. Therefore it has been studied that intermediate layer forms between substrate and TiN thin film. Using R.F. plasma nitriding, nitride layer was first formed, then TiN thin film coated by PECVD. The chemical composition of the coatings has been characterized using AES, EDS and their crystallographic structure by means of XRD. Mechanical properties such as microhardness and film adhesion have also been determined by vickers hardness test, scratch test and indentation test. As a result, there was no difference in chemical composition and structure between the TiN deposition only and the composite of TiN deposition on nitrided steel. It was found that nitrided substrate increased the hardness of TiN coatings and was beneficial in preventing the plastic deformation in the substrate. Therefore the effective load bearing capacity of the TiN coatings on nitrided steel was increased and their adhesion was improved as well. According to the results of this study, the processes that lead to the formation of composite layers characterized by good working properties, i.e., high microhardness, adhesion and resistance to deformation.

• 전자공학회논문지A
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• 제29A권8호
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• pp.49-55
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• 1992

We Have investigated the properties of the titanium nitrite films widely used in VLSI devices as diffusion barrier in Al-based metallization. TiN films were formed by reactive sputtering from Ti target in Ar-N$_2$ mixtures, varying deposition parameters such as N$_2$ partial pressure, substrate temperature, power, and total pressure. All the samples received the heat treatment at 45$0^{\circ}C$ for 30 min. The resulting films are characterized by mechanical stylus($\alpha$-step), x-ray diffraction(XRD), scanning electron microscopy(SEM), and four point probe method. The Tin film properties strongly depend on the deposition condition. The stoichiometry and Ti deposition rate are critically affected by nitrogen partial pressure, and the resistivity, in particular, is dependent on both the substrate temperature and sputtering power.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2001년도 춘계학술발표회 초록집
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• pp.61-62
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• 2001

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2006년도 춘계학술발표회 초록집
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• pp.14-15
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• 2006

• 한국세라믹학회:학술대회논문집
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• 한국세라믹학회 2000년도 추계총회,초청강연,특별강연,연구발표회
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• pp.172.1-172
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• 2000

• Corrosion Science and Technology
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• 제22권4호
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• pp.232-241
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• 2023

The mechanical properties of the hydrogen valve responsible for supplying and blocking hydrogen gas in a hydrogen fuel cell electric vehicle (FCEV) were researched. Mechanical properties by hydrogen embrittlement were investigated by coating chromium nitride (CrN) and titanium nitride (TiN) on aluminum alloy by arc ion plating method. The coating layer was deposited to a thickness of about 2 ㎛, and a slow strain rate test (SSRT) was conducted after hydrogen embrittlement to determine the hydrogen embrittlement resistance of the CrN and TiN coating layers. The CrN-coated specimen presented little decrease in mechanical properties until 12 hours of hydrogen charging due to its excellent resistance to hydrogen permeation. However, both the CrN and TiN-coated specimens exhibited deterioration in mechanical properties due to the peeling of the coating layer after 24 hours of hydrogen charging. The specimens coated at 350 ℃ presented a significant decrease in ultimate tensile strength due to abnormal grain growth.

• ETRI Journal
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• 제13권4호
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• pp.58-69
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• 1991

고집적회로에서 A1 금속공정의 diffusion barrier로 널리 사용되는 titanium nitride의 성질을 조사하였다. 실제 회로 구조의 열적 안정성을 관찰하기 위하여 준비된 TiN/Ti다층 barrier를 $600^{\circ}C$까지 열처리하여 x-ray photoelectron spectroscopy (XPS), cross-sectional transmission electron microscopy(XTEM) 등으로 분석하였다. 열처리 온도가 증가됨에 따라 oxygen은 TiN 층의 표면과 pure-Ti 층에 pile up 된다. TiN 층의 표면에서는 $600^{\circ}C$열처리시 TiN이 분해되어 완전히 $TiO_2$가 형성되며, TiN 층 내에서는 oxygen 함량은 열처리 온도의 증가에 따라 커지고 이때 형성되는 Ti-oxide는 $TiO_2$ 보다 TiO, $Ti_2$$O_3$ 상태로 존재하게 된다. Pure-Ti 층은 열처리시 두개의 층으로 나누어 지는 데, 표면에서 침투하는 oxygen과 pure-Ti이 반응하여 Ti-oxide 층이 생기며 실리콘 기판과의 반응으로 Ti-silicide를 형성한다. $600^{\circ}C$에서 모든 Ti 층이 반응으로 소모되고 열적 stress, Ti-silicide의 grain growth, oxygen의 침입으로 TiN 층에 blistering이 발생한다.

• The Korean Journal of Ceramics
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• 제6권1호
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• pp.32-36
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• 2000

Pyrolytic preparations of Ti-Al-N ceramics from three blended precursors were investigated. The precursors were prepared stirring ($HA1N^{i}Pr_m$ and an aminolysis product of $Ti(NMe_2)_4$ with $MeHNCH_2CH_2$NHMe in $C_6/H_6$ . IR and $^1H\;NMR $analyses suggested that essentially no Ti-N-Al bonds were present in the precursors. Pyrolysis of the precursors under $NH_3-N_2$led to the formation of brown solids with ceramic yields of about 30%, and the Ti-Al ratios in the pyrolyzed products were close to those of the precursors. XRD analysis of the pyrolyzed product from the precursor with Ti:Al=5:1 indicated the formation of a NaCl-type compound as the only crystalline phase. Pyrolysis of the precursor with Ti:Al=2:1 led to the formation of AlN besides the major NaCl-type compound. A ceramic composite containing AlN and the NaCl-type compound was formed by pyrolysis of the precursor with Ti:Al=1:2.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2014년도 추계학술대회 논문집
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• pp.233-233
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• 2014

질화 티타늄(Titanium Nitride)은 뛰어난 물리적 특성이 있어 내마모 재료의 표면처리 분야에 많이 사용되고 있다. 본 연구에서는 음극 아크 방전을 이용하여 빗각 증착을 실시하고 증착 시 기판에 bias 인가 여부에 따라 주상정의 방향성이 변하는 단층 및 다층의 TiN 박막을 제조하였으며 동일한 두께의 다양한 다층구조에서 경도의 증가를 확인하였다.