• Title/Summary/Keyword: Titanium Nitride

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Study on Self-Propagating High-Temperature Synthesis of TiN Powder (SHS 공정에 의한 TiN 분말합성에 관한 연구)

  • ;S.G. Vadchenco
    • Journal of the Korean Ceramic Society
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    • v.33 no.1
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    • pp.41-48
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    • 1996
  • Self-propagating High-temperature Synthesis of Ti+N system has been investigated using the cylindrical high pressure reactor. The nitrogen pressure was varied from 40 to 80 atmosphere and TiNx(x=0.55) powder produced by SHS process was used as a diluent in order to control the reaction. Both the velocity of surface reaction and the ratio of TiN synthesis increased with increasing the nitrogen pressure. As the amount of diluent increases the degree of conversion to titanium nitride increases. Homogenious TiN powder was obtained in the composition 50Ti+50TiN0.94(diluent)

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Processing and Characterization of RF Magnetron Sputtered TiN Films on AISI 420 Stainless Steel (AISI 420 stainless steel 기판위에 D.C magnetron sputtering 법으로 제조한 TiN 박막의 특성 평가)

  • Song, Seung-Woo;Choe, Han-Cheol;Kim, Young-Man
    • Journal of the Korean institute of surface engineering
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    • v.39 no.5
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    • pp.199-205
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    • 2006
  • Titanium nitride (TiN) coatings were produced on AISI 420 stainless steel by DC magnetron sputtering of a Ti target changing the processing variables, such as the flow rate of $N_2/Ar$, substrate temperature and the existence of Ti interlayer between TiN coatings and substrates. The hardness and residual stress in the films were investigated using nanoindentation and a laser scanning device, respectively. The stoichiometry and surface morphology were investigated using X-Ray Diffraction and SEM. The corrosion property of the films was also studied using a polarization method in NaCl (0.9%) solution. Mechanical properties including hardness and residual stress were related to the ratio of $N_2/Ar$ flow rate. The corrosion resistance also was related to the processing variables.

고집적회로에서 TiN/Ti Diffusion Barrier의 열처리에 따른 계면반응 및 구조변화에 대한 연구

  • Yu, Seong-Yong;Choi, Jin-Seog;Paek, Su-Hyon;Oh, Jae-Eung
    • ETRI Journal
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    • v.13 no.4
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    • pp.58-69
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    • 1991
  • 고집적회로에서 A1 금속공정의 diffusion barrier로 널리 사용되는 titanium nitride의 성질을 조사하였다. 실제 회로 구조의 열적 안정성을 관찰하기 위하여 준비된 TiN/Ti다층 barrier를 $600^{\circ}C$까지 열처리하여 x-ray photoelectron spectroscopy (XPS), cross-sectional transmission electron microscopy(XTEM) 등으로 분석하였다. 열처리 온도가 증가됨에 따라 oxygen은 TiN 층의 표면과 pure-Ti 층에 pile up 된다. TiN 층의 표면에서는 $600^{\circ}C$열처리시 TiN이 분해되어 완전히 $TiO_2$가 형성되며, TiN 층 내에서는 oxygen 함량은 열처리 온도의 증가에 따라 커지고 이때 형성되는 Ti-oxide는 $TiO_2$ 보다 TiO, $Ti_2$$O_3$ 상태로 존재하게 된다. Pure-Ti 층은 열처리시 두개의 층으로 나누어 지는 데, 표면에서 침투하는 oxygen과 pure-Ti이 반응하여 Ti-oxide 층이 생기며 실리콘 기판과의 반응으로 Ti-silicide를 형성한다. $600^{\circ}C$에서 모든 Ti 층이 반응으로 소모되고 열적 stress, Ti-silicide의 grain growth, oxygen의 침입으로 TiN 층에 blistering이 발생한다.

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저 염소 TiN필름 제조를 위한 CVD 반응기 내의 유동해석

  • 임익태;전기영
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2003.12a
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    • pp.1-6
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    • 2003
  • Flow modulation chemical vapor deposition process has been reported as an alternative way to obtain low resistivity, low residual chlorine content and good step-coverage titanium nitride film. Flow and concentration characteristics in a vertical FMCVD reactor are analyzed by using computational fluid dynamics method. The results show that 1.0 second as Cl reduction period is too short and there is still $TiCl_4$ gas above the holder at the end of the period. Time variation of $TiCl_4$ gas concentration on the holder shows that at least 3.0 second is necessary as Cl reduction time for the sake of film characteristics.

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Properties of TiAlSiN Films by Hybrid Process of Cathodic Arc Deposition & Sputtering (Hybrid 공정으로 코팅된 TiAlSiN 박막의 특성 연구)

  • Song, Min-A;Yang, Ji-Hun;Jeong, Jae-Hun;Kim, Seong-Hwan;Jeong, Jae-In
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2015.05a
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    • pp.68-68
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    • 2015
  • 질화 티타늄(titanium nitride; TiN)은 색상이 미려하고 물리적 특성이 우수한 특성에도 불구하고 내산화성이 낮아 이를 해결하기 위해서 TiN에 Al을 첨가한 TiAlN 소재가 개발되었다. 하지만 난삭재 가공용 공구의 사용 온도가 $800^{\circ}C$이상인 점을 고려하여 $800^{\circ}C$ 이상의 고온 환경에서도 산화가 일어나지 않는 고경도 박막 소재가 요구되고 있으며 TiAlN 소재에 Si을 첨가하면 내산화성이 향상된다는 연구결과가 보고되고 있다. 본 연구에서는 음극 아크 증착과 스퍼터링을 동시에 이용한 하이브리드 공정으로 제조한 TiAlSiN 박막의 Si 함량에 따른 미세구조, 물리적 특성 그리고 내산화성을 평가하였다.

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The Effects of Surface Pretreatments on Adhesion Strength of TiN Films by DC Magnetron Sputtering (표면전처리가 반응성 스퍼터링법으로 제조한 TiN 코팅층의 밀착력에 미치는 영향)

  • 김흥윤;백운승;권식철;김규호
    • Journal of the Korean institute of surface engineering
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    • v.26 no.5
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    • pp.225-234
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    • 1993
  • Titanium nitride coatings were deposited onto SUS304 stainless steel substrates pretreated by mechanical scrubbing, chemical etching at 50% HCl solution and Ar ion etching. Adhesion strength were measured by scratch tester and confirmed by SEM with EDS. Adhesion strength of Ar ion etched substrate was 10 to 15 times higher than that of mechanical scrubbed or chemical etched substrate. Ar ion etching brought about an uniform and fine spherical shaped surface, while chemical etching gave rise to a rough and irregular surface on SEM micrograph. It was suggested that higher adhesion strength might be caused by anchoring effect of Ar ion etched surface prior to TiN deposition.

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Characteristics of $\pi$-type attenuators using Ti(N) thin film resistors

  • Cuong, Nguyen Duy;Kim, Dong-Jin;Kang, Byoung-Don;Yoon, Soon-Gil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.50-50
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    • 2007
  • We report the effect of the film thickness on electrical properties of Ti(N) film resistors. The applications of titanium nitride thin film resistor in $\Pi$-type attenuators are also characterized. As film thickness decreases from 100 to 30 nm, temperature coefficient of resistance significantly decreases from -60 to -148 ppm/K, while sheet resistance increases from 37 to $270\;{\Omega}/{\square}$. The characterizations of 20dB-attenuators using thin film resistors are improved in comparison with those using thick film resistors. The $\Pi$-type attenuators using Ti(N) thin film resistors exhibit a attenuation of -19.94 dB and voltage standing wave ratio of 1.16 at a frequency of 2.7 GHz.

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TiN coatings by HCD plasma enhanced reactive ion plating method (HCD플라즈마를 이용한 반응성 이온플레이팅법에 의한 TiN 코팅)

  • 서용운;황기웅
    • Journal of the Korean institute of surface engineering
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    • v.25 no.3
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    • pp.133-143
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    • 1992
  • Titanium nitride(TiN) films have been prepared by HCD plasma enhanced reactive ion plating. Density and temperature of the plasma generated by the HCD were investigated. It was shown that parameters such as the substrate bias voltage(0 350V) and N2 flow rate(10 180SCCM) influenced the growth, the growth, the microstructure and the color tone of the film mostly. In order to study the interface region, surface analysis by AES combined with sputter depth profiling was performed. Microhardness of the coated TiN films were measured by micro Vickers hardness tester. Also, the effect of coating parameters on composition, coating surface and fracture morphology, grain size and growth rate were examined.

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The effect of Zirconium Nitride coating on shear bond strength with denture base resin in Co-Cr alloy and titanium alloy (질화 지르코늄 코팅이 코발트 크롬 합금과 타이타늄 합금에서 의치상 레진과의 전단결합강도에 미치는 영향)

  • Park, Chan;Lee, Kyoung-Hun;Lim, Hyun-Pil
    • Journal of Dental Rehabilitation and Applied Science
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    • v.32 no.3
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    • pp.194-201
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    • 2016
  • Purpose: The purpose of this study was to evaluate of Zirconium Nitride (ZrN) coating on shear bond strength with denture base resin in Co-Cr and Ti-6Al-4V alloy. Materials and Methods: Co-Cr and Ti-6Al-4V alloy disks (10 mm in diameter, 2.5 mm in thickness; each other: n = 14) were prepared and divided with 2 groups each other by ZrN coating. After primer was applied to disks surface, denture base resin with diameter 6 mm, height 5 mm was bonded on metal disk surface. After surface roughness was measured by Profiler, shear bond strength was determined with Universal testing machine and analyzed with two-way ANOVA. The specimen surfaces and failure mode were examined using a scanning electron microscope. Results: ZrN coated groups showed significantly higher rough surface than non-coated groups (P < 0.05). Irrespective of alloy materials, shear bond strength of ZrN coated groups were lower than non-coated groups (P < 0.001). The scanning electron microscope (SEM) of ZrN coated groups showed mixed and adhesive fractures. Conclusion: ZrN coating weakened bonding strength between denture base resin and Co-Cr, Ti-6Al-4V alloy.

A STUDY OF ION BEAM ASSISTED DEPOSITION(IBAD) OF TiN ON Ni-Cr Be ALLOY FOR SURFACE CHARACTERISTIC (이온빔 보조 증착법에 의한 TiN 박막도포가 니켈-크롬-베릴륨 합금의 표면 성상에 미치는 영향에 관한 연구)

  • Choi, Soo-Young;Lee, Sun-Hyung;Chang, Ik-Tae;Yang, Jae-Ho;Chung, Hun-Young
    • The Journal of Korean Academy of Prosthodontics
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    • v.37 no.2
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    • pp.212-234
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    • 1999
  • Dental restorative materials must have the physical properties to withstand wear and corrosion. Base metal alloys possess better mechanical properties and lower price than the gold alloys. For these reasons such alloys have largely replaced the precious metal alloys. One aspect to con-sider is the release of metal substances to oral environment. The release of elements from dental alloys is a continuing concern because the elements may have the potentially harmful biological effects on local tissues. The purpose of this study was to minimize metal release on the nonprecious metal surfaces by ion beam assisted deposition(IBAD) of titanium nitride (TiN) Ni-Cr-Be alloys with and without TiN coatings were secured in an wear test machine opposing ruby ball to determine their relative resistance to wear with loom, 200m, 300m and 400m sliding distance. And the corrosion behavior of the Ni-Cr-Be alloys with and without TiN coatings and 3 dental noble alloys have been studied. Potentiodynamic curves were used to analyse the corrosion characteristics of the alloys. The measurement of the released Ni and Cr ions was conducted by analysis of the electrolyte solution with atomic absorption spectroscopy. The results were as follows : 1. The critical sliding distance that wore down TiN coatings of $2.5{\mu}m$ thickness in this study condition was 300m. 2. Ion beam assisted deposition of TiN showed a good surface modification with respect to the properties of wear and corrosion resistance. 3. X-ray diffraction showed that the strongest peak of TiN is TiN(111) in the coatings. 4. The release of Ni and Cr ions from alloys measured by means of atomic absorption spectroscopy was reduced by ion beam assisted deposition of TiN.

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