• 한국신재생에너지학회:학술대회논문집
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• 2010.06a
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• pp.89.1-89.1
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• 2010

Since Gratzel and co-workers developed a new type of solar cell based on the nanocrystalline $TiO_2$ electrode, dye-sensitized solar cells (DSSCs) have attracted considerable attention on account of their high solar energy-to-conversion efficiencies (11%), their easy manufacturing process with low cost production compared to conventional p-n junction solar cells. The mechanism of DSSC is based on the injection of electrons from the photoexcited dye into the conduction band of nanocrystalline $TiO_2$. The oxidized dye is reduced by the hole injection process from either the hole counter or electrolyte. Thus, the electronic structures, such as HOMO, LUMO, and HOMO-LUMO gap, of dye molecule in DSSC are deeply related to the electron transfer by photoexcitation and redox potential. To date, high performance and good stability of DSSC based on Ru-dyes as a photosensitizer had been widely addressed in the literatures. DSSC with Ru-bipyridyl complexes (N3 and N719), and the black ruthenium dye have achieved power conversion efficiencies up to 11.2% and 10.4%, respectively. However, the Ru-dyes are facing the problem of manufacturing costs and environmental issues. In order to obtain even cheaper photosensitizers for DSSC, metal-free organic photosensitizers are strongly desired. Metal-free organic dyes offer superior molar extinction coefficients, low cost, and a diversity of molecular structures, compared to conventional Ru-dyes. Recently, novel photosensitizers such as coumarin, merocyanine, cyanine, indoline, hemicyanine, triphenylamine, dialkylaniline, bis(dimethylfluorenyl)-aminophenyl, phenothiazine, tetrahydroquinoline, and carbazole based dyes have achieved solar-to-electrical power conversion efficiencies up to 5-9%. On the other hand, organic dye molecules have large ${\pi}$-conjugated planner structures which would bring out strong molecular stacking in their solid-state and poor solubility in their media. It was well known that the molecular stacking of organic dyes could reduce the electron transfer pathway in opto-electronic devices, significantly. In this paper, we have studied on synthesis and characterization of dendritic organic dyes with different number of electron acceptor/anchoring moieties in the end of dendrimer. The photovoltaic performances and the incident photon-to-current (IPCE) of these dyes were measured to evaluate the effects of the dendritic strucuture on the open-circuit voltage and the short-circuit current.

• 한국신재생에너지학회:학술대회논문집
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• 2011.05a
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• pp.117.2-117.2
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• 2011

Since Gratzel and co-workers developed a new type of solar cell based on the nanocrystalline TiO2 electrode, dye-sensitized solar cells (DSSCs) have attracted considerable attention on account of their high solar energy-to-conversion efficiencies (11%), their easy manufacturing process with low cost production compared to conventional p-n junction solar cells. The mechanism of DSSC is based on the injection of electrons from the photoexcited dye into the conduction band of nanocrystalline TiO2. The oxidized dye is reduced by the hole injection process from either the hole counter or electrolyte. Thus, the electronic structures, such as HOMO, LUMO, and HOMO-LUMO gap, of dye molecule in DSSC are deeply related to the electron transfer by photoexcitation and redox potential. To date, high performance and good stability of DSSC based on Ru-dyes as a photosensitizer had been widely addressed in the literatures. DSSC with Ru-bipyridyl complexes (N3 and N719), and the black ruthenium dye have achieved power conversion efficiencies up to 11.2% and 10.4%, respectively. However, the Ru-dyes are facing the problem of manufacturing costs and environmental issues. In order to obtain even cheaper photosensitizers for DSSC, metal-free organic photosensitizers are strongly desired. Metal-free organic dyes offer superior molar extinction coefficients, low cost, and a diversity of molecular structures, compared to conventional Ru-dyes. Recently, novel photosensitizers such as coumarin, merocyanine, cyanine, indoline, hemicyanine, triphenylamine, dialkylaniline, bis(dimethylfluorenyl)-aminophenyl, phenothiazine, tetrahydroquinoline, and carbazole based dyes have achieved solar-to-electrical power conversion efficiencies up to 5-9%. On the other hand, organic dye molecules have large ${\pi}$-conjugated planner structures which would bring out strong molecular stacking in their solid-state and poor solubility in their media. It was well known that the molecular stacking of organic dyes could reduce the electron transfer pathway in opto-electronic devices, significantly. In this paper, we have studied on synthesis and characterization of dendritic organic dyes with different number of electron acceptor/anchoring moieties in the end of dendrimer. The photovoltaic performances and the incident photon-to-current (IPCE) of these dyes were measured to evaluate the effects of the dendritic strucuture on the open-circuit voltage and the short-circuit current.

• Journal of Technologic Dentistry
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• v.30 no.2
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• pp.39-45
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• 2008

Titanium and its alloys are widely used as dental implants materials because of their excellent mechanical properties. However, the alumina and zirconia ceramics are preferred to use as the substitute of Ti implants because there is a problems in esthetics and biocompatibility in Ti implant. The the glass infiltrated alumina ceramics are studied to increase the toughness and biocompatibility. The 45S5 and soda-lime glass powder was mixed with ethanol at ratio of 1:1 and brushed on the surface of alumina. Then it was heat treated in the electric furnace at $1400^{\circ}C$ from 30 min. to 5 hours. The glass powder was controlled from 200 to $350{\mu}m$ using ball milling. After heat treatment, the glass infiltrated specimen was tested in universal testing machine to measure the bending strength. The surface microstructure of each specimen was observed with SEM. The biocompatibility of 45S5 and soda-lime glass coated alumina was investigated using PBS at $36.5^{\circ}C$ incubator. The specimen was immersed in PBS for 3, 5, 7, 10 days. After that, the surface morphology was investigated with SEM. As the results of experiment, the 45S5 bioglass infiltrated alumina show the increase of bending strength according to the increasing of heat treatment time from 30 min. to 5 hours at $1400^{\circ}C$ Finally the 1370N bending strength of alumina increased to 1958N at 5 hours heat treatment, which shows 1.4 times higher. In contrast to this, the soda lime glass infiltrated alumina ceramics shows the convex curve according to heat treatment time. Thus it shows maximum bending strength of 1820N at 1 hour heat treatment of $1400^{\circ}C$ It gives 1.3 times higher. However, the bending strength of soda lime glass infiltrated alumina is decreasing with increasing heat treatment time after 1 hour. The precipitation on the surface of 45S5 glass infiltrated alumina was revealed as a sodium phosphate ($Na_{6}P_{6}O_{24}6H_{2}O$) and the amount of precipitation is increasing with increasing of immersion time in PBS. In contrast to this, there is no precipitation are observed on the surface of soda lime glass infiltrated alumina. This implies that 45S5 glass infiltrated alumina brings more biocompatible when it is implanted in human body.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

• Journal of the Korean Chemical Society
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• v.26 no.3
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• pp.128-134
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• 1982

The electrical conductivity of n-type polycrystalline MnOx-Ti$O_2$ system containing 0.40, 0.80, and 1.60 mol % of manganese oxide has been measured from 100 to 400$^{\circ}$C and 1100 to 1300$^{\circ}$C under oxygen partial pressures of$10^{-8}\;to\;10^{-1}$ atm. Plots of log conductivity vs. reciprocals of absolute temperature at constant $Po_2$'s are found to be linear with an inflection, and the activation energies obtained from the slopes appear to be an enough average 0.18eV for the extrinsic and 3.70eV for the intrinsic. The log $\sigma$ vs. log $Po_2$ are found to be linear at $Po_2$'s of $10^{-8}\;to\;10^{-1}$atm. The conductivity dependences on $Po_2$at the two temperature regions are closely approximated by $\sigma{\propto}$Po_2$-1}6$ for the extrinsic and $${\sigma}{\propto}Po_2^{-1}4}$$ for the intrinsic, respectively. The predominant defects are believed to be Vo-2e' and $Ti^3$${\cdot}$interstitial at the extrinsic and intrinsic. From the interpretations of conductivity dependences on temperature and$Po_2$ , the conduction mechanisms and possible band models are proposed.

• The Journal of Korean Academy of Prosthodontics
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• v.45 no.2
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• pp.203-215
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• 2007

Statement of problem: Titanium and its alloy, with their excellent bio-compatibility and above average resistance to corrosion, have been widely used in the field of dentistry. However, the excessive oxidization of titanium which occurs during the process of firing on porcelain makes the bonding of titanium and porcelain more difficult than that of the conventional metal-porcelain bonding. To solve this problem related to titanium-porcelain bonding, several methods which modify the surfaces, coat the surfaces of titanium with various pure metals and ceramics, to enable the porcelain adhesive by limiting the diffusion of oxygen and forming the adhesive oxides surfaces, have been investigated. Purpose: The purpose of this study was to know whether the titanium-porcelain bonding strength could be enhanced by treating the titanium surface with gold and TiN followed by fabrication of clinically applicable porcelain-fused-to-titanium crown Material and method: The porcelain-fused-to-titanium crown was fabricated after sandblasting the surface of the casting titanium coping with $Al_2O_3$ and treating the surface with gold and TiN coating followed by condensation and firing of ultra-low fusing porcelain. To compare with porcelain-fused-to-titanium crowns, porcelain-fused-to-gold crowns were fabricated and used as control groups. The bonding strengths of porcelain-fused-to-gold crowns and porcelain-fused-totitanium crowns were set for comparison when the porcelain was fractured on purpose to get the experimental value of fracture strength. Then, the surface were examined by SEM and each fracturing pattern were compared with each other Result:Those results are as follows. 1. The highest value of fracture strength of porcelain-fused-to-titanium crowns was in the order of group with gold coating, group with TiN coating, group with $Al_2O_3$ sandblasting. No statistically significant difference was found among the three (P>.05). 2. The porcelain-fused-to-gold crowns showed the highest value in bonding strength. The bonding strength of crowns porcelain-fused-to-titanium crowns of rest groups showed bonding strength reaching only 85%-94% of that of PFG, though simple comparision seemed unacceptable due to the difference in materials used. 3. The fracturing patterns between metal and porcelain showed mixed type of failure behavior including cohesive failure and adhesive failure as a similar patterns by examination with the naked eye and SEM. But porcelain-fused-to-gold crowns showed high incidence of adhesive failure and porcelain-fused-to-titanium crowns showed high incidence of cohesive failure. Conclusion: Above results proved that when fabricating porcelain-fused-to-titanium crowns, treating casting titanium surface with gold or TiN was able to enhance the bonding strength between titanium and porcelain. Mean value of masticatory force was found to showed clinically acceptable values in porcelain bonding strength in all three groups. However, more experimental studies and evaluations should be done in order to get better porcelain bonding strength and various surface coating methods that can be applied on titanium surface with ease.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.11a
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• pp.348-351
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• 2003

산소 과전압이 낮은 $MnO_2$를 촉매로 사용하여 반도체 산화물계의 산소선택성 전극을 제조하고 산화물 coating층의 미세구조와 전기화학적 특성을 분석하였다. Ti 기판에 열분해 법을 이용하여 $MnO_2$ 피막을 형성하였고, 또한 PVDF : $MnO_2$의 함량비를 1 : 1에서 1 : 40까지 정량적으로 변화시키고 DMF의 함량을 각각의 고정된 PVDF : $MnO_2$의 함량비에서 변화시켜 Pb전극에 1.5 mm/sec의 속도로 5회 dipping하여 $MnO_2$ 피막층을 형성 하였다. $450^{\circ}C$에서 1시간 열분해하여 약 $1\;{\mu}m$의 $MnO_2$ 피막층이 형성되었으나 Ti 기판과의 접착력이 약하여 피막자체에 대한 전기화학적 특성을 관찰할 수 없었다. PVDF : DMF = 4 : 96인 경우 pb 전극의 피막층이 얇기 때문에 박리현상이 일어났으며 이는 산화물 용제의 낮은 점도 때문인 것으로 판단된다. 또한 PVDF : DMF = 10 : 90의 경우는 5회 dipping 하여 약 $150\;{\mu}m$의 피막층을 형성하였다. PVDF : $MnO_2$의 함량비가 1:1에서 1:6 까지는 DMF의 함량에 무관하게 전극 특성이 나타나지 않았지만 $MnO_2$의 양이 상대적으로 증가하면 cycle이 증가하더라도 거의 일정한 전류 값을 갖고 $MnO_2$와 PVDF의 비가 20:1 이상의 조성에서는 균일한 CV 특성을 나타냈다. 이는 $MnO_2$가 효과적으로 촉매 작용을 한 것으로 판단되며 anodic polarization에 의한 산소 발생 과전압도 약 1.4V 정도로 감소되었다.동등한 MSIL 코드를 생성하도록 시스템을 컴파일러 기법을 이용하여 모듈별로 구성하였다.적용하였다.n rate compared with conventional face recognition algorithms. 아니라 실내에서도 발생하고 있었다. 정량한 8개 화합물 각각과 총 휘발성 유기화합물의 스피어만 상관계수는 벤젠을 제외하고는 모두 유의하였다. 이중 톨루엔과 크실렌은 총 휘발성 유기화합물과 좋은 상관성 (톨루엔 0.76, 크실렌, 0.87)을 나타내었다. 이 연구는 톨루엔과 크실렌이 총 휘발성 유기화합물의 좋은 지표를 사용될 있고, 톨루엔, 에틸벤젠, 크실렌 등 많은 휘발성 유기화합물의 발생원은 실외뿐 아니라 실내에도 있음을 나타내고 있다.>10)의 $[^{18}F]F_2$를 얻었다. 결론: $^{18}O(p,n)^{18}F$ 핵반응을 이용하여 친전자성 방사성동위원소 $[^{18}F]F_2$를 생산하였다. 표적 챔버는 알루미늄으로 제작하였으며 본 연구에서 연구된 $[^{18}F]F_2$가스는 친핵성 치환반응으로 방사성동위원소를 도입하기 어려운 다양한 방사성의 약품개발에 유용하게 이용될 수 있을 것이다.었으나 움직임 보정 후 영상을 이용하여 비교한 경우, 결합능 변화가 선조체 영역에서 국한되어 나타나며 그 유의성이 움직임 보정 전에 비하여 낮음을 알 수 있었다. 결론: 뇌활성화 과제 수행시에 동반되는 피험자의 머리 움직임에 의하여 도파민 유리가 과대평가되었으며 이는 이 연구에서 제안한 영상정합을 이용한 움직임 보정기법에 의해서 개선되었다. 답이 없는 문제, 문제 만들기, 일반화가 가능한 문제 등으로 보고, 수학적 창의성 중 특히 확산적 사고에 초점을 맞추어 개방형 문제가 확산적 사고의 요소인 유창성, 독창성, 유연성 등에 각각 어떤 영향을 미치는지 20주의 프로그램을 개발, 진행하여 그 효과를 검증하고자

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.206.1-206.1
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• 2015

최근에 금속산화물을 증착하는 방법으로 용액공정이 주목 받고 있다. 용액 공정은 대기압에서 매우 간단한 방법으로 복잡한 공정과정을 요구하지 않기 때문에 박막을 경제적으로 간단하게 형성할 수 있다. 하지만 용액공정을 통해 형성한 박막에는 소자의 특성을 열화 시키는 solvent와 탄소계열의 불순물을 많이 포함하고 있어 고온의 열처리가 필수적이다. 박막의 품질을 향상시키기 위해서 다양한 열처리 방법들이 이용되고 있으며, 일반적인 열처리 방법으로는 furnace를 이용한 conventional thermal annealing (CTA)이 많이 이용되고 있다. 하지만, 최근에는 microwave를 이용한 공정이 주목 받고 있다. Microwave energy는 CTA보다 효과적으로 비교적 낮은 온도에서 높은 열처리 효과를 나타낸다. 본 실험은 n-type Silicon 기판에 solution-ZrO2 산화막을 형성 후, oven baking을 한 뒤, CTA와 microwave를 이용하여 solvent와 불순물을 제거 하였다. 전기적 특성을 확인하기 위해 solution ZrO2 산화막 위에 E-beam evaporator를 이용해 Ti 금속 전극을 증착하여 Metal-Oxide-Semiconductor (MOS) capacitor를 제작하였다. 다음으로, PRECISION SEMICONDUCTOR PARAMETER ANALYZER (4156B)를 이용하여, capacitance-voltage (C-V) 특성 및 current-voltage (I-V) 특성을 비교하였다. 다음으로, CTA를 통하여 제작한 소자와 전기적 특성을 비교하였다. 그 결과, Microwave irradiation으로 열처리한 MOS capacitor 소자에서 capacitance 값과 flat band voltage, hysteresis 등이 개선되는 효과를 확인하였다. Microwave irradiation 열처리는 100oC 미만의 온도에서 공정이 이루어짐에도 불구하고 시료 내에서의 microwave 에너지의 흡수가 CTA 공정에서의 열에너지 흡수보다 훨씬 효율적으로 이루어지며, 결과적으로 ZrO2 용액의 불순물과 solvent를 낮은 온도에서 제거하여 고품질 박막 형성에 매우 효과적이라는 것을 나타낸다. 따라서, microwave irradiation 열처리 방법은 비정질 산화막이 포함되는 박막 transistor 소자 제작에 대하여 결정적인 열처리 방법이 될 것으로 기대한다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.331-331
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• 2009

Hafnium oxide ($HfO_2$) attracted by one of the potential candidates for the replacement of si-based oxides. For applications of the high-k gate dielectric material, high thermodynamic stability and low interface-trap density are required. Furthermore, the amorphous film structure would be more effective to reduce the leakage current. To search the gate oxide materials, metal-insulator-metal (MIM) capacitors was fabricated by pulsed laser deposition (PLD) on indium tin oxide (ITO) coated glass with different oxygen pressures (30 and 50 mTorr) at room temperature, and they were deposited by Au/Ti metal as the top electrode patterned by conventional photolithography with an area of $3.14\times10^{-4}\;cm^2$. The results of XRD patterns indicate that all films have amorphous phase. Field emission scanning electron microscopy (FE-SEM) images show that the thickness of the $HfO_2$ films is typical 50 nm, and the grain size of the $HfO_2$ films increases as the oxygen pressure increases. The capacitance and leakage current of films were measured by a Agilent 4284A LCR meter and Keithley 4200 semiconductor parameter analyzer, respectively. Capacitance-voltage characteristics show that the capacitance at 1 MHz are 150 and 58 nF, and leakage current density of films indicate $7.8\times10^{-4}$ and $1.6\times10^{-3}\;A/cm^2$ grown at 30 and 50 mTorr, respectively. The optical properties of the $HfO_2$ films were demonstrated by UV-VIS spectrophotometer (Scinco, S-3100) having the wavelength from 190 to 900 nm. Because films show high transmittance (around 85 %), they are suitable as transparent devices.

• Proceedings of the KIEE Conference
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• 1990.07a
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• pp.227-230
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• 1990

The addition of titanium has come to produce an increase in the conductivity of ${\alpha}-Fe_2O_3$ and has been shown NTC ( negative temperature coefficient ) characteristics. Titanium enters the ${\alpha}-Fe_2O_3$ lattice substitutionally as $Ti^{4+}$,thus producing an $Fe^{2+}$ and maintaining the average charge per cation at three. Thus the $Fe^{2+}$ acts as a donor center with respect to the surrounding $Fe^{3+}$ ions. The sintering temperature, compacting pressure and sintering tire have an effect on the electrical properties. C-V and other properties have been measured on polycrystalline samples of ${\alpha}-Fe_2O_3$ containing small deviations from stoichiometry and small amounts of added Titanium. This measurment was made in the course of an investigation of the NTC mechanism in oxides whose cations have a partially filled d-level. C-V and frequency properties have been applied to the measurement of the trap barrier properties at the grain boundary. The double Schottky barrier at the grain boundary is the major cause of the NTC mechanism in NTC thermistor of ${\alpha}-Fe_2O_3$ containing N-type impurity.