• Proceedings of the Korean Vacuum Society Conference
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• 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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• pp.139-139
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• 1999

다이아몬드는 지구상에서 가장 단단한 물질로 잘 알려져 있을 뿐만 아니라 공업적 측면에서 볼 때, 여러 가지 특출한 성질들을 동시에 지니고 있다. 인장강도, 압축강도, 탄성계수 등 기계적 특성이 우수하고 넓은 광투과성과 내열, 내화학, 내방사성을 지니고 있으며, 열전도율이 높고 전기적으로 절연체이다. 또한 hole이동도가 높고 도핑에 의해서 반도체적 특성을 나타낸다. 이와 같이 매우 뛰어난 성질을 공업적으로 응용하기 위하여 이전부터 많은 연구가 행해져 왔으며, 1980년대에 들어와 박막이나 코팅 형태로의 합성이 가능한 기상합성법이 큰 발전을 보임으로써 다이아몬드의 우수한 특성을 여러 분야에서 폭넓게 응용할 수 있게 되었다. 특히 마찰 응용분야에 최적의 재료로 추천되고 있다. 지금도 Epitaxial 다이이몬드를 기지 위에 성장시키고 다결정질박막을 여러 가지 비다이아몬드(Si, W, Mo 등) 기지 위에 성장시키는 연구가 계속되고 있으며 공구강 위엥 경질코팅으로써 한층 개선된 다이아몬드박막 제조를 위한 수많은 연구노력들이 집중되고 있다. 그러나 일반탄소강에 다이아몬드박막을 성장시키기 위한 많은 노력들은 크게 바람직하지 않은 non-diamond carbon(black carbon or graphitic soot)의 형성 때문에 방해를 받고 있다. 계면에서 이들의 형성은 증착된 다이아몬드박막과 금속기지의 저조한 밀착력을 나타내게 된다. 이외 같이 다이아몬드박막의 응용을 위하여 다이아몬드피막에 요구되는 중요한 조건은 기지에 대해서 강한 밀착력을 나타내는 것이며, 동시에 상대물에 대하여 낮은 마찰계수를 가져야 한다. 그러나 다이아몬드와 금속기지는 서로 다른 열챙창계수(각각 0.87$\times$10-6K-1, 12$\times$10-6K-1)의 차이로 인하여 밀착력이 현저히 떨어진다는 단점으로 인해 산업화에 많은 제약을 받아왔다. 이러한 문제점을 해결하기 위하여 본 연구에서는 다이아몬드박막과 금속기지 사이에 중간층을 이용하는 방법을 제안하였다. 이러한 시도는 일반적으로 중간층 형성 금속인 Ti 또는 TiN 등이 적용되었으나 원하는 결과를 얻지 못하였다. 즉 carbon과 Fe의 상호확산, non-diamond carbon상의 형성 그리고 열잔류응력을 완화시키고 일반탄소강 위에 다이아몬드박막을 형성시켜 우수한 밀착력을 얻기 위한 목적에 미흡하였던 것이다. 이에 중간층으로 Cr 또는 Cr계 화합물 박막을 이용하였는 바, 이 중간층을 이용한 결과 우수한 밀착력을 나타내는 다이아몬드박막을 얻었으며 열적, 구조저으로 모재와 다이아몬드에 적합한 결과를 얻을 수 있었다. 본 연구에 의해 얻어진 결과들은 재료 가공을 위하여 높은 경도와 내마모성등이 요구되는 절삭공구나 금형의 수명 향항에 크게 기여할 것이며 산업적으로 큰 응용이 기대된다.

• Proceedings of the Korean Vacuum Society Conference
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.287-287
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• 2011

ITRS(international technology roadmap for semiconductors)에 따르면 MOS (metal-oxide-semiconductor)의 CD(critical dimension)가 45 nm node이하로 줄어들면서 poly-Si/SiO2를 대체할 수 있는 poly-Si/metal gate/high-k dielectric이 대두되고 있다. 일반적으로 metal gate를 식각시 정확한 CD를 형성시키기 위해서 plasma를 이용한 RIE(reactive ion etching)를 사용하고 있지만 PIDs(plasma induced damages)의 하나인 PICD(plasma induced charging damage)의 발생이 문제가 되고 있다. PICD의 원인으로 plasma의 non-uniform으로 locally imbalanced한 ion과 electron이 PICC(plasma induced charging current)를 gate oxide에 발생시켜 gate oxide의 interface에 trap을 형성시키므로 그 결과 소자 특성 저하가 보고되고 있다. 그러므로 본 연구에서는 이에 차세대 MOS의 metal gate의 식각공정에 HDP(high density plasma)의 ICP(inductively coupled plasma) source를 이용한 중성빔 시스템을 사용하여 PICD를 줄일 수 있는 새로운 식각 공정에 대한 연구를 하였다. 식각공정조건으로 gas는 HBr 12 sccm (80%)와 Cl2 3 sccm (20%)와 power는 300 w를 사용하였고 200 eV의 에너지로 식각공정시 TEM(transmission electron microscopy)으로 TiN의 anisotropic한 형상을 볼 수 있었고 100 eV 이하의 에너지로 식각공정시 하부층인 HfO2와 높은 etch selectivity로 etch stop을 시킬 수 있었다. 실제 공정을 MOS의 metal gate에 적용시켜 metal gate/high-k dielectric CMOSFETs의 NCSU(North Carolina State University) CVC model로 effective electric field electron mobility를 구한 결과 electorn mobility의 증가를 볼 수 있었고 또한 mos parameter인 transconductance (Gm)의 증가를 볼 수 있었다. 그 원인으로 CP(Charge pumping) 1MHz로 gate oxide의 inteface의 분석 결과 이러한 결과가 gate oxide의 interface trap양의 감소로 개선으로 기인함을 확인할 수 있었다.

• Tribology and Lubricants
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• 제24권3호
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• pp.122-128
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• 2008

To reduce the friction losses and the wear amounts in the piston assembly two methods were proposed. One is the modification of surface profile of the skirt part. The surface coating is another method to protect the sliding surfaces. To modify the profile of the skirt surfaces the surfaces were ground to have three different shapes of profiles. Also, several coatings, such as graphite, TiN, and $MoS_2$, and DLC, were used to protect the surfaces of the piston skirts. The specimens of the skirt and the cylinder bores were tested with the reciprocating wear tester. SAE 5W40 engine oil was used in boundary lubrication regime. Among several coatings the graphite and DLC coatings were very effective to reduce the friction forces. Especially, DLC film represented much better tribological performances than the others. The friction coefficient of the graphite coating was the lowest, but the graphite coating was not effective to protect the surfaces.

• Proceedings of the Korean Vacuum Society Conference
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.211-212
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• 2010

GaN 기반의 상부발광형 LED는 동작되는 동안 생기는 전기적 단락, 그리고 칩 위의 p-형 전극과 n-형 전극 사이에 생기는 누설전류 및 신뢰성 확보를 위하여 칩 표면에 passivation 층을 형성하게 된다. SiO2, Si3N4와 같은 passivation layers는 일반적으로 PECVD (Plasma Enhanced Chemical Vapor Deposition)공정을 이용한다, 하지만 이는 공정 특성상 plasma로 인한 damage가 유발되기 때문에 표면 누설 전류가 증가 한다. 이로 인해 forward voltage와 reverse leakage current의 특성이 저하된다. 본 실험에서는 원자층 단위의 박막 증착으로 인해 PECVD보다 단차 피복성이 매우 우수한 PEALD(Plasma Enhanced Atomic Layer Deposition)공정을 이용하여 Al2O3 passivation layer를 증착한 후, 표면 누설전류와 빛의 출력 특성에 대해서 조사해 보았다. PSS (patterned sapphire substrate) 위에 성장된 LED 에피구조를 사용하였고, TCP(Trancformer Copled Plasma)장비를 사용하여 에칭 공정을 진행하였다. 이때 투명전극을 증착하기 위해 e-beam evaporator를 사용하여 Ni/Au를 각각 $50\;{\AA}$씩 증착한 후 오믹 특성을 향상시키기 위하여 $500^{\circ}C$에서 열처리를 해주었다. 그리고 Ti/Au($300/4000{\AA}$) 메탈을 사용하여 p-전극과 n-전극을 형성하였다. Passivation을 하지 않은 경우에는 reverse leakage current가 -5V 에서 $-1.9{\times}10-8$ A 로 측정되었고, SiO2와 Si3N4을 passivation으로 이용한 경우에는 각각 $8.7{\times}10-9$과 $-2.2{\times}10-9$로 측정되었다. Fig. 1 에서 보면 알 수 있듯이 5 nm의 Al2O3 film을 passivation layer로 이용할 경우 passivation을 하지 않은 경우를 제외한 다른 passivation 경우보다 reverse leakage current가 약 2 order ($-3.46{\times}10-11$ A) 정도 낮게 측정되었다. 그 이유는 CVD 공정보다 짧은 ALD의 공정시간과 더 낮은 RF Power로 인해 plasma damage를 덜 입게 되어 나타난 것으로 생각된다. Fig. 2 에서는 Al2O3로 passivation을 한 소자의 forward voltage가 SiO2와 Si3N4로 passivation을 한 소자보다 각각 0.07 V와 0.25 V씩 낮아지는 것을 확인할 수 있었다. 또한 Fig. 3 에서는 Al2O3로 passivation을 한 소자의 output power가 SiO2와 Si3N4로 passivation을 한 소자보다 각각 2.7%와 24.6%씩 증가한 것을 볼 수 있다. Output power가 증가된 원인으로는 향상된 forward voltage 및 reverse에서의 leakage 특성과 공기보다 높은 Al2O3의 굴절률이 광출력 효율을 증가시켰기 때문인 것으로 판단된다.

• Current Photovoltaic Research
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• 제10권1호
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• pp.16-22
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• 2022

The long-term stability of PSCs against visual and UV light, moisture, electrical bias and high temperature is an important issue for commercialization. In particular, since the operation temperature of solar cell can rise above 85℃, a study on thermal stability is required. In this study, the cause of thermal-induced degradation of PSCs was investigated using the SCAPS-1D simulation tool. First, PSCs of TiO₂/CH₃NH₃PbI₃/Spiro-OMeTAD/Au structure were exposed to a constant temperature of 85℃ to observe changes in conversion efficiency and quantum efficiency. Because the EQE reduction above 500 nm was remarkable, we simulated PSCs performance as a function of lifetime, doping density of perovskite and spiro-OMeTAD. Consequently, the main cause of thermal-induced degradation is considered to be the change in the perovskite doping concentration and lifetime due to ion migration of perovskite.

• Proceedings of the KACD Conference
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• 대한치과보존학회 2008년도 Spring Scientific Meeting(the 129th) of Korean Academy if Conservative Dentistry
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• pp.204-212
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• 2008

The purpose of this study was to compare the apical microleakage in root canal filled with Resilon by methacrylate-based root canal sealer or 2 different self-adhesive resin cements. Seventy single-rooted extracted human teeth were sectioned at the CEJ perpendicular to the long axis of the roots with diamond disk. Canal preparation was performed with crown-down technique using Profile NiTi rotary instruments and GG drill. Each canal was prepared to ISO size 40, .04 taper and 1 mm short from the apex. The prepared roots were randomly divided into 4 experimental groups of 15 roots each and 5 roots each for positive and negative control group. The root canals were filled by lateral condensation as follows. Group 1: Gutta-percha with AH-26, Group 2: Resilon with RealSeal primer & sealer, Group 3: Resilon with Rely-X Unicem, Group 4: Resilon with BisCem. After stored in $37^{\circ}C$, 100% humidity chamber for 7 days, the roots were coated with 2 layers of nail varnish except apical 3 mm. The roots were then immersed in 1% methylene blue dye for 7 days. Apical microleakage was measured by a maximum length of linear dye penetration after roots were separated longitudinally. One way ANOVA and Scheffe's post-hoc test were performed for statistical analysis. Group 1 showed the least apical leakage and there was no statistical significance between Group 2, 3, 4. According to the results, the self adhesive resin cement is possible to use as sealer instead of primer & sealant when root canal filled by Resilon.

• Restorative Dentistry and Endodontics
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• 제33권3호
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• pp.204-212
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• 2008

The purpose of this study was to compare the apical microleakage in root canal filled with Resilon by methacrylate-based root canal sealer or 2 different self-adhesive resin cements. Seventy single-rooted extracted human teeth were sectioned at the CEJ perpendicular to the long axis of the roots with diamond disk. Canal preparation was performed with crown-down technique using Profile NiTi rotary instruments and GG drill. Each canal was prepared to ISO size 40, .04 taper and 1 mm short from the apex. The prepared roots were randomly divided into 4 experimental groups of 15 roots each and 5 roots each for positive and negative control group. The root canals were filled by lateral condensation as follows. Group 1: Guttapercha with AH-26, Group 2: Resilon with RealSeal primer & sealer, Group 3: Resilon with Rely-X Unicem, Group 4: Resilon with BisCem. After stored in $37{\circ}C$, 100% humidity chamber for 7 days, the roots were coated with 2 layers of nail varnish except apical 3 mm. The roots were then immersed in 1% methylene blue dye for 7 days. Apical microleakage was measured by a maximum length of linear dye penetration after roots were separated longitudinally. One way ANOVA and Scheffe's post-hoc test were performed for statistical analysis. Group 1 showed the least apical leakage and there was no statistical significance between Group 2, 3, 4. According to the results, the self adhesive resin cement is possible to use as sealer instead of primer & sealant when root canal filled by Resilon.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.331-331
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• 2009

Hafnium oxide ($HfO_2$) attracted by one of the potential candidates for the replacement of si-based oxides. For applications of the high-k gate dielectric material, high thermodynamic stability and low interface-trap density are required. Furthermore, the amorphous film structure would be more effective to reduce the leakage current. To search the gate oxide materials, metal-insulator-metal (MIM) capacitors was fabricated by pulsed laser deposition (PLD) on indium tin oxide (ITO) coated glass with different oxygen pressures (30 and 50 mTorr) at room temperature, and they were deposited by Au/Ti metal as the top electrode patterned by conventional photolithography with an area of $3.14\times10^{-4}\;cm^2$. The results of XRD patterns indicate that all films have amorphous phase. Field emission scanning electron microscopy (FE-SEM) images show that the thickness of the $HfO_2$ films is typical 50 nm, and the grain size of the $HfO_2$ films increases as the oxygen pressure increases. The capacitance and leakage current of films were measured by a Agilent 4284A LCR meter and Keithley 4200 semiconductor parameter analyzer, respectively. Capacitance-voltage characteristics show that the capacitance at 1 MHz are 150 and 58 nF, and leakage current density of films indicate $7.8\times10^{-4}$ and $1.6\times10^{-3}\;A/cm^2$ grown at 30 and 50 mTorr, respectively. The optical properties of the $HfO_2$ films were demonstrated by UV-VIS spectrophotometer (Scinco, S-3100) having the wavelength from 190 to 900 nm. Because films show high transmittance (around 85 %), they are suitable as transparent devices.

• Proceedings of the Korean Vacuum Society Conference
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.377-377
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• 2011

Organic solar cells (OSCs) with low cost have been studied to apply on flexible substrate by solution process in low temperature [1]. In previous researches, conventional organic solar cell was composed of metal oxide anode, buffer layer such as PEDOT:PSS, photoactive layer, and metal cathode with low work function. In this structure, indium tin oxide (ITO) and Al was generally used as metal oxide anode and metal cathode, respectively. However, they showed poor reliability, because PEDOT:PSS was sensitive to moisture and air, and the low work function metal cathode was easily oxidized to air, resulting in decreased efficiency in half per day [2]. Inverted organic solar cells (IOSCs) using high work function metal and buffer layer replacing the PEDOT:PSS have focused as a solution in conventional organic solar cell. On the contrary to conventional OSCs, ZnO and TiO2 are required to be used as a buffer layer, since the ITO in IOSC is used as cathode to collect electrons and block holes. The ZnO is expected to be excellent electron transport layer (ETL), because the ZnO has the advantages of high electron mobility, stability in air, easy fabrication at room temperature, and UV absorption. In this study, the IOSCs based on poly [N-900-hepta-decanyl-2,7-carbazole-alt-5,5-(40,70-di-2-thienyl-20,10,30-benzothiadiazole)] (PCDTBT) : [6,6]-phenyl C71 butyric acid methyl ester (PC70BM) were fabricated with the ZnO electron-transport layer and MoO3 hole-transport layer. Thickness of the ZnO for electron-transport layer was controlled by rotation speed in spin-coating. The PCDTBT and PC70BM were mixed with a ratio of 1:2 as an active layer. As a result, the highest efficiency of 2.53% was achieved.

• The Journal of Advanced Prosthodontics
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• 제6권6호
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• pp.491-497
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• 2014

PURPOSE. This study evaluated the influence of abutment materials on the stability of the implant-abutment joint in internal conical connection type implant systems. MATERIALS AND METHODS. Internal conical connection type implants, cement-retained abutments, and tungsten carbide-coated abutment screws were used. The abutments were fabricated with commercially pure grade 3 titanium (group T3), commercially pure grade 4 titanium (group T4), or Ti-6Al-4V (group TA) (n=5, each). In order to assess the amount of settlement after abutment fixation, a 30-Ncm tightening torque was applied, then the change in length before and after tightening the abutment screw was measured, and the preload exerted was recorded. The compressive bending strength was measured under the ISO14801 conditions. In order to determine whether there were significant changes in settlement, preload, and compressive bending strength before and after abutment fixation depending on abutment materials, one-way ANOVA and Tukey's HSD post-hoc test was performed. RESULTS. Group TA exhibited the smallest mean change in the combined length of the implant and abutment before and after fixation, and no difference was observed between groups T3 and T4 (P>.05). Group TA exhibited the highest preload and compressive bending strength values, followed by T4, then T3 (P<.001). CONCLUSION. The abutment material can influence the stability of the interface in internal conical connection type implant systems. The strength of the abutment material was inversely correlated with settlement, and positively correlated with compressive bending strength. Preload was inversely proportional to the frictional coefficient of the abutment material.