• Electrical & Electronic Materials
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• v.9 no.3
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• pp.298-303
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• 1996

A double diffusion technique is developed to enhance the effective mode index of optical waveguides in $LiTaO_3$. It consists of Zn diffusion from the vapor phase at relatively low temperatures (750->$800^{\circ}C$), into waveguides initially produced by Ti indiffusion at higher temperature (1150->$1200^{\circ}C$). Both X- and Z-cut substrates are investigated. A model that combines profiles of both diffusion is formulated to calculate the expected effective index values for planar waveguides. Good agreement is found between experimental results and model predictions which assume that the initial Ti profile is not affected by the lower temperature Zn diffusion. Effective index enhancements as high as 0.005 and 0.003 are obtained by this method for the fundamental extraordinary and ordinary modes, respectively.

• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.10
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• pp.1584-1590
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• 1989

In this study, a planar waveguide has been fabricated on a Y-cut LiNbO3 substrate by the Ti indiffusion technique and its guiding characteristics are measured by bright M-line spectroscopy. Using the photolithography method, an electro-optic grating modulator with interdigital electrodes has been fabricated by depositing Al on the Ti:LiNbO3 planar waveguide. And the beam intensity diffracted by the grating is measured as the applied voltage is increased.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.05a
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• pp.282-285
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• 1999

Fabrication and pakaging method for low delve voltage and 10Gbps Ti diffused waveguide LiNbO$_3$ optical intensity modulator are described. Optical waveguides were prepared by conventionaly electron-beam evaporation and Ti-indiffusion into Z-cut plate LiNbO$_3$. Traveling-wave electrodes were used for obtaining the wideband frequency response and impedance matching. Microwave effective index and characteristic impedance measured by time domain reflectometry and compared with the calculated value by conformal mapping. The characteristics of 10Gbps modulator at the 1550nm wavelength are as follows : perfect modulation voltage Is about 5V, optical insertion loss Is about 5dB, 3-dB bandwidth is 10GHz, and characteristic impedance is about 50$\Omega$.

• Journal of the Korean Institute of Telematics and Electronics
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• v.25 no.3
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• pp.343-351
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• 1988

Planar optical waveguides are fabricated on a Y-cut LiNbO3 single crystal substrate by Ti indiffusion method. From data measured by the bright M-line spectroscopy, refractive index profiles are reconstructed by WKB approximation method. Then, single strip, X-crossing strip, and Y-brinch strip optical waveguides are fabricated on X-cut LiNbO3 single crystal substrate, with waveguide patterns made by the laser beam direct writing method. And their near-field intensity profiles are observed after coupling the light to the waveguide edges.

• Korean Journal of Materials Research
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• v.12 no.4
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• pp.254-258
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• 2002

To realize channel cross-connecting in optical communications systems, a high speed optical matrix switch was fabricated using z-cut $LiNbO_3$. For switch fabrication was design bending structure and coupling length and four $2{\times}2$ directional couplers were integrated on one substrate far construction of a $4{\times}4$ switch. Single-mode optical waveguides were formed by Ti-diffusion at a wet $O_2$ atmosphere. Ti-diffusion profile, refractive index variation and waveguide morphology were analyzed by Prism coupler and optical microscopy, respectively.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.17 no.4
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• pp.371-378
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• 1992

In this paper we report the fabrication of a planar optical wavehuide lens on a Y-cut LiNbO3 substrate by Ti_indiffusion and Ti-indiffused proton-exchange(TIPE). LiNbo3 planar waveguides are fabricated and refractive indices of the waveguides are fabricated and refractive indices of the waveguides are measured. Based on the measured indices, palanr waveguide lenses are designed and fabricated. The measured focal point and spot size of the fabricated lens are in good agreement with those of the designed lens.

• Korean Journal of Optics and Photonics
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• v.7 no.1
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• pp.51-59
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• 1996

In this paper, we propose a new type of a planar waveguide lens, a meniscus lens instead of a plano-convex lens used widely for the optical integrated circuits such as optical numerical processors. A plano-convex lens has a spherical aberration caused by the linear boundary. In the proposed meniscus lens, this linear boundary is replaced by a circular-boundary, and the spherical aberration is removed. To test the performance of the proposed lens, a meniscus lens is designed using Fermat principle and fabricated on the Y-cut $LiNbO_3$ substrate. First a $Ti:LiNbO_3$ planar waveguide is fabricated on the $LiNbO_3$ substrate by Ti indiffusion. Then a meniscus lens is fabricated on the planar waveguide by TIPE(Ti indiffued proton-exchange) method. A plano-convex lens is also fabricated on the same substrate to compare the spot size at the focal point. The measured spot size of the meniscus lens is reduced to 59% that of the plano-convex lens. This result shows that the proposed meniscus lens is more effective for optical integrated circuits than the plano-convex lens.