• 제목/요약/키워드: Ti substrate

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Ti-silicide 박막 형성시 규소 기판에 이온 주입된 붕소 거동에 대한 SIMS 분석 (SIMS analysis of the behavior of boron implanted into single silicon during the Ti-silicide formation)

  • 황유상;백수현;조현춘;마재평;최진석;강성건
    • 분석과학
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    • 제5권2호
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    • pp.199-202
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    • 1992
  • $BF_2$를 50keV, 90keV로 에너지를 달리하여 주입한 실리콘 기판에 타이타늄을 sputter하여 Ti-slicide를 형성한 시편과 composite target을 사용하여 Ti-silicide를 형성한 시편을 준비하였다. Ti-silicide 형성시 boron의 거동을 SIMS(secondary ion mass spectrometry)로 분석하였다. Metal-Ti target을 사용한 경우 Ti-silicide 형성시 불순물들이 재분포하였으며 이온 주입 에너지가 작은 경우 심한 out-diffusion이 발생하였다. 한편 Composite target을 사용한 경우 거의 재분포가 발생하지 않고 안정된 boron의 분포를 보였다.

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유한요소해석에 의한 코팅면의 브리넬 경도 평가: 제3보 - 다층 코팅에 적용 (Evaluation of Brinell Hardness of Coated Surface Using Finite Element Analysis: Part 3 - Application to Multilayer Coatings)

  • 박태조;강정국
    • Tribology and Lubricants
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    • 제37권6호
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    • pp.240-245
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    • 2021
  • Ceramic coatings with high hardness and excellent chemical stability have been successfully applied to various machine elements, tools, and implants. However, in the case of monolayer coating on soft substrates, a high-stress concentration at the interface between the coating and the substrate causes delamination of the coating layer. Recently, to overcome this problem, multilayer coatings with a metal layer with a low modulus of elasticity added between the ceramic and the substrate have been widely applied. This study presents the third part of a recent study and focuses on the effect of the number of coating layers on the Brinell hardness of multilayered coating with TiN/Ti, following the two previous studies on a new Brinell hardness test method for a coated surface and on the influence of substrate and coating thickness. Indentation analyses are performed using finite element analysis software, von Mises stress and equivalent plastic strain distributions, load-displacement curves, and residual indentation shapes are presented. The number of TiN/Ti layers considerably affect the stress distributions and indentation shapes. Moreover, the greater the number of TiN/Ti layers, the higher is the Brinell hardness. The stress and plastic strain distributions confirm that the multilayer coatings improve the wear resistance. The results are expected to be used to design and evaluate various coating systems, and additional study is required.

동시증착에 의한 Si(111)-7$\times$7 기판 위에 $TiSi_2$ 에피택셜 성장 (In situ Epitaxial Growth of the $TiSi_2$ on si(111)-7$\times$7 Substrate by Codeposition)

  • 최치규;류재연;오상식;염병렬;박형호;조경익;이정용;김건호
    • 한국진공학회지
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    • 제3권4호
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    • pp.405-413
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    • 1994
  • 초고진공에서 기판 Si(111)-7$\times$7 위에 Ti:Si 또는 1:2의 조성비로 Ti와 Si을 동시증착한 후 in situ 열처리하여 TiSi2 박막을 에피택셜 성장시켰다 XRD와 XPS 분석결과 동시증착된 혼합 층에서 C49-TiSi2 박막의 성장은 핵형성에 의함을 확인하였으며 양질의 C49-TiSi2 박막은 Ti를 증착한후 Ti와 Si를 동시 증착한 (Ti+2Si)/(Ti)/Si(111)-7$\times$7구조의 시료를 초고진공에서 50$0^{\circ}C$에서 열처리하여 얻을수 있었다. 형성된 C49-TiSi2/Si(111)의 계면은 깨끗하였고 HRTEM 분석 결과 C49-TiSi2\ulcornerSi(111)의 계면은 약 10。 의 편의를 가지면서 TiSi2[211]∥Si[110] TiSi2(031)/Si(111) 의 정합성을 가졌으며 시료의 전 영 역에 에피택셜 성장되었다.

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$TiO_2$ 박막의 광학적 특성에 관한 연구 (A Study on the Optical Properties of $TiO_2$ Thin Films)

  • 강성준;정양희
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2003년도 추계종합학술대회
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    • pp.995-998
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    • 2003
  • MOCVD 법을 이용하여 TiO$_2$ 박막을 제작하여, 투과곡선을 비교적 간단하게 분석할 수 있는 포락선방법을 사용하여 기판온도에 따른 TiO$_2$ 박막의 굴절률, 소광계수 등의 광학적 상수들을 구하였다. 투과곡선의 모사를 실시하여 포락선방법으로 구한 값들이 매우 신뢰도가 높음을 입증하였다. TiO$_2$ 박막은 35$0^{\circ}C$ 에서 부터 결정화가 되기 시작하여, 40$0^{\circ}C$ 이상에서 tetragonal structure 를 갖는 anatase 상으로 완전히 결정화됨을 알 수 있다. 기판온도에 따른 증착률을 Arrhenius plot 하여 구한 활성화에너지는 reaction limited 단계에서 17.8 kcal/mol 이었다. 포락선방법을 이용하여 구한 TiO$_2$ 박막의 굴절률 (λ=632.8 nm) 은 기판온도가 40$0^{\circ}C$ 에서 $600^{\circ}C$ 로 증가함에 따라 2.19 에서 2.32 로 증가하는 추세를 나타내었고, 소광계수는 0.021 에서 0.007로 감소하는 경향을 나타내었다.

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Co/Si 시스템에서 capping layer에 따른 코발트 실리사이드 박막의 형성에 관한 연구 (A study on the formation of cobalt silicide thin films in Co/Si systems with different capping layers)

  • 김해영;김상연;고대홍;최철준;김철성;구자흠;최시영;;강호규
    • 한국진공학회지
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    • 제9권4호
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    • pp.335-340
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    • 2000
  • 코발트실리사이드형성에 있어서 Capping layer로써의 Ti의 역할에 대한 연구를 수행하였다. 실리콘 산화막이 제거된 Si(100)기판과 $H_2SO_4$에 의한 chemical oxide를 형성한 Si(100)기판 위에 Co와 Ti를 증착한 후 열처리 온도 증가에 따른 계면반응과 상변화 등의 미세구조와 면저항 특성의 변화를 four point prove, XRD, TEM, SIMS등의 분석을 통하여 TiN capping, capping layer가 없는 경우에 대하여 비교하였다. 실리콘 산화막이 제거된 Si 기판 상에서 Ti capping의 경우 TiN capping, capping layer가 없는 경우보다 높은 온도에서 $CoSi_2$상이 형성되었으며, chemical oxide가 형성된 Si 기판 상에서는 Ti capping의 경우 코발트 실리사이드 박막을 형성 할 수 있었다. 이것은 capping layer인 Ti가 1차 RTA(Rapid Thermal Annealing)동안 Si 기판 방향으로 확산 침투하여 Co와 Si 사이에 존재하는 실리콘 산화막을 분해하는 역할을 하기 때문이다.

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티타늄 금속지지체에 고정화된 나노튜브 광촉매와 평판형 광반응기를 이용한 Cr(VI) 환원처리 효율 향상 연구 (Enhanced photocatalytic Cr(VI) reduction using immobilized nanotubular TiO2 on Ti substrates and flat type photoreactor)

  • 김영지;주현규;윤재경
    • 상하수도학회지
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    • 제29권1호
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    • pp.33-38
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    • 2015
  • In this study, flat-type photocatalytic reaction system is applied to reduce toxic hexavalent chromium (Cr(VI)) to trivalent chromium (Cr(III)) in aqueous solution under UV irradiation. To overcome the limitation of conventional photocatalysis, a novel approach toward photocatalytic system for reduction of hexavalent chromium including nanotubular $TiO_2$ (NTT) on two kinds of titanium substrates (foil and mesh) were established. In addition, modified Ti substrates were prepared by bending treatment to increase reaction efficiency of Cr(VI) in the flat-type photocatalytic reactor. For the fabrication of NTT on Ti substrates, Ti foil and mesh was anodized with mixed electrolytes ($NH_4F-H_2O-C_2H_6O_2$) and then annealed in ambient oxygen. The prepared NTT arrays were uniformly grown on two Ti substrates and surface property measurements were performed through SEM and XRD. Hydraulic retention time(HRT) and substrate type were significantly affected the Cr(VI) reduction. Hence, the photocatalytic Cr(VI) reduction was observed to be highest up to 95% at bended(modified) Ti mesh and lowest HRT. Especially, Ti mesh was more effective as NTT substrate in this research.

잉크젯 프린팅을 이용한 low-e $TiO_2$-silver 투명박막형성 (Fabrication of $TiO_2$-silver transparent thin films low-e coated on glass substrate by ink-jet printing)

  • 윤초롱;오효진;이남희;;김병환;김선재
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.511-511
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    • 2007
  • Low-emissivity (low-e) coatings with visible transparency have attracted increased interest m reducing heat radiation loss through window panes from ecological and sustainable aspects. $TiO_2$-silver transparent thin films for low-e have good properties for UV and IR blocking as well as photocatalyst compared to that with commercial UV blocking films such as fluorine doped oxide (FTO), antimony doped tin oxide (ATO), etc. In this study, transparent $TiO_2$-silver thin films were prepared by successive ink-jet printing of commercial nano silver and $TiO_2$ sol. The $TiO_2$ sol, as ink for ink-jet printing, were synthesized by hydrothermal process in the autoclave externally pressurized with $N_2$ gas of 200 bar at $120^{\circ}C$ for 10 hrs. The synthesized $TiO_2$ sols were all formed with brookite phase and their particle size was several to 30 nm. At first nano sized silver sol was coated on glass substrate, after that $TiO_2$ sol was coated by ink-jet printing. With increasing coating thickness of $TiO_2$-silver multilayer by repeated ink-jet coating, the absorbance of UV region (under 400nm) and IR region (over 700nm) also increase reasonably, compared to that with commercial UV blocking films.

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RF Magnetron 스퍼터링법으로 성장시킨 Ba($Zr_{0.2}Ti_{0.8}$)$O_3$ 박막의 특성 (Preparation and Properties of Ba($Zr_{0.2}Ti_{0.8}$)$O_3$ Thin Films Grown by RF Magnetron Sputtering Method)

  • 최원석;장범식;김진철;박태석;이준신;홍병유
    • 한국전기전자재료학회논문지
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    • 제14권7호
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    • pp.567-571
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    • 2001
  • We investigated the structural and electrical properties of Ba(Zr$_{x}$Ti$_{1-x}$ )O$_3$(BZT) thin films with a mole fraction of x=0.2 and a thickness of 150 nm. BZT films were prepared on Pt/SiO$_2$/Si substrate with the various substrate temperature by a RF magnetron sputtering system. When the substrate temperature was above 50$0^{\circ}C$, we obtained multi-crystalline BZT films oriented to (110), (111), and (200) directions. As the substrate temperature increases, the films are crystallized and their dielectric constants become high. C-V characteristic curve of the film deposited at high temperature is more sensitive than that of the film deposited at low temperature. The parameters of the BZT film are as follows; the dielectric constants(dissipation factors) at 1 MHz are 95(0.021), 140(0.024), and 240(0.033) deposited at 400, 500, $600^{\circ}C$, respectively; the leakage currents at 666.7 kV/cm are 5.73, 23.5, and 72.8x10$^{-8}$ A/$\textrm{cm}^2$ fo the films deposited at 400, 500, and 600 $^{\circ}C$, respectively; the leakage currents at 666.7kV/cm are 5.73, 23.5, and 72.8x10$^{-8}$ A/$\textrm{cm}^2$ for the films deposited at 400, 500, $600^{\circ}C$, respectively. The BZT film deposited at 40$0^{\circ}C$ shows stable electrical properties, but dielectric constant for application is a little small.ll.

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반응성 스프레이방법으로 제작한 티타늄 알루미나이드/탄화물 복합박막의 미세조직과 경도 (Microstructure and Hardness of Titanium Aluminide/Carbide Composite Coatings Prepared by Reactive Spray Method)

  • 한창석;진성윤
    • 한국재료학회지
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    • 제30권7호
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    • pp.350-358
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    • 2020
  • A variety of composite powders having different aluminum and carbon contents are prepared using various organic solvents having different amounts of carbon atoms in unit volume as ball milling agents for titanium and aluminum ball milling. The effects of substrate temperature and post-heat treatment on the texture and hardness of the coating are investigated by spraying with this reduced pressure plasma spray. The aluminum part of the composite powder evaporates during spraying, so that the film aluminum content is 30.9 mass%~37.4 mass% and the carbon content is 0.64 mass%~1.69 mass%. The main constituent phase of the coating formed on the water-cooled substrate is a non-planar α2 phase, obtained by supersaturated carbon regardless of the alloy composition. When these films are heat-treated at 1123 K, the main constituent phase becomes γ phase, and fine Ti2AlC precipitates to increase the film hardness. However, when heat treatment is performed at a higher temperature, the hardness is lowered. The main constitutional phase of the coating formed on the preheated substrate is an equilibrium gamma phase, and fine Ti2AlC precipitates. The hardness of this coating is much higher than the hardness of the coating in the sprayed state formed on the water-cooled substrate. When hot pressing is applied to the coating, the porosity decreases but hardness also decreases because Ti2AlC grows. The amount of Ti2AlC in the hot-pressed film is 4.9 vol% to 15.3 vol%, depending on the carbon content of the film.

Al2O3와 TiO2의 반응소결로 제조한 Al2TiO5-기계가공성 세라믹스 (Al2TiO5-machinable Ceramics Made by Reactive Sintering of Al2O3 and TiO2)

  • 박재현;이원재;김일수
    • 한국세라믹학회지
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    • 제47권6호
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    • pp.498-502
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    • 2010
  • Aluminium titanate($Al_2TiO_5$) has extremely anisotropic thermal expansion properties in single crystals, and polycrystalline material spontaneously microcracks in the cooling step after sintering process. These fine intergranular cracks limit the strength of the material, but provide an effective mechanism for absorbing strain energy during thermal shock and preventing catastrophic crack propagation. Furthermore, since machinable BN-ceramics used as an insulating substrate in current micro-electronic industry are very expensive, the development of new low-cost machinable substrate ceramics are consistently required. Therefore, cheap $Al_2TiO_5$-machinable ceramics was studied for the replacement of BN ceramics. $Al_2O_3-Al_2TiO_5$ ceramic composite was fabricated via in-situ reaction sintering. $Al_2O_3$ and $TiO_2$ powders were mixed with various mol-ratio and sintered at 1400 to $1600^{\circ}C$ for 1 h. Density, hardness and strength of sintered ceramics were systematically measured. Phase analysis and microstructures were observed by XRD and SEM, respectively. Machinability of each specimens was tested by micro-hole machining. The results of research showed that the $Al_2TiO_5$-composites could be used for low-cost machinable ceramics.