• Title/Summary/Keyword: Ti substrate

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Effects of Sputtering pressure on preferred Orientation of Shielding NbTi Thin Film by RF Magnetron Sputtering (RF 마그네트론 스퍼터링법으로 제조된 차폐용 NbTi박막의 우선방향에 미치는 스퍼터링 압력의 영향)

  • Kim, Bong-Seo;Woo, Byung-Chul;Byun, Woo-Bong;Lee, Hee-Woong
    • Proceedings of the KIEE Conference
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    • 1995.07c
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    • pp.1098-1101
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    • 1995
  • NbTi thin films were prepared on Si wafer and Cu substrate by rf magnetron sputtering in the range of sputtering pressure $3{\times}10^{-2}$torr to $3{\times}10^{-4}$torr at room temperature. The influence of sputtering pressure and substrate type on crystallographic orientation and morphology of NbTi thin films was investigated by using X-ray diffraction(XRD) and scanning electron microscopy(SEM), respectively. And the effect of crystallographic orientation and morphology of NbTi film on electromagnetic behaviors was estimated by measuring critical current in various applied magnetic field. The film morphology changed from porous structure consisting of tapered crystallites to densely deposited film decreasing with sputtering pressure. The change of crystallographic orientation with the sputtering pressure and rf power was calculated from the texture coefficient of(002) plane based on XRD patterns. It was found that a change of texture coefficient of(002) plane increased with decreasing sputtering pressure. From observation of critical current in various applied magnetic field, we have identified that the change of critical current abruptly decrease applying with magnetic field and NbTi film produced at high sputtering pressure does not exhibit superconductivity but at low sputtering pressure shows superconductivity.

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Synthesis and characterization Au doped TiO2 film for photocatalytic function

  • Son, Jeong-Hun;Bae, Byung-Seo;Bae, Dong-Sik
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.25 no.6
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    • pp.280-284
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    • 2015
  • Au doped $TiO_2$ nanoparticles have been synthesized using a reverse micelle technique combined with metal alkoxide hydrolysis and condensation. Au doped $TiO_2$ was coated with glass substrate. The size of the particles and thickness of the coating can be controlled by manipulating the relative rates of the hydrolysis and condensation reaction of TTIP within the micro-emulsion. The average size of synthesized Au doped $TiO_2$ nanoparticle was about in the size range of 15 to 25 nm and the Au particles formed mainly the range of 2 to 10 nm in diameter. The effect of synthesis parameters, such as the molar ratio of water to TTIP and the molar ratio of water to surfactant, are discussed. The synthesized nanopaticles were coated on glass substrate by a spin coating process. The thickness of thin film was about 80 nm. The degradation of MB on a $TiO_2$ thin film was enhanced over 20 % efficiency by the incorporation of Au.

High Temperature Oxidation Behavior of Plasma-sprayed Ti(Al,O)/$Al_2O_3$ Coatings on SS41 Steel (Ti(Al,O)/$Al_2O_3$ 플라즈마 코팅한 SS41의 고온산화 거동)

  • Choi, G.S.;Woo, K.D.;Lee, H.B.;Jeon, J.Y.
    • Journal of the Korean Society for Heat Treatment
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    • v.20 no.5
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    • pp.231-236
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    • 2007
  • High velocity oxy-fuel (HVOF) spraying was used to coat Ti(Al,O)/$Al_2O_3$ powder onto the SS41 steel plate. Macrostructure of the coated specimen has been investigated by scanning electron micrograph (SEM). High temperature oxidation behavior of the coated specimen and SS41 steel have been studied. From the results of SEM observation, Ti(Al,O)/$Al_2O_3$ powder was coated well onto the substrate SS41 steel. Porosity onto the coated layer was only 0.38%. The oxidation results showed that Ti(Al,O)/$Al_2O_3$ powder coated SS41 steel have improved little oxidation resistance at $900^{\circ}C$ in air, but improved remarkably oxidation resistance at $800^{\circ}C $ in air compare to the substrate SS41 steel.

Study on High-Temperature Oxidation Behaviors of Plasma-Sprayed TiB2-Co Composite Coatings

  • Fadavi, Milad;Baboukani, Amin Rabiei;Edris, Hossein;Salehi, Mahdi
    • Journal of the Korean Ceramic Society
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    • v.55 no.2
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    • pp.178-184
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    • 2018
  • In the present study, $TiB_2-Co$ composite coatings were thermally sprayed onto the surface of a 304 stainless steel substrate using an atmospheric plasma spray (APS). The phase analysis of the powders and plasma-sprayed coatings was performed using X-ray diffractometry analysis. The microstructures of the coatings were studied by a scanning electron microscope (SEM). The average particle size and flowability of the feedstocks were also measured. Both $TiB_2-32Co$ and $TiB_2-45Co$ (wt.%) coatings possessed typical dense lamellar structures and high-quality adhesion to the substrate. The oxidation behaviors of the coatings were studied at $900^{\circ}C$ in an atmospheric environment. In addition, the cross-sectional images of the oxidized coatings were analyzed by SEM. A thin and well-adhered layer was formed on the surface of both $TiB_2-Co$ coatings, confirming satisfactory high-temperature oxidation resistance. The kinetic curves corresponding to the isothermal oxidation of the coatings illustrated a short transient stage from rapid to slow oxidation during the early portion of the oxidation experiment.

Electrical Properties of DC Sputtered Titanium Nitride Films with Different Processing Conditions and Substrates

  • Jin, Yen;Kim, Young-Gu;Kim, Jong-Ho;Kim, Do-Kyung
    • Journal of the Korean Ceramic Society
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    • v.42 no.7 s.278
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    • pp.455-460
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    • 2005
  • Deposition of TiN$_{x}$ film was conducted with a DC sputtering technique. The effect of the processing parameters such as substrate temperature, deposition time, working pressure, bias power, and volumetric flowing rate ratio of Ar to N$_{2}$ gas on the resistivity of TiN$_{x}$ film was systematically investigated. Three kinds of substrates, soda-lime glass, (100) Si wafer, and 111m thermally grown (111) SiO$_{2}$ wafer were used to explore the effect of substrate. The phase of TiN$_{x}$ film was analyzed by XRD peak pattern and deposition rate was determined by measuring the thickness of TiNx film through SEM cross-sectional view. Resistance was obtained by 4 point probe method as a function of processing parameters and types of substrates. Finally, optimum condition for synthesizing TiN$_{x}$ film having lowest resistivity was discussed.

Photocatalytic Degradation of Gaseous Formaldehyde and Benzene using TiO2 Particulate Films Prepared by the Flame Aerosol Reactor

  • Chang, Hyuksang;Seo, Moonhyeok
    • Environmental Engineering Research
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    • v.19 no.3
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    • pp.215-221
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    • 2014
  • Nano-sized $TiO_2$ particles were produced by a premixed flame aerosol reactor, and they were immobilized on a mesh-type substrate in form of particulate film. The reactor made it possible maintaining the original particulate characteristics determined in the flame synthetic process. The particulate morphology and crystalline phase were not changed until the particulate were finally coated on the substrate, which resulted in the better performance of the photocatalytic conversion of the volatile organic compounds (VOCs) in the ultraviolet $(UV)-TiO_2$ system. In the flame aerosol reactor, the various specific surface areas and the anatase weight fractions of the synthesized particles were obtained by manipulating the parameters in the combustion process. The performance of the $TiO_2$ particulate films was evaluated for the destruction of the VOCs under the various UV irradiation conditions. The decomposition rates of benzene and formaldehyde under the irradiation of UV-C of 254 nm in wavelength were evaluated to check the performance of $TiO_2$ film layer to be applied in air quality control system.

Dependence of RF power of ($Ba_{0.5}Sr_{0.5})TiO_3$ thin film using RF magnetron sputtering (RF magnetron sputtering을 이용한 ($Ba_{0.5}Sr_{0.5})TiO_3$ 박막의 RF power 의 존성)

  • 최형윤;이태일;정순원;박인철;최동한;김흥배
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.51-54
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    • 2000
  • In this paper, $Ba_{0.5}$Sr$_{0.5}$TiO$_3$ thin films were prepared on Pt/Ti/SiO$_2$/Si substrate by RF magnetron sputtering method. We investigated effect of deposition conditions (especially RF input power) on structural properties of BST thin films. Deposit conditions of BST films were set working gas ratio, Ar:O$_2$= 70 : 30, working pressure 10mTorr, and RF input power 25W, 50W, 75W and 100W. Post-annealing using rapid thermal annealing(RTA) performed at 45$0^{\circ}C$, 55$0^{\circ}C$, $650^{\circ}C$, and 75$0^{\circ}C$ in oxigen ambient for 60 sec, respectively. The structural properties of BST films on Pt/Ti/SiO$_2$/Si substrate analysed by X-ray diffraction(XRD).).).

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Effects of Wollastonite Coating on Surface Characteristics of Plasma Electrolytic Oxidized Ti-6Al-4V Alloy (플라즈마 전해 산화처리된 Ti-6Al-4V합금의 표면특성에 미치는 울라스토나이트 코팅효과)

  • Jaeeun Go;Jong Kook Lee;Han Cheol Choe
    • Corrosion Science and Technology
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    • v.22 no.4
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    • pp.257-264
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    • 2023
  • Ti-6Al-4V alloys are mainly used as dental materials due to their excellent biocompatibility, corrosion resistance, and chemical stability. However, they have a low bioactivity with bioinertness in the body. Therefore, they could not directly bond with human bone. To improve their applications, their bone bonding ability and bone formation capacity should be improved. Thus, the objective of this study was to improve the bioinert surface of titanium alloy substrate to show bioactive characteristics by performing surface modification using wollastonite powder. Commercial bioactive wollastonite powder was successfully deposited onto Ti-6Al-4V alloy using a room temperature spray process. It was found that wollastonite-coated layer showed homogeneous microstructure and uniform thickness. Corrosion resistance of Ti-6Al-4V alloy was also improved by plasma electrolytic oxidation treatment. Its wettability and bioactivity were also greatly increased by wollastonite coating. Results of this study indicate that both plasma electrolytic oxidation treatment and wollastonite coating by room temperature spray process could be used to improve surface bioactivity of Ti-6Al-4V alloy substrate.

Research on Microstructure and Properties of TiN, (Ti, Al)N and TiN/(Ti, Al)N Multilayer Coatings

  • Wang, She Quan;Chen, Li;Yin, Fei;Jia, Li
    • Proceedings of the Korean Powder Metallurgy Institute Conference
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    • 2006.09a
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    • pp.658-659
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    • 2006
  • Magnetron sputtered TiN, (Ti, Al)N and TiN/(Ti, Al)N multilayer coatings grown on cemented carbide substrates have been characterized by using electron probe microanalysis (EPMA), X-ray diffraction (XRD), scanning electron spectroscopy (SEM), nanoindentation, scratcher and cutting tests. Results show that TiN coating is bell mouth columnar structures, (Ti, Al)N coating is straight columnar structures and the modulation structure has been formed in the TiN/(Ti, Al)N multilayer coating. TiN/(Ti, Al)N multilayer coating exhibited higher hardness, better adhesion with substrate and excellent cutting performance compared with TiN and (Ti, Al)N coating.

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The Study of Formation of Ti-silicide deposited with Composite Target [II] (Composite Target으로 증착된 Ti-silicide의 현성에 관한 연구[II])

  • Choi, Jin-Seog;Paek, Su-Hyon;Song, Young-Sik;Sim, Tae-Un;Lee, Jong-Gil
    • Korean Journal of Materials Research
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    • v.1 no.4
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    • pp.191-197
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    • 1991
  • The surface roughnesses of titanium silicide films and the diffusion behaviours of dopants in single crystal and polycrystalline silicon substrates durng titanium silicide formation by rapid thermal annealing(RTA) of sputter deposited Ti-filicide film from the composite $TiSi_{2.6}$ target were investigated by the secondary ion mass spectrometry(SIMS), a four-point probe, X-ray diffraction, and surface roughness measurements. The as-deposited films were amorphous but film prepared on single silicon substrate crystallized to the orthorhombic $TiSi_2$(C54 structure) upon rapid thermal annealing(RTA) at $800^{\circ}C$ for 20sec. There was no significant out-diffusion of dopants from both single crystal and polycrystalline silicon substrate into titanum silicide layers during annealing. Most of the implanted dopants piled up near the titanium silicide/silicon interface. The surface roughnesses of titanium silicide films were in the range between 16 and 22nm.

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