• Title/Summary/Keyword: Ti 전극

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Photoelectrochemical Characteristics for Cathodic Electrodeposited Cu2O Film on Indium Tin Oxide (음극전착법을 이용한 Cu2O 막의 광전기 화학적 특성)

  • 이은호;정광덕;주오심;최승철
    • Journal of the Korean Ceramic Society
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    • v.41 no.3
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    • pp.183-189
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    • 2004

  • Cuprous oxide (Cu$_2$O) thin films are cathodically deposited on Indium Tin Oxide (ITO) substrate. The as-deposited films were heat-treated at 30$0^{\circ}C$ to obtain Cu$_2$O. After the heat treatment, the film was changed from Cu metal into Cu$_2$O phase. The phase, morphology and photocurrent density of the films were dependent on the preparation conditions of deposition time, applied voltage, and the duration of heat treatment. The Cu$_2$O films were characterized by X-Ray Diffractometer (XRD) and Scanning Electron Microscope (SEM). The apparent grain size of the films formed by the normal method was larger than those grown by the pulse method. The CU$_2$O film what was deposited at -0.7 V for 300 sec and then, calcined at 30$0^{\circ}C$ for 1 h showed the predominant photocurrent density of 1048 $\mu$A/$\textrm{cm}^2$. And the stability of Cu$_2$O electrodes were improved with chemically deposited TiO$_2$ thin films on Cu$_2$O.

  • https://doi.org/10.4191/KCERS.2004.41.3.183 인용 PDF KSCI

Effect of Deposition Parameters on TiN by Plasma Assisted Chemical Vapor Deposition(III) -Influence of r.f. power and electrode distance on the Tin deposition- (플라즈마 화학증착법에서 증착변수가 TiN 증착에 미치는 영향(III) -r.f. power 및 전극간 거리를 중심으로-)

  • Kim, C.H.;Shin, Y.S.;Kim, M.I.
    • Journal of the Korean Society for Heat Treatment
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    • v.3 no.1
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    • pp.1-7
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    • 1990

  • To investigate the influence of r.f. power and electrode distance on the TiN deposition, TiN films were deposited onto STC3, STD11 steel and Si-wafer from gas mixtures of $TiC_4/N_2/H_2$ using the radio frequency plasma assisted chemical vapor deposition. The crystallinity of TiN film could be improved by the increase of r.f. power and the decrease of electrode distance. The TiN coated layer contains chlorine, its content were decreased with increasing r.f. power as well as decreasing electrode distance. And the thickness of deposited TiN was largely affected by r.f. power and electrode distance. The hardness of deposited TiN reached a maximum value of about Hv 2,000.

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Comparison of Efficiency between Dye-Sensitized Solar Cells with $TiO_2$ Electrode Manufactured by different Method ($TiO_2$전극의 제조법에 따른 염료감응형 태양전지의 효율비교)

  • Han, Zhen-Ji;Baek, Hyung-Ryul;Park, Kyung-Hee;Gu, Hal-Bon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.05a
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    • pp.109-110
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    • 2006

  • Nanocrystalline $TiO_2$ electrode were prepared by spray-printing in order to efficiency and improved fill factor. Different compositions of nanocrystalline $TiO_2$ pastes are described, based on $TiO_2$ powder made by ourselves. The produced by spray printing $TiO_2$ films were compare with the produced by squeeze printing $TiO_2$ films and was studied in the light of static I-V characteristics. The produced $TiO_2$ films are extensively characterized by means of spectroscopy(Ramon, XRD) and microscopy(FE-SEM).

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