• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2014년도 추계학술대회 논문집
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• pp.192-192
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• 2014

TiN, Ti(C,N), TiAlSiN, TiZrAlN, TiAlCrSiN 박막을 제조한 후, 이 들의 고온산화 특성을 SEM, EPMA, TGA, TEM, AES 등을 이용하여 조사하고, 산화기구를 제안하였다. 산화속도, 생성되는 산화물의 종류와 분포는 박막의 조성, 산화온도, 산화시간에 따라 변하였다.

• Tribology and Lubricants
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• 제4권2호
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• pp.36-43
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• 1988

Titanium carbide(TiC) and titanium nitride(TiN) flims were deposited on $Si_3N_4$-TiC composite cutting tools by chemical vapor deposition(CVD) using $TiCl_4-CH_4-H_2$ and $TiCl_4-H_2-N_2$ gas mixtures, respectively. The nonmetal to metal ratio of deposit increases with increasing $m_{C/Ti}$(mole ratio of CH$_4$ to TiCl$_4$ in the input) for TiC coatings and $m_{N/Ti}$(mole ratio of N$_2$ to TiCl$_4$ in the input) for TiN coatings. The nearly stoiahiometric films could be obtained under the deposition condition of $m_{C/Ti}$ between 1.15 and 1.61 for TiC, and that of $m_{N/Ti}$ between 25 and 28 for TiN. Also maximum microhardness of the coatings can be obtained in these ranges. The interfacial region of TiC coatings on $Si_3N_4$-TiC ceramics is wider than that of TiN coatings according to Auger depth profile analysis, which indicates good interfacial bonding for TiC. Experimental results show that TiC coatings have an randomly equiaxed structure and Columnar structure with(220) preferred orientation can be obtained for TiN coatings. And, multilayer coatings have a dense and equiaxed structure.

• 한국재료학회지
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• 제18권10호
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• pp.558-563
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• 2008

TiAlN films were deposited on WC-5Co substrates with different buffer layers by D.C. magnetron sputtering. The films were evaluated by microstructural observations and measuring of preferred orientation, hardness value, and adhesion force. As a process variable, various buffer layers were used such as TiAlN single layer, TiAlN/TiAl, TiAlN/TiN and TiAlN/CrN. TiAlN coating layer showed columnar structures which grew up at a right angle to the substrates. The thickness of the TiAlN coating layer was about $1.8{\mu}m$, which was formed for 200 minutes at $300^{\circ}$. XRD analysis showed that the preferred orientation of TiAlN layer with TiN buffer layer was (111) and (200), and the specimens of TiAlN/TiAl, TiAlN/CrN, TiAlN single layer have preferred orientation of (111), respectively. TiAlN single layer and TiAlN/TiAl showed good adhesion properties, showing an over 80N adhesion force, while TiAlN/TiN film showed approximately 13N and the TiAlN/CrN was the worst case, in which the layer was destroyed because of high internal residual stress. The value of micro vickers hardness of the TiAlN single layer, TiAlN/TiAl and TiAlN/TiN layers were 2711, 2548 and 2461 Hv, respectively.

• 한국산학기술학회논문지
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• 제15권3호
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• pp.1253-1258
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• 2014

CA 이온도금기술에 의한 TiC와 TiN 그리고 TiC/TiN 코팅재를 비교하기 위하여 트라이볼로지 물성을 연구하였다. 실험은 Falex journal V block 시스템을 이용한 터보시험기에서 수행하였다. 코팅재의 마찰과 마모특성은 작용된 하중과 미끄럼 속도에 의하여 다양하게 결정되었다. TiC와 TiN 그리고 TiC/TiN 코팅재는 표면에서 트라이볼로지 특성이 현저하게 증가하였다. 단층코팅에서는 TiC보다 TiN이 좋은 결과를 얻었다. 그러나, TiC/TiN의 다층코팅은 다른 어떤 단층코팅보다 좋은 성능을 보였다. 다층코팅의 성능이 향상된 핵심요소는 TiN층 외부와 강 사이에서 부착이 증가하게된 TiC의 역할 때문이다.

• 한국재료학회지
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• 제27권11호
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• pp.603-608
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• 2017

$Si_3N_4$와 Ti 또는 TiAl 합금을 $900^{\circ}C$에서 확산쌍을 제조하여 분석하고, 확산층의 분석을 통하여 생성된 층마다의 조성을 분석하여 각 원소들의 확산 경로 및 속도를 비교 하였다. $Si_3N_4/Ti$의 확산 쌍의 확산 경로는 $Si_3N_4/Ti_5Si_3+TiN/TiN/Ti$로 나타났고, Ti 측면에서 TiN층이 생성 되었음으로 N의 확산 속도가 Si 보다 빠름을 알 수 있었다. $Si_3N_4/TiAl$ 합금의 확산쌍은 $Si_3N_4/Ti$ 사이의 확산쌍과는 다르게 Si, N, Ti, Al 의 각 원소 마다의 확산 속도 차이로 인하여 확산 경로는 $Si_3N_4/TiN(Al)/Ti_3Al/TiAl$ 상으로 나타났다. 상태도를 통하여 생성된 확산쌍의 확산경로를 파악한 결과, 확산경로의 요구사항을 모두 만족하였다. $Si_3N_4/Ti$ 확산에서 Ti를 이용한 적분확산 계수는 $Ti_5Si_3$, TiN에서 $2.18{\times}10^{-16}m^2/sec$, $2.19{\times}10^{-16}m^2/sec$, $Si_3N_4/TiAl$ 확산 쌍에서 Ti를 이용한 적분확산 계수는 각각 TiN(Al) 상에서 $2.88{\times}10^{-16}m^2/sec$, $Ti_3Al$ 상에서 $1.48{\times}10^{-15}m^2/sec$으로 나타났다. 본 연구는 $Si_3N_4$와 Ti 및 TiAl의 계면 반응을 분석한 결과로서 $Si_3N_4$ 상을 이용한 확산반응의 기초자료로 사용될 수 있을 것으로 사료된다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2013년도 춘계학술대회 논문집
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• pp.119-120
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• 2013

공구, 다이몰드 등에 널리 쓰이는 TiC, TiN, CrN, TiCrN, TiAlN 코팅의 산화특성을 비교하기 위하여 $600^{\circ}C-900^{\circ}C$에서 대기중 산화시험을 실시하였다. 내산화성은 (TiC, TiN), TiAlN, TiCrN, CrN 코팅의 순서로 증가하였다. 코팅원소중 Ti는 $TiO_2$로, Cr은 $Cr_2O_3$로, Al은 $Al_2O_3$로 산화되었다.

• 열처리공학회지
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• 제18권5호
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• pp.281-287
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• 2005

Titanium aluminium nitride((TiAl)N) film is anticipated as an advanced coating film with wear resistance used for drills, bites etc. and with corrosion resistance at a high temperature. In this study, (TiAl)N thin films were deposited both at room temperature and at elevated substrate temperatures of 573 to 773 K by using a two-facing-targets type DC sputtering system in a mixture Ar and $N_2$ gases. Atomic compositions of the binary Ti-Al alloy target is Al-rich (25Ti-75Al (atm%)). Process parameters such as precursor volume %, substrate temperature and Ar/$N_2$ gas ratio were optimized. The crystallization processes and phase transformations of (TiAl)N thin films were investigated by X-ray diffraction, field-emission scanning electron microscopy. The microhardness of (TiAl)N thin films were measured by a dynamic hardness tester. The films obtained with Ar/$N_2$ gas ratio of 1:3 and at 673 K substrate temperature showed the highest microhardness of $H_v$ 810. The crystallized and phase transformations of (TiAl)N thin films were $Ti_2AlN+AlN{\rightarrow}TiN+AlN$ for Ar/$N_2$ gas ratio of 1:3, $Ti_2AlN+AlN{\rightarrow}TiN+AlN{\rightarrow}Ti_2AlN+TiN+AlN$ for Ar/$N_2$ gas ratio of 1:1 and $TiN+AlN{\rightarrow}Ti_2AlN+TiN+AlN{\rightarrow}Ti_2AlN+AlN{\rightarrow}Ti_2AlN+TiN+AlN$ for Ar/$N_2$ gas ratio of 3:1. The above results are discussed in terms of crystallized phases and microhardness.

• 한국표면공학회지
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• 제35권6호
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• pp.408-414
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• 2002

TiN and TiAlN coating layer were deposited on WC-Co steel substrates by an arc ion plating(AIP) technique. The crystallinity and morphology for the deposited coating layers were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The impact behaviors of the deposited TiN and TiAlN coating layer were investigated with a ball-on-plate impact tester. Beyond $10^2$ impact cycle, TiAlN coating layer showed superior impact wear resistance compared to TiN coating layer. On the other hand, both TiN and TiAlN coating layers started to be partially failed between $10^2$ and $10^3$ impact cycle. Above $10^3$ impact cycle, TiN and TiAlN coating layers showed similar impact behavior because of the substrate effect.

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part 1
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• pp.658-659
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• 2006

Magnetron sputtered TiN, (Ti, Al)N and TiN/(Ti, Al)N multilayer coatings grown on cemented carbide substrates have been characterized by using electron probe microanalysis (EPMA), X-ray diffraction (XRD), scanning electron spectroscopy (SEM), nanoindentation, scratcher and cutting tests. Results show that TiN coating is bell mouth columnar structures, (Ti, Al)N coating is straight columnar structures and the modulation structure has been formed in the TiN/(Ti, Al)N multilayer coating. TiN/(Ti, Al)N multilayer coating exhibited higher hardness, better adhesion with substrate and excellent cutting performance compared with TiN and (Ti, Al)N coating.

• 대한전기학회논문지
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• 제41권8호
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• pp.869-874
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• 1992

The physical and electrical properties of TiN/TiSiS12T bilayer were studied. The TiN/TiSiS12T bilayer was formed by rapid thermal anneal in NHS13T ambient after the Ti film was deposited on silicon substrate. The Ti film reacts with NHS13T gas to make a TiN layer at the surface and reacts with silicon to make a TiSiS12T layer at the interface respectively. It was found that the formation of TiN/TiSiS12T bilayer depends on RTA temperature. In this experiment, competitive reaction for TiN/TiSiS12T bilayer occured above $600^{\circ}C$. Ti-rich TiNS1xT layer and Ti-rich TiSiS1xT layer and Ti-rich TiSiS1xT layer were formed at $600^{\circ}C$. stable structure TiN layer TiSiS12T layer which has CS149T phase and CS154T phase were formed at $700^{\circ}C$. Both stable TiN layer and CS154T phase TiSiS12T layer were formed at 80$0^{\circ}C$. The thickness of TiN/TiSiS12T bilayer was increased as the thickness of deposited Ti film increased.