• 한국표면공학회:학술대회논문집
• /
• 한국표면공학회 2009년도 추계학술대회 초록집
• /
• pp.163-164
• /
• 2009

dc unbalanced magnetron sputtering 방법으로 superhard quarternary Ti-B-C-N films을 합성하였다. XPS, XRD 분석 결과 Ti-B-C-N films은 solid-solution (Ti,C,N)$B_2$와 Ti(C,N) 결정이 amorphous BN에 분포된 나노 복합체를 형성하였다. 여기에서는 film내 N의 양에 따라 강도가 증가하다가 그 후 감소하는 경향을 보였다.

• 한국세라믹학회지
• /
• 제31권1호
• /
• pp.25-30
• /
• 1994

W-Ti-C-N based multiphase hard materials have been prepared from WC/TiN powder mixture. By sintering at and above 190$0^{\circ}C$, the two phases of powder mixture has transformed into intermixed W, W2C and Ti(C, N) phases. For the temperature range between 180$0^{\circ}C$ and 210$0^{\circ}C$, the sintered or hot pressed samples show maximum density and hardness. The seems that metallic W grains enhance the fracture toughness of materials. The wear resistance of the material is found to increase with increasing hardness.

• 한국세라믹학회지
• /
• 제34권5호
• /
• pp.512-518
• /
• 1997

The high temperature oxidation behaviors of titanium nitride films prepared by PACVD technique were studied in the temperature range of from 50$0^{\circ}C$ to 80$0^{\circ}C$ under air atmosphere. Ti0.88Al0.12N film, which showed the excellent microhardness from the previous work, was investigated on its oxidation resistance compared with pure TiN film. Ti-Al-N film showed superior oxidation resistance up to $700^{\circ}C$, whereas TiN film was fast oxidized into rutile TiO2 crystallites from at 50$0^{\circ}C$. It was found that an amorphous layer having AlxTiyOz formula was formed on the surface region due to outward diffusion of Al ions at the initial stage of oxidation. The amorphous oxide layer played a role as a barrier against oxygen diffusion, protected the remained nitride layer from further oxidation, and thus, resulted in the high oxidation resistive characteristics of Ti-Al-N film.

• 열처리공학회지
• /
• 제9권3호
• /
• pp.177-186
• /
• 1996

Surface alloying of Ti alloy by $CO_2$ laser is able to produce few hundred micrometers thick TiN or TiC surface-alloyed layer with high hardness on the substrate by injecting reaction gas($N_2$ or $CH_4$). Laser surface alloying by means of process control is in many applications essential in order to obtain predictable hardening layer. This research has been investigated the effect of such parameters on TiN and TiC gas alloying of Ti-6Al-4V alloy by $CO_2$ laser. The maximum surface hardness of TiN layer was obtained 1750Hv on the conditions of 0.8kW laser power, 0.8m/min scanning speed and 100% $N_2$ atmosphere. However, the maximum hardness of TiC formation layer after laser treatment was about 630Hv. As scanning speed was increased, the hardness and depth of these layers were decreased at constant laser power.

• Tribology and Lubricants
• /
• 제20권5호
• /
• pp.272-277
• /
• 2004

This study deals with the friction and wear characteristics of C-N coated spur gear. The PSII apparatus was built and a SCM415 test piece and test gear with steel substrate was treated with carbon nitrogen by this apparatus. The composition and structure of the surface layer were analyzed and compared with that of PVD coated TiN layer. It was found that both of friction coefficient of C-N coating and TiN coating decreased with increasing load, however, C-N coating showed relatively lower friction coefficient than that of TiN coating. We was investigated the effect of C-N coating on hardness, friction and wear. The TiN coated gear showed a more serious friction phenomena than that of C-N coated gear. It was considered that coating of TiN, which was conducted at a vacuum chamber at about 500$^{\circ}C$, results in a tempering of base material that causes microstructural change, which in turn resulted in decreasing of hardness. The C-N coated gear and pinion had higher wear resistance that of TiN coated gear and pinion. C-N coating significantly improved the friction and wear resistance of the gear.

• 한국윤활학회:학술대회논문집
• /
• 한국윤활학회 2004년도 학술대회지
• /
• pp.41-46
• /
• 2004

This study deals with the friction and wear characteristics of C-N coated spur gear. The PSII apparatus was built and a SCM415 test piece and test gear with steel substrate was treated with carbon nitrogen by this apparatus. The composition and structure of the surface layer were analyzed and compared with that of PVD coated TiN layer. It was found that both of friction coefficients of C-N coating and TiN coaling decreased with increasing load, however, C-N coating showed relatively lower friction coefficient than that of TiN coating. We was investigated the effect of C-N coating on hardness, friction and wear. The TiN coated gear showed more serious friction phenomena than that of C-N coated gear. It was considered that coating of TiN, which was conducted at a vacuum chamber at about $500^{\circ}C$ results in a tempering of base material that causes microstructure change, which in turn resulted in decreasing of hardness. The C-N coated gear and pinion had higher wear resistance that of TiN coated gear and pinion. C-N coating significantly improved the friction and wear resistance of the gear.

• 한국표면공학회지
• /
• 제24권1호
• /
• pp.16-16
• /
• 1991

Generally brittle eta phase produced during TiC deposition has a effect on the TRS (transverse rupture strength ; thoughness). Therefore it is necessary to reduce eta(η), phase for the improvement of tool life. At this experiment some properties (TRS, bonding strength, tool life, eta phase)have been investigated by inserting TiN or TiCN underlayer between TiC layer and substrate. The results obtained were as follows; 1. by inserting underlayer eta phase were decreased and TRS was increased, but the bonding strength was decreased. 2. the diffusion of W, Co from the substrate was hindered by the underlayer. 3. TiC layer with TiCN underlayer had the finsest grain size. 4. by inserting underlayer (TiCN or TiN) the tool life was improved and especially notch and crater wear resistance was greatly improved.

• 전자공학회논문지A
• /
• 제29A권7호
• /
• pp.73-81
• /
• 1992

We have investigated the thermal reaction property and the oxygen behavior of TiN/Ti/Si structure after different hear treatments using x-ray photoelectron spectroscopy and cross-sectional transmission electron microscopy measurements. During the heat treatment in N$_2$ amibient, the considerable amount of oxygen atoms incorporates into TiN/Ti/Si Structures. It is found that oxygen atoms pile up at the top surface of TiN and TiN/Ti interface, forming a compound of TiO$_2$ above $600^{\circ}C$. Inside the TiN film, the oxygen content increases as the annealing temperature increases, mostly TiO and Ti$_2$O$_3$ rather than thermodynamically stable TiO$_2$. Above the annealing temperature of 55$0^{\circ}C$, the TiSi$_2$ formation has initiated. One thing to note is that a severe blistering is observed in the sample annealed at $600^{\circ}C$, due to (1) the difference of thermal expansion coefficient between TiN and Si` (2) the compressive stress induced by the volume reduction caused by the Ti-Silicide grain while elevating temperatures.

• 한국세라믹학회지
• /
• 제27권7호
• /
• pp.916-924
• /
• 1990

The preparatin of the fine TiN powders by reduction-nitridation of TiCl3-Al-N2 system was attempted in the temperature range from 350$^{\circ}$to 100$0^{\circ}C$. The formation mechanism and kinetics of TiN were examined, and the resultant TiN powder was characterized by means of XRD, PSA and SEM-EPMA methods. TiN was formed at temperatrue higher than $600^{\circ}C$. As an intermediate phase, AlTi was obtained. The apparent activation energy for the formation of TiN was approximately 4.2kcal/mole(600$^{\circ}$~90$0^{\circ}C$). The crystallite size and lattice constnat of TiN powder obtained in the temperature range from 600$^{\circ}$to 100$0^{\circ}C$ for 2h at the Al/TiCl3 molar ratio of 1.0 were 160~255A and 4.231~4.239A, respectively. According to PSA measurement, the mean particle size ranged from 14.0 to 14.8${\mu}{\textrm}{m}$.

• 열처리공학회지
• /
• 제2권4호
• /
• pp.1-10
• /
• 1989

To investigate the influence of temperature on the TiN film, it was deposited on the STC-3 steel and Si-wafer from $TiCl_4/N_2/H_2$ gas mixture by using the radio frequency plasma assisted chemical vapor deposition. The deposition was performed at temperature of $400^{\circ}C-500^{\circ}C$. The results showed that crystalline TiN film was deposited over $480^{\circ}C$, and all specimens showed the crystalline TiN X-ray diffraction peaks after vacuum heat treatment for 3 hrs, at $1000^{\circ}C$, $10^{-5}torr$. While the film thickness was increased above $480^{\circ}C$, it was decreased under $480^{\circ}C$ as temperature increased. And the contents of titanium were increased and it of chlorine were decreased as temperature increased. Because temperature increase was attributed to the increase in the density of TiN film, surface hardness of TiN film was increased with temperature.