• Title/Summary/Keyword: Thin-wall

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The Effect of Thermal Annealing and Growth of CuAlSe2 Single Crystal Thin Film by Hot Wall Epitaxy (Hot Wall Epitaxy(HWE)법에 의한 CuAlSe2 단결정 박막 성장과 열처리 효과)

  • 윤석진;정태수;이우선;박진성;신동찬;홍광준;이봉주
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.10
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    • pp.871-880
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    • 2003
  • Single crystal CuAlSe$_2$ layers were grown on thoroughly etched semi-insulating GaAs(100) substrate at 410 C with hot wall epitaxy (HWE) system by evaporating CuAlSe$_2$ source at 680 C. The crystalline structure of the single crystal thin films was investigated by the photoluminescence(PL) and double crystal X -ray diffraction (DCXD). The carrier density and mobility of single crystal CuAlSe$_2$ thin films measured with Hall effect by van der Pauw method are 9.24${\times}$10$\^$16/ cm$\^$-3/ and 295 cm$^2$/V $.$ s at 293 K, respectively. The temperature dependence of the energy band gap of the CuAlSe$_2$ obtained from the absorption spectra was well described by the Varshni's relation, Eg(T) = 2.8382 eV - (8.86 ${\times}$ 10$\^$-4/ eV/K)T$^2$/(T + 155K). After the as-grown single crystal CuAlSe$_2$ thin films were annealed in Cu-, Se-, and Al-atmospheres, the origin of point defects of single crystal CuAlSe$_2$ thin films has been investigated by PL at 10 K. The native defects of V$\_$cd/, V$\_$se/, Cd$\_$int/, and Se$\_$int/ obtained by PL measurements were classified as donors or acceptors. And we concluded that the heat-treatment in the Cu-atmosphere converted single crystal CuAlSe$_2$ thin films to an optical n-type. Also, we confirmed that Al in CuAlSe$_2$/GaAs did not form the native defects because Al in single crystal CuAlSe$_2$ thin films existed in the form of stable bonds.

Effect of Thin Wall Tube on Clay Soil Disturbance during Sampling (점성토 시료추출관이 시료교란에 미치는 영향)

  • Eam, Sung-Hoon
    • Journal of The Korean Society of Agricultural Engineers
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    • v.51 no.5
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    • pp.51-58
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    • 2009
  • The total recovery ratio test on undisturbed clay soil sampling in the field and the finite element method analysis on modified static state of penetration process were conducted for the purpose of deciding the most important factor among the shape factors of thin wall tube. The adhesion between tube wall and soil did not decrease although internal clearance ratio of tube increased within the little change of tube area ratio. The most part of disturbance occurred in the tip of sampling tube during the penetration. The longitudinal displacement was larger than the lateral displacement because soil was confined laterally after being entered into tube, and also the longitudinal displacement was larger in the upper part of the sample tube than in the lower part.

Growth and Study on Photo current of Valence Band Splitting for $AgGaSe_2$ single crystal thin film by hot wall epitaxy (Hot Wall Epitaxy(HWE)법에 의한 $AgGaSe_2$ 단결정 박막 성장과 특성)

  • Park, Chang-Sun;Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.85-86
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    • 2006
  • Single crystal $AgGaSe_2$ layers were grown on thoroughly etched semi-insulating GaAs(100) substrate at $420^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating $AgGaSe_2$ source at $630^{\circ}C$. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The temperature dependence of the energy band gap of the $AgGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=19501 eV-(879{\times}10^{-4} eV/K)T^2/(T+250 K)$.

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Growth and electrical properties for $AgGaSe_2$ epilayers by hot wall epitaxy (Hot Wall Epitaxy(HWE)법에 의한 $AgGaSe_2$ 단결정 박막 성장과 전기적 특성)

  • Park, Chang-Sun;Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.96-97
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    • 2008
  • Single crystal $AgGaSe_2$ layers were grown on thoroughly etched semi-insulating GaAs(100) substrate at 420 $^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating $AgGaSe_2$ source at 630 $^{\circ}C$. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of single crystal $AgGaSe_2$ thin films measured with Hall effect by van def Pauw method are $9.24\times10^{16}cm^{-3}$ and 295 $cm^2/V{\cdot}s$ at 293 K, respectively.

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Characterization of SrS:Ag Thin Film Electroluminescence Deposited by Hot Wall Technique (Hot Wall법에 의해 제작한 SrS:Ag 박막EL소자의 특성)

  • Lee, Sang-Tae;Heo, Sung-Gon;Lee, Hong-Chan
    • Proceedings of the Korean Society of Marine Engineers Conference
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    • 2005.11a
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    • pp.242-243
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    • 2005
  • The SrS:Ag, Cl thin films have been grown by the hot wall technique with S furnace placed on the outside of the growth chamber in order to investigate the crystallographic and optical characteristics. The XRD patterns indicate a strongly preferential orientation in the [200] direction. The PL spectrum has an emission peak of about 398nm which is assigned by the transition from $4d^{95}s^1$ to $4d^{10}$ of$Ag^+$ center.

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A Study on the CNC Milling Machining of Thin-wall Part (범용 CNC 밀링에 의한 박막 측벽 파트 가공에 관한 연구)

  • 지성희;이동주;신보성;최두선;제태진;이응숙
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2001.04a
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    • pp.83-88
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    • 2001
  • In order to suggest the proper optimal conditions of the CNC milling machining for the Thin-wall surface, some experiments were carried out. The process was applied in the aerospace industry for the machining of light alloys, notably aluminium. In recent year, however, the mold and die industry has begun to use the technology for the production of components, including those manufactured from hardened tool steels. And the end mill is an important tool in the milling process. A typical example for the end mill is the milling of pocket and slot in which a lot of material is removed from the workpiece. Therefore the proper selection of cutting parameter for end milling is one of the important factors affecting the cutting cost. In this paper, we choose the optimal parameters(cutting forces) to cut thin-walled Al part by experiment.

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Growth and Characterization of $CuInS_2$ Single Crystal Thin Film by Hot Wall Epitaxy (Hot Wall Epitaxy(HWE) 방법에 의해 성장된 $CuInS_2$)

  • 최승평;홍광준
    • Korean Journal of Crystallography
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    • v.11 no.3
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    • pp.137-146
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    • 2000
  • The stoichiometric mix of evaporating materials for he CuInS₂ single crystal thin films was prepared. To obtain the single crystal thin films, CuINS₂ mixed crystal was deposited on etched semi-insulator GaAs(100) substrate by the hot wall epitaxy(HWE) system. The source and substrate temperature were 640℃ and 430℃, respectively and the thickness of the single crystal thin films was 2 ㎛. The crystalline structure of single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction(DCXD). The carrier density and mobility deduced from Hall data are 9.64x10/sup 22//㎥ and 2.95x10/sup -2/ ㎡/V·s, respectively at 293 K. he optical energy gap was found to be 1.53 eV at room temperature. From the photocurrent spectrum obtained by illuminating perpendicular light on the c-axis of the thin film, we have found that the values of spin orbit coupling splitting ΔSo and the crystal field splitting ΔCr were 0.0211 eV and 0.0045 eV at 10K, respectively. From PL peaks measured at 10K, were can assign the 807.7 nm (1.5350 eV) peak to E/sub x/ peak of the free exciton emission, the 810.3 nm(1.5301 eV) peak to I₂ peak of donar-bound exciton emission and the 815.6 nm(1.5201 eV) peak to I₁ peak of acceptor-bound excition emission. In addition, the peak observed at 862.0 nm(1.4383 eV) was analyzed to be PL peak due to donor-acceptor pair(DAP).

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Heat transfer and flow characteristics of sweeping jet issued from rectangular nozzle with thin plate (박판이 부착된 사각노즐에서 분사되는 Sweeping jet의 유동 및 열전달 특성)

  • Kim, Donguk;Jung, Jae Hoon;Seo, Hyunduk;Kim, Hyun Dong;Kim, Kyung Chun
    • Journal of the Korean Society of Visualization
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    • v.17 no.2
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    • pp.58-66
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    • 2019
  • This study investigated heat transfer and flow characteristics of a sweeping jet issued from a rectangular nozzle with a thin plate. A thin vertical aluminum plate was attached on outlet of fluidic oscillator to increase velocity of central area with Coanda effect and enhance heat transfer performance. From visualization and PIV experiments, sweeping jet with a thin plate has larger velocity distribution in center region than that of the normal sweeping jet while oscillating frequency is similar as the normal one. Thermographic phosphor thermometry method was used to visualize the temperature field and Nu distribution of plate with impinging sweeping jet with thin plate. Four Reynolds numbers and three jet-to-wall distances were selected as parameters. It is found that heat transfer performance in the low jet-to-wall spacing was enhanced as the cooled area was expanded. However, when the jet-to-wall spacing became greater than 8dh, heat transfer performance became similar due to reduced impinging velocity.

Growth and Characterization of CuGaTe$_2$ Sing1e Crystal Thin Films by Hot Wall Epitaxy (Hot Wall Epitaxy (HWE) 방법에 의한 CuGaTe$_2$ 단결정 박막 성장과 특성)

  • 유상하;홍광준
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.273-280
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    • 2002
  • The stochiometric mix of evaporating materials for the CuGaTe$_2$ single crystal thin films was prepared from horizontal furnance. For extrapolation method of X-ray diffraction patterns for the CuGaTe$_2$ polycrystal, it was found tetragonal structure whose lattice constant a$\_$0/ and c$\_$0/ were 6.025 ${\AA}$ and 11.931 ${\AA}$, respectively. To obtain the single crystal thin films, CuGaTe$_2$ mixed crystal was deposited on throughly etched semi-insulator GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were 670 $^{\circ}C$ and 410 $^{\circ}C$ respective1y, and the thickness of the single crystal thin films is 2.1 $\mu\textrm{m}$. The crystalline structure of single crystalthin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). Hall effect on this sample was measured by the method of van der Pauw and studied on carrier density and mobility dependence on temperature. The carrier density and mobility of CuGaTe$_2$ single crystal thin films deduced from Hall data are 8.72${\times}$10$\^$23/㎥, 3.42${\times}$10$\^$-2/㎡/V$.$s at 293K, respectively. From the photocurrent spectrum by illumination of perpendicular light on the c - axis of the CuGaTe$_2$ single crystal thin film, we have found that the values of spin orbit coupling Δs.o and the crystal field splitting Δcr were 0.0791 eV and 0/2463eV at 10K, respectively. From the PL spectra at 10K, the peaks corresponding to free bound excitons and D-A pair and a broad emission band due to SA is identified. The binding energy of the free excitons are determined to be 0.0470eV and the dissipation energy of the donor -bound exciton and acceptor-bound exciton to be 0.0490eV, 0.00558eV, respectively.

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Growth and Optoelectric Characterization of $ZnGa_{2}Se_{4}$ Single Crystal Thin Films by Hot Wall Epitaxy (Hot Wall Epitaxy (HWE)에 의한 $ZnGa_{2}Se_{4}$ 단결정 박막 성장과 광전기적 특성)

  • Park, Chang-Sun;Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.163-166
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    • 2001
  • The stochiometric mix of evaporating materials for the $ZnGa_{2}Se_{4}$ single crystal thin films was prepared from horizontal furnace. To obtain the single crystal thin films, $ZnGa_{2}Se_{4}$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were $610^{\circ}C$ and $450^{\circ}C$, respectively. The crystalline structure of single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $ZnGa_{2}Se_{4}$ single crystal trun films measured from Hall effect by van der Pauw method are $9.63{\times}10^{17}cm^{-3}$, $296cm^{2}/V{\cdot}s$ at 293 K, respectively. From the photocurrent spectrum by illumination of perpendicular light on the c axis of the $ZnGa_{2}Se_{4}$ single crystal thin film, we have found that the values of spin orbit splitting $\Delta$ So and the crystal field splitting $\Delta$Cr were 251.9 meV and 183.2 meV at 10 K, respectively. From the photoluminescence measurement on $ZnGa_{2}Se_{4}$ single crystal thin film, we observed free excition (Ex) existing only high quality crystal and neutral bound exiciton $(A^{0},X)$ having very strong peak intensity. Then, the full-width-at -half-maximum(FWHM) and binding energy of neutral acceptor bound excition were 11 meV and 24.4 meV, respectivity. By Haynes rule, an activation energy of impurity was 122 meV.

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