• Journal of Korea Foundry Society
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• v.31 no.5
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• pp.288-292
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• 2011

In order to complement the drawbacks of quartz crucible such as fragile-like break and melt-leakage through open slit nozzle, a new PFC system has been developed using a common graphite crucible and plugging system. The u melt is fed on to the rotating a roll through slit nozzle by self-gravity. The new equipment was designed and manufactured successfully. An effort for optimizing all related parameter has been made. Then using the optimized parameters about 10 meters u foil having very thin thickness, which meets the target thickness of 130 ${\mu}m$ and enough width more than 60 mm could be made. The thickness homogeneity set improved, due to the lower eddy flowing of the melt flow the self-gravity feeding system.

• Proceedings of the Optical Society of Korea Conference
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• 2008.07a
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• pp.243-244
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• 2008

• Journal of the Optical Society of Korea
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• v.13 no.1
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• pp.37-41
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• 2009

We observe the proton signals produced by laser interaction with thin-foil targets of polyimide and of copper. We change the thickness of the polyimide target to $7.5{\mu}m$, $12.5{\mu}m$, and $50{\mu}m$. High-energy protons with the maximum energy of ${\sim}2.3\;MeV$ from $7.5{\mu}m$ thick polyimide are observed. This proton beam with the maximum energy of multi-MeV has various applications such as a proton shadowgraphy.

• Journal of the Optical Society of Korea
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• v.13 no.1
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• pp.48-52
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• 2009

Micro-hole targets are studied to generate energetic protons from laser-thin foil targets by using 2-dimensional particle-in-cell simulations. By using a small hole, the maximum energy of the accelerated proton is increased to 4 times higher than that from a simple planar target. The main proton acceleration mechanism of the hole-targets is the electrostatic field created between the fast electrons accelerated by the laser pulse ponderomotive force combined with the vacuum heating and the target rear surface. But in this case, the proton angular distribution shows double-peak shape, which means poor collimation and low current density. By using a small cone-shaped hole, the maximum proton energy is increased 3 times higher than that from a simple planar target. Furthermore, the angular distribution of the accelerated protons shows good collimation.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.271-272
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• 2012

Bulk Metallic Glasses (BMGs or amorphous alloy) exhibit high strength and good corrosion resistance. Applications of thin films and micro parts of BMGs have been used a lot since its inception in the research of BMGs. However, Application and fabrication of BMGs are limited to make structural materials. Thin films of BMGs which is sputtered on the surface of structural materials by sputtering process is used to improve limits about application of BMGs. In order to investigate the difference of properties between designed alloys and thin films, we identified that thin films deposited on the surface that have the characteristic of the amorphous films and the composition of designed alloys. Zr-Cu (Cu=30, 35, 38, 40, 50 at.%) and Zr-Cu-Al (Al=10 at.% fixed, Cu=26, 30, 34, 38 at.%) alloys were fabricated with Zr (99.7% purity), Cu (99.997% purity), and Al (99.99% purity) as melting 5 times by arc melting method before rods 2mm in diameter was manufactured. In order to analyze GFA (Glass Forming Ability), rods were observed by Optical Microscopy and SEM and $T_g$, $T_x$, ($T_x$ is crystallization temperature and $T_g$ is the glass transition temperature) and Tm were measured by DTA and DSC. Powder was manufactured by Gas Atomizer and target was sintered using powder in large supercooled liquid region ($=T_x-T_g$) by SPS(Spark Plasma Sintering). Amorphous foil was prepared by RSP process with 5 gram alloy button. The composition of the foil and sputtered thin film was analyzed by EDS and EPMA. In the result of DSC curve, binary alloys ($Zr_{62}Cu_{38}$, $Zr_{60}Cu_{40}$, $Zr_{50}Cu_{50}$) and ternary alloys ($Zr_{64}Al_{10}Cu_{26}$, $Zr_{56}Al_{10}Cu_{34}$, $Zr_{52}Al_{10}Cu_{38}$) have $T_g$ except for $Zr_{70}Cu_{30}$ and $Zr_{60}Al_{10}Cu_{30}$. The compositions with $T_g$ made into powders. Figure shows XRD data of thin film showed similar hollow peak.

• Proceedings of the Korean Vacuum Society Conference
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• 1994.06a
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• pp.92-92
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• 1994

Relative intensities of photons emitted from tilted carbon foils have been measured in the wavelength region 300800 nm by 0,6-2,4 MeV $H^{+}\;and\;He^{+}$ ion impacts, Ions were directed onto target surfaces at tilt angles with respect to the sllrface normal, Experimental results support the model that the observed continuum radiation is emitted from the exited carbon foil itself. At each incident projectile energy, the photon intensities of continuum spectra for tilted carbon foi Is were compatred to the stoppi ng powers of carbon for $H^{+}\;and\;He^{+}$ ions, It was found that the photon emission intensity for $H^{+}$ ion is linearly proportional to the stopping power, whereas that for $He^{+}$ ions is proportional to a higher power of the stopping power, and that this tendency increases wi th decreasing velocity of the projectiIes[1, 2].[1, 2].

• Journal of the Korean Vacuum Society
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• v.14 no.1
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• pp.17-23
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• 2005

Glow discharge mass spectrometry(GDMS) was used to determine the impurity concentrations of the deposited Cu films and the 6N Cu target. Cu films were deposited on Si (100) substrates at zero substrate bias voltage and a substrate bias voltage of -50 V using a non-mass separated ion beam deposition method. Since do GDMS has a little difficulty to apply to thin films because of the accompanying non-conducting substrate, we have used an aluminum foil to cover the edge of the Cu film in order to make an electrical contact of the Cu film deposited on the non-conducting substrate. As a result, the Cu film deposited at the substrate bias voltage of -50 V showed lower impurity contents than the Cu film deposited without the substrate bias voltage although both the Cu films were contaminated during the deposition. It was found that the concentration change of each impurity in the Cu films by applying the negative substrate bias voltage is related to the difference in their ionization potentials. The purification effect by applying the negative substrate bias voltage might result from the following reasons: 1) Penning ionization and an ionization mechanism proposed in the present study, 2) difference in the kinetic energy of accelerated Cu+ ions toward the substrate with/without the negative substrate bias voltage.