• Title/Summary/Keyword: Thin mirror

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Physical Characteristics of Polycrystalline 3C-SiC Thin Films Grown by LPCVD (LPCVD로 성장된 다결정 3C-SiC 박막의 물리적 특성)

  • Chung Gwiy-Sang;Kim Kang-San
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.8
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    • pp.732-736
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    • 2006
  • This paper describes the physical characterizations of polycrystalline 3C-SiC thin films heteroepitaxially grown on Si wafers with thermal oxide, In this work, the 3C-SiC film was deposited by LPCVD (low pressure chemical vapor deposition) method using single precursor 1, 3-disilabutane $(DSB:\;H_3Si-CH_2-SiH_2-CH_3)\;at\;850^{\circ}C$. The crystallinity of the 3C-SiC thin film was analyzed by XPS (X-ray photoelectron spectroscopy), XRD (X-ray diffraction) and FT-IR (fourier transform-infrared spectometers), respectively. The surface morphology was also observed by AFM (atomic force microscopy) and voids or dislocations between SiC and $SiO_2$ were measured by SEM (scanning electron microscope). Finally, residual strain was investigated by Raman scattering and a peak of the energy level was less than other type SiC films, From these results, the grown poly 3C-SiC thin film is very good crystalline quality, surface like mirror, and low defect and strain. Therefore, the polycrystalline 3C-SiC is suitable for harsh environment MEMS (Micro-Electro-Mechanical-Systems) applications.

Influence of air pressure, temperature, humidity and CO$_{2}$ concentration on optical phase changes in thin films

  • Kim, Moon-Hwan;Tachikawa, Yoshihiko;Ogita, Eiji;Ueda, Toshitsugu
    • 제어로봇시스템학회:학술대회논문집
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    • 1989.10a
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    • pp.799-804
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    • 1989
  • A new method for measuring optical phase changes of reflection beam from optical mirror is proposed. The optical phase change is liable to change with varying atmosphere conditions. This optical phase changes are measured against air pressure, temperature, humidity and CO$\_$2/ concentration variations. It is clarified that the optical phase changes are most effected by humidity change.

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The study on the preparation methods and industrial applications of aluminum thin films (알루미늄 박막의 제조와 산업적 응용에 대한 고찰)

  • Jeong, Jae-In;Yang, Ji-Hun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2015.05a
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    • pp.111-111
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    • 2015
  • 알루미늄 박막은 광학부품의 코팅과 Mirror 제조는 물론 철강이나 항공기 부품의 내식성 코팅이나 반도체 및 디스플레이 소자의 전극 등에 이용되어 산업적 응용이 가장 넓은 박막의 하나이다. 알루미늄 박막은 주로 진공증착 방법으로 제조하는데 제조 공정에 따라 그 특성이 현저히 달라지는 특성이 있다. 본 논문에서는 알루미늄 박막의 제조 공정에 대해 고찰하고 공정에 따른 특성과 응용분야에 대해 고찰하고자 하였다.

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Investigation of electrochromism thin films deposited by RF magnetron sputtering (RF 마그네트론 스퍼터링법으로 증착한 전기변색 박막의 물성평가)

  • Jo, Sang-Hyeon;Lee, Jae-Geun;Lee, Seong-Ho
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2015.05a
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    • pp.105-105
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    • 2015
  • 전기변색 (electrochromism) 박막은 전기화학적 산화, 환원 과정을 통해 가역적인 광학 특성의 변화를 갖는 현상을 말하며, 이를 이용한 전기변색 소자(electrochromic device)는 전력 소모가 적고 변색 효율이 크다는 장점으로 인해 Smart window, display, mirror 등에 응용 될 수 있다. 본 연구에서는 대표적인 전기 변색 물질인 WxOy, NixOy 전기 변색 재료의 Sputtering법으로 증착한 박막의 특성에 대하여 평가하였다.

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A Study on the Anti-Stiction Coating of Glass Lens Mold for Optical Communication (광통신용 글라스렌즈 성형 금형의 이형성 코팅에 관한 연구)

  • Jeong, Woon-Jo;Cho, Jae-Cheol
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.66 no.6
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    • pp.962-967
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    • 2017
  • The Diamond-Like-Carbon (DLC) coating is a new carbon-based amorphous material. Carbon ions in the plasma are electrically accelerated and collide with the substrate to form a thin film. This film has similar properties to diamonds such as high surface hardness, low coefficient of friction, corrosion resistance and durability that do not react with acids and bases. Also, since there is no thermal deformation, it can be printed at room temperature. and coated on almost all materials such as paper, polymer, ceramics and various metals even aspheric lens it is possible to mirror surface coating with excellent surface roughness. In this paper, we have analyzed the DLC film formed by Filtered Arc Ion Plating (Filtered AIP) process.

Evaluating Interfacial Adhesion Properties of Pt/Ti Thin-Film by Using Acousto-Optic Technique (Acousto-Optic 기법을 이용한 Pt/Ti 박막 계면의 접합특성 평가)

  • Park, Hae-Sung;Didie, David;Yoshida, Sanichiro;Park, Ik-Keun
    • Journal of the Korean Society for Nondestructive Testing
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    • v.36 no.3
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    • pp.188-194
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    • 2016
  • We propose an acousto-optic technique for the nondestructive evaluation of adhesion properties of a Pt/Ti thin-film interface. Since there are some problems encountered when using prevailing techniques to nondestructively evaluate the interfacial properties of micro/nano-scale thin-films, we applied an interferometer that combined the acoustic and optical methods. This technique is based on the Michelson interferometer but the resultant surface of the thin film specimen makes interference instead of the mirror when the interface is excited from the acoustic transducer at the driving frequency. The thin film shows resonance-like behavior at a certain frequency range, resulting in a low-contrast fringe pattern. Therefore, we represented quantitatively the change in fringe pattern as a frequency spectrum and discovered the possibility that the interfacial adhesion properties of a thin film can be evaluated using the newly proposed technique.

Effects of Form Errors of a Micromirror Surface on the Optical System of the TMATM(Thin-film Micromirror ArrayTM) Projector

  • Jo, Yong-Shik;Kim, Byoung-Chang;Kim, Seung-Woo;Hwang, Kyu-Ho
    • International Journal of Precision Engineering and Manufacturing
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    • v.1 no.1
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    • pp.98-105
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    • 2000
  • The projectors using liquid crystal display(LCD) have faults such as low optical efficiency, low brightness and even heat generation. To solve these problems reflective-type spatial light modulators based on MEMS (Microelectromechanical Systems) technology have emerged. Digital Micromirror DeviceTM(DMDTM), which was already developed by Texas Instruments Inc., and Thin-film Micromirror ArrayTM(TMATM), which has been recently developed by Daewoo Electronics Co., are the representative examples. The display using TMATM has particularly much higher optical efficiency than other projectors. But the micromirrors manufactured by semiconductor processes have inevitable distortion because of the limitations of the manufacturing processes, so that the distortions of their surfaces have great influence on the optical efficiency of the projector. This study investigated the effects of mirror flatness on the optical performance, including the optical efficiency, of the TMATM projector. That is to say, as a part of the efforts to enhance the performance of the TMATM projector, how much influence the form errors of a micromirror surface exert on the optical efficiency and the modulation of gray scale of the projector were analyzed through a pertinent modeling and simulations.

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Preparation of $SnO_2$ Thin Film Using Reactive DC Magnetron Sputtering (반응성 DC 마그네트론 스퍼터법에 의한 $SnO_2$ 박막재조 및 특성)

  • Jung, H.W.;Lee, C.;Shin, J.H.;Song, K.H.;Shin, S.H.;Park, J.I.;Park, K.J.
    • Proceedings of the KIEE Conference
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    • 1997.07d
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    • pp.1352-1354
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    • 1997
  • Transparent conductive thin films have found many application in many active and passive electronic and opto-electronic devices as like flat Panel display electrode and window heat mirror, etc. Low resistivity and high transmittance of this films can be obtained by controlling deposition parameters, which are oxygen partial Pressure, substrate temperature and dopant concentration. In this study, We prepared non-stoichiometric and Sb-doped thin films of tin dioxide by reactive DC magnetron sputtering technology. The lowest resistivity of about $3.0{\times}10^{-3}\;{\Omega}cm$ and 80% transmittance in the visible light region have heed obtained at optimal deposition condition.

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Electrical and Optical proper ties of Sno$_2$:sb thin Films Using Reactive DC Suttering (반응성 DC sputtering으로 제작한 Sno$_2$:Sb 박막의 전기적.광학적 특성)

  • Jung H. W.;Lee, C.;Shin, J. H.;Song, K. H.;Sin, Seong-Ho;Park, J. I.;Park, K. J.
    • Journal of the Korean institute of surface engineering
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    • v.30 no.6
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    • pp.406-411
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    • 1997
  • Transparent conductive thin films have found many applications in active and passive electronic and opto-electronic devices such as flat panel display electrode, solar cell electrode and window heat mirror, etc. Low resistivity and high transmittance of these films can beotained by controlling deposition parameters which are oxygen partial pressure, substrate temperature and dopant concentration. In this study, non-stoichiometric and Sb-doped thin electrical properties of undoped films have been degraded with increase of substrate temperature and optical properties have been improved in Sb-doped films. The resistivity of $2.5\times10^{-3}\Omega\textrm{cm}$,/TEX>, average transmittance of 80% and sheet resistance of 130$\Omega$/$\square$ at thickess of 2000 $\AA$ could be obrained at optmal condimal conditions which were at $400^{\circ}C$ of substrate temperature, 58% of oxygen partial pressure and 5% of Sb doping concentration.

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A Study of cut off effect of ultraviolet in sunglasses lens coated with nickel-ferrite thin film NxFe3-xO4 (니켈페라이트 박막 NxFe3-xO4를 이용한 선글라스 렌즈의 자외선 차단효과에 대한 연구)

  • Ha, T.W.;Lee, Y.H.;Choi, K.S.;Cha, J.W.
    • Journal of Korean Ophthalmic Optics Society
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    • v.8 no.2
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    • pp.25-29
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    • 2003
  • Nickel-ferrite $Ni_xFe_{3-x}O_4$ thin films with several composition for Ni on glass substrate was prepared by ferrite plating method in order to make sunglass which cut off ultraviolet and shield electromagnetic field. It has single phase of polycrystalline spinel structure and has gloss as mirror and has high hardness which is no scratch while scraping by using nail. The transmittance of nickel-ferrite thin film is lowered to zero below 400 nm manifestly. And it shows that the nickel-ferrite thin film in nickel composition rate x = 0.09 was most cut oil ultraviolet when compared with goods of other company in the cut off effect of ultraviolet. Therefore, sunglasses coated with $Ni_xFe_{3-x}O_4$ thin film can be used in removing ultraviolet and electromagnetic field.

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