• Title/Summary/Keyword: Thermal Barrier

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Decomposition of Acetonitrile by Planar Type Dielectric Barrier Discharge Reactor (평판형 유전체 장벽 방전 반응기에서 Acetonitrile의 분해 특성)

  • 송영훈;김관태;류삼곤;이해완
    • Journal of the Korea Institute of Military Science and Technology
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    • v.5 no.3
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    • pp.105-112
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    • 2002
  • A combined process of non-thermal plasma and catalytic techniques has been investigated to treat toxic gas compounds in air. The treated gas in the present study is $CH_3$CN that has been known to be a simulant of toxic chemical agent. A planar type dielectric barrier discharge(DBD) reactor has been used to generate non-thermal plasma that produces various chemically active species, O, N, OH, $O_3$, ion, electrons, etc. Several different types of adsorbents and catalysts, which are MS 5A, MS 13X, Pt/alumina, are packed into the plasma reactor, and have been tested to save power consumption and to treat by-products. Various aspects of the present techniques, which are decomposition efficiencies along with the power consumption, by-product analysis, reaction pathways modified by the adsorbents and catalysts, have been discussed in the present study.

Structure Behavior of Sputtered W-B-C-N Thin Film for various nitrogen gas ratios (PVD법으로 증착한 W-B-C-N 박막의 질소량에 따른 구조변화 연구)

  • Song, Moon-Kyoo;Lee, Chang-Woo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.109-110
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    • 2005
  • We have suggested sputtered W-C-N thin film for preventing thermal budget between semiconductor and metal. These results show that the W-C-N thin film has good thermal stability and low resistivity. In this study we newly suggested sputtered W-B-C-N thin diffusion barrier. In order to improve the characteristics, we examined the impurity behaviors as a function of nitrogen gas flow ratio. This thin film is able to prevent the interdiffusion during high temperature (700 to $1000^{\circ}C$) annealing process and has low resistivity ($\sim$200$\mu{\Omega}-cm$). Through the analysis of X-Ray diffraction, resistivity and XPS, we studied structure behavior of W-B-C-N diffusion barrier.

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Study on the Technical Trend of a Pulse Separation Device with Thermal Barrier Type (격막형 펄스분리장치 기술동향 연구)

  • Kim, Won-Hoon;Lee, Bang-Eop;Koo, Song-Hoe;Lee, Won-Bok
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2010.11a
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    • pp.225-228
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    • 2010
  • In this paper, the present status of research, development, and required technologies for the thermal barrier type dual-pulse rocket motor of the advanced countries was analysed. The result of the conceptual design of the forward or backward ignition systems was also demonstrated.

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Effect of Composition of Bond Coating on the Durability of the Plasma Sprayed $\textrm{ZrO}_2$-$\textrm{CeO}_2$-$\textrm{Y}_2\textrm{O}_3$ Thermal Barrier Coating (금속결합층의 조성이 $\textrm{ZrO}_2$-$\textrm{CeO}_2$-$\textrm{Y}_2\textrm{O}_3$ 단열층의 내구성에 미치는 영향)

  • Kim, Hye-Seong;Kim, Byeong-Hui;Seo, Dong-Su
    • Korean Journal of Materials Research
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    • v.9 no.1
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    • pp.73-80
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    • 1999
  • The effect of alloy compositions of the bond coating on the plasma sprayed-thermal barrier coatings was investigated. The performance of the coating composed of Rene80/NiCrAl/ZrO$_2$-CeO$_2$-Y$_2$O$_3$ and Rene80/CoNiCrAlY/ZrO$_2$-CeO$_2$-Y$_2$O$_3$was evaluated by isothermal and thermal cyclic test in an ambient atmosphere at 115$0^{\circ}C$. The failure of Rene80/NiCrAl/ZrO$_2$-CeO$_2$-Y$_2$O$_3$ coatings was occurred at the bond coating/ceramic coating interface while Rene80/CoNiCrAlY/ZrO$_2$-CeO$_2$-Y$_2$O$_3$ coating was failed at the substrate/bond coating interface after thermal cyclic test. The lifetime of Rene80/NiCrAl/ZrO$_2$-CeO$_2$-Y$_2$O$_3$coatings was longer than Rene80/CoNiCrAlY/ZrO$_2$-CeO$_2$-Y$_2$O$_3$coating. The oxidation rate of the NiCrAl bond coating examined by TGA was lower than CoNiCrAlY bond coatings. In summary, these results suggest that Rene80/CoNiCrAlY/ZrO$_2$-CeO$_2$-Y$_2$O$_3$system as thermal barrier coating be not suitable considering the durability of the coating layer for high temperature oxidation and thermal stress.

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Thermal Properties and Refractive Index of $B_2O_3-Al_2O_3-SiO_2$ Glasses for Photolithographic Process of Barrier Ribs in PDP (PDP의 격벽 형성 공정인 감광성 공법에서 $B_2O_3-Al_2O_3-SiO_2$계 유리 조성의 열적 특성과 굴절률 변화)

  • Hwang, Seong-Jin;Won, Ju-Yeon;Kim, Hyung-Sun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.321-321
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    • 2008
  • To obtaingood resolution in PDP, one of the important factors is to achieve the accuracy of barrier ribs. The photolithographic process can be used to form patterns of barrier rib with high accuracy and a high aspect ratio. The composition for photolithography is based on the $B_2O_3-SiO_2-Al_2O_3$ glass system including additives such as alkali oxides and alkali earth oxides. The refractive index and thermal properties in glass system are changed by amount of alkali oxides and alkali earth oxides. Therefore, it is important that additives are controlled to have proper refractive index and thermal properties. The additives are contributed to non-bridging oxygen within the glass network, causing a change of density. In addition to a change of the structural cross-link density, the refractive index, dielectric and thermal properties glass are correlated with ionic radius and polarizability of cations. In this study, we investigated the refractive index and the thermal properties such as glass transition temperature, glass softening temperature and coefficient of thermal expansion by changing composition in the $B_2O_3-SiO_2-Al_2O_3$ glass system.

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Thermal Durability of 4YSZ Thermal Barrier Coating Deposited by Electron Beam PVD (전자빔을 이용한 물리기상증착법으로 제조된 열차폐용 4 mol% YSZ 코팅의 내열특성)

  • Park, Chanyoung;Yang, Younghwan;Kim, Seongwon;Lee, Sungmin;Kim, Hyungtae;Lim, Daesoon;Jang, Byungkoog;Oh, Yoonsuk
    • Journal of Powder Materials
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    • v.20 no.6
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    • pp.460-466
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    • 2013
  • 4 mol% Yttria-stabilized zirconia (4YSZ) coatings with $200{\mu}m$ thick are fabricated by Electron Beam Physical Vapor Deposition (EB-PVD) for thermal barrier coating (TBC). $150{\mu}m$ of NiCrAlY based bond coat is prepared by conventional APS (Air Plasma Spray) method on the NiCrCoAl alloy substrate before deposition of top coating. 4 mol% YSZ top coating shows typical tetragonal phase and columnar structure due to vapor phase deposition process. The adhesion strength of coating is measured about 40 MPa. There is no delamination or cracking of coatings after thermal cyclic fatigue and shock test at $850^{\circ}C$.

Fabrication and Characteristics of Thermal Barrier Coatings in the La2O3-Gd2O3-ZrO2 System by Using Suspension Plasma Spray with Different Suspension Preparations (서스펜션의 준비방법에 따른 서스펜션 플라즈마 용사를 이용한 La2O3-Gd2O3-ZrO2 계 열차폐코팅의 제조와 특성)

  • Lee, Soyul;Lee, Sung-Min;Oh, Yoon-Suk;Kim, Hyung-Tae;Nahm, Sahn;Kim, Seongwon
    • Journal of the Korean institute of surface engineering
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    • v.49 no.6
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    • pp.595-603
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    • 2016
  • Rare-earth zirconates, including lanthanum zirconate and gadolinium zirconate, have been investigated as ones of the most promising candidates for next-generation thermal barrier coating (TBC) materials due to their excellent properties such as low thermal conductivity, chemical stability at high temperature and so on. In this study, TBCs with three compositions, in the $La_2O_3-Gd_2O_3-ZrO_2$ system with reduced rare-earth contents from $RE_2Zr_2O_7$ compositions, were fabricated by using suspension plasma spray with different suspension preparation methods. The phase formation, microstructure, and thermal properties of TBCs were examined. In particular, each coating exhibited single fluorite phase and a dense, vertically-separated microstructure. The potential of coatings with rare-earth zirconates for TBC applications was also discussed.

Facilitation of the four-mask process by the double-layered Ti/Si barrier metal for oxide semiconductor TFTs

  • Hino, Aya;Maeda, Takeaki;Morita, Shinya;Kugimiya, Toshihiro
    • Journal of Information Display
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    • v.13 no.2
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    • pp.61-66
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    • 2012
  • The double-layered Ti/Si barrier metal is demonstrated for the source/drain Cu interconnections in oxide semiconductor thin-film transistors (TFTs). The transmission electromicroscopy and ion mass spectroscopy analyses revealed that the double-layered barrier structure suppresses the interfacial reaction and the interdiffusion at the interface after thermal annealing at $350^{\circ}C$. The underlying Si layer was found to be very useful for the etch stopper during wet etching for the Cu/Ti layers. The oxide TFTs with a double-layered Ti/Si barrier metal possess excellent TFT characteristics. It is concluded that the present barrier structure facilitates the back-channel-etch-type TFT process in the mass production line, where the four- or five-mask process is used.

Magnetic Effects of La0.67Sr0.33MnO3 on W-C-N Diffusion Barrier Thin Films

  • Song, Moon-Kyoo;So, Ji-Seop;Shim, In-Bo;Lee, Chang-Woo
    • Journal of the Korean Magnetics Society
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    • v.15 no.2
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    • pp.133-136
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    • 2005
  • In the case of contacts between semiconductor and metal in semiconductor devices, they tend to be unstable because of thermal budget. To prevent these problems we deposited W-C-N diffusion barrier for preventing the interdiffusion between metal and semiconductor. The thickness of the barrier is $1,000{\AA}$ and the pressure is 3 mTorr during the deposition. In this work we coated LSMO (CMR material) on W-C-N diffusion barrier and then we studied the interface effects between LSMO layer and W-C-N diffusion barrier. We got results that the magnetic characteristics of LSMO thin film are still maintained after annealing at $800^{\circ}C$ for 3 hr because W-C-N thin diffusion barrier was prevented the diffusion of oxygen between LSMO and Si substrate.

Optimization of a straight fin heat sink in 3D LCos projector considering bypass flow and a flow barrier

  • Kim, Jin-Wook;Kim, Sang-Hoon;Lee, Seung-Gyu
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1265-1268
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    • 2009
  • In this paper, the effect of a flow barrier and bypass on the cooling performance for a straight fin heat sink is presented. Both side directions and upward direction of bypass are controlled using various ducts which have different width and heights. In addition, a flow barrier is used to control flow toward heat sink. Through experiments, the distance from leading edge of a heat sink to a flow barrier is varied for various bypasses under fixed volume flow rate condition. This study shows possibility to improve cooling performance when bypass and a flow barrier exist.

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