• 제목/요약/키워드: Target Sheet

검색결과 148건 처리시간 0.027초

RF magnetron 스파터링법으로 제작한 TiNx 박막의 면저항분석 (Sheet Reisistance Analysis of TiNx Thin Film by RF Magnetron Sputtering)

  • 박문찬;오정홍;김남영;황보창권
    • 한국안광학회지
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    • 제4권1호
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    • pp.21-25
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    • 1999
  • RF(radio-frequency) magnetron 스퍼터링 장치에 질소가스와 아르곤가스를 동시에 주입하면서 Ti 타켓을 스퍼터링하여 TiN, 박막을 유리기판위에 제작하였다. 박막제작시 RF power supply 출력은 240W로, 증착기 내부의 온도는 $200^{\circ}C$를 유지하였다. TiN, 박막은 알곤 가스를 20sccm으로 고정시킨 상태에서 질소를 3sccm부터 9secm까지 변화시켜가며 증착시켰다. 이때 박막의 면저항과 화학적 조성과의 관계를 분석하기 위하여 XPS depth profiling과 4점 탐침법을 사용하였다.

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우물정자형 Sub-frame의 블랭크 설계 (Optimum Blank Design of Automobile Sub-Frame)

  • 김종엽;김낙수;허만성
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 1998년도 춘계학술대회논문집
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    • pp.185-195
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    • 1998
  • A new blank design method is proposed to predict the optimum initial blank shape in the sheet metal forming process. The rollback method for blank shape design takes the difference between final deformed shape and target contour shape into account. Based on the method, a computer program composed of blank design module, FE-analysis program and mesh generation module is developed. The rollback method is applied to square cup drawing process with the flange of unifiorm size around its periphery to confirm its validity. The optimum initial blank shape is obtained from an arbitrary square blank after three modifications. Good agreements are recognized between the numerical results and the published results for initial blank shape and thickness strain distribution. The optimum blank shape for two parts of automobile sub-frame is designed. The thickness distribution and the level of punch load is improved. Also, the method is applied to design the weld line in the tailor-welded blank. It is concluded that the rollback method is an effective and convenient method for an optimum blank shape design.

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전기주석도금강판의 Zr계 화학처리 피막 특성 (Characteristics of Zr-base Passivation Layers of Tinplate)

  • 배대철;김태엽;조경목
    • 한국표면공학회지
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    • 제36권3호
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    • pp.251-255
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    • 2003
  • With increasing environmental demands in surface treatment of steel sheets, the passivation layers containing hexavalent chromium $(Cr^{+6})$ are being replaced by non-chromium or trivalent chromium compounds. After review on the various types of inorganic compounds, the zirconates was chosen as the candidate for alternative to sodium dichromate in the aspect of its barrier properties with excellent adhesion to organics. The ammonium zirconium carbonate (AZC) and sodium hexafluorozirconate (SFZ) could be reach $70-80\%$ level of CDC (cathodic dichromate) treatment by their single applications. But high porosity in the AZC layer and poor electrical conductivity of SFZ solution limit the single application of zirconate. Mixed composition of zirconates to compensate their inferiorities or incorporation of organic compounds to seal the porosity seems to be inevitable to match up the target level of Cr-free passivation of tinplate.

RF-Sputtering법에 의한 CoSi2/Si 박막 형성에 관한 특성 (The Characteristic of Formation CoSi2/Si Thin Film by the RF-Sputtering Method)

  • 조금배;이강연;최연옥;김남오;정병호
    • 전기학회논문지
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    • 제59권7호
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    • pp.1255-1258
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    • 2010
  • In this paper, the $CoSi_2$ thin films with thicknesses of about $5{\mu}m$ were deposited on n-type silicon (111) substrates by RF magnetron sputtering method using a $CoSi_2$ target (99.99%). The flow rate of argon of 50 sccm, substrate temperature of $100^{\circ}C$, RF power of 60 watts, deposition time of 30 minutes, and the vacuum of $1\times10^{-6}$ Torr. The annealing treatments of the $CoSi_2$ thin film were performed from 500, 700 and $900^{\circ}C$ for 1h in air ambient by an electric furnace. In order to investigate the $CoSi_2$ thin film X-ray diffraction patterns were measured using the X-ray diffractometer (XRD). The structure of the thin films were investigated by using scanning the electron microscope (SEM) were used for review. The surface morphology of the thin films was measured with a atomic force microscopy (AFM). Temperature dependence of sheet resistivity and property of Hall effect was measured in the $CoSi_2$ thin film.

Characterization of Al Doped ZnO Thin Films Prepared by RF Magnetron Sputtering Under Various Substrate Temperatures

  • Kim, Deok Kyu;Kim, Hong Bae
    • Applied Science and Convergence Technology
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    • 제23권5호
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    • pp.279-283
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    • 2014
  • Al doped ZnO thin films have been deposited by a RF magnetron sputtering technique from a ZnO (2 wt.% $Al_2O_3$) target onto glass substrates heated at temperature ranging from RT to $400^{\circ}C$. X-ray diffraction analysis shows that the deposits have a preferential growth along the c-axis of a hexagonal structure. The full with at half maximum decreases from 0.45 to $0.43^{\circ}$ in the studied temperature range. The root main square surface roughness increases with substrate temperature from 1.89 to 2.67 nm. All films are transparent up to 80% in the visible wavelength range and the adsorption edge is red-shifted with substrate temperature from RT to $400^{\circ}C$. The sheet resistance increases from 92 ohm/sq to 419 ohm/sq when the deposition temperature increases from RT to $400^{\circ}C$. The increment of sheet resistance is caused by lowered carrier concentration resulting from an increase in surface roughness.

Multilayered Graphene Electrode using One-Step Dry Transfer for Optoelectronics

  • Lee, Seungmin;Jo, Yeongsu;Hong, Soonkyu;Kim, Darae;Lee, Hyung Woo
    • Current Optics and Photonics
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    • 제1권1호
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    • pp.7-11
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    • 2017
  • In this study, multilayered graphene was easily transferred to the target substrate in one step using thermal release tape. The transmittance of the transferred graphene according to the number of layers was measured using a spectrophotometer. The sheet resistance was measured using a four-point probe system. Graphene formed using this transfer method showed almost the same electrical and optical properties as that formed using the conventional poly (methyl methacrylate) transfer method. This method is suitable for the mass production of graphene because of the short process time and easy large-area transfer. In addition, multilayered graphene can be transferred on various substrates without wetting problem using the one-step dry transfer method. In this work, this easy transfer method was used for dielectric substrates such as glass, paper and polyethylene terephthalate, and a sheet resistance of ~240 ohm/sq was obtained with three-layer graphene. By fabricating organic solar cells, we verified the feasibility of using this method for optoelectronic devices.

Pulsed-DC 스퍼터링에서 Reverse Pulse Time에 따른 AZO 박막의 특성 변화에 관한 연구 (A Study on the Dependency of Pulsed-DC Sputtered Aluminum-doped Zinc Oxide Thin Films on the Reverse Pulse Time)

  • 류형석;조진건;권상직;조의식
    • 반도체디스플레이기술학회지
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    • 제17권4호
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    • pp.32-36
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    • 2018
  • For various oxygen($O_2$) to argon(Ar) gas ratio, aluminum-doped zinc oxide(AZO) films were deposited for 3 min at different duty ratio by changing reverse pulse times. As the duty ratio increased, the thickness of the AZO film decreased and the sheet resistance increased. It can be concluded that When sputtering AZO Thin film, oxygen interfered with sputtering. When the reverse time was increased, the thickness of AZO was proportional to the real sputtering time and decreased. From the optical transmittance and sheet resistance, it was possible to obtain a higher figure of merits of AZO at a lower reverse pulse time. Even at the short reversed pulse time, it can be concluded that the accumulated charges on the AZO target are completely cleared. At a lower reverse pulse time, pulsed-DC sputtering of AZO is expected to be used instead of DC sputtering in the deposition of transparent conductive oxide(TCO) films without any degradation in thickness and structural/electrical characteristics.

리브를 가진 장섬유 복합재료 커버 플레이트의 최적설계 (Optimal Design of Long-fiber Composite Cover Plate with Ribs)

  • 한민구;배지훈;이성우;장승환
    • Composites Research
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    • 제30권1호
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    • pp.65-70
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    • 2017
  • 일방향 탄소섬유 복합재료는 복잡한 성형 공정과 낮은 드레이핑능을 보여 비교적 단순한 형태의 구조물 제작에 제한적으로 사용되어 왔으나, 최근 이를 해결하고자 성형성과 생산효율이 우수한 장섬유 복합재료(Long Fiber Prepreg Sheet; LFPS)가 제안되었다. 본 연구에서는 단순한 성형 공정과 높은 성형 정밀도를 갖는 LFPS를 활용하여 전자 기기용 커버 플레이트 설계를 수행하였다. 설계에 앞서 리브 구조가 적용되는 대상 구조물을 8-inch 태블릿 PC 제품의 뒷 커버로 선정하였다. 해당 구조물에 평판에 적용되는 대표적인 하중 조건을 선정하여 유한요소해석에 적용하였고, 이를 활용하여 리브 구조물의 패턴과 리브 형상 변화에 따른 구조물의 구조 강성을 확인하였다. 해석 결과 제한된 부피 내에서 최적의 리브 패턴과 형상을 확보하였으며, 리브 폭이 균일하지 않은 경우가 균일한 경우에 비해 6~10% 처짐량이 감소함을 확인하였다.

아나타세 TiO2 도핑파워가 다성분계 TiO2-ITO 투명 전극의 전기적, 광학적, 구조적 특성에 미치는 효과 (Effect of Anatase TiO2 Doping Power on Electrical, Optical and Structural Properties of Multicomponent TiO2-Doped ITO Electrodes)

  • 임종욱;최윤영;조충기;최광혁;김한기
    • 한국재료학회지
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    • 제21권7호
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    • pp.371-376
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    • 2011
  • We report on the effects of $TiO_2$ doping power on the characteristics of multicomponent $TiO_2$-ITO (TITO) electrodes prepared by a multi-target sputtering system with tilted cathode guns. Both as-deposited and annealed TITO electrodes showed linearly increased sheet resistance and resistivity with increasing $TiO_2$ doping power. However, the TITO electrodes exhibited a fairly high optical transmittance regardless of the $TiO_2$ doping power due to the high transparency of the $TiO_2$. Although the annealed TITO showed much lower sheet resistance and resistivity relative to the as-deposited samples, the electrical properties of the annealed samples exhibited similar dependence on the $TiO_2$ power to the as-deposited samples. In addition, it was found that doping of an anatase $TiO_2$ in the ITO electrode prevented the preferred (222) orientation of the TITO electrodes. Although the TITO electrode showed higher sheet resistance and resistivity than that of the pure ITO electrode, it offers a very smooth surface and usage of a low-cost Ti element. It is thus considered a promising multicomponent transparent conducting electrode for cost-efficient flat panel displays and photovoltatics.

Light Scattering from Microscopic Structure and Its Role on Enhanced Haze Factor

  • Kang, Junyoung;Park, Hyeongsik;Yi, Junsin
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.340-340
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    • 2016
  • We have prepared alumina (Al2O3) doped zinc oxide (AZO) films by DC magnetron sputtering (MS) technique and obtained higher self surface texturing at a high target angle (f). We have characterized the films and applied it as a front electrode of a single junction amorphous silicon solar cell. At a lower f the deposited films show higher values of optical gap (Eg), charge carriers mobility & concentration, crystallite grain size and wider wavelength range of transmission. At higher target angle the sheet resistance, surface roughness, haze factor etc for the films increase. For f=72.5o the haze factor for diffused transmission becomes 6.46% at 540 nm wavelength. At f=72.5o the material shows a reduction in crystallinity and evolution of a hemispherical-type sub-micron surface textures. A Monte Carlo method (MCM) of simulation of the AZO film deposition shows that such an enhanced self-surface texturing of the films at higher f is possible.

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