• Title/Summary/Keyword: TEM Journal

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Microstructure of ZnO Thin Films Deposited by PECVD using Diethylzine (Diethylzinc를 사용하여 PECVD로 증착한 ZnO 박막의 미세 구조 분석)

  • 김영진;김형준
    • Korean Journal of Crystallography
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    • v.4 no.2
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    • pp.92-99
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    • 1993
  • ZnO thin films were depositsd by Plasma enhanced CVD (PUW) using Diethylzinc and N2O gas, and micro-structue of ZnO thin films were investigated ZnO thin films composed of micro-crystallites was deposited at the substrate of loot. However, highly c-axis oriented ZnO thin films were deposited on the glass substrates above 200℃. TEM analysis revealed that an epitaxial (002) ZnO thin film was deposited on c-plane sapphire substrate at the substrate temperature of 350℃, and More patterns showing partial dislocation were observed at the grain boundary.

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Characterization of Surface Damage and Contamination of Si Using Cylindrial Magnetron Reactive Ion Etching

  • Young, Yeom-Geun
    • Korean Journal of Materials Research
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    • v.3 no.5
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    • pp.482-496
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    • 1993
  • Radiation damage and contamination of silicons etched in the $CF_4+H_2$ and $CHF_3$ magnetron discharges have been characterized using Schottky diode characteristics, TEM, AES, and SIMS as a function of applied magnetic field strength. It turned out that, as the magnetic field strength increased, the radiation damage measured by cross sectional TEM and by leakage current of Schottky diodes decreased colse to that of wet dtched samples especially for $CF_4$ plasma etched samples, For $CF_4+H_2$and $CHF_3$ etched samples, hydrogen from the plasmas introduced extended defects to the silicon and this caused increased leakage current to the samples etched at low magnetic field strength conditions by hydrogen passivation. The thickness of polymer with the increasing magnetic field strength and showed the minimum polymer residue thickness near the 100Gauss where the silicon etch rate was maximum. Also, other contaminants such as target material were found to be minimum on the etched silicon surface near the highest etch rate condition.

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Effects of Rapid Thermal Anneal on the Magnetoresistive Properties of Magnetic Tunnel Junction

  • Lee, K.I.;Lee, J.H.;K. Rhie;J.G. Ha;K.H. Shin
    • Journal of Magnetics
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    • v.6 no.4
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    • pp.126-128
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    • 2001
  • The effect of rapid thermal anneal (RTA) has been investigated on the properties of an FeMn exchange-biased magnetic tunnel junction (MTJ) using magnetoresistance and I-V measurements and transmission electron microscopy (TEM). The tunneling magnetoresistance (TMR) in an as-grown MTJ is found to be ∼27%, while the TMR in MTJs annealed by RTA increases with annealing temperature up to 300$\^{C}$, reaching ∼46%. A TEM image reveals a structural change in the interface of A1$_2$O$_3$layer for the MTJ annealed by RTA at 300$\^{C}$. The oxide barrier parameters are found to vary abruptly with annealing time within a few ten seconds. Our results demonstrate that the present RTA enhances the magnetoresistive properties of MTJs.

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Effects of Pretreatment on the Adhesive Bonding of Aluminium Plate (Al 판재의 Adhesion Bonding에 미치는 전처리 영향)

  • Han, Seong-Ho;Kim, Man;Chung, Do-Yeon;Rho, Byug-Ho
    • Journal of Surface Science and Engineering
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    • v.25 no.2
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    • pp.97-102
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    • 1992
  • Transimission electron microscope(TEM)/ultramicrotomy were used to characterize the detailed surface morphology of 2024-T3 Al alloy surfaces prepared by various pretreatment process. It was found that, for good and superior initial adhesive strength and durability, chemically pretreated substrates appeared essential. The film morphology developed after CSA etching treatment, ass revealed by TEM, suggested the present of irregular cell pattern with finely separated whisker-like protrusion with was responsible for increase of bond strength.

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Experimental Analysis on Particle Growth in TEOS/O2 Plasma Reactor (TEOS/O2용 플라즈마 반응기에서의 미립자 성장에 대한 실험적 분석)

  • Hong, Sung-Taik;Kim, Kyo-Seon
    • Journal of Industrial Technology
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    • v.23 no.A
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    • pp.175-179
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    • 2003
  • A study on the particle growth in $TEOS/O_2$ plasma was performed by observing the particle size and its morphology by TEM. The qualitative chemical analysis of particles was also determined by the EDS (Energy Dispersive X-Ray Spectrometer). The effects of process variables such as the plasma on-time and bubbler temperature on the particle growth were investigated. The particle size becomes larger as the plasma on-time because of the longer coagulation, and also as the bubbler temperature increases because of the faster coagulation between particles.

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Morphology Changes of E. coli in Ag-HAp Observed by TEM

  • Kim, T.N.;Feng, Q.L.;Kim, Y.J.;Yim, H.J.;Lim, D.Y.;Hwang, D.S.;Kim, J.W.;Cui, F.Z.
    • Journal of the Korean Vacuum Society
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    • v.7 no.s1
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    • pp.44-49
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    • 1998
  • The antimicrobial effects of HAp and Ag-HAp was observed using periprosthetic infection bacteria such as Pseudomonas Aeruginosa, Staphylococcus Epidermidis, Escherichia coli (DH5$\alpha$). Ag-HAp showed good antimicrobial effects. TEM study of E. coli with and without Ag treatment in HAp was experimented in order to find the mechanism of Ag in antimicrobial effects. It was observed that the shape of Ag-treated E. coli was changed, the cells walls became inhomogeneous. The vaculoes at cytoplasm formed into E. coli and finally it was discovered by EDAX that there were many dark granules which contain the Ag element inside the cells.

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Study of the Intraction between PVP and Silver Cation (은 양이온과 PVP의 상호작용에 대한 연구)

  • Lee, Chul-Jae;Kim, Dong-Yeub;Nam, Ki-Young
    • Journal of the Korean Chemical Society
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    • v.53 no.5
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    • pp.565-569
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    • 2009
  • The interaction between polyvinylpyrrolidone(PVP) and silver cation has been studied in water at room temperature and atmospheric pressure. The PVP and PVP/Ag composite was observed by transmission electron microscopy (TEM), UV-VIS absorption spectroscopy, Raman spectroscopy and oxygen/carbon dioxide analyzer. We identified silver cations interacting with nonbonding electrons of the oxygen atom in the carbonyl group of PVP. It was shown that PVP/Ag formed stable composites.

Self-Assembled InAs Quantum Dots on InP(001) for Long-Wavelength Laser Applications

  • Kim, Jin-Soo;Lee, Jin-Hong;Hong, Sung-Ui;Kwack, Ho-Sang;Lee, Chul-Wook;Oh, Dae-Kon
    • ETRI Journal
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    • v.26 no.5
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    • pp.475-480
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    • 2004
  • Self-assembled InAs quantum dots (QDs) embedded in an InAlGaAs matrix were grown on an InP (001) using a solid-source molecular beam epitaxy and investigated using transmission electron microscopy (TEM) and photoluminescence (PL) spectroscopy. TEM images indicated that the QD formation was strongly dependent on the growth behaviors of group III elements during the deposition of InAlGaAs barriers. We achieved a lasing operation of around 1.5 ${\mu}m$ at room temperature from uncoated QD lasers based on the InAlGaAs-InAlAs material system on the InP (001). The lasing wavelengths of the ridge-waveguide QD lasers were also dependent upon the cavity lengths due mainly to the gain required for the lasing operation.

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The Substructure Near Indents With Temperature During Microindentation on Basal (0001) Plane in Sapphire Single Crystals (사파이어 단결정의 basal (0001) 결정면에 미세압흔시 온도에 따른 압흔 주위 미세구조에 관한 연구)

  • Yun, Seok-Yeong
    • Korean Journal of Materials Research
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    • v.10 no.11
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    • pp.784-788
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    • 2000
  • The Vickers microhardness was measured on the basal (0001) plane of sapphire single crystals in the temperature range from 25$^{\circ}C$to 1000$^{\circ}C$. The substructure surrounding the indents was investigated using selective chemical polishing and etching, optical microscopy, and trasmission electron microscopy (TEM). At room temperature, cracks were predominant, and at intermediate temperatures (400$^{\circ}C$and 600$^{\circ}C$), extensive rhombohedral twinning was observed. On the other hand, at higher temperatures, prism plane slip bands on prism plane {1120}(원문참조) were dominant in the microstructure. TEM observations revealed that the dislocation substructure at the vicinity of the indents consisted of fairly straight dislocations lying in basal and/or prism planes and aligned along the <1100> and <1120> directions. The details of the glide dissociation of perfect <110> screw dislocations into three collinear 1/3<1100> partials on the prism plane and the Peierls potential for sapphire single crystals were discussed.

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Synthesis of Ultrafine Silicon Nitride Powders by the Vapor Phase Reaction (기상반응에 의한 $Si_3N_4$ 미세분말의 합성)

  • 유용호;어경훈;소명기
    • Journal of the Korean Ceramic Society
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    • v.37 no.1
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    • pp.44-49
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    • 2000
  • Silicon nitride powders, were synthesized by the vapor phase reaction using SiH4-NH3 gaseous mixture. The reaction temperature, ratio of NH3 to SiH4 gas and the overall gas quantity were varied. The synthesized powders were characterized using X-ray, TEM, FT-IR and EA. The synthesized silicon nitride powders were in amorphous state, and the average particle size was about 100nm. TEM analysis revealed that the particle size decreased with increasing reaction temperature and gas flow quantity. As-received amorphous powders were annealed in nitrogen atmosphere at 140$0^{\circ}C$ for 2h, then the powders were completely crystallized at 0.2 ratio of NH3 to SiH4.

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