• 대한화학회지
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• 제29권6호
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• pp.599-607
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• 1985

Thioacetamide(TA) - CC$l_4$ 용액과 TA- DMP - CC$l_4$ 용액에 대한 $ν_3$ + Amide II 조합띠의 근적외선 스펙트럼을 5 ~ 55${\circ}C$ 범위에서 얻었다. 이 띠 부근에서 생기는 DMP와 용매의 약한 흡수띠는 대조액을 사용하여 보상하였다. 복합된 스펙트럼은 콤퓨터를 사용하여 각 띠의 형태를 Lorentzian-Gaussian 곱의 함수로 보아 두 개의 띠로 분리하였고 이는 각각 TA 단위체와 TA-DMP의 1:1 복합체 임을 확인하였다. 매우 묽은 CC$l_4$ 용액 중에서 TA-DMP 농도 및 온도 의존스펙트럼을 분석하여 TA와 DMP 간의 수소결합에 대한 평형상수와 열역학적 파라미터를 구하였다. TA와 DMP 간의 $ΔH{\circ}는 -14.6 kJmol^{-1}$이었고 $ΔS{\circ}는 -16.2 Jmol^{-1}$de$g^{-1}$이었다.

• The Journal of Advanced Prosthodontics
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• 제1권1호
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• pp.56-61
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• 2009

STATEMENT OF PROBLEM. The success of titanium implants is due to osseointegration or the direct contact of the implant surface and bone without a fibrous connective tissue interface. PURPOSE. The purpose of this study was to evaluate the osteoblast precursor response to titanium-10 tantalum-10 niobium(Ti-Ta-Nb) alloy and its sputtered coating. MATERIAL AND METHODS. Ti-Ta-Nb coatings were sputtered onto the Ti-Ta-Nb disks. Ti6-Al-4V alloy disks were used as controls. An osteoblast precursor cell line, were used to evaluate the cell responses to the 3 groups. Cell attachment was measured using coulter counter and the cell morphology during attachment period was observed using fluorescent microscopy. Cell culture was performed at 4, 8, 12 and 16 days. RESULTS. The sputtered Ti-Ta-Nb coatings consisted of dense nanoscale grains in the range of 30 to 100 nm with alpha-Ti crystal structure. The Ti-Ta-Nb disks and its sputtered nanoscale coatings exhibited greater hydrophilicity and rougher surfaces compared to the Ti-6Al-4V disks. The sputtered nanoscale Ti-Ta-Nb coatings exhibited significantly greater cell attachment compared to Ti-6Al-4V and Ti-Ta-Nb disks. Nanoscale Ti-Ta-Nb coatings exhibited significantly greater ALP specific activity and total protein production compared to the other 2 groups CONCLUSIONS. It was concluded that nanoscale Ti-Ta-Nb coatings enhance cell adhesion. In addition, Ti-Ta-Nb alloy and its nanoscale coatings enhanced osteoblast differentiation, but did not support osteoblast precursor proliferation compared to Ti-6Al-4V. These results indicate that the new developed Ti-Ta-Nb alloy and its nanoscale Ti-Ta-Nb coatings may be useful as an implant material.

• 한국분말재료학회지
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• 제10권4호
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• pp.255-261
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• 2003

Ultrafine TaC-5%Co composite powders were synthesized by spray conversion process using tantalum oxalate solution and cobalt nitrate hexahydrate(Co($(NO_3)_2$ . 6$H_2O$). The phase of Ta-Co oxide powders had amorphous structures after calcination below 50$0^{\circ}C$ and changed $Ta_2O_5$, $TaO_2$ and $CoTa_2O_6$ phase by heating above $600^{\circ}C$. The calcined Ta-Co oxide powders were spherical agglomerates consisted of ultrafine primary particles <50 nm in size. By carbothermal reaction, the TaC phase began to form from 90$0^{\circ}C$. The complete formation of TaC could be achieved at 105$0^{\circ}C$ for 6 hours. The observed size of TaC-Co composite powders by TEM was smaller than 200 nm.

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part2
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• pp.1116-1117
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• 2006

Lanthanide tantalite $LnTaO_4$ (Ln= La, Nd, Sm, Dy, Er and Tm) was synthesized by a solid state reaction between mixed powders of $Ln_2O_3$ and $Ta_2O_5$. The single-phase $LnTaO_4$ was prepared by sintering at temperatures of 1423-1673 K in air. The SEM observation showed that the particles were provided with the growth steps and the depeloped facets. The photocatalytic activity for water splitting of $LnTaO_4$ prepared was measured under UV light irradiation. The activity obtained was higher than that previously reported. These results suggested the crystallinity of $LnTaO_4$ photocatalysts correlates closely with the efficiency of water splitting.

• 한국재료학회지
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• 제9권8호
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• pp.837-842
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• 1999

Ta/TaN 다층피막구조는 경도는 떨어지지만 연성이 큰 Ta 막과 취성을 가지며 경도가 높은 TaN 막을 교대로 반복하여 만든 다층구조로서 경도와 연성의 장점이 잘 조화되어 높은 인성을 나타낼 것으로 기대된다. 본 연구에서는 고속도강 기판위에 Ta/TaN 복합다층피막과 compositional gradient Ta-TaN 막을 각각 반응성 스퍼터링에 의하여 증착하고 열처리에 따른 경도 및 접착성을 조사하였다. $N_2$/Ar 유량비가 0.4일 때 결정성이 가장 우수한 TaN 막이 얻어지며, Ta/TaN 복합다층피막의 경도 및 스크래치 테스트 결과도 가장 우수하였다. 또한 Ta/TaN 복합다층피막 증착후의 어닐링 처리 시 어닐링 온도가 증가할수록 피막의 경도와 접착성이 악화되었으며, compositional modulation wavelength가 감소함에 따라 Ta/TaN 복합다층피막의 경도는 증가하지만 접착성은 wavelength에 대한 의존성이 약하게 나타났다. 그리고 compositional gradient Ta-TaN 막 증착후의 어닐링 처리 시 경도와 스크래치 테스트 값은 각각 20$0^{\circ}C$와 40$0^{\circ}C$에서 최대값을 나타내었다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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• pp.1420-1421
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• 2006

In this study, structural and micowave dielectric properties of the $Mg_{5}B_{4}O_{15}$ (B=Ta, Nb) cation-deficient perovskite ceeramics. The specimens are prepared through the solid-state route. According to the XRD pattern, $Mg_{4}Ta_{2}O_9$ and $MgTa_{2}O_6$ phase exist in calcined and sintered $Mg_{5}Ta_{4}O_{15}$ powder. Also $Mg_{5}Ta_{4}O_{15}$ phase added with increasing sintering temperature. In the case of calcined and sintered $Mg_{5}Nb_{4}O_{15}$ powder, single phase of $Mg_{5}Nb_{4}O_{15}$ were appeared. The bulk density and quality factor of the $Mg_{5}B_{4}O_{15}$ (B=Ta, Nb) ceramics were increased with sinteming temperature in $1400^{\circ}C{\sim}1450^{\circ}C$, but these were decreased in another sintering temperature. Dielectric constant of the $Mg_{5}Ta_{4}O_{15}$ ceramics was increased continuously with increasing of sintering temperature. And the dielectric constant of the $Mg_{5}Nb_{4}O_{15}$ ceramics was increased in $1400^{\circ}C{\sim}1450^{\circ}C$ but decreased in $1475^{\circ}C$. In the case of the $Mg_{5}Ta_{4}O_{15}$ and $Mg_{5}Nb_{4}O_{15}$ ceramics sintered at $1450^{\circ}C$ for 5h, the dielectric constant, quality factor, and temperature coefficient of the resonant frequency (TCRF) were 8.2, 259,473 GHz, -10.91 $ppm/^{\circ}C$ and 14, 37,350 GHz, -52.3 $ppm/^{\circ}C$, respectively.

• 한국결정성장학회지
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• 제9권1호
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• pp.60-63
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• 1999

Ta-Al 합금 박막의 건식식각에 대하여 조사하였다. $CF_{4}$ 기체를 이용한 반응성 이온 식각(Reactive Ion Etching, RIE)이 1:1 조성의 Ta-Al 합금 박막의 식각에 적용될 수 있음을 확인하였으며, 식각속도는 $67{\AA}/min$으로 측정되었다. 그리고 $CF_{4}$ 기체는 Ta-Al 합금 박막과 $SiO_{2}$ 층간에 선택성이 없다는 것이 확인되었으며, $SiO_{2}$ 층의 식각속도는 Ta-Al 박막의 경우보다 약 12배 빠른 $800{\AA}/min$으로 측정되었다. 그 외에 $CF_{4}$ 기체를 이용한 반응성 이온 식각에서는 Shiepley 1400-27 Photo Resist 보다 AZ 5214 Photo Resist가 더 안정적이라는 것이 조사되었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.398-398
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• 2013

The electronic properties and the local structure of tantalum oxide thin film with variation of oxygen flow rate ranging from 9.5 to 16 sccm (standard cubic centimeters per minute) have been investigated by X-ray photoelectron spectroscopy (XPS), Reflection Electron Energy Loss Spectroscopy (REELS), and X-ray absorption spectroscopy (XAS). The XPS results show that the Ta4f spectrum for all films consist of the strong spin-orbit doublet $Ta4f_{7/2}$ and $Ta4f_{5/2}$ with splitting of 1.9 eV. The oxygen flow rate of the film results in the appearance of new features in the Ta4f at binding energies of 23.2 eV, 24.4 eV, 25.8, and 27.3 eV, these peaks attribute to $Ta^{1+}$, $Ta^{2+}$, $Ta^{4+}$/$Ta^{2+}$, and $Ta^{5+}$, respectively. Thus, the presence of non-stoichiometric state from tantalum oxide ($TaO_x$) thin films could be generated by the oxygen vacancies. The REELS spectra suggest the decrease of band gap for tantalum oxide thin films with increasing the oxygen flow rate. The absorption coefficient ${\mu}$ and its fine structure were extracted from the fluorescence mode of extended X-ray absorption fine structure (EXAFS) spectra. In addition, bond distances (r), coordination numbers (N) and Debye-Waller factors (${\sigma}^2$) each film were determined by a detailed of EXAFS data analysis. EXAFS spectrapresent both the increase of coordination number of the first Ta-O shell and a considerable reduction of the Ta-O bond distance with the increase of oxygen flow rate.

• 한국자기학회지
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• 제6권3호
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• pp.151-157
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• 1996

반응가스의 분압과 압력비($P_{CH4}/P_{CH4}+P_{N2}$)가 FeTaNC 박막의 연자기특성에 미치는 영향을 조사하였다. 반응가스분압 5%에서 가장 우수한 연자기특성을 나타내었는데 포화자속밀도는 $N_{2}$ 가스와 $CH_{4}$ 가스가 혼합($P_{CH4}$ : 20%~100%)된 조성에서 15~17 kG의 높은 값을 나타내었으며 보자력과 투자율(5 MHz)도 각각 0.3~0.5 Oe, 2000~4000의 값을 나타내었다. 또한, 반응가스분압 10%에서도 $P_{CH4}$이 30%에서 100%로 조성이 변함에 따라 포화자속밀도 15 kG, 보자력 0.18~0.4 Oe, 투자율(5 MHz) 2000~4000의 우수한 연자기 특성을 얻을 수 있었다. 반응가스분압 15%에서 포화자속밀도는 15 kG 정도로 일정하였으나 보자력과 투자율 (5 MHz)은 ($P_{CH4}/P_{CH4}+P_{N2}$) < 0.5 구간에서 보자력 > 0.5 Oe, 투자율(5 MHz) < 1000,($P_{CH4}/P_{CH4}+P_{N2}$) > 0.5 구간에서 보자력 < 0.5 Oe, 투자율(5 MHz) > 1000을 나타내었다. 반면 반응가스분압 20%에서는 과다한 반응가스 첨가에 의해 높은 보자력과 낮은 투자율을 나타내어 연자기특성을 얻을 수 없었다. 따라서 Ta 8%의 조성에서 반응가스분압이 20%에서 5%로 감소할수록 연자기특성이 크게 향상된 것으로 고찰되었다.

• Bulletin of the Korean Chemical Society
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• 제26권8호
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• pp.1260-1264
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• 2005

Three new quaternary tantalum thiophosphates, $K_{0.18}TaPS_6,\;K_{0.28}TaPS_6,\;and\;Rb_{0.09}TaPS_6$ have been synthesized by using reactive alkali metal halide fluxes and structurally characterized by single crystal X-ray diffraction techniques. The crystal structures of $K_{0.18}TaPS_6,\;K_{0.28}TaPS_6,\;and\;Rb_{0.09}TaPS_6$ contain 3-dimensional open framework anions, $[TaPS_6]^{x-}$(x = 0.09, 0.18, 0.28) with the empty channel which disordered alkali metal cations, $K^+\;and\;Rb^+$ are located in. Crystal data: $K_{0.18}TaPS_6$, tetragonal, space group$I4_1$/acd (no. 142), a=15.874(3) $\AA$, c=13.146(4) $\AA$, V=3312.7(12) ${\AA}^3$, K, Z=16, R1=0.0545. Crystal data: $K_{0.28}TaPS_6$, tetragonal, space group $I4_1$/acd (no. 142), a=15.880(2) $\AA$, c=13.134(3) $\AA$, V=3312.1(10) ${\AA}^3$, Z=16, R1=0.0562. Crystal data: $Rb_{0.09}TaPS_6$, tetragonal, space group I41/acd (no. 142), a=15.893(3) $\AA$, c=13.163(4) $\AA$, V=3324.7(15) ${\AA}^3$, Z=16, R1=0.0432.