• Title/Summary/Keyword: Synchrotron Radiation

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Exposure Time and X-Ray Absorber thickness in the LIGA Process (LIGA 공정에서의 노광시간과 X선마스크 흡광체의 두께)

  • 길계환;이승섭;염영일
    • Journal of the Korean Vacuum Society
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    • v.8 no.2
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    • pp.102-110
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    • 1999
  • The LIGA X-ray exposure step was modelled into three inequalities, by assuming that the X-ray energy attenuated within a resist is deposited only in the localized range of the resist. From these inequalities, equations for the minimum and maximum exposure times required for a good quality microstructure were obtained. Also, an equation for the thickness of an X-ray mask absorber was obtained from the exposure requirement of threshold dose deposition. The calculation method of the synchrotron radiation power from a synchrotron radiation source was introduced and applied to an X-ray exposure step. A power from a synchrotron radiation source was introduced and applied to an X-ray exposure step/ A power function of photon energy, approximating the attenuation length of the representative LIGA resist, PMMA, and the mean photon energy of the XZ-rays incident upon an X-ray mask absorber were applied to the above mentioned equations. Consequently, the tendencies of the minimum and maximum exposure and with respect to mean photon energy and thick ness of PMMA was obtained. Additionally, the tendencies of the necessary thickness of PMMA and photon energy of the X-ray mask absorber with respect to thickness of PMMA and photon energy of the X-rays incident upon an X-ray mask absorber were examined. The minimum exposure time increases monotonically with increasing mean photon energy for the same total power density and is not a function of the thickness of resist. The minimum exposure time increases with increasing mean photon energy for the same total power density in the case of the general LIGA process, where the thickness of PMMA is thinner than the attenuation length of PMMA. Additionally, the minimum exposure time increases monotonically with increasing thickness of PMMA. The maximally exposable thickness of resist is proportional to the attenuation length of the resist at the mean photon energy with its proportional constant of ln $(Dd_m/D_{dv})$. The necessary thickness of a gold X-ray mask absorber due to absorption edges of gold, increases smoothly with increasing PMMA thickness ratio, and is independent of the total power density itself. The simplicity of the derived equations has made clearly understandable the X-ray exposure phenomenon and the correlation among the exposure times, the attenuation coefficient and the thickness of an X-ray mask absorber, the attenuation coefficient and the thickness of the resist, and the synchrotron radiation power density.

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On the Nature of the Gamma-ray Bursts

  • Hong, Kyung-Ai;Kim, Sug-Whan;Kim, Tu-Hwan
    • Journal of Astronomy and Space Sciences
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    • v.4 no.2
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    • pp.107-127
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    • 1987
  • Review of the $\gamma$-ray burst phenomena are presented. History of the $\gamma$-ray bursts, characteristics, and three radiation mechanisms of thermal bremsstrahlung, thermal synchrotron, and inverse Compton scattering processes are considered.

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Improvement of detection sensitivity of impurities on Si wafer surface using synchrotron radiation (방사광을 이용한 Si 웨이퍼 표면불순물 검출감도 향상)

  • 김흥락;김광일;강성건;김동수;윤화식;류근걸;김영주
    • Journal of the Korean Vacuum Society
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    • v.8 no.1
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    • pp.13-19
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    • 1999
  • Total reflection X-ray fluorescence spectroscopy using synchrotron radiation source called as TRSFA was explored to achieve high sensitivities to impurity metals on Si wafer surface. It consists of monochromating part to select a specific wavelength, slit part to shield direct beam and to control monochromated beam, and main chamber to dectect fluorescent X-ray counts of impurities on si wafer. Monochromated X-ray of 10.90 KeV was selected and the optimum total reflection condition on silicon wafer was obtained through tuning the dead time and fluorescent X-ray count of Si and Fe. TRSFA system could increase the sensitivity as high as 50 times in comparision with TRXFA using normal X-ray source. But the trend was varied since the surface conditions of Si wafers and, therefore, the reflectivities were different. Furthemore, there seems to be a promising path to reaching a detection limit useful to the next generation metal impurities control, because Fe impurity below to the $5\times10^{9}\textrm{atomas/cm}^2$ can be detectable through the developed TRSFA system.

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e-Science Technologies in Synchrotron Radiation Beamline - Remote Access and Automation (A Case Study for High Throughput Protein Crystallography)

  • Wang Xiao Dong;Gleaves Michael;Meredith David;Allan Rob;Nave Colin
    • Macromolecular Research
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    • v.14 no.2
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    • pp.140-145
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    • 2006
  • E-science refers to the large-scale science that will increasingly be carried out through distributed global collaborations enabled by the Internet. The Grid is a service-oriented architecture proposed to provide access to very large data collections, very large scale computing resources and remote facilities. Web services, which are server applications, enable online access to service providers. Web portal interfaces can further hide the complexity of accessing facility's services. The main use of synchrotron radiation (SR) facilities by protein crystallographers is to collect the best possible diffraction data for reasonably well defined problems. Significant effort is therefore being made throughout the world to automate SR protein crystallography facilities so scientists can achieve high throughput, even if they are not expert in all the techniques. By applying the above technologies, the e-HTPX project, a distributed computing infrastructure, was designed to help scientists remotely plan, initiate and monitor experiments for protein crystallographic structure determination. A description of both the hardware and control software is given together in this paper.

Enhanced Hole Injections in Organic Light Emitting Diode using Rhodium Oxide Coated Anode

  • Kim, Soo-Young;Choi, Ho-Won;Kim, Kwang-Young;Tak, Yoon-Heung;Lee, Jong-Lam
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.5 no.2
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    • pp.77-82
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    • 2005
  • We compare electrical and optical properties of organic light emitting diodes (OLEDs) using rhodium-oxide-coated indium-tin-oxide ($O_2$-Rh/ITO) to that using $O_2$-plasma-treated ITO (ITO) anodes. The turn-on voltage decreased from 7 V to 5 V and luminance value increased when the $O_2$ plasma treated Rh layer was deposited on ITO. Synchrotron radiation photoelectron spectroscopy results showed the dipole energies of both ITO and $O_2$-Rh/ITO were same with each other, - 0.3 eV, meaning the formation of same amount of interface dipole. The secondary electron emission spectra revealed that the work function of $O_2$-Rh/ITO is higher hy 0.2 eV than that of ITO, resulting in the decrease of the tum-on voltage via reduction ofhole injection barrier.

Growth, Structure, and Stability of Ag on Ordered ZrO2(111) Films

  • Han, Yong;Zhu, Junfa;Kim, Ki-jeong;Kim, Bongsoo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.204.2-204.2
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    • 2014
  • Among various metal oxides, ZrO2 is of particular interests and has received widespread attention thanks to its ideal mechanical and chemical stability. As a cheap metal, Ag nanoparticles are also widely used as catalysts in ethylene epoxidation and methanol oxidation. However, the nature of Ag-ZrO2 interfaces is still unknown. In this work, the growth, interfacial interaction and thermal stability of Ag nanoparticles on ZrO2(111) film surfaces were studied by low-energy electron diffraction (LEED), synchrotron radiation photoemission spectroscopy (SRPES), and X-ray photoelectron spectroscopy (XPS). The ZrO2(111) films were epitaxially grown on Pt(111). Three-dimensional (3D) growth model of Ag on the ZrO2(111) surface at 300 K was observed with a density of ${\sim}2.0{\times}1012particles/cm2$. The binding energy of Ag 3d shifts to low BE from very low to high Ag coverages by 0.5 eV. The Auger parameters shows the primary contribution to the Ag core level BE shift is final state effect, indicating a very weak interaction between Ag clusters and ZrO2(111) film. Thermal stability experiments demonstrate that Ag particles underwent serious sintering before they desorb from the zirconia film surface. In addition, large Ag particles have stronger ability of inhibiting sintering.

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A Study On Structure Change of Binding Actin and Moysin On The Contracting Muscle Membrane (수축중인 근육막에서 actin과 myosin 결합의 구조변화에 관한 연구)

  • Kim, Duck-Sool;Park, Keun-Ho
    • Journal of the Korean Applied Science and Technology
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    • v.25 no.3
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    • pp.380-387
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    • 2008
  • The effects of the applied stretch and MgADP binding on the structure of the actin and myosin cross-bridges in rabbit fibers in the rigor state have been investigatedwith improved resolution by x-ray diffraction using synchrotron radiation. To clarify the structure of the ATP hydrolysis intermediates formed by actin and myosin cross-bridges,the effects of various phosphate analogs in the of MgADP on the structure of the thin and thick filaments in glycerinated rabbit muscle fibers in the rigor state investigated by x-ray diffraction with a short exposure time using synchrotron radiation. These results strongly suggest that when MgADP and phosphate analogs such as metallofluorides(BeF3 and AlF4)and vanadate(VO4(Vi)) were added the rigor fibers in the presence of the ATP-depletion backup system, the intensities of the actin-based layer lines were markedly weakened. We found that the intensity of the 14.5 nm-based meridional reflections increase by 20-50% when phosphate analogs such as metallofluorides(BeF3 and AlF4) and vanadate(VO4(Vi)) was added to the rigor muscle.