• Title/Summary/Keyword: Surface patterning

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Soft-Lithographic Fabrication of Ni Nanodots Using Self-Assembled Surface Micelles

  • Seo, Young-Soo;Lee, Jung-Soo;Lee, Kyung-Il;Kim, Tae-Wan
    • Journal of Magnetics
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    • v.13 no.2
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    • pp.53-56
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    • 2008
  • This study proposes a simple nano-patterning process for the fabrication of magnetic nanodot arrays on a large area substrate. Ni nanodots were fabricated on a large area (4 inches in diameter) Si substrate using the soft lithographic technique using self-assembled surface micelles of Polystyrene-block-Poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer formed at the air/water interface as a mask. The hexagonal array of micelles was successfully transferred to a Ni thin film on a Si substrate using the Langmuir-Blodgett technique. After ion-mill dry etching, a magnetic Ni nanodot array with a regular hexagon array structure was obtained. The Ni nanodot array showed in-plane easy axis magnetization and typical soft magnetic properties.

A NUMERICAL STUDY ON A THIN FILM MANUFACTURING PROCESS USING THE CONTROL OF SURFACE ENERGY OF A MICRODROPLET (미세액적의 표면에너지 제어를 통한 박막 제조 공정에 대한 연구)

  • Suh, Y.;Son, G.
    • 한국전산유체공학회:학술대회논문집
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    • 2008.03a
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    • pp.221-226
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    • 2008
  • Numerical simulation is performed for microdroplet deposition on a pre-patterned micro-structure. The level-set method for tracking the liquid-gas interface is extended to treat the immersed (or irregular-shaped) solid surface. The no-slip condition at the fluid-solid interface as well as the matching conditions at the liquid-gas interface is accurately imposed by incorporating the ghost fluid approach based on a sharp-interface representation. The method is further extended to treat the contact angle condition at an immersed solid surface. The present computation of a patterning process using microdroplet ejection demonstrates that the multiphase characteristics between the liquid-gas-solid phases can be used to improve the patterning accuracy.

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A NUMERICAL STUDY ON A THIN FILM MANUFACTURING PROCESS USING THE CONTROL OF SURFACE ENERGY OF A MICRODROPLET (미세액적의 표면에너지 제어를 통한 박막 제조 공정에 대한 연구)

  • Suh, Y.;Son, G.
    • 한국전산유체공학회:학술대회논문집
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    • 2008.10a
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    • pp.221-226
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    • 2008
  • Numerical simulation is performed for microdroplet deposition on a pre-patterned micro-structure. The level-set method for tracking the liquid-gas interface is extended to treat the immersed (or irregular-shaped) solid surface. The no-slip condition at the fluid-solid interface as well as the matching conditions at the liquid-gas interface is accurately imposed by incorporating the ghost fluid approach based on a sharp-interface representation. The method is further extended to treat the contact angle condition at an immersed solid surface. The present computation of a patterning process using microdroplet ejection demonstrates that the multiphase characteristics between the liquid-gas-solid phases can be used to improve the patterning accuracy.

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Cu Electrode Fabrication by Acid-assisted Laser Processing of Cu Nanoparticles and Application with Transparent·Flexible Electrode (구리 나노 입자에 산-보조 레이저 공정을 적용한 구리 전극 제작 공정 개발 및 투명·유연 전극으로 활용)

  • Jo, Hyeon-Min;Gwon, Jin-Hyeong;Ha, In-Ho;Go, Seung-Hwan
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2018.06a
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    • pp.121-121
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    • 2018
  • Copper is a promising electronic material due to low cost and high electrical conductivity. However, the oxidation problem in an ambient condition makes a crucial issue in practical applications. In here, we developed a simple and cost-effective Cu patterning method on a flexible PET film by combining a solution processable Cu nanoparticle patterning and a low temperature post-processing using acetic acid treatment, laser sintering process and acid-assisted laser sintering process. Acid-assisted laser sintering processed Cu electrode showed superior characteristics in electrical, mechanical and chemical stability over other post-processing methods. Finally, the Cu electrode was applied to the flexible electronics applications such as flexible and transparent heaters and touch screen panels.

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The ablation of ITO thin films by KrF Eximer laser and its characteristics (KrF 엑시머 레이저에 의한 ITO 박막의 어블레이션과 표면특성관찰)

  • Lee, Kyoung-Cheol;Lee, Cheon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.11a
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    • pp.511-514
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    • 2000
  • This work aimed to develop ITO (Indium Tin Oxide) thin films ablation with a KrF Eximer laser required for the application in flat panel display, especially patterning into small geometry on a large substrate area. The threshold fluence for ablating ITO on glass substrate is about 0.1 J/cm$^2$. And its value is much smaller than using third harmonic Nd:YAG laser. Through the optical microscope measurement the surface color of the damaged ITO is changed into dark brown and irradiated spot is completely isolated form the undamaged surroundings by laser light. The XPS analysis showed that the relative surface concentration of Sn and In were essentially unchanged (In :Sn=5:1) after irradiating Eximer laser. Using aluminium mask made by second harmonic Nd:YAG laser the ITO patterning is carried out.

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The UV Laser Ablation of Cr film on Glass Substrate (UV레이저를 이용한 Cr 박막의 어블레이션)

  • Yoon, Kyung-Ku;Lee, Seong-Kuk;Kim, Jae-Gu;Choi, Doo-Sun;Whang, Kyung-Hyun;Jung, Jae-Kyoung;Jang, Won-Suk;Na, Suck-Joo
    • Journal of the Korean Society for Precision Engineering
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    • v.17 no.8
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    • pp.134-139
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    • 2000
  • In order to understand the removal mechanism and seek the optimal conditions. KrF excimer laser ablation of Cr films on glass substrates is investigated. The surface morphology of the laser-irradiated spot is examined by SEM. The measured single-shot ablation rate is found to be about two times the result of numerical analysis based on a surface vaporization model and heat conduction theory. Surface morphology examination indicates that the Cr film is removed by the sequence of melting-surface vaporization-,melt expulsion by plasma recoil and that the outmost ripple of the diffraction pattern gives a strong effect on the morphology of molten Cr during the melting and vaporization processes. To seek the optimal process parameters for micro patterning morphological investigation is carried out experimentally on samples having different chromium film thicknesses. Optimal processing conditions are determined to enhance the accuracy and quality of thin film removal for micro patterning.

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Novel Method to Form Metal Electrodes by Self-Alignment and Self-Registration Processes

  • Shin, Dong-Youn
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1197-1199
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    • 2009
  • Self-alignment for the fabrication of printed thin film transistors has become of great interest because of the resolution and registration limits of printing technologies. In this work, self-patterning and selfregistration processes are introduced, which do not need surface energy patterning and the resulting minimum gate channel length could be down to $11.2{\mu}m$ with the sheet resistance of 2.6 ${\Omega}/{\square]$ for the source and drain electrodes.

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Fabrication of the Printed Circuit Board by Direct Photosensitive Etch Resist Patterning (감광성 에칭 레지스트의 잉크젯 인쇄를 이용한 인쇄회로 기판 제작)

  • Park, Sung-Jun;Lee, Ro-Woon;Joung, Jae-Woo
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.5
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    • pp.97-103
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    • 2007
  • A novel selective metallization process to fabricate the fine conductive line based on inkjet printing has been investigated. Recently, Inkjet printing has been widely used in flat panel display, electronic circuits, biochips and bioMEMS because direct inkjet printing is an alternative and cost-effective technology for patterning and fabricating objects directly from design without masks. The photosensitive etching resist used in this process is an organic polymer which becomes solidified when exposed to ultraviolet lights and has high viscosity at ambient temperature. A piezoelectric-driven inkjet printhead is used to dispense 20-30 ${\mu}m$ diameter droplets onto the copper substrate to prevent subsequent etching. Repeatability of circuitry fabrication is closely related to the formation of steady droplets, adhesion between etching resist and copper substrate. Therefore, the ability to form small and stable droplets and surface topography of the copper surface and chemical attack must be taken into consideration for fine and precise patterns. In this study, factors affecting the pattern formation such as adhesion strength, etching mechanism, UV curing have been investigated. As a result, microscale copper patterns with tens of urn high have been fabricated.

Study on Indirect Laser Patterning for Manufacturing the Printing Roll (인쇄용 롤 제작을 위한 간접식 레이저 패터닝에 관한 연구)

  • Kang, Heeshin;Noh, Jiwhan;Suh, Jeong
    • Laser Solutions
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    • v.15 no.4
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    • pp.12-15
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    • 2012
  • On behalf of the existing semiconductor process, the electronic devices to low-cost mass production to mass print the way, the research for development of roll-to-roll printing process is actively underway. This study was performed in about the research on the manufacturing technology of the printing roll used in the printing process of electronic devices. The indirect laser imprinting technology was used to create printable roll, and after coating copper on the surface of steel and thereon after coating polymer, after removing the polymer on the surface of roll, the printable roll was made. The laser system and roll feeder system were constructed and control program was developed. We has found the optimal conditions to perform laser patterning experiments using a system developed and We can make the minimum line width of 18 ${\mu}m$.

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Grinding Technology for Surface Texturing (연삭기법을 이용한 패터닝 기술)

  • Ko, Tae Jo;Han, Do Sup;Qiu, Kang;Park, Jong-Kweon
    • Journal of the Korean Society for Precision Engineering
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    • v.31 no.5
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    • pp.367-373
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    • 2014
  • Surface texturing is a machining process on the surface to give engineering functions. The representative process of the surface texturing is lotus effect to give hydrophobic property by the lithography and chemical etching, which is the bio mimic from the nature. Surface texturing can be manufactured by a lot of processes, in particular using mechanical method such as a precise diamond turning, grinding, rolling, embossing, vibrorolling, and abrasive jet machining (AJM). Among them, the grinding process is notable in terms of the wide range of texturing area and fast processing time. The patterning by grinding is done by the grooved grinding wheel on the work piece. In this case, the pattern shape is determined by the grinding conditions as well as the wheel dressing conditions. In this paper, experimental study on the pattern shapes were done and provide the feasibility in use for the large area patterning.