• 한국재료학회지
• /
• 제11권6호
• /
• pp.527-532
• /
• 2001

O$_2$plasma와 H(hfac)을 이용한 Cu 박막의 건식 식각을 조사하였다. 휘발성이 큰 Cu(hfac)$_2$와 $H_2O$를 탈착시키기 위하여 $O_2$ Plasma를 이용한 Cu 박막의 산화와 생성된 Cu 산화막을 H(hfac)과의 반응으로 제거하는 공정으로 식각을 수행하였다. Cu 박막의 식각율은 50-700 /min의 범위를 보였으며, 기판온도, H(hfac)/O$_2$ 유량비, plasma power에 따라 변하였다. Cu 박막의 식각율은 기판온도 215$^{\circ}C$보다 높은 온도구간에서 RF power가 증가함에 따라 증가하였고, 산화 공정과 H (hfac)과의 반응이 균형을 이루는 최적의 H (hfac)/O$_2$ 유량비는 1:1임을 확인하였다. Ti mask를 사용한 Cu Patterning은 유량비 1 : 1, 기판온도 25$0^{\circ}C$에서 실시하였고, 30$^{\circ}$외 taper slope를 갖는 등방성 etching profile을 얻을 수 있었다. Taper angle을 갖는 Cu 건식 patterning은 고해상도의 대면적 thin film transistor liquid-crystal(TFT-LCDs)를 위래 필요한 것으로써 기판온도, RF power, 유량비를 조절한 one-step 공정으로부터 성공적으로 얻을 수 있었다.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
• /
• pp.919-921
• /
• 2005

We describe that an elastomeric stamp of poly(dimethylsiloxane) (PDMS) can modify the surface energy of some surfaces when brought into conformal contact with the number of stamping. We focus on an increase of the hydrophobicity of the patterned surface due to diffusion of low molecular weight (LMW) silicone polymer chains. The transfer of PDMS to the surface during patterning is relevant to and calls for attention by those who are using this method in applications where control of the surface chemistry is of importance for the application.

• Macromolecular Research
• /
• 제17권3호
• /
• pp.197-202
• /
• 2009

Solution-based, direct-write patterning by an automated, computer-controlled, inkjet technique is of particular interest in a wide variety of industrial fields. We report the construction of three-dimensional (3D), micro-patterned structures by polymer inkjet printing. A piezoelectric, drop-on-demand (DOD) inkjet printing system and a common polymer, PVA (poly(vinyl alcohol)), were explored for 3D construction. After a systematic preliminary study with different solvent systems, a mixture of water and DMSO was chosen as an appropriate solvent for PVA inks. The use of water as a single solvent resulted in frequent PVA clogging when the nozzles were undisturbed. Among the tested polymer ink compositions, the PVA inks in a water/DMSO mixture (4/1 v/v) with concentrations of 3 to 5 g/dL proved to be appropriate for piezoelectric DOD inkjet printing because they were well within the proper viscosity and surface tension range. When a dot was printed, the so-called 'coffee-ring effect' was significant, but its appearance was not prominent in line printing. The optimal polymer inkjet printing process was repeated slice after slice up to 200 times, which produced a well-defined, 3 D micro-patterned surface. The overall results implied that piezoelectric DOD polymer inkjet printing could be a powerful, solid-freeform, fabrication technology to create a controlled 3D architecture.

• 한국재료학회:학술대회논문집
• /
• 한국재료학회 2009년도 추계학술발표대회
• /
• pp.33.2-33.2
• /
• 2009

Block copolymer lithography has attracted great attention for emerging nanolithography since nanoscaleperiodic patterns can be easily obtained through self-assembly process without conventional top-down patterning process. Since the morphologies of self-assembled block copolymer patterns are strongly dependent on surface energy of a substrate, suitable surface modification is required. Until now, the surface modification has been studied by using random copolymer or self-assembled mono layers (SAMs). However, the research on surface modifications has been limited within several substrates such as Si-based materials. In present study, we investigated the formation of block copolymer on Au substrate by $O_2$ plasma treatment with the SAM of 3-(p-methoxy-phenyl)propyltrichloro-silane [MPTS, $CH_3OPh(CH_2)_3SiCl_3$]. After $O_2$ plasma treatment, the chemical bonding states of the surface were analyzed by X-ray photoelectron spectroscopy (XPS). The static contact angle measurement was performed to study the effects of $O_2$ plasma treatment on the formation of MPTS monolayer. The block copolymer nanotemplates formed on Au surface were analyzed by scanning electron microscopy. The results showed that the ordering of self-assembled block copolymer pattern and the formation of cylindrical nano hole arrays were enhanced dramatically by oxygen plasma treatment. Thus, the oxidation of gold surface by $O_2$ plasma treatment enables the MPTS to form the monolayer assembly leading to surface neutralization of gold substrates.

• 한국레이저가공학회지
• /
• 제11권1호
• /
• pp.1-6
• /
• 2008

We proposed new light guide panel (LGP) fabrication method exploiting laser-processed inner scatterers and surface pattern. The proposed method has achieved LGP performance improvement in both brightness and uniformity. The inner scatterers and surface pattern of grid type were fabricated with a 2nd harmonic Nd:YAG pulse laser engraving system and a $CO_2$ laser scanning system, respectively. In the implementation of LGP, inner scatterers was arranged in accordance with linear or curved pattern with changing density and surface pattern was engraved on the surface of an inner-scatterers embedded LGP. The increase of scatterers' density and the use of surface patterns in both linear and curved pattern provided high luminance and uniformity enhancement. While thecurved pattern incorporated with increased scatterers' density and surface patterns yielded brightness improvement with preserving good uniformity, the linear pattern showed highly localized brightness near the light entrance of the LGP. We can also observe that the uniformity was mainly determined by pattern of inner scatterers, and the brightness was improved by the higher density and the utilization of surface patterns. From the results, the use of laser-processed inner and surface patterns can be a potential alternative for efficient and simple LGP fabrication method.

• 대한기계학회논문집B
• /
• 제36권12호
• /
• pp.1171-1176
• /
• 2012

실리콘 기판 위에 플라즈마 기상층착법을 이용하여 합성된 탄소나노튜브를 화학적인 방법이나 전자빔 혹은 이온빔과 같은 진공 챔버 내에서의 공정없이 펨토초레이저를 이용하여 선택적으로 패터닝 하는 방법을 구현하였다. 플라즈마 기상층착법으로 합성된 탄소나노튜브는 수직성장이 가능하며 탄소나노튜브 간의 간격을 조절하여 성장이 가능하다. 이러한 장점으로 전계방출소자, 바이오센서 등의 응용을 위하여 이용되는 합성 방법이다. 이러한 응용을 위하여 선택적으로 나노튜브를 제거하고 탄소나노튜브 끝의 촉매금속을 제거하는 것이 응용의 효율을 높이는데 매우 중요하다. 본 연구에서는 탄소나노튜브의 전기적, 구조적 특성에 영향을 줄 수 있는 화학적인 방법을 사용하지 않고 펨토초레이저를 사용하여 패터닝과 촉매금속을 제거하는 방법을 구현하였다.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
• /
• pp.436-437
• /
• 2012

Double patterning technology (DPT) has been suggested as a promising candidates of the next generation lithography technology in FLASH and DRAM manufacturing in sub-40nm technology node. DPT enables to overcome the physical limitation of optical lithography, and it is expected to be continued as long as e-beam lithography takes place in manufacturing. Several different processes for DPT are currently available in practice, and they are litho-litho-etch (LLE), litho-etch-litho-etch (LELE), litho-freeze-litho-etch (LFLE), and self-aligned double patterning (SADP) [1]. The self-aligned approach is regarded as more suitable for mass production, but it requires precise control of sidewall space etch profile for the exact definition of hard mask layer. In this paper, we propose etch end point detection (EPD) in spacer etching to precisely control sidewall profile in SADP. Conventional etch EPD notify the end point after or on-set of a layer being etched is removed, but the EPD in spacer etch should land-off exactly after surface removal while the spacer is still remained. Precise control of real-time in-situ EPD may help to control the size of spacer to realize desired pattern geometry. To demonstrate the capability of spacer-etch EPD, we fabricated metal line structure on silicon dioxide layer and spacer deposition layer with silicon nitride. While blanket etch of the spacer layer takes place in inductively coupled plasma-reactive ion etching (ICP-RIE), in-situ monitoring of plasma chemistry is performed using optical emission spectroscopy (OES), and the acquired data is stored in a local computer. Through offline analysis of the acquired OES data with respect to etch gas and by-product chemistry, a representative EPD time traces signal is derived. We found that the SE-EPD is useful for precise control of spacer etching in DPT, and we are continuously developing real-time SE-EPD methodology employing cumulative sum (CUSUM) control chart [2].

• 한국재료학회지
• /
• 제10권2호
• /
• pp.171-174
• /
• 2000

본 연구에서는 실리콘 wafer위에 sputtering방법으로 진공증착된 CoNbZr 비정질 박막을 Nd:YAG 레이저로 식각하기 위한 실험을 했는데, 금속의 경우 표면에서 빛의 반사율이 매우 크기 때문에 파장이 $1.06{\mu\textrm{m}}$인 Nd:YAG 레이저의 에너지를 흡수하는 것이 매우 어려우므로 식각이 거의 이루어지지 않았다. 그래서 이러한 문제를 해결하기 위한 새로운 시도로서 본 연구에서는 빛의 흡수율이 좋은 검은색의 polymer막을 금속박막의 표면에 도포하고 이 polymer막 위에 레이저를 조사해서 금속박막의 식각하는 실험을 실시하였다. 기존의 방법으로는 laser power가 332W나 되는데도 식각이 거의 일어나지 않았지만 본 연구의 방법을 이용했을 때는 laser power가 114W로 1/3정도 밖에 안 되는데도 레이저 식각이 비교적 양호하게 이루어졌다. 이는 검은색의 polymer층이 Nd:YAG 레이저 에너지의 흡수 및 전달 층의 역할을 하기 때문인 것으로 생각된다.

• Journal of Korean Dental Science
• /
• 제5권1호
• /
• pp.13-20
• /
• 2012

Purpose: The purpose of this study was to investigate the effect of patterning on the stress distribution in the bone tissue using the finite element analysis (FEA) model. Materials and Methods: For optimal comparison, it was assumed that the implant was axisymmetric and infinitely long. The implant was assumed to be completely embedded in the infinitely long cortical bone and to have 100% bone apposition. The implant-bone interface had completely fixed boundary conditions and received an infinitely big axial load. von Mises stress and maximal principal stress were analyzed. Conventional thread and 2 or 3 patterns on the upper and lower flank of the thread were compared. Result: The surface areas of patterned implants were increased up to 106~115%. The thread with patterns distributed stress better than conventional thread. Patterning in threads may produce more stress in the implant itself, but reduce stress in the surrounding bone. Stress patterns of von Mises stress were favorable with patterns, while the maximal principal stress was increased with patterns. Patterns in the lower flank showed favorable stress distribution. Conclusion: The patterns in implant thread reduce the stress generated in surrounding bone, but the number and position of patterns were crucial factors in stress distribution.

• 한국고분자학회:학술대회논문집
• /
• 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
• /
• pp.1-2
• /
• 2006

Polymer architecture plays a great role in determining the properties of functional polymers. This lecture will explore the design and the synthesis of polymers with controlled architecture and functionality. Especially featured will be star and dendritic architectures where the functional group placement and the molecular shape can be controlled. This will be followed by examples of applications illustrated with a few model systems of functional polymers designed for use in areas such as organic electronics, catalysis, surface patterning, separation and molecular recognition, and polymer therapeutics.