• 한국표면공학회지
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• 제56권4호
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• pp.250-258
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• 2023

Ceramic oxide layer was formed on the surface of high silicon aluminum alloy by using PEO (plasma electrolytic oxidation) process. The microstructure of the oxide layer was analyzed using scanning electron microscopy (SEM) and x-ray diffraction patterns (XRD). The high silicon aluminum alloy prior to PEO process consists of Al, Si and Al₂Cu phases in XRD analysis, whereas Al₂Cu phase selectively disappeared after PEO treatment. Considerable decrease of relative intensity in most of peaks in XRD results of the high silicon aluminum alloy treated by PEO process was observed. It may be attributed to the formation of amorphous phases after PEO treatment. The corrosion behavior of the high silicon aluminum alloy treated by PEO process was investigated using electrochemical impedance spectroscopy (EIS) and other electrochemical techniques (i.e., open circuit potential and polarization curve). Electroanalytical studies indicated that the high silicon aluminum alloy treated by PEO process shows greater corrosion resistance than that untreated by PEO process.

• Journal of Advanced Marine Engineering and Technology
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• 제40권8호
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• pp.692-697
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• 2016

This study investigated the effect of surface roughness of zinc oxide (ZnO) layer on the growth of polycrystalline Si layer via an Al-induced layer exchange process. It was found that the growth rate, grain size, crystallization fraction, and preferential orientation of the polycrystalline Si layer were strongly influenced by the surface roughness of the underlying ZnO layer. As the roughness of the ZnO surface increased, a higher growth rate (~40 min) and preferential Si (100) orientation were obtained because of the spatial concentration fluctuations in the Al-Si alloy, induced by the surface roughness of the underlying ZnO layer.

• 한국재료학회지
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• 제33권7호
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• pp.309-314
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• 2023

This study aimed to address the limitations of traditional plasma nitriding methods by implementing a short-term plasma oxy-nitriding treatment on the surface of AISI 420 martensitic stainless steel. This treatment involved the sequential formation of nitride and oxide layers, to enhance surface hardness and corrosion resistance, respectively. The process resulted in the formation of a 20 ㎛-thick nitride layer and a 3 ㎛-thick oxide layer on the steel surface. Initially, the hardness increased by 2.2 times after nitriding, followed by a subsequent decrease of approximately 31 % after oxidation. While the nitriding process reduced corrosion resistance, the subsequent oxidation process led to the formation of a passive oxide film, effectively resolving this issue. The pitting corrosion of the oxide passive film started at 82.6 mVssc, providing better corrosion resistance characteristics than the nitride layer. Consequently, the trade-off between surface hardness and corrosion resistance in plasma oxy-nitrided AISI 420 martensitic stainless steel is anticipated to be recognized as an innovative and comprehensive surface treatment process for biomedical components.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 2002년도 proceedings of the second asia international conference on tribology
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• pp.179-180
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• 2002

In this study. the friction transition diagram based on the effect of oxide layer formation on contact surface between TiN coated steel ball and uncoated steel disk was constructed. From the diagram. it can be seen that as the contact load increases. the contact number of cycle at the beginning of oxide layer formation decreases linearly and as the coating thickness increases and the surface roughness of steel disk increases under same contact load. that increases. For the coated ball specimen, a AISI 52100 steel ball was used and AISI 1045 steel was used for the disk counter part.

• 한국진공학회지
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• 제3권4호
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• pp.414-419
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• 1994

알루미늄 박편 위에 Pt/$Al_2O_3$ 모델 촉매를 만들었다. 알루미늄 표면을 $10 ^5Torr$의 산소 압력 하에서 산화시킨후 plasma evaporation source를 사용하여 Pt을 증착시켰다. 이 모델 촉매 표면에서 일 어나는 1-butene 의 반응을 연구하였다. 산화알루미늄 표면에서는 이성질화 반응이 일어 났으나 Pt을 증착시킨 산화알루미늄 표면에서는 수소첨가반응이 일어남이 관찰되었다. 알루미나 표면의 Pt이 증가함 에 따라 수소첨가반응으로서 선택성이 증가되었다.

• 전기화학회지
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• 제6권2호
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• pp.158-160
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• 2003

We have reported to make nanostructured cobalt oxide electrode that have large capacitance over than 400 F/g (specific capacitance) and good cycleability. But, it had serious demerits of low voltage range under 0.5 V and low power density. Therefore, we need to increase voltage range of cobalt oxide electrode. We report here on the electrochemical properties of sol-gel-derived nanoparticulate cobalt xerogel in 1M KOH solution and aqueous polymeric gel electrolyte. In solution electrolyte, cobalt oxide electrode had over 250 F/g capacitance consisted of EDLC and pseudocapacitance. In gel electrolyte, cobalt oxide electrode had around 100 F/g capacitance. This capacitance was only electric double layer capacitance of active surface area. In solution electrolyte, potassium ion as working ion reacted with both of layers easily. However, In gel electrolyte, reacted with only surface-active layer. Itis very hard to reach resistive layer. So, we have studied on pretreatment of electrode to contain working ions easily. We'll report more details.

• Journal of Welding and Joining
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• 제19권3호
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• pp.305-310
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• 2001

UBM-coated Si-wafer was fluxlessly soldered with glass substrate in $N_2$ atmosphere using plasma cleaning method. The bulk Sn-37wt.%Pb solder was rolled to the sheet of $100\mu\textrm{m}$ thickness in order to bond a solder disk by fluxless 1st reflow process. The oxide layer on the solder surface was analysed by AES(Auger Electron Spectroscopy). Through rolling, the oxide layer on the solder surface became thin, and it was possible to bond a solder disk on the Si-wafer with fluxless process in $N_2$ gas. The Si-wafer with a solder disk was plasma-cleaned in order to remove oxide layer formed during 1st reflow and soldered to glass by 2nd reflow process without flux in $N_2$ atmosphere. The thickness of oxide layer decreased with increasing plasma power and cleaning time. The optimum plasma cleaning condition for soldering was 500W 12min. The joint was sound and the thicknesses of intermetallic compounds were less than $1\mu\textrm{m}$.

• ETRI Journal
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• 제31권6호
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• pp.653-659
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• 2009

We have investigated the channel protection layer (PL) effect on the performance of an oxide thin film transistor (TFT) with a staggered top gate ZnO TFT and Al-doped zinc tin oxide (AZTO) TFT. Deposition of an ultra-thin PL on oxide semiconductor films enables TFTs to behave well by protecting the channel from a photo-resist (PR) stripper which removes the depleted surface of the active layer and increases the carrier amount in the channel. In addition, adopting a PL prevents channel contamination from the organic PR and results in high mobility and small subthreshold swings. The PL process plays a critical role in the performance of oxide TFTs. When a plasma process is introduced on the surface of an active layer during the PL process, and as the plasma power is increased, the TFT characteristics degrade, resulting in lower mobility and higher threshold voltage. Therefore, it is very important to form an interface using a minimized plasma process.

• 열처리공학회지
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• 제25권5호
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• pp.227-232
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• 2012

Magnesium alloy have good physical properties such as good castability, good vibration absorption, high strength/weight ratios. Despite the desirable properties, the poor resistance of Mg alloy impedes their use in many various applications. Therefore, magnesium alloy require surface treatment to improve hardness, corrosion and wear resistance. Plasma Electrolytic Oxidation (PEO) is one the surface treatment methods to form oxide layer on Mg alloy in alkali electrolyte. In comparison with Anodizing, there is environmental process having higher hardness and faster deposition rate. In this study, the characteristics of oxide film were examined after coating the AZ31 Mg alloy through the PEO process. We changed concentration of sodium aluminate into $K_2ZrF_6$, KF base electrolyte. The morphologies of the coating layer were characterized by using scanning electron microscopy (SEM). Corrosion resistance also investigated by potentiodynamic polarization analysis. As a result, propertiy of oxide layer were changed by concentration of sodium aluminate. Increasing with concentration of sodium aluminate in electrolyte, the oxidation layer was denser and the pore size was smaller on the surface.

• Bulletin of the Korean Chemical Society
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• 제20권11호
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• pp.1340-1344
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• 1999

The electrochemical behavior of oxide layers on aluminium was studied using electrochemical impedance spectroscopy. Impedance spectra were taken at a compact and a porous oxide layer of Al. The anodic films on Al have a variable stoichiometry with gradual reduction of oxygen deficiency towards the oxide-electrolyte interface. Thus, the interpretation of impedance spectra for oxide layers is complicated, with the impedance of surface layers differing from those of ideal capacitors. This layer behavior with conductance gradients was caused by an inhomogeneous dielectric. The frequency response cannot be described by a single RC element. The oxide layers of Al are properly described by the Young model of dielectric constant with a vertical decay of conductivity.