• Title/Summary/Keyword: Surface films

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Formation of Superhydrophobic Surfaces on Fluoropolymer Films Using Ion Implantation

  • Park, Yong-Woon;Jo, Yong-Jun;Jung, Chan-Hee;Hwang, In-Tae;Choi, Jae-Hak
    • Journal of Radiation Industry
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    • v.6 no.4
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    • pp.323-328
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    • 2012
  • In this study, a facile method to fabricate superhydrophobic surfaces on perfluoroalkoxy (PFA) films using ion implantation was developed. PFA films were implanted at 100 keV with a fluence ranging from $4{\times}10^{16}$ to $7{\times}10^{16}ions\;cm^{-2}$. The surface properties of the implanted films were investigated in terms of their surface morphology, wettability, and chemical composition. As the fluence increased to $6{\times}10^{16}ions\;cm^{-2}$, the surface morphology and surface roughness of the PFA films were dramatically changed. The PFA surface implanted at a fluence of $6{\times}10^{16}ions\;cm^{-2}$ showed a maximum contact angle (CA) of $157.1^{\circ}$, while the control CA of the smooth PFA surface was $103.6^{\circ}$. Thus, the superhydrophobic surface was successfully fabricated by ion implantation.

Effects of metal dopant content on mechanical properties of Ti-Cu-N films

  • Hyun S. Myung;Lee, Hyuk M.;Kim, Sang S.;Jeon G. Han
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2001.11a
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    • pp.37-37
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    • 2001
  • TiN coatings were applied for VarIOUS application fields, because of a good wear-resistance and a high hardness. Typically, TiN thin films show the hardness of 25GPa and friction coefficient of 0.6. However, in many field, one is looking for a more improved tool which has low friction coefficient and high wear resistance. The main motivation of this study is to characterize the influence of copper dopant content on TiN thin films. Ti-Cu-N thin films were deposited onto D2 steel substrates by PVD processing with various magnetron current densities (Cu contents). In this work, we synthesized titanium nitride films similar with reported typical titanium nitride films and synthesized Ti-Cu-N thin films with the addition of elemental copper which is measured improved hardness more than pure TiN films with copper content variables. This films has preferred oriented films of (111) direction. In addition, It was found that there is a strong correlation between content of various metal and film characteristics such as preferred orientation, grain size, hardness and friction coefficient and so, in future study, improved mechanical properties of TiN films can be controlled by change in target current density. The Ti-Cu-N film will show apparent hardness improvement and mechanical properties enhancement, when doping element is added onto TiN thin films. Film structure, chemical composition, mechanical properties were investigated by means of X-ray diffraction(XRD), scanning electron microscopy(SEM), transmission electron microscopy (TEM), energy dispersive spectroscopy(EDS), wear resistance tester and nanohardness tester.

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Preparation and Characterization of IZO Thin Films grown by DC Magnetron Sputtering (DC 마그네트론 스퍼터링을 이용한 IZO 박막의 제조와 특성 연구)

  • Park Chang-Ha;Lee Hak-Jun;Kim Hyeon-Boum;Kim Dong-Ho;Lee Gun-Hwan
    • Journal of the Korean institute of surface engineering
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    • v.38 no.5
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    • pp.188-192
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    • 2005
  • Indium zinc oxide (IZO) thin films were deposited on glass substrate by dc magnetron sputtering. The effects of oxygen flow rate and deposition temperature on electrical and optical properties of the films were investigated. With addition of small amount of oxygen gas, the characteristic properties of amorphous IZO films were improved and the specific resistivity was about $4.8{\times}10^{-4}\Omega{\cdot}cm$. Change of structural properties according to the deposition temperature was observed with XRD, SEM, and AFM. Films deposited above $300^{\circ}C$ were found to be polycrystalline. Surface roughness of the films was increased due to the formation of grains on the surface. Electrical conductivity became deteriorated for polycrystalline IZO films. Consequently, high quality IZO films could be prepared by do sputtering with $O_{2}/Ar{\simeq}0.03$ and deposition temperature in range of $150\~200^{\circ}C$; a specific resistivity of $3.4{\times}10^{-4}{\Omega}{\cdot}cm$, an optical transmission over $90\%$ at wavelength of 550 nm, and a rms value of surface roughness about $3{\AA}$.

Novel Methods for Measuring the Surface Hardness of Anodic Oxide Films on Aluminum Alloy (알루미늄 합금 양극산화피막의 표면경도 측정법)

  • Moon, Sungmo
    • Journal of the Korean institute of surface engineering
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    • v.53 no.1
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    • pp.36-42
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    • 2020
  • In this study, two novel methods to measure the surface hardness of anodic oxide films on aluminum alloys are reported. The first method is to impregnate oil-based ink into pores in the anodic oxide film and then to clean the ink on the surface using ethanol, resulting in an impregnation of inks only inside of the pores in anodic oxide film. The second method is to coat the anodic oxide film surface with thin Au layer less than 0.1 ?. Both the ink-impregnating method and Au-coating method provided clear indentation marks on the anodic oxide film surface when it was indented using a pyramidal-diamond penetrator. Thus, Vickers hardness of anodic oxide films on aluminium alloy could be measured successfully and precisely from the anodic film surface. In addition, advantages and disadvantages of the ink-impregnating method and Au-coating method for the measurement of surface hardness of anodic oxide films are discussed.

A Composite of Metal and Polymer Films: Thin Nickel Film Coated on a Polypropylene Film after Atmospheric Plasma Induced Surface Modification

  • Song, Ho-Shik;Choi, Jin-Moon;Kim, Tae-Wan
    • Transactions on Electrical and Electronic Materials
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    • v.12 no.3
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    • pp.110-114
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    • 2011
  • Polymeric films of high chemical stability and mechanical strength covered with a thin metallic film have been extensively used in various fields as electric and electronic materials. In this study, we have chosen polypropylene (PP) as the polymer due to its outstanding chemical resistance and good creep resistance. We coated thin nickel film on PP films by the electroless plating process. The surfaces of PP films were pre-treated and modified to increase the adhesion strength of metal layer on PP films, prior to the plating process, by an environment-friendly process with atmospheric plasma generated using dielectric barrier discharges in air. The surface morphologies of the PP films were observed before and after the surface modification process using a scanning electron microscope (SEM). The static contact angles were measured with deionized water droplets. The cross-sectional images of the PP films coated with thin metal film were taken with SEM to see the combined state between metallic and PP films. The adhesion strength of the metallic thin films on the PP films was confirmed by the thermal shock test and the cross-cutting and peel test. In conclusion, we made a composite material of metallic and polymeric films of high adhesion strength.

Optical Properties of PVA Polarizing Films Surface-modified by UV Irradiation (자외선 조사에 의해 표면 개질된 PVA 편광필름의 광학특성)

  • Koo, Gwang-Hoe;Jang, Jin-Ho
    • Textile Coloration and Finishing
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    • v.18 no.6 s.91
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    • pp.49-56
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    • 2006
  • Surface treatment using UV irradiation was carried out to improve optical properties of polarizing films. The effects of UV energy of the UV-treated PVA films were investigated by measuring reflectance, surface roughness, contact angles, ESCA, and ATR. Reflectance decreased at wavelength of 450 nm or less and surface roughness increased with increasing UV energy. Water contact angle increased in the irradiated PVA films and surface energy decreased with increase in w energy. An analysis showed that the OH groups were broken and some new groups were introduced such as C=C and C=O bonds together with increased $O_{1s}/C_{1s}$, resulting in the observed surface modification effect. Surface modified PVA polarizing films showed improvement in light transmittance of polarizing films at high wavelength region without deteriorating polarization efficiency, which was not affected by UV irradiation sequence during manufacturing processes such as coloring and drawing.

Dielectric Breakdown Behavior of Anodic Oxide Films Formed on Pure Aluminum in Sulfuric Acid and Oxalic Acid Electrolytes

  • Hien Van Pham;Duyoung Kwon;Juseok Kim;Sungmo Moon
    • Journal of the Korean institute of surface engineering
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    • v.56 no.3
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    • pp.169-179
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    • 2023
  • This work studies dielectric breakdown behavior of AAO (anodic aluminum oxide) films formed on pure aluminum at a constant current density in 5 ~ 20 vol.% sulfuric acid (SA) and 2 ~ 8 wt.% oxalic acid (OA) solutions. It was observed that dielectric breakdown voltage of AAO film with the same thickness increased with increasing concentration of both SA and OA solutions up to 15 vol.% and 6 wt.%, respectively, above which it decreased slightly. The dielectric breakdown resistance of the OA films appeared to be superior to that of SA films. After dielectric breakdown test, cracks and a hole were observed. The crack length increased with increasing SA film thickness but it did not increase with increasing OA film thickness. To explain the reason why shorter cracks formed on the OA films than the SA films after dielectric breakdown test, the generation of tensile stresses at the oxide/metal interface was discussed in relation to porosity of AAO films obtained from cross-sectional morphologies.

Surface Morphology and Magnetic Properties of NiFe Thin Films (NiFe 박막의 표면형상과 자기특성)

  • 이원재;백성관;민복기;송재성;김현식;이동윤
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.519-522
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    • 2000
  • The correlation of surface morphology and magnetic property of NiFe thin films on Si(001) deposited by RF-magnetron sputter has been investigated, using AFM, XRD and MR measurements. During short field annealing for 15 min, there was no significant change in XRD patterns of NiFe thin films. However, the degree of surface roughness was changed with increasing annealing temperature. With variation of surface roughness, there was significant difference in MR characteristics of NiFe thin films. In the case of as-deposited NiFe thin films(T$\_$G/ = 150$^{\circ}C$) and UFA400 (T$\_$A/ = 400$^{\circ}C$) having smooth surface, good linearity of MR Curve was observed.

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Grain Boundary Characteristics and Stress-induced Damage Morphologies in Sputtered and Electroplated Copper Films (스퍼터링 및 전기 도금으로 제조된 구리 박막에서의 표면 결함에 미치는 결정립계의 영향)

  • Park, Hyun;Hwang, Soo-Jung;Joo, Young-Chang
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2003.05a
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    • pp.4-4
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    • 2003
  • Various Cu films were fabricated using sputtering and electroplating with and without additive, and their surface damages after annealing were investigated. After annealing at 43SoC, the difference between damage morphologies of the films was observed. In some films stress-induced grooves along the grain boundaries were observed, while in the others voids at the grain boundary triple junctions were observed. It was also observed that the stress-induced groove was formed along the high energy grain boundaries. It was found out that the difference of the morphologies of surface damages in Cu films depends on not process type but grain boundary characteristics. To explain the morphological difference of surface damages, a simple parameter considering the contributions of grain structures and grain boundary characteristics to surface and grain boundary diffusions is suggested. The effective grain boundary area, which is a function of grain size, film thickness and the fraction of high energy grain boundaries, played a key role in the morphological difference.

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Adhesion of Human Osteoblasts Cell on TiN Thin Film Deposited by Cathodic Arc Plasma Deposition

  • Pham, Vuong Hung;Kim, Sun-Kyu;Le, Vinh Van;Kwon, Byoung-Se
    • Journal of the Korean institute of surface engineering
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    • v.41 no.6
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    • pp.264-268
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    • 2008
  • Interaction between human osteoblast and TiN films was conducted in vitro. TiN films were produced by cathodic arc plasma deposition. The surface was characterized by atomic force microscopy (AFM). TiN films, glass substrates and Ti films were cultured with human osteoblasts for 48 and 72 h hours. Actin stress fiber patterns and microtubules of osteoblasts were found slightly more organized and distributed on TiN films compared to those on the Ti films and the glass substrates. Human osteoblasts also showed slightly higher cell attachment, proliferation, and focal contact adhesion on TiN films compared to those on Ti films and glass substrates. Our results demonstrated that TiN films showed slightly better cellular adhesion of osteoblasts than Ti films and glass substrates in a short-time culture period.