• Transactions of the Korean Society of Mechanical Engineers A
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• v.38 no.8
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• pp.887-892
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• 2014

In a conventional magnetic abrasive polishing process, the polishing abrasives are mixed with ferrous particles and slight cutting oil to form a cluster of abrasives. However, when a tool rotates at a high revolution speed, most of the polishing abrasives are scattered away from it due to the increase in centrifugal force. This phenomenon directly reduces the polishing efficiency. The use of a highly viscous matter such as silicone gel instead of cutting oil for mixing is one method to solve this problem and increase abrasive adhesion. Another method to avoid high abrasive scattering is the application of wet magnetic abrasive polishing (WMAP). In WMAP, abundant mineral oil is preliminarily applied to the workpiece surface. This study experimentally evaluated the effect of WMAP on abrasive adhesion. The relationship between the amount of working abrasives and polishing conditions was characterized. Despite the lower adhesion ratio of polishing abrasives, the surface roughness was found to be significantly improved as the result of WMAP.

• Korean Journal of Optics and Photonics
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• v.16 no.2
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• pp.113-120
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• 2005

Luminous efficiency and uniformity in a LCD-BLU are mainly determined by fine scattering patterns formed on the light guide panel. We propose a novel fabrication method of 3-dimensional scattered patterns based on anisotropic etching of silicon wafers. Micro-pyramid patterns with 70.5 degree apex-angle and micro-prism patterns with 109.4 degree apex-angle can be self-constructed by the wet, anisotropic etching of (100) and (110) silicon wafers, respectively, and those patterns are easily duplicated by the PDMS replica process. Experimental results on spatial and angular distributions of irradiation from the light guide panel with the micro-pyramid patterns were very consistent with the calculation results. Surface roughness of the silicon-based micro-patterns is free from any artificial defects since the micro-patterns are inherently formed with silicon crystal surfaces. Therefore, we expect that the silicon based micro-patterning process makes it possible to fabricate perfect 3-dimensional micro-structures with crystal surface and apex angles, which may guarantee mass-reproduction of the light guide panels in LCD-BLU.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.41 no.5
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• pp.427-433
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• 2017

In the case of high-strength or low thermal conductivity material milling, tool breakage occurs easily because of the high friction temperature. Therefore, the effectiveness of the coolant supply is very important for proper tool cooling. As the manually adjustable joint mechanism nozzle is generally used for coolant supply, the cooling efficiency is very low. It also has a bad influence on the workspace environment because of coolant scattering. In this study, the milling characteristics of STS316L were investigated according to the coolant spray position based on the automatic adjustable system. Tool wear and surface roughness were measured according to the coolant spray position. Through these experiments, the effectiveness of the fabricated system was explained.

• Journal of the Korean Magnetics Society
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• v.6 no.6
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• pp.411-416
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• 1996

We have studied the effect of a spin-dependence interface electron scattering on the giant magnetoresistance by adding a Fe magnetic material to the Co/Cu interfaces. The $Fe(50\;{\AA})/[Co(17\;{\AA})/Fe(t\;{\AA})/Cu(24\;{\AA})]_{20}$ multilayers are deposited on the Corning glass 2948 and 7059 substrates in a dc magnetron sputtering system. The magnetoresistance ratio is 22 % in the only Co/Cu multilayer, while it is increased to 26 % with inserted ultra thin Fe interface layer and reduced with increasing thickness of the Fe interface layer. It was investigated to the dependence of the magnetoresistance behaviors on annealing temperature. The magnetic properties of the multilayers were measured by vibrating sample magnetometer. Also, the structures and the surface roughness of samples were characterized by X-ray diffraction and atomic force microscope, respectively. The magnetoresistance ratio was increased to annealing temperature $300^{\circ}C$, but reduced at the temperature higher than $300^{\circ}C$ due to the interfacial diffuse.

• Journal of the Society of Cosmetic Scientists of Korea
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• v.43 no.3
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• pp.247-254
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• 2017

Optical Coherence Tomography (OCT) is a non-invasive imaging method that utilizes the optical scattering and interference for visualizing the surface as well as cross-sectional structures of tissue. OCT has been used for diagnosing diseases in early stage in various medical fields, but an application in cosmetics is still at early stage. In this study, OCT was adopted to evaluate skin texture and wrinkle. Results showed similar patterns of evaluation with PRIMOS in the assessment using replica. In addition, OCT produced smaller errors at different angles compared to the PRIMOS in the assessment using 3-dimensional models of wrinkles. The resolution of the image was also high enough to differentiate the images of before and after the application of makeup products. Possible use of OCT in the evaluation of fine wrinkle assessment was studied in this research. Further development of methods is necessary to provide more evidences of the effectiveness.

• Journal of the Korean Vacuum Society
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• v.11 no.3
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• pp.176-182
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• 2002

Amorphous $TiO_2$ thin films were deposited on glass substrates by ion beam sputtering in which the ratio of $O_2$/Ar gas used as discharged gas was varied from 0 to 2. After optical and microstructure properties and chemical composition of thin films was analyzed, antireflection coating layers were fabricated with $SiO_2$/$TiO_2$ multi-layers. Thin films deposition was performed at room temperature and ion beam voltage and ion current density for sputtering of target were fixed at 1.2 kV and 200 $\mu\textrm{A}/\textrm{cm}^2$, respectively. Refractive indexs of the deposited $TiO_2$films were 2.40-2.45 at a wavelength of 633 nm. $TiO_2$films had high transmission and stoichiometry when ratio of $O_2$/Ar was 1. Rms roughness of deposited $TiO_2$ film was below 7 $\AA$. In excessive $O_2$ environments, however Rms roughness increased over 50 $\AA$. Transmittance decreased by scattering of rough surface. Reflectance of $SiO_2$/$TiO_2$multi-layers was below 1% in visible light.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.363-363
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• 2008

The development of dry etching process for sapphire wafer with plasma has been key issues for the opto-electric devices. The challenges are increasing control and obtaining low plasma induced-damage because an unwanted scattering of radiation is caused by the spatial disorder of pattern and variation of surface roughness. The plasma-induced damages during plasma etching process can be classified as impurity contamination of residual etch products or bonding disruption in lattice due to charged particle bombardment. Therefor, fine pattern technology with low damaged etching process and high etch rate are urgently needed. Until now, there are a lot of reports on the etching of sapphire wafer with using $Cl_2$/Ar, $BCl_3$/Ar, HBr/Ar and so on [1]. However, the etch behavior of sapphire wafer have investigated with variation of only one parameter while other parameters are fixed. In this study, we investigated the effect of pressure and other parameters on the etch rate and the selectivity. We selected $BCl_3$ as an etch ant because $BCl_3$ plasmas are widely used in etching process of oxide materials. In plasma, the $BCl_3$ molecule can be dissociated into B radical, $B^+$ ion, Cl radical and $Cl^+$ ion. However, the $BCl_3$ molecule can be dissociated into B radical or $B^+$ ion easier than Cl radical or $Cl^+$ ion. First, we evaluated the etch behaviors of sapphire wafer in $BCl_3$/additive gases (Ar, $N_2,Cl_2$) gases. The behavior of etch rate of sapphire substrate was monitored as a function of additive gas ratio to $BCl_3$ based plasma, total flow rate, r.f. power, d.c. bias under different pressures of 5 mTorr, 10 mTorr, 20 mTorr and 30 mTorr. The etch rates of sapphire wafer, $SiO_2$ and PR were measured with using alpha step surface profiler. In order to understand the changes of radicals, volume density of Cl, B radical and BCl molecule were investigated with optical emission spectroscopy (OES). The chemical states of $Al_2O_3$ thin films were studied with energy dispersive X-ray (EDX) and depth profile anlysis of auger electron spectroscopy (AES). The enhancement of sapphire substrate can be explained by the reactive ion etching mechanism with the competition of the formation of volatile $AlCl_3$, $Al_2Cl_6$ or $BOCl_3$ and the sputter effect by energetic ions.

• Journal of Astronomy and Space Sciences
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• v.18 no.3
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• pp.239-248
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• 2001

Far-ultraviolet IMaging Spectrograph (FIMS) is the main payload of the first Korean scientific satellite, KAISTSAT-4, which will be launched in 2002. Among the optical parts, parabolic cylinder mirror does not have any heritage from previous astronomical missions, so the manufacturing and testing process itself is a challenging issue. We describe the method of manufacturing and measuring of the off-axis parabolic cylinder mirror and our initial experiments to establish the entire manufacturing process. Using the method, the profile error can meet the specification of $lambda$ per cm which is closely related with the astronomical performances. In case of the surface roughness, temperature controlled pitch polishing reduces $R_{q}$ under 1 nm implying that scattering in the entire spectral range of FIMS is less than 2% of the incident UV light.