• 한국재료학회지
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• 제11권1호
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• pp.48-54
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• 2001

고순도알루미늄 유전체의 내부표면적을 증가시키기 위하여 1M의 염산 에칭용액에 첨가제를 사용했을 때 나타나는 에칭특성의 변화를 조사하였다. 염산용액에 에틸렌글리콜이 첨가된 혼합용액에서 에칭을 실시했을 경우 알루미늄 기지 표면에 미세하고 균일한 에치피트가 형성되어 표면적 증가 효과가 크게 나타났으며, 또한 양극 산화 후 측정된 정전용량의 결과에서도 에틸렌 글리콜이 첨가된 에칭액에서 제조된 유전체는 표면적 증가에 의한 높은 정전용량 값을 나타냈다.

• 한국표면공학회지
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• 제42권6호
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• pp.260-266
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• 2009

The anodic oxidation behaviour of a cast component of AC2A Al alloy with machined surface and ascast surface was investigated in sulfuric acid solution. The anodized specimen showed relatively uniform and thick anodic oxide films on the as-cast surface, while non-uniform and very thin oxide films were formed on the machined surface. Non-anodized as-cast surface was observed to be covered with thick oxide scales and showed a number of second-phase particles containing Si, while non-anodized machined surface showed no oxide scales and relatively very small number of Si particles. Thus, the very limited growth of anodic oxide films on the as-cast surface was attributed to the presence of thick oxide scales and Si-containing second-phase particles on its surface.

• Composites Research
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• 제13권4호
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• pp.42-53
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• 2000

차세대 항공기소재로 관심을 가지고 있는 Al 7075/CFRP 적층 복합재인 CARALL(CARbon ALuminum Laminates)하이브리드 복합소재 제조를 위한 중요조건중의 하나인 Al 표면처리조건과 경화방법에 대해 조사하였다. 항공기용 Al 전처리 중 대표적인 것으로 증기탈지, 크롬산 양극산화 피막처리, 황산-중크롬산 나트륨 에칭처리 및 인산 양극산화 피막처리공정이 있다. 본 실험에서는 상기 전처리 공정을 모두 항공 규격에 준해서 실시하여 Lap shear 및 Bell peel strength를 비교함으로써 효과적인 접착강도를 나타내는 표면처리 공정을 찾아내고, 시편의 자연표면상태를 그대로 관찰할 수 있는 AFM(Atomic Force Microscope)장비를 이용하여 각 전처리 시편의 표면형상을 측정함으로써 표면형상과 접착강도와의 상관관계를 고찰 하였다. 그리고 Al 표면처리와 별도로 Al과 접착제 및 탄소섬유 프리프레그를 동시에 경화시키는 방법과 탄소섬유 프리프레그를 미리 경화시킨후 다시 Al과 탄소섬유 라미네이트를 접착필름을 이용하여 재 접착시키는 이차 경화법을 적용하여 상호 접착강도 및 물성을 비교하였다. 또한 이차경화법에서의 오토클레이브 압력 변화와 DMA(Dynamic Mechanical Analysis) 장비를 이용한 접착필름의 유리전이온도($T_g$) 측정을 통해 효과적인 공정압력 및 접착내구성 유지에 필요한 최소 경화시간을 파악하였다. 상기 결과로부터 정밀 치수관리가 필요하며 고접착강도, 내구성 항공기 부품을 제작하기 위한 알루미늄 표면처리 공정과 복합재 경화공정 조건을 제시하고자 하였다.

• 한국재료학회지
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• 제10권5호
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• pp.369-374
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• 2000

전해콘텐서용 알루미늄박의 직류에칭에서 1M 염산욕에 부식억제제로 1M 황산을 첨가했을 때의 영향을 조사하기 위하여 에치 피트의 밀도, 에치 터널의 길이와 직경, 정전 용량 등의 변화를 분석하였다. 황산이온은 부식억제제로서 염소이온보다 시료의 표면에서 에치 피트의 밀도를 증가시키며 에치 터널의 직경은 감소하나 길이를 증가시킴으로써 전체적으로 표면적이 커지고 또한 정전 용량 값이 증가하였다. 황산이온을 첨가하였을 경우 전류 밀도가 $0.9A/\textrm{cm}^2$ 보다 낮은 경우에는 정전 용량 값이 작지만 그 이상에서는 정전용량이 현저하게 증가하였다.

• 한국재료학회지
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• 제12권7호
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• pp.528-532
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• 2002

Anodic $TiO_2$film on Ti substrate was fabricated at 180V in sulfuric acid solutions containing phosphoric acid and hydrogen peroxide. Effects of the anodizing conditions on the morphology of the oxide layers, and chemical states of the component elements of the layers were studied primarily using SEM, XRD, AFM, and XPS. The pores in the oxide layer was not uniform in size, shape, and growth direction particularly near the interface between the substrate and the oxide layer, compared with those of the surface layer. The formation of irregular type of pores seemed to be attributed to spark discharge phenomena which heavily occurred during increasing the anodic voltage. The pore diameter and the cell size increased, and the number of cells per unit area decreased with the increasing time. From the XPS results, it was shown that component elements of the electrolytes, P and S, existed in the chemical states of $PO_4^{-3}$ , $P_2$$O_{5}$, $SO_4^{-2}$ , $SO_3^{-2}$ , P, S, etc., which were penetrated from the electrolytes into the oxide layer during anodization.

• 한국재료학회지
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• 제21권5호
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• pp.288-294
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• 2011

Simultaneous Ni and C codeposition by electrolysis was investigated with the aim of obtaining better corrosion resistivity and surface conductivity of a metallic bipolar plate for application in fuel cells and redox flow batteries. The carbon content in the Ni-C composite plate fell in a range of 9.2~26.2 at.% as the amount of carbon in the Ni Watt bath and the roughness of the composite were increased. The Ni-C composite with more than 21.6 at.% C content did not show uniformly dispersed carbon. It also displayed micro-sized defects such as cracks and crevices, which result in pitting or crevice corrosion. The corrosion resistance of the Ni-C composite in sulfuric acid is similar with that of pure Ni. Electrochemical test results such as passivation were not satisfactory; however, the Ni-C composite still displayed less than $10^{-4}$ $A/cm^2$ passivation current density. Passivation by an anodizing technique could yield better corrosion resistance in the Ni-C composite, approaching that of pure Ni plating. Surface resistivity of pure Ni after passivation was increased by about 8% compared to pure Ni. On the other hand, the surface resistivity of the Ni-C composite with 13 at.% C content was increased by only 1%. It can be confirmed that the metal plate electrodeposited Ni-C composite can be applied as a bipolar plate for fuel cells and redox flow batteries.

• 전기화학회지
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• 제8권3호
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• pp.125-129
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• 2005

본 연구에서는 고순도 알루미늄 호일$(t=300{\mu}m)$양극산화 공정을 통해 AAO 나노템플레이트를 자체 제조하였고, 이렇게 제조된 형틀을 가지고 교류 나노전주법에 의해 경자성 합금인 CoP와 연자성 합금인 CoFe를 나노와이어로 제조하였다. 대표적인 Co계 자성합금인 CoP와 CoFe나노와이어는 각기 독특한 자기적 성질을 나타내었다. 경자성 CoP 합금 나노와이어의 경우 교류 인가전압에 따라 hcp와 fcc가 혼재된 구조가 형성되어 자기적 특성에 영향을 미쳤다. 또한 높은 포화자화 값을 갖는 CoFe연자성 합금 나노와이어는 박막 도금 시와는 달리 이상합금도금현상이 거의 나타나지 않았으며 $Co_{30}Fe_{70}$에서 가장 좋은 238emu/g의 포화자화 값을 나타내었다.

• Applied Science and Convergence Technology
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• 제27권1호
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• pp.9-13
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• 2018

Samples of anodic oxide film used in semiconductor and display manufacturing processes were prepared at different electrolyte temperatures to investigate the corrosion resistance. The anodic oxide film was grown on aluminum alloy 6061 by using a sulfuric acid ($H_2SO_4$) electrolyte of 1.5 M at $0^{\circ}C$, $5^{\circ}C$, $10^{\circ}C$, $15^{\circ}C$, and $20^{\circ}C$. The insulating properties of the samples were evaluated by measuring the breakdown voltage, which gradually increased from 0.43 kV ($0^{\circ}C$) to 0.52 kV ($5^{\circ}C$), 1.02 kV ($10^{\circ}C$), and 1.46 kV ($15^{\circ}C$) as the electrolyte temperature was increased from $0^{\circ}C$ to $15^{\circ}C$, but then decreased to 1.24 kV ($20^{\circ}C$). To evaluate the erosion of the film by fluorine plasma, the plasma erosion and the contamination particles were measured. The plasma erosion was evaluated by measuring the breakdown voltage after exposing the film to $CF_4/O_2/Ar$ and $NF_3/O_2/Ar$ plasmas. With exposure to $CF_4/O_2/Ar$ plasma, the breakdown voltage of the film slightly decreased at $0^{\circ}C$, by 0.41 kV; however, the breakdown voltage significantly decreased at $20^{\circ}C$, by 0.83 kV. With exposure to $NF_3/O_2/Ar$ plasma, the breakdown voltage of the film slightly decreased at $0^{\circ}C$, by 0.38 kV; however, the breakdown voltage significantly decreased at $20^{\circ}C$, by 0. 77 kV. In addition, for the entire temperature range, the breakdown voltage decreased more when sample was exposed to $NF_3/O_2/Ar$ plasma than to $CF_4/O_2/Ar$ plasma. The decrease of the breakdown voltage was lower in the anodic oxide film samples that were grown slowly at lower temperatures. The rate of breakdown voltage decrease after exposure to fluorine plasma was highest at $20^{\circ}C$, indicating that the anodic oxide film was most vulnerable to erosion by fluorine plasma at that temperature. Contamination particles generated by exposure to the $CF_4/O_2/Ar$ and $NF_3/O_2/Ar$ plasmas were measured on a real-time basis. The number of contamination particles generated after the exposure to the respective plasmas was lower at $5^{\circ}C$ and higher at $0^{\circ}C$. In particular, for the entire temperature range, about five times more contamination particles were generated with exposure to $NF_3/O_2/Ar$ plasma than for exposure to $CF_4/O_2/Ar$ plasma. Observation of the surface of the anodic oxide film showed that the pore size and density of the non-treated film sample increased with the increase of the temperature. The change of the surface after exposure to fluorine plasma was greatest at $0^{\circ}C$. The generation of contamination particles by fluorine plasma exposure for the anodic oxide film prepared in the present study was different from that of previous aluminum anodic oxide films.