• Title/Summary/Keyword: Subwavelength grating

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Squint-less Phased Array Antenna Near-field Subwavelength Focusing with True-time Optical Delay Line (광 지연선로를 이용한 스퀸팅이 없는 위상배열 안테나의 근접장 서브파장 포커싱)

  • Jung, Young Jin
    • Korean Journal of Optics and Photonics
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    • v.30 no.3
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    • pp.94-100
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    • 2019
  • The near-field subwavelength squint-less focusing system of a phased array antenna is designed and demonstrated by numerical simulation. The Huygens-Fresnel principle is applied to numerical simulation for calculation of the phased array antenna at microwave frequency. It was shown that beam squinting can be eliminated, utilizing true-time optical delay lines based on a chirped fiber grating in the proposed system. Furthermore, subwavelength focusing with high numerical aperture can be achieved by considering the fact that the array elements of the phased-array antenna can be treated as diffractive elements in an optical lens system. Also, side lobes can be suppressed by decreasing the distance between element antennas to less than half of the wavelength.

Beam focusing by a single subwavelength metal slit surrounded by chirped dielectric surface gratings (금속 슬릿 주변에 유전체 chirped grating을 배열함으로써 구현한 beam focusing)

  • Kim, Se-Yun;Park, Jeong-Hyeon;Im, Yong-Jun;Kim, Hwi;Lee, Byeong-Ho
    • Proceedings of the Optical Society of Korea Conference
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    • 2007.07a
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    • pp.255-256
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    • 2007
  • We propose a novel method for the beam focusing by a single subwavelength metal slit surrounded by chirped dielectric surface gratings. In the proposed method, the period of each grating is chirped to make a focused beam at the desired position. Design of the grating structures for optimal beam focusing and the analysis of the field distribution are conducted based on the rigorous coupled wave analysis (RCWA). It is shown that the focused beam is formed at 1.5${\mu}m$ from the metal substrate and its full width at half maximum (FWHM) is 411nm.

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Angle-sensitive Pixels Based on Subwavelength Compound Gratings

  • Meng, Yunlong;Hu, Xuemei;Yang, Cheng;Shen, Xinyu;Cao, Xueyun;Lin, Lankun;Yan, Feng;Yue, Tao
    • Current Optics and Photonics
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    • v.6 no.4
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    • pp.359-366
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    • 2022
  • In this paper, we present a new design for angle-sensitive pixels (ASPs). The proposed ASPs take advantage of subwavelength compound gratings to capture the light angle, which enables pixel size to reach the wavelength scale of 0.7 ㎛ × 0.7 ㎛. The subwavelength compound gratings are implemented by the wires of the readout circuit inherent to the standard complementary metal-oxide-semiconductor manufacturing process, thus avoiding additional off-chip optics or post-processing. This technique allows the use of two pixels for horizontal or vertical angle detection, and can determine the light's angle in the range from -45° to +45°. The proposed sensor enables surface-profile reconstruction of microscale samples using a lensless imaging system.

열적 산화된 실리콘 나노구조의 표면 및 무반사 특성

  • Im, Jeong-U;Jeong, Gwan-Su;Yu, Jae-Su
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.316-316
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    • 2013
  • 실리콘(Si)은 이미지 센서, 포토검출기, 태양전지등 반도체 광전소자 분야에서 널리 사용되고 있는 대표적인 물질이다. 이러한 소자들은 광추출 또는 광흡수 효율을 향상시키는 것이 매우 중요하다. 그러나 Si의 높은 굴절율은 표면에서 30% 이상의 반사율을 발생시켜 소자의 성능을 저하시킨다. 따라서, 표면에서의 광학적 손실을 줄이기 위한 효과적인 무반사 코팅이 필요하다. 최근, 우수한 내구성과 광대역 파장 및 다방향성에서 무반사 특성을 보이는 서브파장 주기를 갖는 나노격자(subwavelength grating, SWG) 구조의 형성 및 제작에 관한 연구가 활발히 진행되고 있다. 이러한 구조는 경사 굴절율 분포를 가지는 유효 매질을 형성시킴으로써 Fresnel 반사율을 감소시킬 수 있어 반도체 소자 표면에서의 광손실을 줄일 수 있다. 그러나, SWG나노구조는 식각에 의한 표면 결함(defects)들이 발생하게 된다. 이러한 결함은 표면에서의 재결합 손실을 발생시켜 소자의 성능을 크게 저하시킨다. 이러한 문제를 해결하기 위해, 표면 보호막 및 무반사 코팅 층을 목적으로 하는 산화막을 표면에 형성시키기도 한다. 따라서 본 실험에서는 레이저간섭리소그라피 및 건식 식각을 이용하여 Si 기판에 SWG 나노구조를 형성하였고, 제작된 샘플 표면 위에 실리콘 산화막(SiOx)을 furnace를 이용하여 형성시켰다. 제작된 샘플들의 표면 및 식각 profile은 scanning electron microscope를 사용하여 관찰하였으며, UV-vis-NIR spectrophotometer 를 사용하여 빛의 입사각에 따른 반사율을 측정하였고, 표면 접촉각 측정 장비를 이용하여 표면 wettability를 조사하였다.

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Broadband Phase-change Metagrating Design for Efficient Active Reflection Steering

  • Kim, Sun-Je
    • Current Optics and Photonics
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    • v.5 no.2
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    • pp.134-140
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    • 2021
  • In this paper, I introduce a novel design method of a high performance nanophotonic beam deflector providing broadband operation, large active tunability, and signal efficiency, simultaneously. By combining thermo-optically tunable vanadium dioxide nano-ridges and a metallic mirror, reconfigurable local optical phase of reflected diffraction beams can be engineered in a desired manner over broad bandwidth. The active metagrating deflectors are systematically designed for tunable deflection of reflection beams according to the thermal phase-change of vanadium dioxide nano-ridges. Moreover, by multiplexing the phase-change supercells, a robust design of actively tunable beam splitter is also verified numerically. It is expected that the proposed intuitive and simple design method would contribute to development of next-generation optical interconnects and spatial light modulators with high performances. The author also envisions that this study would be fruitful for modern holographic displays and three-dimensional depth sensing technologies.

Color Filter Based on a Sub-Wavelength Patterned Poly-Silicon Grating Fabricated using Laser Interference Lithography (광파장 이하의 주기를 갖는 다결정 실리콘 격자 기반의 컬러필터)

  • Yoon, Yeo-Taek;Lee, Hong-Shik;Lee, Sang-Shin;Kim, Sang-Hoon;Park, Joo-Do;Lee, Ki-Dong
    • Korean Journal of Optics and Photonics
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    • v.19 no.1
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    • pp.20-24
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    • 2008
  • A color filter was proposed and demonstrated by incorporating a subwavelength patterned 1-dimensional grating in poly silicon. It was produced by employing the laser interference lithography method, providing much wider effective area compared to the conventional e-beam lithography. A $SiO_2$ layer was introduced on top of the silicon grating layer as a mask for the etching of the silicon, facilitating the etching of the silicon layer. It was theoretically found that the selectivity of the filter was also improved thanks to the oxide layer. The parameters for the designed device include the grating pitch of 450 nm, the grating height of 100 nm and the oxide-layer height of 200 nm. As for the fabricated filter, the spectral pass band corresponded to the blue color centered at 470 nm and the peak transmission was about 40%. Within the effective area of $3{\times}3mm^2$, the variation in the relative transmission efficiency and in the center wavelength was less than 10% and 2 nm respectively. Finally, the influence of the angle of the incident beam upon the transfer characteristics of the device was investigated in terms of the rate of the relative transmission efficiency, which was found to be equivalent to 1.5%/degree.

산화아연 나노막대/PDMS 제작기술과 광학적 특성 연구

  • Go, Yeong-Hwan;Lee, Su-Hyeon;Yu, Jae-Su
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.474-474
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    • 2013
  • PDMS는 미세패턴을 위해 소프트 리소그래피 널리 활용되어질 뿐만 아니라, 재질이 투명하고 탄성과 강한 내구성을 갖고 있어 유연한 광학 및 전자소자에 이용될 수 있다. 최근에는, 이러한 PDMS를 서브파장구조(subwavelength grating structure)를 형성하거나 텍스쳐(texture)표면구조를 이용한 효과적인 반사방지막(antireflection coating)기판을 제작하여 태양전지 및 디스플레이 소자의 성능을 발전시키는 연구가 활발히 진행되고 있다. 한편, 수열합성법(hydrothermal method)이나 전기화학증착법(electrodeposition method)으로 비교적 간단한 공정을 통해서 다양한 기판위에 산화아연(ZnO) 나노막대(nanorod)를 수직정렬로 성장시킬 수 있는데, 이러한 구조는 반사방지특성의 유효 굴절률 분포(effective refractive index profile)를 갖고 있기 때문에 LED나 태양전지에 성능을 개선할 수 있다. 이에 본 연구에서는 수열합성법을 통해 성장된 수직 정렬된 산화아연 나노막대를 이용한 PDMS 표면의 미세패턴 형성하여 광학적 특성을 분석하였다. 실험을 위해, 스퍼터링을 통해서 산화아연 시드층을 형성한 후, 질산아연헥사수화물과 헥사메틸렌테트라민을 수용액에 담가두어 산화아연 나노막대를 성장시켰으며, PDMS의 베이스와 경화제의 질량비를 10:1으로 용액을 준비하여 수직 정렬된 산화아연 나노막대 표면을 casting method으로 코팅하여 열경화 처리하였다. 제작된 샘플의 형태, 구조 광특성을 관찰하기 위해서 전계방출형전자현미경, X선 회절 분석기, 분광 광도계를 이용하였다.

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Implementation of Highly Efficient GMR Color Filter using Asymmetric Si3N4 Gratings (비대칭 Si3N4 격자를 사용한 고효율 GMR 컬러 필터의 구현)

  • Ho, Kwang-Chun
    • The Journal of the Institute of Internet, Broadcasting and Communication
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    • v.17 no.1
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    • pp.225-230
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    • 2017
  • In this paper, a highly efficient GMR(guided-mode resonant) color filter is proposed and implemented. The GMR color filter consists of $Si_3N_4/air$ layers containing complementary fixed and mobile gratings. The device is designed using RETT(rigorous equivalent transmission-line theory) and a grating structure operating in subwavelength. The numerical result reveals that the color filter has a tuning capability of about 35 nm over the $0.45{\mu}m{\sim}0.55{\mu}m$ range for blue-green color and across $0.6{\mu}m{\sim}0.7{\mu}m$ range for red color. Furthermore, The color filters have a spectral bandwidth of about 8 nm with efficiencies of 99%, 98%, and 99% at the center wavelength of blue, green, and red color, respectively, and these are higher efficiencies than reported in the literature previously.