• Journal of the Korean Society of Clothing and Textiles
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• v.21 no.1
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• pp.129-143
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• 1997

This study is about'The Costumes of Ch'oyong dance. (namely Ch'oyong-mu-bok; 처용무복)': emphasis on its structure and change. 1 studied Akhakguebum (the book of music and dance; 낙학궤범), Eui-Gue-Do (a collection of a series of paintings showing the whole processes of the royal courtesies and ceremonies; 의궤도) and some genre painting (풍증화). 'The costumes of Ch'oyong-Dance'were composed of robe(의), pants-skirt(대) , outer-skirt (상) , scarf-string(천의·길경) , shirt(한삼) , hat with mask (사교·가면) , belt(대) and shoes (혜) . According to the position, the colours of robe(의) and pants-skirt(군) were different. What is called, it is'the Colour of Five-Position (오방색) .'The Costumes of choyong-Dance' can be divided three factors by its symbolic means; i. e. shamanism, buddhism and bureaucratism. The pants-skirt(군), outer-skirts(상), scarf · string(천의·길경) and mask are considered as shamanic factor. However, the scarf(천의) , string(길경) and patterns(만화)which are decorated with many lotus patterns enclosed with vine are considered as buddhistic factor. And the hat (사모) , robe(의) , outer-skirt(상) , belt(대) and shoes(잔) are considered as bureaucratic factor. Ch'oyong is endowed with some power by these factors, and its symbolic means became stronger and enlarged by 'the Colour of five-position'. As time goes, the forms and details of robe had been changed noticeable; sleeve-width, neck-line and patterns. The shamanic, buddhistic and bureaucratic factors are reduced. These changes were derived from the changes of Ch'oyong·Dance. On the ground of the shape of mask and round-neckline robe(단영) , someone has an opinion that Ch'oyong is an aribian. However, according to this study, Ch'oyonh is Korean traditional thing; round-neckline robe already existed and settled in Silla dynasty and Ch'oyong-mask symbolized shamanic power.

• Journal of the Korea Society of Computer and Information
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• v.27 no.10
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• pp.185-193
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• 2022

This study attempted to compare and analyze the commercially available multi-use patterns to develop mask patterns suitable for the face types of adult women. Through this, it was intended to provide necessary data to mask pattern development and products. As a results of comparing the dimensions and shapes of commercial multi-use mask patterns, there was a significant difference in dimensions even though it was a L-size mask manufactured for adults. As a result of the appearance evaluation of the virtual outfit, there were significant differences by design in the vertical of the center front line, the cover and space of the mask, the height of the nose, and the lower part of the mask. The side also showed significant differences in the covering of the side of the face, the space of the side, and the width and length of the string. As a result of the appearance evaluation, Mask 4 received the best evaluation. The shape of the mask pattern had a large dart in the lower part of the nose so that it can cover the three-dimensional shape of the face, but there was a difference in the degree and angle of the curve depending on the mask. Although the upper part of the mask, the lower part of the mask, and the cheek part are in close contact, the evaluation of the mask pattern, which has room in the nose and mouth, was high. It is thought that the mask pattern should be set according to the upper length, lower length, and nose height of the mask through analysis of the face shape and dimensions.

• Proceedings of the IEEK Conference
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• 1999.06a
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• pp.942-945
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• 1999

In this work, we proposed Proper etching algorithm for ultra-large scale integrated circuit device and simulated etching process using the proposed algorithm in the case of ICP (inductive coupled plasma) 〔1〕source. Until now, many algorithms for etching process simulation have been proposed such as Cell remove algorithm, String algorithm and Ray algorithm. These algorithms have several drawbacks due to analytic function; these algorithms are not appropriate for sub 0.1 ${\mu}{\textrm}{m}$ device technologies which should deal with each ion. These algorithms could not present exactly straggle and interaction between Projectile ions and could not consider reflection effects due to interactions among next projectile ions, reflected ions and sputtering ions, simultaneously In order to apply ULSI process simulation, algorithm considering above mentioned interactions at the same time is needed. Proposed algorithm calculates interactions both in plasma source region and in target material region, and uses BCA (binary collision approximation4〕method when ion impact on target material surface. Proposed algorithm considers the interaction between source ions in sheath region (from Quartz region to substrate region). After the collision between target and ion, reflected ion collides next projectile ion or sputtered atoms. In ICP etching, because the main mechanism is sputtering, both SiO$_2$ and Si can be etched. Therefore, to obtain etching profiles, mask thickness and mask composition must be considered. Since we consider both SiO$_2$ etching and Si etching, it is possible to predict the thickness of SiO$_2$ for etching of ULSI.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.14 no.5
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• pp.2415-2421
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• 2013

Widespread personal data utilization has led personal data protection to its importance at core, and serious data spill has increased constantly as a result. Though various types of protection systems for data spill have been suggested, all these met failures in detection of personal data when printed out or preventing fatal data exposure without any protections when data spill happens. I propose API-Hook method which detects and controls personal data within printouts, and prevents data leakage through masking on the printed-out data. Also, it is verified if security is guaranteed on the documents containing personal data when implementing. In order to obtain security, it is essential to put more weights on the balance with availability than confidentiality.

• Journal of Medicine and Life Science
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• v.16 no.1
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• pp.23-26
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• 2019

Total scalp irradiation is a challenging treatment because of unique concave target volume and difficulty with bolus applying. There are few reports about bolus applying methods to the entire scalp in detail. Application of conventional bolus (wax or superflab) is widely used, and it is considered effective. However, the curvature and irregularity of the scalp can produce significant air gap, resulting in inadequate radiation dose distribution. We describe a new method to applying the bolus to the entire scalp. We sutured 1 cm thickness superflab bolus on the thermoplastic mask using cotton string. This method can reduce the air gap between the bolus and scalp and be reproducible.

• Journal of Intelligence and Information Systems
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• v.12 no.1
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• pp.17-31
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• 2006

In this paper, passport recognition and face verification methods which can automatically recognize passport codes and discriminate forgery passports to improve efficiency and systematic control of immigration management are proposed. Adjusting the slant is very important for recognition of characters and face verification since slanted passport images can bring various unwanted effects to the recognition of individual codes and faces. Therefore, after smearing the passport image, the longest extracted string of characters is selected. The angle adjustment can be conducted by using the slant of the straight and horizontal line that connects the center of thickness between left and right parts of the string. Extracting passport codes is done by Sobel operator, horizontal smearing, and 8-neighborhood contour tracking algorithm. The string of codes can be transformed into binary format by applying repeating binary method to the area of the extracted passport code strings. The string codes are restored by applying CDM mask to the binary string area and individual codes are extracted by 8-neighborhood contour tracking algerian. The proposed RBF network is applied to the middle layer of RBF network by using the fuzzy logic connection operator and proposing the enhanced fuzzy ART algorithm that dynamically controls the vigilance parameter. The face is authenticated by measuring the similarity between the feature vector of the facial image from the passport and feature vector of the facial image from the database that is constructed with PCA algorithm. After several tests using a forged passport and the passport with slanted images, the proposed method was proven to be effective in recognizing passport codes and verifying facial images.