• Title/Summary/Keyword: SrTiO3

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Impedance Spectroscopy Analysis of the Screen Printed Thick Films (스크린 프린트된 후막의 Impedance Spectroscopy 특성 분석)

  • Ham, Yong-Su;Moon, Sang-Ho;Nam, Song-Min;Lee, Young-Hie;Koh, Jung-Hyuk;Jyoung, Soon-Jong;Kim, Min-Soo;Cho, Kyung-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.6
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    • pp.477-480
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    • 2010
  • In this study, we fabricate 3 wt% $Li_2CO_3$ doped $(Ba,Sr)TiO_3$ thick films on the Ag/Pd bottom electrode printed $Al_2O_3$ substrates for the LTCCs (low temperature co-fired ceramics) applications. From the X-ray diffraction analysis, 3 wt% $Li_2CO_3$ doped BST thick films on the Ag/Pd printed $Al_2O_3$ substrates, which sintered at $900^{\circ}C$, showed perovskite structure without any pyro phase. The dielectric properties of 3 wt% $Li_2CO_3$ doped BST thick films are measured from 1 kHz to 1 MHz. To investigate the electrical properties of 3 wt% $Li_2CO_3$ doped BST thick films, we employ the impedance spectroscopy. The complex impedance of 3 wt% $Li_2CO_3$ doped BST thick films are measured from 20 Hz to 1 MHz at the various temperatures.

Fabrication and Characterization of the BLT/STA/Si Structure for Fe-FETs Application

  • Park, Kwang-Huna;Jeon, Ho-Seung;Park, Jun-Seo;Im, Jong-Hyun;Park, Byung-Eun;Kim, Chul-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.73-74
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    • 2006
  • Ferroelectric thin films have been widely investigated for future nonvolatile memory application. We fabricated the BLT ($(Bi,La)_4Ti_3O_{12}$) films on Si using a STA ($SrTa_2O_6$) buffer layer BLT and STA film were prepared by sol-gel method. Measurement data by XRD and AFM, showed that BLT film and STA films were well crystallized and a good surface morphology. From C-V measurement reward that the Au/BLT/STA/Si structure showed a clockwise hysteresis loop with a memory window of 1.5 V for the bias voltage sweep of ${\pm}5$ V. From results, the Au/BLT/STA/Si structure is useful for FeFETs.

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The Effects of Grain Size on the Degradation Phenomena of PZT Ceramics (입자의 크기가 PZT 세라믹스의 열화현상에 미치는 영향)

  • 정우환;김진호;조상희
    • Journal of the Korean Ceramic Society
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    • v.29 no.1
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    • pp.65-73
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    • 1992
  • The effect of grain size on the time-dependent piezoelectrice degradation of a poled PZT of MPB composition Pb0.988Sr0.012 (Zr0.52Ti0.48)O3 with 2.4 mol% of Nb2O5 was studied, and the degradation mechanism was discussed. Changes in the internal bias field and the internal stress both responsible for the time-dependent degradation of poled PZT were examined by the polarization reveral technique, XRD and Vickers indentation, respectively. The piezoelectric degradation increased with increasing time and grain size, and the internal bias field due to space charge diffusion decreased with increasing grain size of poled PZT. The internal bias field, however, was almost insensitive to the degradation time regardless of the grain size. On the other hand, both the x-ray diffraction peak intensity ratio of (002) to (200) and the fracture behavior including the crack propagation support that the ferroelectric domain rearrangement of larger grain size showed rapid relaxation of the internal stress compared with smaller one, which is thought the origin of the larger piezoelectric degradation in the former. In conclusion, the contribution of space charge diffusion on the piezoelectric degradation of PZT is strongly dependent on both the grain size and the composition. Thus, the relaxation of internal stress due to the ferroelectric domain rearrangement as well as the amount and time-dependence of the internal bias field due to space charge diffusion should be considered simultaneously in the degradation mechanism of PZT.

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Etching characteristics and modeling of BST thin films using inductively coupled plasma (유도결합 플라즈마를 이용한 BST 박막의 식각 특성 및 모델링)

  • Kim, Gwan-Ha;Kim, Kyoung-Tae;Kim, Dong-Pyo;Lee, Cheol-In;Kim, Tae-Hyung;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11a
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    • pp.29-32
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    • 2004
  • This work was devoted to an investigation of etching mechanisms for $(Ba,Sr)TiO_3$ (BST) thin films in inductively coupled $CF_4/Ar$ plasma. We have found that an increase of the Ar content in $CF_4/Ar$ plasma causes non-monotonic behavior of BST etch rate, which reaches a maximum value of 40 nm/min at 80% Ar. Langmuir probe measurements show a weak sensitivity of both electron temperature and electron density to the change of $CF_5/Ar$ mixing ratio. O-D model for plasma chemistry gave monotonic changes of both volume densities and fluxes for active species responsible for the etching process. The analysis of surface kinetics confirms the possibility of non-monotonic etch rate behavior due to the concurrence of physical and chemical pathways in ion-assisted chemical reaction.

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Piezoelectric property variation with respect to the frit addition for lower temperature sintering in PNW-PMN-PZT ceramic system (PNW-PMN-PZT 압전 세라믹의 저온소결을 위한 프리트 첨가 압전 특성평가)

  • Ryu, Sung-Lim;Kwon, Soon-Yong;Woo, Duck-Hyun;An, Sang-Gi;Jeong, Ji-Hyun;Um, Ju-Chul
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.191-191
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    • 2008
  • 강유전성 세라믹스 재료로써는 PZT계열의 세라믹재료가 널리 쓰이고 있다. 이는 우수한 유전 및 압전특성을 가지고 있으나, PbO을 다량 함유하고 있어 $1000^{\circ}C$이상에서 PbO가 급격하게 휘발되는 성질 때문에 조성의 변동이 생겨 재현성이 어려우며 이를 방지하기 위하여 PbO를 과잉 첨가시키기 때문에 PbO휘발로 인한 강한 독성이 인체에 유해하고, 비환경 친화적인 물질로 최근에는 환경문제가 대두됨에 따라 대체 또는 보완 할 수 있는 방안에 검토되고 있다. 본 연구는 그 해결책의 한 방안으로 압전특성이 우수한 $(Pb_{0.94}Sr_{0.06})[(Ni_{1/2}W_{1/2})_{0.02}(Mn_{1/3}Nb_{2/3})_{0.07}(Zr_{0.51}Ti_{0.49})_{0.91}]O_3$계 조성을 설계하고 Glass frit(0~1.1 wt%)를 소량 첨가하여 액상 소결 특성을 부여하고 $1000^{\circ}C$ 이하의 저온에서 소결하여 유전 및 압전 특성을 평가하였다. 실험방법은 일반적인 세라믹스 제조공정으로 24시간 ball milling하고 $850^{\circ}C$에서 2시간 하소 후 Glass frit를 소결조제로 소랑 첨가하여 $1000^{\circ}C$ 이하 온도에서 소결을 진행하여 각 소결온도에 따른 유전 및 압전 특성을 평가하였다. 최종 소결된 시편의 밀도와 수축율을 분석하여 최적의 소결온도를 확립하였으며 XRD분석을 통해 perovskite구조를 확인하고 미세구조확인을 위해 SEM으로 관찰하였다. 압전 특성을 평가하였다.

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Low-temperature crystallized BST thin films by excimer laser annealing for embedded RF tunable capacitor

  • Kang, Min-Gyu;Do, Young-Ho;Oh, Seung-Min;Kang, Chong-Yun;Kim, Sang-Sig;Yoon, Seok-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.28-28
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    • 2010
  • This study realized low-temperature crystallization process of the $Ba_{0.6}Sr_{0.4}TiO_3$ (BST) thin films without thermal damage of substrate using excimer laser annealing (ELA) and structural and electrical characteristics were investigated. The amorphous BST thin films were prepared on Pt/Ti/$SiO_2$/Si substrate by sol-gel method at $250^{\circ}C$. The ELA was carried out using KrF excimer laser which provided excitation wavelength of 248 nm. The beam homogenizing system was used in order to homogenize beam shape of Gaussian fit. The XRD and SEM were used to analyze structural characteristics and the microwave capacitance, dielectric loss and tunability of the BST films were measured by a symmetrical stripline resonator method with shorted end. Consequently, the crystallinity of BST thin films were improved after ELA process and RF tunable capacitor was demonstrated at low temperature below $300^{\circ}C$.

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Nitrogen-incorporated (Ba, Sr)$TiO_3$ thin films fabricated by r.f.- magnetron sputtering

  • Lim, Won-Taeg;Jeong, Yong-Kuk;Lee, Chang-Hyo
    • Journal of Korean Vacuum Science & Technology
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    • v.4 no.4
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    • pp.97-101
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    • 2000
  • In this study, two kinds of barium strontium titanate (BST) samples were prepared. One is a conventional BST film that is sputtered in a mixture of argon and oxygen. The other is a nitrogen-incorporated BST film that is sputtered in a mixture of oxygen and intentionally added nitrogen instead of argon gas. The structural properties of both of the BST films had not changed significantly with the species of sputtering gas. However, the leakage current of BST films sputtered at ($N_2$+O$_2$) atmosphere was lower than those sputtered at (Ar +O$_2$) atmosphere: 1.9$\times$10$^{-8}$ A/cm$^2$ at 2V for the films prepared at (Ar +O$_2$) atmosphere and 8.6$\times$10$^{-9}$ A/cm$^2$ for the films at ($N_2$+O$_2$) atmosphere. From an XPS analysis, it has been found that nitrogen atoms are incorporated in BST films with a concentration of 1.92 at% and form a certain oxynitride phase. It is proposed that nitrogen atoms are able to fill the oxygen vacancies of BST films during sputtering process, and then the leakage current reduces due to a decrease in the vacancies. The BST films sputtered at ($N_2$+O$_2$) atmosphere have superior electrical properties to the films sputtered at (Ar +O$_2$), without any significant structural changes.

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Study on working gas ratio dependance of BST thin film (작업가스비에 따른 BST 박막의 특성)

  • Cui, Ming-Lu;Kwon, Hak-Yong;Park, In-Chul;Kim, Hong-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.393-396
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    • 2004
  • 본 논문에서는 완충층용 MgO 박막을 P-type(100)Si 기판위에 작업가스 $Ar:O_2=80:20$, RF 파워 50W, 기판온도 $400^{\circ}C$, 10mtorr의 작업진공에서 $500{\AA}$ 증착하였다. 제작된 MgO/Si 기판위에 RF Magnetron sputtering법으로 작업가스 $Ar:O_2$의 비율을 90:10, 80:20, 70:30으로 변화하면서 $BST(Ba_{0.5}Sr_{0.5}TiO_3)$ 박막을 약 $2000{\AA}$ 증착하였다. XRD 측정결과 작업가스비의 변화에 관계없이(110)BST와 (111)BST 피크만이 관찰되었으며 작업가스 $Ar:O_2=80:20$에서 가장 양호한 결정성을 나타내었다. I-V 측정결과 인가전계 ${\pm}100kV/cm$에서 $10^{-7}A/cm^2$이하의 양호한 누설전류 특성을 보여주고 있으며 C-V 측정결과 작업가스 $Ar:O_2$의 비율 90:10, 80:20, 70:30에서의 비유전율은 각각 283, 305, 296으로서 작업가스비 80:20에서 제작된 박막의 특성이 가장 우수하였다. 작업가스비 80:20에서 제작된 박막의 SEM 측정결과 결정이 성장되었음을 확인할 수 있었고 그레인의 크기는 약 10nm였다.

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Growth of La0.35Pr0.35Ca0.3MnO3/LaAlO3 Thin Film using Laser Molecular-Beam Epitaxy and its Magnetic Properties (Laser Molecular-Beam Epitaxy를 이용한 La0.35Pr0.35Ca0.3MnO3/LaAlO3 초격자 박막의 합성과 그 자기적 특성의 연구)

  • Seung, S.K.;Song, J.H.
    • Journal of the Korean Magnetics Society
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    • v.21 no.3
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    • pp.93-98
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    • 2011
  • We successfully grew $La_{0.35}Pr_{0.35}Ca_{0.3}MnO_3$(LPCMO)/$LaAlO_3$(LAO) thin film using Laser Molecular-Beam Epitaxy and studied post-growth annealing effects ($750^{\circ}C$, 5 h) on its crystal structural and magnetic properties. Whereas the single-layered LPCMO and LPCMO/STO superlattice thin films show rough surface before and after the post-growth annealing, LPCMO/LAO superlattice shows a relatively very flat surface even after the post-growth annealing. The enhancement of ferromagnetism of LPCMO/LAO superlattice after the post-growth annealing was remarkable compared to the single-layered LPCMO thin film. The coercive and saturation magnetic field of the single-layed LPCMO thin film were decreased after the post-annealing. However, for LPCMO/LAO superlattice, a same coercive and increased saturation magnetic field were exhibited after post-growth annealing. We suggest that these peculiar observations are originate from the super-structure of LPCMO and LAO.

Dependence of Strength and Crack Growth of PZT Ceramics on Poling Strength (Poling 강도 변화에 따르는 PZT 세라믹스의 강도와 균열성장 의존성)

  • 이홍림;권종오;한봉석
    • Journal of the Korean Ceramic Society
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    • v.34 no.8
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    • pp.877-885
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    • 1997
  • The dependence of strength, crack growth, fracture mode and degree of domain rearrangement of PZT ceramics on poling strength were studied. The PZT [(Pb0.94Sr0.06)(Zr0.46Ti0.54)O3+Nb(trace)] specimens were poled at 0, 0.5, 1.0, 1.5, 2.0, 2.5, 3.0 kv/mm, and the strength of the specimens was measured by 3 point flexure system. The bending strength of the specimen decreased in different modes according to the bending directions; xz, zx and yz plane direction with x axis of the poling direction in Cartesian coordinate system. The strength differences between the directions increased as the poling strength increased. The fracture mode transferred to intergranular fracture mode from transgranular one as the poling strength increased. The mechanical breakdown occurred when the poling strength higher than 3 kV/mm was applied to the specimen. It was observed that the crack length increased in the normal direction to the poling direction, however, decreased in the parallel direction to the poling direction when the poled PZT specimen was indented by the Vickers indenter. However, the crack produced by indentation continuously was continuously increased little by little after indentation on the specimen. The domain rearrangement occurred as the poling strength increased and the domains were rearranged more effectively when the electric field was continuously increased little by little.

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