• Title/Summary/Keyword: Spherical Aberration

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Four-mirror optical system for UV submicron lithography (서브미크론 리소그라피를 이한 4 반사광학계의 설계)

  • 박성찬
    • Proceedings of the Optical Society of Korea Conference
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    • 1991.06a
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    • pp.81-87
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    • 1991
  • A design of a four-mirror optical system for submicron lithography using KrF excimer laser beam(λ=248nm) is presented. By using the third order aberration theory, analytic solutions for a telecentric, flat-field, and anastigmatic four-spherical-mirror system (reduction magnification 5$\times$) are found. Aspherization is carried out to the spherical mirror surfaces in order to reduce the residual higher order aberrations and vignetting effect. Finally we obtain a reflection system useful in submicron lithographic application.

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Optical CAD and Analyses of Four Spherical Mirror System for Micro-Lithography (Micro-Lithography를 위한 4 구면경계의 설계 및 수차해석)

  • 조영민
    • Proceedings of the Optical Society of Korea Conference
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    • 1991.06a
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    • pp.88-89
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    • 1991
  • For the micro-lithography using a KrF excimer laser beam(λ=0.248${\mu}{\textrm}{m}$) a mirror system consisting of four spherical surfaces with reduction magnification 5$\times$ is designed. Initially the aplanat condition of the mirror system is considered. And for the further improved performance of the system the distortion free condition and flat field condition within Seidel 3rd order aberrations are added to the above condition. During the process of designing the computer-aided optimization technique is extensively employed. The spherical aberration, coma, field curvature and distortion of the optimized four-spherical mirror system are removed to the diffraction limit, and residual astigmatism and off-axial vignetting are not corrected enough.

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Telephotolens design with refractove/diffractive hybrid lens

  • Hong, Young-Ghi;Kim, Sun-Il;Yeo, Wan-Gu;Lee, Chul-Koo
    • Journal of the Optical Society of Korea
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    • v.1 no.2
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    • pp.74-80
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    • 1997
  • 300mm F/4.0 telephotolens with diffractive hybrid lens was designed, and its optical performance was tested and compared with a traditional lens system. DOE(Diffractive Optical Element) reconstructs wavefronts using wave phenomena of light to focus the incident light onto the focal point and has negative Abbe number while a traditional lens uses geometrical phenomena of light and has positive Abbe number. Therefore, a diffractive hybrid lens containing both refractive and diffractive elements can remarkably correct chromatic aberration and spherical aberration of an optical system. We investigated and analyzed the optical properties of a diffractive hybrid lens for the visible spectrum, and we used a difractive hybrid lens to design and evaluate a 300mm F/4.0 telephotolens without the special LD(Low Dispersive) glass lens which is costly and difficult to manufacture. Most traditional telephotolenses use the special LD glass for chromatic aberration correcton. Optical performance tests such as resolution and characteristics of aberration of both lens systems using a diffractive hybrid lens and traditional lens were performed.

The Performance Analysis and Design of Selling Spectacle Lenses in Domestic Market (국내 시판 안경렌즈의 성능 분석 및 설계)

  • Kim, Se-Jin;Lim, Hyeon-Seon
    • Journal of Korean Ophthalmic Optics Society
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    • v.15 no.4
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    • pp.355-360
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    • 2010
  • Purpose: Analysis performance for spectacle lens which sales in domestic market and optimization design a spectacle lens which is corrected aberration. Methods: Measured center thickness, radius and aspherical surface coefficient for spherical and aspherical lenses which were ${\pm}$5.00D. Refractive index for every lens was 1.6 and they came from 4 different companies. I used 3 types of equipment to measure lenses. ID-F150 (Mitutoyo) : Center Thickness, FOCOVISION (SR-2, Automation Robotics) : Radius, PGI 1240S (Taylor Hobson) : Aspherical surface coefficient. Designed a lens which had 27 mm of distance from lens rear surface to center of eye, 4 mm of pupil diameter and small aberration on center vision $30^{\circ}C$. To shorten axial distance compared with the measured lens rise merits for cosmetic. Lens Design tool was CODE V (Optical Research Associates). Results: -5.00D aspherical lens had somewhat high astigmatism and distortion compared with the spherical lens. But it had a merit for cosmetic because of short axial height and decrease edge thickness. Improved a performance of distortion and ascertain merits for cosmetic due to short axial height and decrease edge thickness same as (-) lens in case of +5.00 aspherical lens. Though an optimization process front surface aspherical lens had a good performance for astigmatism and distortion and the merit for beauty compared with measured spherical lens. Conclusions: Design trend for domestic aspherical lens is decrease axial height and thickness to increase a merit for cosmetic not but increase performance of aberration. From design theory for optimization design front surface aspherical spectacle lens which has improved performance of aberration and merit for cosmetic at the same time compared with the measured lens. Expect an improved performance from design back aspherical lens compared with front aspherical lens.

A Study on a Hartmann Test of Optical Mirror for On-Machine Measurement of Polishing machine (광학면 연마기의 OMM을 위한 Hartmann Test 방법 연구)

  • 김옥현;이응석;오창진;김용관
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.1
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    • pp.40-45
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    • 2004
  • Recently, aspheric optical lenses and mirrors, which are harder to manufacture and measure than the conventional spherical ones, are widely used, particularly in electronic fabrication process. Generally, interferometric optical method is used for the measurement of spherical optical surface. However, the interferometric method for aspheric surface measurement is difficult because it needs a precise null corrector and strict environmental conditions such as constant temperature, humidity and vibrations. We have been studied on the manufacturing of aspheric optics to improve the surface profile accuracy and productivity using a corrective polishing process. For the corrective polishing, a practical method of On-Machine Measurement (OMM) is required. For this purpose, an optical OMM system has been studied using the Shach-Hartmann test, which is very robust to the practical polishing environment. The wavefront has been reconstructed from the measured data using the primary aberration polynomial function by the least squares fitting. The measured result of the OMM system shows that the maximum deviation is less than 200 nm for the one of commercial Fizeau interferometer Wyko 6000.

The diffraction property of the bessel beam for defocus (Defous에 따른 bessel beam의 회절 특성)

  • 박성종;최기준;박민경;김재범;심상현;정창섭
    • Korean Journal of Optics and Photonics
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    • v.6 no.2
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    • pp.101-107
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    • 1995
  • To investigate the diffraction property of the Bessel beam for defocus which acts CFAP (Combined Filter of Amplitude and Phase), we calculated numerically the intensity, the radius of central spot, and the optical transfer function for the number of node of the Bessel beam when an optical system has an aberration-free or a spherical aberration. The Bessel beam has larger the maximum intensity and the OTF value for an optical system with a spherical aberration than that with an aberrationfree. Particularly, the OTF value at the point of maximum intensity for $W_{40}=3\lambda$is higher for the Bessel beam than for the Clear aperture. From these results, we know that the Bessel beam has the compensating effect. The Bessel beam also has the radius of central spot having a superresolution. We will useful for the fabrication of semiconductor device and the optical recording system using these effects.ffects.

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Performance Criterion of Bispectral Speckle Imaging Technique (북스펙트럼 스펙클 영상법의 성능기준)

  • 조두진
    • Korean Journal of Optics and Photonics
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    • v.4 no.1
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    • pp.28-35
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    • 1993
  • In the case of an imaging system affected by aberrations which are not precisely known, the effect of aberrations can be minimized and near-diffraction-limited images can be restored by introducing artificial random phase fluctuations in the exit pupil of the imaging system and using bispectral speckle imaging. In order to determine the optimum value of the correlation length for Gaussian random phase model, computer simulation is performed for 50 image frames of a point object in the presence of defocus, spherical aberration, coma, astigmatism of 1 wave, respectively. In terms of the criterion of performance, the FWHM of the point spread function, normalized peak intensity, MTF and visual inspection of the restored object are employed. The optimum value for the rms difference $\sigma$ of aberration on the exit pupil in the interval of Fried parameter ${\Upsilon}_0$ is given by 0.27-0.53 wave for spherical aberration, and 0.24-0.36 wave for defocus and astigmatism, respectively. It is found that the bispectral speckle imaging technique does not give good results in the case of coma.

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Optical Design of a High-numerical-aperture Objective with a Reflective Focal Reducer (반사형 Focal Reducer를 가지는 높은 개구수의 대물렌즈 설계)

  • Jong Ung Lee
    • Korean Journal of Optics and Photonics
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    • v.34 no.6
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    • pp.248-260
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    • 2023
  • A 0.5-numerical-aperture (NA) refractive-reflective objective, composed of a low-NA refractive and a reflective focal reducer, is designed. A 0.25-NA Lister objective is used for the refractive. A two-spherical-mirror system, corrected for spherical aberration, coma, and astigmatism is used for the reflective focal reducer. In spite of high NA, the refractive-reflective objective has an 18-mm working distance and improved imaging performance, compared to the 0.25-NA Lister objective.

Wavefront Aberration Measurement of DVD pick-up lenses with a Shack-Hartmann Sensor and a Point Source (Shack-Hartmann 파면분석기와 점광원을 이용한 DVD 픽업 렌즈의 수차 측정)

  • Kang, Dong-Won;Lee, Jin-Seok;Hahn, Jae-Won
    • Transactions of the Society of Information Storage Systems
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    • v.3 no.3
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    • pp.135-138
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    • 2007
  • Using a Shack-Hartmann sensor and sub-wavelength sized pinhole point source, we develope an optical testing system that measures the wavefront error of high numerical aperture and small sized optical components. The subwavelength sized pinhole generates perfect spherical waves with large diffraction angle and this makes possible to test high numerical aperture optics. The Shack-Hartmann sensor reconstructs the wavefront and calculates the aberrations. We make a home-made reference plane wave source which generates nearly perfect plane waves and the calibration with this plane source gives the overall uncertainty of the optical testing system 0.010 $\lambda$ rms.

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