• 제목/요약/키워드: Solution-based process

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AHP 기반의 비즈니스 프로세스 관리시스템 평가 모형에 관한 연구 (A Study on Evaluation Model of Business Process Management Systems based on Analytical Hierarchy Process)

  • 유성열
    • 경영과정보연구
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    • 제31권4호
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    • pp.433-444
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    • 2012
  • 본 연구의 목적은 계층적 분석 기법을 이용한 비즈니스 프로세스 관리 시스템(BPMS)의 평가 모형을 개발하는 것이다. 이를 위해 전문가 집단으로부터 BPMS 솔루션 선택을 위한 기준을 도출하였으며, 이 기준들의 쌍대비교를 통해 AHP 기반의 분석 모형을 개발하였다. 분석모형을 통해 기업이 원하는 BPMS 솔루션을 선택할 수 있으며, 이는 기업의 프로세스 관리 능력 제고에 기여할 수 있을 것이다.

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초임계 유체와 공용매를 이용한 미세전자기계시스템 웨이퍼의 식각, 세정을 위한 최적공정조건 (Optimum process conditions for supercritical fluid and co-solvents process for the etching, rinsing and drying of MEMS-wafers)

  • 노성래;유성식
    • 반도체디스플레이기술학회지
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    • 제16권3호
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    • pp.41-46
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    • 2017
  • This study aims to select suitable co-solvents and to obtain optimal process conditions in order to improve process efficiency and productivity through experimental results obtained under various experimental conditions for the etching and rinsing process using liquid carbon dioxide and supercritical carbon dioxide. Acetone was confirmed to be effective through basic experiments and used as the etching solution for MEMS-wafer etching in this study. In the case of using liquid carbon dioxide as the solvent and acetone as the etching solution, these two components were not mixed well and showed a phase separation. Liquid carbon dioxide in the lower layer interfered with contact between acetone and Mems-wafer during etching, and the results after rinsing and drying were not good. Based on the results obtained under various experimental conditions, the optimum process for treating MEMS-wafer using supercritical CO2 as the solvent, acetone as the etching solution, and methanol as the rinsing solution was set up, and MEMS-wafer without stiction can be obtained by continuous etching, rinsing and drying process. In addition, the amount of the etching solution (acetone) and the cleaning liquid (methanol) compared to the initial experimental values can be greatly reduced through optimization of process conditions.

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HVOF 용사법에 의해 제조된 WC계 합금 코팅층의 방식특성(II) - 알칼리 용액에서의 분극특성 - (Anti-Corrosion Characteristics of WC-based Alloy Coatings Fabricated by HVOF Process - Polarization Characteristics in Alkaline Solution -)

  • 김태용;김영식;김재동
    • 동력기계공학회지
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    • 제18권6호
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    • pp.40-44
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    • 2014
  • The purpose of this paper is to investigate polarization characteristics of WC-based alloy coatings in alkaline solution. The coatings were fabricated with WC-CrC-Ni, WC-Co-Cr and WC-Co composite powders by HVOF process. Corrosion tests of coatings and substrate were carried out using potentiostat/galvanostat at solution with pH 8 and pH 13. Corrosion potential(Ecorr) and corrosion current density(Icorr) could be studied from polarization curve, and corrosion behavior was analyzed by SEM and EDS. WC-Co-Cr coating and WC-CrC-Ni coating showed more favorable anti-corrosion characteristics than WC-Co coating and substrate at solution with pH 8 and pH 13.

AFM 기반 액중 Tribo nanolithography 에서의 마스크 층 내식각성에 관한 연구 (Etch Resistance of Mask Layer modified by AFM-based Tribo-Nanolithography in Aqueous Solution)

  • 박정우;이득우
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 추계학술대회 논문집
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    • pp.268-271
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    • 2005
  • Etch resistance of mask layer on silicon substrate modified by AFM-based Tribo-Nanolithography (TNL) in Aqueous Solution in an aqueous solution was demonstrated. n consists or sequential processes, nano-scratching and wet chemical etching. The simple scratching can form a mask layer on the silicon substrate, which acting as an etching mask. For TNL, a specially designed cantilever with diamond tip, allowing the formation of mask layer on silicon substrate easily by a simple scratching process, has been applied instead of conventional silicon cantilever fur scanning. This study demonstrates how the TNL parameters can affect the etch resistance of mask layer, hence introducing a new process of AFM-based maskless nanolithography in aqueous solution.

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화학적으로 제어된 전구체용액을 사용하여 MOD법으로 제조된 YBCO 박막 (MOD-processed YBCO thin films prepared by chemically controlled precursor solution)

  • 유재무;김영국;고재웅;허순영;홍계원;이희균;김철진;정경원
    • 한국초전도저온공학회:학술대회논문집
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    • 한국초전도저온공학회 2003년도 추계학술대회 논문집
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    • pp.27-29
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    • 2003
  • Solution-based MOD-TFA deposition technology of YBCO layers offers a route to low-cost YBCO coated conductors. Since the structures and properties of grown thin film by MOD process are strongly influenced by chemistry of precursor solution, the chemical modification of precursor solution for MOD process are important for improvement of the electrical properties of YBCO films. In this study, the precursor solution for MOD process are modified by chemical additives and solvents. The microstructure and texture of YBCO films grown by chemically modified precursor solution were characterized with SEM/EDS, XRD.

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용액 미립화공정 기반의 마이크로 스텐실 프린팅에 관한 연구 (A Study of Micro Stencil Printing based on Solution Atomization Process)

  • 당현우;김형찬;고정범;양영진;양봉수;최경현;도양회
    • 한국정밀공학회지
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    • 제31권6호
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    • pp.483-489
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    • 2014
  • In this study, experiments were conducted for micro pattern printing to combine solution atomization process and stencil printing based on electrospray deposition. The stencil mask fabricated by etching the photosensitive glass placed below 0.3 mm distance to substrate has 100 um line width. The process parameters of electrospray deposition system for the atomization of the solution are applied voltage and supply flow rate of the solution. Meniscus angle of cone-jet was optimized by varying the supply flow rate from 0.3 ml/hr to 0.7 ml/hr. Voltage condition was verified having symmetric cone-jet angle and no pulsation at 8.5 kV applied voltage. In addition, a number of micro patterns are printed using a single 1 step process by solution atomization process. Variable line width of approximate 100 um was confirmed by changing conditions of solution atomization regardless of the pattern size of stencil mask.

Development of Nanostructured Light-Absorbers for Ultrasound Generation by Using a Solution-Based Process

  • Sang, Pil Gyu;Heo, Jeongmin;Song, Ju Ho;Thakur, Ujwal;Park, Hui Joon;Baac, Hyoung Won
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.377-377
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    • 2016
  • Under nanosecond-pulsed laser irradiation, light-absorbing thin films have been used for photoacoustic transmitters for ultrasound generation. Especially, nanostructured absorbers are attractive due to high optical absorption and efficient thermoacoustic energy conversion: for example, 2-dimensional (2-D) gold nanostructure array, synthetic gold nanoparticles, carbon nanotubes (CNTs), and reduced graphene oxides. Among them, CNT has been used to fabricate a composite film with polydimethylsiloxane (PDMS) that exhibits excellent photoacoustic conversion performance for high-frequency, high-amplitude ultrasound generation. Previously, CNT-PDMS nanocomposite films were made by using a high-temperature chemical vapor deposition (HTCVD) process for CNT growth. However, this approach is not suitable to fabricate large-area CNT films (>several cm2). This is because a chamber dimension of HTCVD is limited and also the process often causes nonuniform CNT growth when the film area increases. As an alternative approach, a solution-based process can be used to overcome these issues. We develop PDMS composite transmitters, based on the solution process, using several nanostructured light-absorbers such as CNTs, nanoink powders, and imprinted regular arrays of gold nanostructure. We compare fabrication processes of each composite transmitters and photoacoustic output performance.

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Structural and Electrical Features of Solution-Processed Li-doped ZnO Thin Film Transistor Post-Treated by Ambient Conditions

  • Kang, Tae-Sung;Koo, Jay-Hyun;Kim, Tae-Yoon;Hong, Jin-Pyo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.242-242
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    • 2012
  • Transparent oxide semiconductors are increasingly becoming one of good candidates for high efficient channel materials of thin film transistors (TFTs) in large-area display industries. Compare to the conventional hydrogenated amorphous silicon channel layers, solution processed ZnO-TFTs can be simply fabricated at low temperature by just using a spin coating method without vacuum deposition, thus providing low manufacturing cost. Furthermore, solution based oxide TFT exhibits excellent transparency and enables to apply flexible devices. For this reason, this process has been attracting much attention as one fabrication method for oxide channel layer in thin-film transistors (TFTs). But, poor electrical characteristic of these solution based oxide materials still remains one of issuable problems due to oxygen vacancy formed by breaking weak chemical bonds during fabrication. These electrical properties are expected due to the generation of a large number of conducting carriers, resulting in huge electron scattering effect. Therefore, we study a novel technique to effectively improve the electron mobility by applying environmental annealing treatments with various gases to the solution based Li-doped ZnO TFTs. This technique was systematically designed to vary a different lithium ratio in order to confirm the electrical tendency of Li-doped ZnO TFTs. The observations of Scanning Electron Microscopy, Atomic Force Microscopy, and X-ray Photoelectron Spectroscopy were performed to investigate structural properties and elemental composition of our samples. In addition, I-V characteristics were carried out by using Keithley 4,200-Semiconductor Characterization System (4,200-SCS) with 4-probe system.

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Solution-based fabrication of germanium sulphide doped with or without Li ions for solid electrolyte applications

  • Jin, Byeong Kyou;Cho, Yun Gu;Shin, Dong Wook;Choi, Yong Gyu
    • Journal of Ceramic Processing Research
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    • 제13권spc1호
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    • pp.110-113
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    • 2012
  • Ge-S and Li-Ge-S powders were synthesized via solution-based process in order to employ chalcogenide-based solid electrolyte for use in Li secondary batteries. GeCl4 and thioacetamide in combination result in Ge-S powders of which major crystalline phase becomes GeS2 where the tetragonal and orthorhombic phases coexist after heat treatment. A chemical treatment using NaOH brings about the reduction of chlorine in the powders obtained. However, the heat treatment at 300 ℃ is more effective in minimizing the chlorine content. When lithium chloride is used as the precursor of Li ions, the LiCl powders are agglomerated with an inhomogeneous distribution. When Li2S is used, the Li-Ge-S powders are distributed more uniformly and the orthorhombic GeS2 phase dominates in the powders.

Preparation of high-performance nanofiltration membrane with antioxidant properties

  • Yu, Feiyue;Zhang, Qinglei;Pei, Zhiqiang;Li, Xi;Yang, Xuexuan;Lu, Yanbin
    • Membrane and Water Treatment
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    • 제13권4호
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    • pp.191-199
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    • 2022
  • In industrial production, the development of traditional polyamide nanofiltration (NF) membrane was limited due to its poor oxidation resistance, complex preparation process and high cost. In this study, a composite NF membrane with high flux, high separation performance, high oxidation resistance and simple process preparation was prepared by the method of dilute solution dip coating. And the sulfonated polysulfone was used for dip coating. The results indicated that the concentration of glycerin, the pore size of the based membrane, the composition of the coating solution, and the post-treatment process had important effects on the structure and performance of the composite NF membrane. The composite NF membrane prepared without glycerol protecting based membrane had a low flux, when the concentration of glycerin increased from 5% to 15%, the pure water flux of the composite NF membrane increased from 46.4 LMH to 108.2 LMH, and the salt rejection rate did not change much. By optimizing the coating system, the rejection rate of Na2SO4 and PEG1000 was higher than 90%, the pure water flux was higher than 40 LMH (60psi), and it can withstand 20,000 ppm.h NaClO solution cleaning. When the post treatment processes was adjusted, the salt rejection rate of NaCl solution (250 ppm) reached 45.5%, and the flux reached 62.2 LMH.