• Title/Summary/Keyword: SolarCell

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Fabrication of P-type Transparent Oxide Semiconductor SrCu2O2 Thin Films by RF Magnetron Sputtering (RF 마그네트론 스퍼터링을 이용한 p 타입 투명전도 산화물 SrCu2O2 박막의 제조)

  • Seok, Hye-Won;Kim, Sei-Ki;Lee, Hyun-Seok;Lim, Tae-Young;Hwang, Jong-Hee;Choi, Duck-Kyun
    • Korean Journal of Materials Research
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    • v.20 no.12
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    • pp.676-680
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    • 2010
  • Most TCOs such as ITO, AZO(Al-doped ZnO), FTO(F-doped $SnO_2$) etc., which have been widely used in LCD, touch panel, solar cell, and organic LEDs etc. as transparent electrode material reveal n-type conductivity. But in order to realize transparent circuit, transparent p-n junction, and introduction of transparent p-type materials are prerequisite. Additional prerequisite condition is optical transparency in visible spectral region. Oxide based materials usually have a wide optical bandgap more than ~3.0 eV. In this study, single-phase transparent semiconductor of $SrCu_2O_2$, which shows p-type conductivity, have been synthesized by 2-step solid state reaction at $950^{\circ}C$ under $N_2$ atmosphere, and single-phase $SrCu_2O_2$ thin films of p-type TCOs have been deposited by RF magnetron sputtering on alkali-free glass substrate from single-phase target at $500^{\circ}C$, 1% $H_2$/(Ar + $H_2$) atmosphere. 3% $H_2$/(Ar + $H_2$) resulted in formation of second phases. Hall measurements confirmed the p-type nature of the fabricated $SrCu_2O_2$ thin films. The electrical conductivity, mobility of carrier and carrier density $5.27{\times}10^{-2}S/cm$, $2.2cm^2$/Vs, $1.53{\times}10^{17}/cm^3$ a room temperature, respectively. Transmittance and optical band-gap of the $SrCu_2O_2$ thin films revealed 62% at 550 nm and 3.28 eV. The electrical and optical properties of the obtained $SrCu_2O_2$ thin films deposited by RF magnetron sputtering were compared with those deposited by PLD and e-beam.

A Development of Green Transportation Design for Special Identity of Jecheon Area - centered on Exterior Design for Development of Design Business - (제천지역의 특성화를 위한 친환경운송수단 디자인개발 - 디자인비즈니스 개발을 위한 익스테리어 디자인을 중심으로 -)

  • Mun Keum-Hi
    • Archives of design research
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    • v.19 no.4 s.66
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    • pp.175-186
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    • 2006
  • In the 21C, each nation controls exhaust fumes from automobiles and makes an effort to develop alternative energy because of serious environmental problem. Jechon area has many historical and cultural archeological sites. And Jechon city sponsors various cultural events. But the way of transportation which is connected with Jecheon and around sightseeing places is general and not ready yet. Therefore, if a special means of vehicle is developed, it could play an another role of sightseeing resources. Special identity of Jecheon area for establishment of green vehicle traffic system which gives Jecheon area specific character was investigated for theoretical background. Traffic system was studied for establishment of direction through existent successful case study. Moreover content, method, structure and advantage & shortcoming etc. of vehicle that use green energy resource such as solar car, fuel cell car, hybrid car, natural gas car etc. were examined. The suitable means of vehicle for Jechon area was proposed to three directions with research and investigation. After comparison and investigation by inquiry of each section's experts, the most suitable traffic system of which energy resource of car, form of vehicles, the complement, dimension of vehicles etc. were decided. Design proposal should be drawn according to process of automobile design in decided direction. Special Exterior design of vehicle that use green energy resource connecting Jecheon and around area should be suggested in Jecheon City Hall and Chungchong-bukdo provincial office for vivify image of cleanliness area.

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The Survey and Analysis of Technology Level on Korea's Key Green Technologies and its Implications (우리나라의 중점녹색기술수준 조사.분석 및 시사점)

  • Hong, Mi-Young;Hwang, KiHa;Hong, Jung Suk;Lee, Kyong-Jae
    • Journal of Korea Technology Innovation Society
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    • v.16 no.2
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    • pp.476-505
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    • 2013
  • Korea government has established and pursued green technology development strategy as the core of green growth, for example, withdrawal of 27 key green technologies through 'green technology research and development comprehensive plan ('09.1)' since 'low carbon green growth' was proposed as a new national development paradigm. In this study, we performed the Delphi survey of technology levels of 131 strategic product and service technologies derived from 27 key green technologies, utilizing large-scale group of green technology experts. The survey of technology level among main five nations resulted in the world's leading nation (US) versus EU (99.4%), Japan (95.3%), Korea (77.7%), China (67.1%) and Korea was ranked fourth. The technology gap between the world's leading nation (US) and Korea is 4.1 years behind EU (3.9 years) and Japan(3.1 years), but 2.1 years earlier than China. For our nation, key green technologies with high technology level are 'improved light water reactor (90.1%)', 'silicon-based solar cell (85.0%)', 'high-efficiency low-emission car (84.5%)' in order. Depending on the investment type of key green technologies, technology level is represented as short-term (85.0%), mid-term (77.3%) and long-term (71.1%) in order, indicating that lower technology level requires mid-to long-term investment and that the investment type is set appropriate.

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Radiation detector material development with multi-layer by hetero-junction for the reduction of leakage current (헤테르접합을 이용한 누설전류 저감을 위한 다층구조의 방사선 검출 물질 개발)

  • Oh, Kyung-Min;Yoon, Min-Seok;Kim, Min-Woo;Cho, Sung-Ho;Nam, Sang-Hee;Park, Ji-Goon
    • Journal of the Korean Society of Radiology
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    • v.3 no.1
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    • pp.11-15
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    • 2009
  • In this study, the basic research verifying possibility of applications as radiology image sensor in Digital Radiography was performed, the radiology image sensor was fabricated using a multi-layer technique to decrease dark current. High efficiency materials in substitution for Amorphous Selenium(a-Se) have been studied as a direct method of imaging detector in Digital Radiography to decrease dark current by using PN junction or Hetero junction already used as solar cell, semiconductor. Particle-In -Binder method is used to fabricate radiology image sensor because it has a lot of advantages such as fabrication convenient, high yield, suitability for large area sensor. But high leakage current is one of main problem in Particle-In -Binder method. To make up for the weak points, multi-layer technique is used, and it is considered that high efficient digital radiation sensor can be fabricated with easy and convenient process. In this study, electrical properties such as leakage current, sensitivity, signal linearity is measured to evaluate multi-layer radiation sensor material.

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Effects of Annealing on Ni/Au Ohmic Contact to Nonpolar p-type GaN

  • Lee, Dong-Min;Kim, Jae-Gwan;Yang, Su-Hwan;Kim, Jun-Yeong;Lee, Seong-Nam;Lee, Ji-Myeon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.358-359
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    • 2012
  • 최근 분극 특성이 상이한 무분극 GaN 에피성장에 관한 심도 있는 연구와 함께 전자-전공 캐리어의 주입 및 캐리어의 거동, 방출되는 편광 특성 및 다양한 물리적 특성들에 대해 보고되고 있으며, 광학적 특성 및 물리적 특성의 확보를 위한 많은 연구가 활발히 진행 중이다 [1]. GaN의 ohmic 접촉(ohmic contact)의 형성은 발광 다이오드(light emitting diode), 레이저 다이오드(Laser), 태양전지(solar cell)와 같은 고신뢰도, 고효율 광전자 소자를 제조하기 위해서는 매우 중요하다 [2]. 그러나 이와 함께 병행 되어야 할 무분극 p-GaN 의 ohmic contact에 관한 연구는 많이 이루어지고 있지 않는 실정이다. 따라서 본 논문에서는 r-plane 사파이어 기판 상에 성장된 p-GaN에서의 ohmic 접촉 형성 연구를 위하여 Ni/Au ohmic 전극의 접촉저항 특성을 연구하였다. 본 실험에서는 성장된 a-plane GaN의 Hole농도가 $3.09{\times}1017cm3$ 인 시편을 사용하였다. E-beam evaporation 장비를 이용하여 Ni/Au를 각각 20 nm 그리고80 nm 증착 하였으며 비접촉저항을 측정하기 위해 Circle-Transfer Length Method (C-TLM) 패턴을 사용하였다. 샘플은 RTA (Rapid Thermal Annealing)를 사용하여 $300^{\circ}C$에서 $700^{\circ}C$까지 온도를 변화시키며 전기적 특성을 비교하여 그림 1(a) 나타내었다. 그림에서 알 수 있듯이 $400^{\circ}C$에서 가장 낮은 비접촉저항 값인 $6.95{\times}10-3{\Omega}cm2$를 얻을 수 있음을 발견하였다. 이 때의 I-V curve 도 그림1(b)에 나타낸 바와 같이 열처리에 의해 크게 향상됨을 알 수 있다. 그러나, $500^{\circ}C$ 이상 온도를 증가시키면 다시 비접촉 저항이 증가하는 것을 관찰하였다. XRD (x-Ray Diffraction) 분석을 통하여 $400^{\circ}C$ 이상열처리 온도가 증가하면 금속 표면에 $NiO_2$가 형성되며, 이에 따라 오믹특성이 저하 된다고 사료된다. 또한 $Ni_3N$의 존재를 확인 하였으며 이는 nonpolar surface의 특성으로 인해 nitrogen out diffusion 현상이 동시에 발생하여 계면에는 dopant로 작용하는 질소 공공을 남기고 표면에 $Ni_3N$을 형성하여 ohmic contact의 특성이 저하되기 때문인 것으로 사료된다.

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Research on the Multi-electrode Plasma Discharge for the Large Area PECVD Processing

  • Lee, Yun-Seong;You, Dae-Ho;Seol, You-Bin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.478-478
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    • 2012
  • Recently, there are many researches in order to increase the deposition rate (D/R) and improve film uniformity and quality in the deposition of microcrystalline silicon thin film. These two factors are the most important issues in the fabrication of the thin film solar cell, and for the purpose of that, several process conditions, including the large area electrode (more than 1.1 X 1.3 (m2)), higher pressure (1 ~ 10 (Torr)), and very high frequency regime (VHF, 40 ~ 100 (MHz)), have been needed. But, in the case of large-area capacitively coupled discharges (CCP) driven at frequencies higher than the usual RF (13.56 (MHz)) frequency, the standing wave and skin effects should be the critical problems for obtaining the good plasma uniformity, and the ion damage on the thin film layer due to the high voltage between the substrate and the bulk plasma might cause the defects which degrade the film quality. In this study, we will propose the new concept of the large-area multi-electrode (a new multi-electrode concept for the large-area plasma source), which consists of a series of electrodes and grounds arranged by turns. The experimental results with this new electrode showed the processing performances of high D/R (1 ~ 2 (nm/sec)), controllable crystallinity (~70% and controllable), and good uniformity (less than 10%) at the conditions of the relatively high frequency of 40 MHz in the large-area electrode of 280 X 540 mm2. And, we also observed the SEM images of the deposited thin film at the conditions of peeling, normal microcrystalline, and powder formation, and discussed the mechanisms of the crystal formation and voids generation in the film in order to try the enhancement of the film quality compared to the cases of normal VHF capacitive discharges. Also, we will discuss the relation between the processing parameters (including gap length between electrode and substrate, operating pressure) and the processing results (D/R and crystallinity) with the process condition map for ${\mu}c$-Si:H formation at a fixed input power and gas flow rate. Finally, we will discuss the potential of the multi-electrode of the 3.5G-class large-area plasma processing (650 X 550 (mm2) to the possibility of the expansion of the new electrode concept to 8G class large-area plasma processing and the additional issues in order to improve the process efficiency.

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InAs/GaAs 양자점 태양전지의 Photoreflectance Spectra에서 AlGaAs Potential Barrier 두께에 따른 Franz Keldysh Oscillation 주파수 특성

  • Son, Chang-Won;Lee, Seung-Hyeon;Han, Im-Sik;Min, Seong-Sik;Ha, Jae-Du;Lee, Sang-Jo;Smith, Ryan P.;Kim, Jong-Su;Lee, Sang-Jun;No, Sam-Gyu;Kim, Jin-Su;Choe, Hyeon-Gwang;Im, Jae-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.441-441
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    • 2012
  • Franz Keldysh Oscillation (FKO)은 p-n 접합 구조의 Photoreflectance (PR) spectra에서 표면 및 계면의 전기장(electric field) 특성을 반영한다. InAs/GaAs 양자점 태양전지(Quantum Dot Solar Cell, QDSC) 구조에서 InAs 양자점 층 전후에 AlGaAs 층을 삽입하여 퍼텐셜 장벽(potential barrier) 두께에 따른 PR spectra 및 GaAs-matrix에서 FKO 주파수 특성을 비교 분석하였다. InAs/GaAs 양자점 태양전지는 p-i-n 구조의 i-GaAs에 2.0 monolayer (ML), 8주기의 InAs 양자점 층을 삽입하여 Molecular Beam Epitaxy (MBE) 방법으로 성장하였다. 각 양자점 층 전후에 두께가 각각 0.0, 1.6, 2.8, 6.0 nm인 AlGaAs 층을 삽입하여 퍼텐셜 장벽 두께에 따른 FKO 주파수 변화를 관측하였다. 또한 태양전지 구조의 전기장 분포를 좀 더 용이하게 관측하기 위해 여기 광의 세기(power intensity)를 충분히 낮추어 Photovoltaic effect에 의한 내부 전기장의 변화를 최소화하여 비교 분석하였다. InAs/GaAs 양자점 태양전지 구조에서 AlGaAs 장벽층이 없는 경우, PR spectra의 Fast Fourier Transform 결과에 반영되는 FKO 주파수 특성은 p-i-n 구조 계면에서 공핍층(depletion region)의 space charge field보다 양자점 층의 내부 전기장에 의한 FKO 주파수가 더 큰 진폭(amplitude)을 보였다. 반면에, AlGaAs 장벽층이 삽입되면 두께가 커짐에 따라 p-i-n 구조 계면의 space charge field에 의해 더 큰 진폭의 FKO 주파수가 관측되었다. 이는 AlGaAs 장벽층이 삽입됨으로써 양자점 층 내 양자 상태 수 및 여기광에 의한 캐리어의 수와 관련이 있음을 확인하였으며, 결과적으로 GaAs-matrix에서 p-i-n 구조 계면의 space charge field에 영향을 미치게 됨을 알 수 있다. 이러한 PR 특성 결과들을 InAs/GaAs 양자점 태양전지의 설계 및 제조에 반영함으로써 양자효율 증대에 기여할 것으로 기대된다.

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Analysis of Mechanism for Photovoltaic Properties and Bypass Diode of Crystalline Silicon and CuInxGa(1-x)Se2 Module in Partial Shading Effect (결정질 실리콘 및 CuInxGa(1-x)Se2 모듈의 부분음영에 따른 태양전지 특성 변화 및 바이패스 다이오드의 작동 메커니즘 분석)

  • Lee, Ji Eun;Bae, Soohyun;Oh, Wonwook;Kang, Yoonmook;Kim, Donghwan;Lee, Hae-Seok
    • Korean Journal of Materials Research
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    • v.25 no.4
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    • pp.196-201
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    • 2015
  • This paper presents the impact of partial shading on $CuIn_xGa_{(1-x)}Se_2(CIGS)$ photovoltaic(PV) modules with bypass diodes. When the CIGS PV modules were partially shaded, the modules were under conditions of partial reverse bias. We investigated the characterization of the bypass diode and solar cell properties of the CIGS PV modules when these was partially shaded, comparing the results with those for a crystalline silicon module. In crystalline silicon modules, the bypass diode was operated at a partial shade modules of 1.67 % shading. This protected the crystalline silicon module from hot spot damage. In CIGS thin film modules, on the other hand, the bypass diode was not operated before 20 % shading. This caused damage because of hotspots, which occurred as wormlike defects in the CIGS thin film module. Moreover, the bypass diode adapted to the CIGS thin film module was operated fully at 60% shading, while the CIGS thin film module was not operated under these conditions. It is known that the bypass diode adapted to the CIGS thin film module operated more slowly than that of the crystalline silicon module; this bypass diode also failed to protect the module from damage. This was because of the reverse saturation current of the CIGS thin film, $1.99{\times}10^{-5}A/cm^2$, which was higher than that of crystalline silicon, $8.11{\times}10^{-7}A/cm^2$.

Optical Characteristics of Near-monolayer InAs Quantum Dots

  • Kim, Yeong-Ho;Kim, Seong-Jun;No, Sam-Gyu;Park, Dong-U;Kim, Jin-Su;Im, In-Sik;Kim, Jong-Su
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.293-294
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    • 2011
  • It is known that semiconductor quantum-dot (QD) heterostructures have superior zero-dimensional quantum confinement, and they have been successfully applied to semiconductor laser diodes (QDLDs) for optical communication and infrared photodetectors (QDIPs) for thermal images [1]. The self-assembled QDs are normally formed at Stranski-Krastanov (S-K) growth mode utilizing the accumulated strain due to lattice-mismatch existing at heterointerfaces between QDs and cap layers. In order to increase the areal density and the number of stacks of QDs, recently, sub-monolayer (SML)-thick QDs (SQDs) with reduced strain were tried by equivalent thicknesses thinner than a wetting layer (WL) existing in conventional QDs (CQDs) by S-K mode. Despite that it is very different from CQDs with a well-defined WL, the SQD structure has been successfully applied to QDIP[2]. In this study, optical characteristics are investigated by using photoluminescence (PL) spectra taken from self-assembled InAs/GaAs QDs whose coverage are changing from submonolayer to a few monolayers. The QD structures were grown by using molecular beam epitaxy (MBE) on semi-insulating GaAs (100) substrates, and formed at a substrate temperature of 480$^{\circ}C$ followed by covering GaAs cap layer at 590$^{\circ}C$. We prepared six 10-period-stacked QD samples with different InAs coverages and thicknesses of GaAs spacer layers. In the QD coverage below WL thickness (~1.7 ML), the majority of SQDs with no WL coexisted with a small amount of CQDs with a WL, and multi-peak spectra changed to a single peak profile. A transition from SQDs to CQDs was found before and after a WL formation, and the sublevel of SQDs peaking at (1.32${\pm}$0.1) eV was much closer to the GaAs bandedge than that of CQDs (~1.2 eV). These revealed that QDs with no WL could be formed by near-ML coverage in InAs/GaAs system, and single-mode SQDs could be achieved by 1.5 ML just below WL that a strain field was entirely uniform.

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Technical Trends of Hydrogen Production (수소생산 기술동향)

  • Ryi, Shin-Kun;Han, Jae-Yun;Kim, Chang-Hyun;Lim, Hankwon;Jung, Ho-Young
    • Clean Technology
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    • v.23 no.2
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    • pp.121-132
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    • 2017
  • The increase of greenhouse gases and the concern of global warming instigate the development and spread of renewable energy and hydrogen is considered one of the clean energy sources. Hydrogen is one of the most elements in the earth and exist in the form of fossil fuel, biomass and water. In order to use hydrogen for a clean energy source, the hydrogen production method should be eco-friendly and economic as well. There are two different hydrogen production methods: conventional thermal method using fossil fuel and renewable method using biomass and water. Steam reforming, autothermal reforming, partial oxidation, and gasification (using solid fuel) have been considered for hydrogen production from fossil fuel. When using fossil fuel, carbon dioxide should be separated from hydrogen and captured to be accepted as a clean energy. The amount of hydrogen from biomass is insignificant. In order to occupy noticeable portion in hydrogen industries, biomass conversion, especially, biological method should be sufficiently improved in a process efficiency and a microorganism cultivation. Electrolysis is a mature technology and hydrogen from water is considered the most eco-friendly method in terms of clean energy when the electric power is from renewable sources such as photovoltaic cell, solar heat, and wind power etc.