• Title/Summary/Keyword: Sol-gel hybrid binder

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Printability of Thermally and Chemically Stable Silica-Titanium Dioxide Composite Coating Layer (실리카-이산화티탄 복합 코팅층의 열적, 화학적 안정성 및 인쇄적성 평가)

  • Kim, Hye Jin;Han, Kyu Sung;Hwang, Kwang Taek;Nahm, Sahn;Kim, Jin Ho
    • Korean Journal of Materials Research
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    • v.29 no.10
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    • pp.631-638
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    • 2019
  • As automation systems become more common, there is growing interest in functional labeling systems using organic and inorganic hybrid materials. Especially, the demand for thermally and chemically stable labeling paper that can be used in a high temperature environment above $300^{\circ}C$ and a strong acid and base atmosphere is increasing. In this study, a composite coating solution for the development of labeling paper with excellent thermal and chemical stability is prepared by mixing a silica inorganic binder and titanium dioxide. The silica inorganic binder is synthesized using a sol-gel process and mixed with titanium dioxide to improve whiteness at high-temperature. Adhesion between the polyimide substrate and the coating layer is secured and the surface properties of the coating layer, including the thermal and chemical stability, are investigated in detail. The effects of the coating solution dispersion on the surface properties of the coating layer are also analyzed. Finally, it is confirmed that the developed functional labeling paper showed excellent printability.

Fabrication of Transparent Conducting Thin Film with High Hardness by Wet Process (습식 공정법에 의한 고경도 투명 전도막 제조)

  • Park, Jong-Guk;Jeon, Dae-Woo;Lee, Mi-Jai;Lim, Tea-Young;Hwang, Jonghee;Kim, Jin-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.28 no.12
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    • pp.826-830
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    • 2015
  • Transparent Ag nanowire conducting thin films with high surface hardness were fabricated by bar coating method. When coating speed was changed from 35 mm/sec to 50 mm/sec, the transmittance of coated glass increased from 65.3% to 80.8% in visible light range and the surface resistance was changed from $10.1{\Omega}/sq$ to $23.3{\Omega}/sq$. The surface hardness and adhesion of thin film were 5H and 5B.