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http://dx.doi.org/10.4313/JKEM.2015.28.12.826

Fabrication of Transparent Conducting Thin Film with High Hardness by Wet Process  

Park, Jong-Guk (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology)
Jeon, Dae-Woo (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology)
Lee, Mi-Jai (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology)
Lim, Tea-Young (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology)
Hwang, Jonghee (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology)
Kim, Jin-Ho (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.28, no.12, 2015 , pp. 826-830 More about this Journal
Abstract
Transparent Ag nanowire conducting thin films with high surface hardness were fabricated by bar coating method. When coating speed was changed from 35 mm/sec to 50 mm/sec, the transmittance of coated glass increased from 65.3% to 80.8% in visible light range and the surface resistance was changed from $10.1{\Omega}/sq$ to $23.3{\Omega}/sq$. The surface hardness and adhesion of thin film were 5H and 5B.
Keywords
Wet process; Conducting film; Ag nanowire; Sol-gel hybrid binder; Hardness;
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