• Title/Summary/Keyword: Sn-doped $In_2O_3$

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Synthesis of Cr-doped Pyrochlore-type Pigments and Coloring in Glazes (Cr-doped Pyrochlore계 안료의 합성 및 유약에서의 발색)

  • Eo, Hye-Jin;Lee, Byung-Ha
    • Journal of the Korean Ceramic Society
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    • v.48 no.4
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    • pp.298-302
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    • 2011
  • This study developed a pigment by doping Cr to Pyrochlore-type stannate crystals and investigated the chromogenic relationship in a glaze. Crystal phases of the pigment according to firing temperatures were analyzed by XRD, and the doping relationship was analyzed by Raman Spectroscopy. Color and reflection rate of the pigment were measured by UV-vis Spectrophotometer. Consequently, stannate characteristic band appeared at 307, 408, 505 and $755cm^{-1}$ until 0.1 mole substitution of $Cr_2O_3$. However, as amount of $Cr_2O_3$ increased, the stannate characteristic peak was decreased and shift happened at the left hand side due to Cr-dope. In composition of 0.12~0.14 mole substituted, the unreacted $Cr_2O_3$ stannate characteristic peak, which was not engaged, was shown. This result shows the maximum limit of solid solution was 0.1 mole $Cr_2O_3$. The color of the glaze, which was produced by adding 6 wt% of $Y_2Sn_{1.94}Cr_{0.06}O_7$ pigment in a lime or a lime-magnesia glaze and fired the mixture at $1260^{\circ}C$, was grayish pink with $L^*$ 70.29, $a^*$ 5.68 and $b^*$ 6.27. It showed gray with $L^*$ 68.82, $a^*$ 3.07and $b^*$ 8.13 for $Y_2Sn_{1.9}Cr_{0.1}O_7$.

Fabrication and yield improvement of oxide semiconductor thin film gas sensor array (산화물 반도체 박막 가스센서 어레이의 제조 및 수율 개선)

  • 이규정;류광렬;허창우
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.6 no.2
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    • pp.315-322
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    • 2002
  • A thin film oxide semiconductor micro gas sensor array which shows only 60㎽ of power consumption at an operating temperature of 30$0^{\circ}C$ has been fabricated using microfabrication and rnicrornachining techniques. Excellent thermal insulation of the membrane is achieved by the use of a double la! or structure of 0.1${\mu}{\textrm}{m}$ thick Si$_3$N$_4$ and 1${\mu}{\textrm}{m}$ thick phosphosilicate glass(PSG) prepared by low pressure chemical vapor deposition(LPCVD) and atmospheric-pressure chemical-vapor deposition(APCVD), respectively. The sensor way consists of such thin film oxide semiconductor sensing materials as 1wt.% Pd-doped SnO$_2$, 6wt.% AI$_2$O$_3$-doped ZnO, WO$_3$ and ZnO. The thin film oxide semiconductor micro gas sensor array exhibited resistance changes usable for subsequent data processing upon exposure to various gases and the sensitivity strongly depended on the sensing layer materials. Heater Part of the sensor structure has been modified in order to improve the process yield of the sensor, and as a result of modified heater structure improved process yield has been achieved.

Effects of Sb doping on the Characteristis of $SnO_2$ Transparent Electrodes ($SnO_2$ 수용전극특성에 미치는 Sb첨가의 영향)

  • 이정한
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.13 no.3
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    • pp.16-21
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    • 1976
  • Transparent eloctroaes of polycrystalline till-oxide films doped with antimony are prepared on the substrate of microscopic cover g1ass by modified spray method and from SnCl4 Solution. Their electrical and optical properties are investigated in relation to the surface temperature of the substrate glass and to antimony concentration in the starting materials. The sheet.resiststrace of the film electrodes and transmittance for incandescent light depen on tile antimony concentration and surface temperature of substrates at the time of making films. The transmittance increases with decrease of sheet resistance of the film. The optimum sheet.resistance was obtianed in the case of the antimony concentration 0.6(%) approximately , and the max. transmittance was 93(%).

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Microstructure and Microwave Dielectric Properties of Ni-doped $(Zr_{0.8}Sn_{0.2})$TiO$_4$ Ceramics (Ni가 첨가된 $(Zr_{0.8}Sn_{0.2})$TiO$_4$세라믹스의 미세구조와 고주파유전성질)

  • Lee, Dal-Won;Nahm, Sahn;Byun, Jae-Dong;Kim, Myong-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.11a
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    • pp.59-62
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    • 1996
  • The effect of NiO addition on the microstructure and microwave dielectric properties of (Zr$_{0.8}$Sn$_{0.2}$)TiO$_4$(ZST) was investigated. With the NiO addition, a dense ZST body of density higher than 95% has been achieved in the sintering temperature range of 1400 to 150$0^{\circ}C$. Energy dispersive X-ray spectrometry (EDS) analysis of sintered specimen shows the presence of second phase at grain boundaries, which is considered to be NiTiO$_3$. Dielectric constant of the specimen is found to increase linearly with density. Q-values and TC$_{f}$decrease with increasing NiO content. The variation of dielectric properties with NiO content is discussed in term of the second phase. The ZST ceramics with small amount of additive gave $\varepsilon$$_{r}$=38, Q=7000 at 7 GHz and TC$_{f}$=-0.5 ppm/$^{\circ}C$, comparable with the values obtained by previous investigation.stigation.

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Fabrication of compact surface structure by molar concentration on Sb-doped SnO2 transparent conducting films (안티몬 도핑된 주석 산화물 투명전도막의 몰 농도에 따른 치밀한 표면 구조 제조)

  • Bae, Ju-Won;Koo, Bon-Ryul;Ahn, Hyo-Jin
    • Journal of Powder Materials
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    • v.25 no.1
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    • pp.54-59
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    • 2018
  • Sb-doped $SnO_2$ (ATO) transparent conducting films are fabricated using horizontal ultrasonic spray pyrolysis deposition (HUSPD) to form uniform and compact film structures with homogeneously supplied precursor solution. To optimize the molar concentration and transparent conducting performance of the ATO films using HUSPD, we use precursor solutions of 0.15, 0.20, 0.25, and 0.30 M. As the molar concentration increases, the resultant ATO films exhibit more compact surface structures because of the larger crystallite sizes and higher ATO crystallinity because of the greater thickness from the accelerated growth of ATO. Thus, the ATO films prepared at 0.25 M have the best transparent conducting performance ($12.60{\pm}0.21{\Omega}/{\square}$ sheet resistance and 80.83% optical transmittance) and the highest figure-of-merit value ($9.44{\pm}0.17{\times}10^{-3}{\Omega}^{-1}$). The improvement in transparent conducting performance is attributed to the enhanced carrier concentration by the improved ATO crystallinity and Hall mobility with the compact surface structure and preferred (211) orientation, ascribed to the accelerated growth of ATO at the optimized molar concentration. Therefore, ATO films fabricated using HUSPD are transparent conducting film candidates for optoelectronic devices.

Study of the Feature of Antimony doped Tin Oxide Using Urea (우레아를 이용한 ATO(Antimony doped Tin Oxide)의 특성 연구)

  • Kim, Jin-Chul;Ahn, Yong-Kwan;Choi, Byung-Hyun;Lee, Mi-Jae;Back, Jong-Hoo;Sim, Kaung-Bo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.361-362
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    • 2005
  • Antimony doped tin oxide(ATO) nano powders have been synthesized by homogeneous precipitation method using $SnCl_4\cdot5H_2O$ for precursor, $SbCl_3$ as doped material and urea. The hydrolysis of urea and conductive mechanism and Heat treatment was performed at the temperature from $500^{\circ}C$ to $700^{\circ}C$ in air. The ATO nano powders are characterized by means of Thermogravimetry differential thermal analyzer (TG-DTA), X-ray diffraction (XRD), Brunauer, Emmett, and Teller adsorption (BET), Scanning electron microscopy (SEM) ATO nano powders with an average size of nm and the highest surface area 129 $m^2g^{-1}$ are obtained.

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Optimization of ZnO-based transparent conducting oxides for thin-film solar cells based on the correlations of structural, electrical, and optical properties (ZnO 박막의 구조적, 전기적, 광학적 특성간의 상관관계를 고려한 박막태양전지용 투명전극 최적화 연구)

  • Oh, Joon-Ho;Kim, Kyoung-Kook;Song, Jun-Hyuk;Seong, Tae-Yeon
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.11a
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    • pp.42.2-42.2
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    • 2010
  • Transparent conducting oxides (TCOs) are of significant importance for their applications in various devices, such as light-emitting diodes, thin-film solar cells, organic light-emitting diodes, liquid crystal displays, and so on. In order for TCOs to contribute to the performance improvement of these devices, TCOs should have high transmittance and good electrical properties simultaneously. Sn-doped $In_2O_3$ (ITO) is the most commonly used TCO. However, indium is toxic and scarce in nature. Thus, ZnO has attracted a lot of attention because of the possibility for replacing ITO. In particular, group III impurity-doped ZnO showed the optoelectronic properties comparable to those of ITO electrodes. Al-doped ZnO exhibited the best performance among various doped ZnO films because of the high substitutional doping efficiency. However, in order for the Al-doped ZnO to replace ITO in electronic devices, their electrical and optical properties should further significantly be improved. In this connection, different ways such as a variation of deposition conditions, different deposition techniques, and post-deposition annealing processes have been investigated so far. Among the deposition methods, RF magnetron sputtering has been extensively used because of the easiness in controlling deposition parameters and its fast deposition rate. In addition, when combined with post-deposition annealing in a reducing ambient, the optoelectronic properties of Al-doped ZnO films were found to be further improved. In this presentation, we deposited Al-doped ZnO (ZnO:$Al_2O_3$ = 98:2 wt%) thin films on the glass and sapphire substrates using RF magnetron sputtering as a function of substrate temperature. In addition, the ZnO samples were annealed in different conditions, e.g., rapid thermal annealing (RTA) at $900^{\circ}C$ in $N_2$ ambient for 1 min, tube-furnace annealing at $500^{\circ}C$ in $N_2:H_2$=9:1 gas flow for 1 hour, or RTA combined with tube-furnace annealing. It is found that the mobilities and carrier concentrations of the samples are dependent on growth temperature followed by one of three subsequent post-deposition annealing conditions.

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마그네트론 스퍼터링법을 이용하여 증착한 Sn doped IZO 박막의 열전 특성

  • Byeon, Ja-Yeong;Song, Pung-Geun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.253-253
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    • 2016
  • 최근 세계적으로 대체 에너지는 중요한 이슈가 되고 있으며 그 중 열전 재료는 유망한 에너지 기술로서 주목 받고 있다. 특히 고 직접화 전자 소자의 발열 문제를 해결하기 위해, 소형화와 정밀 온도 제어가 가능한 박막형 열전 소자에 연구가 주목 받고 있다. 박막형 열전소자 중 산화물 반도체계에 대한 연구가 활발히 진행되고 있으며, 이러한 산화물 반도체계 중 In2O3는 BiTe, PbTe 등의 기존의 재료에 비해 독성이 낮을 뿐만 아니라 내 산화성 및 고온에서 열적 안정성이 우수하여 고온에서 적용 불가능한 금속계 열전 재료의 한계를 극복 할 수 있다는 장점을 가진다. 우수한 성능 가장 낮은 캐리어 밀도를 가지기 때문에 의 열전 재료는 높은 전기 전도도 및 제백 계수 그리고 낮은 열전도도 특성을 가져야만 한다. IZO:Sn(Zn 10 wt.%, Sn 800 ppm) 박막의 경우, 높은 전기 전도성을 가지면서 비정질 구조를 가진다. 이와 같이 비정질 구조를 가지는 박막 열전 재료는 격자에 의한 열 전도도가 낮기 때문에 결정질 구조에 비해 전체 열 전도도 값이 낮을 것으로 기대된다. 따라서 높은 전기 전도도를 가지면서 동시에 낮은 열 전도도를 가지게 되어 우수한 열전 특성을 가질 것이라 예상된다. 이러한 특성을 바탕으로 본 연구에서는 비정질 구조를 갖는 Zn와 미량의 Sn을 동시에 첨가한 In2O3박막의 전기적 특성및 열전 특성을 관찰하고자 한다. 본 연구에서는 magnetron sputtering법으로 IZO:Sn(Zn 10 wt.%, Sn 800 ppm) 타깃을 이용하여 기판 가열없이 DC Power 70 W, 작업 압력 0.7 Pa으로 SiO2 기판 위에 $400{\pm}20nm$ 두께의 박막을 증착하였다. 이러한 공정으로 만들어진 박막은 대기 중 후 열처리를 각각의 200, 300, 400, 500, $600^{\circ}C$ 온도에서 진행하였다. 박막의 미세 구조는 XRD를 통해 관찰하였다. 그리고 박막의 전기적 특성은 Hall effect measurement을 통해 측정하였고, 열전 특성은 Seebeck 상수의 측정을 통하여 평가하였다. XRD 확인 결과 RT에서 증착한 박막과 후 열처리 200, 300, 400, $500^{\circ}C$ 결과 비정질 구조를 보였고, 후열처리 $600^{\circ}C$에서는 결정의 회절 피크를 보였다. 전기적 특성의 경우, 후 열처리 온도가 증가함에 따라 전기 전도도는 감소한다. 이는 공기중의 산소가 박막에 침투하여 oxygen vacancy를 막아 캐리어 밀도가 감소한것에 기인 된 것으로 판단된다. 열전 특성의 경우 제백상수는 후 열처리 $600^{\circ}C$에서 가장 높은 제백상수를 나타낸다. 제백 상수는 수식에 따라 캐리어 밀도의 -2/3승에 비례하게 된다. 수식에 따라 후 열처리 $600^{\circ}C$에서 가장 낮은 캐리어 밀도를 가지기 때문에 가장 높은 제백 상수를 가지게 된다. 열전 성능 척도인 Power factor는 제백 상수의 제곱과 전기전도도의 곱으로 나타내는데, 후 열처리 $200^{\circ}C$에서 가장 높은 Power factor를 보인다. 이는 캐리어 밀도 감소에 따라 전기 전도도는 감소하였지만 이로 인해 제백상수는 증가하였고, 또한 캐리어 밀도 감소에 따라 이온화 불순물 산란의 감소에 의해 이동도의 증가에 의한 것으로 판단된다. 박막의 경우 기판의 영향으로 인해 열 전도도 측정이 어려워 열전 성능 지수(ZT)를 계산을 할 수 없지만, 마그네트론 스퍼터링법으로 증착한 IZO:Sn 박막은 비정질 구조를 가지므로 격자진동에 의한 열 전도도가 낮아 전체 열 전도도가 결정질에 비해 낮을 것이며 이는 높은 열전 성능 지수를 가질 것으로 예상된다.

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Dielectric and Piezoelectric Properties of PSS-PT-PZ Ceramics with the Addition of Dopant (불순물 첨가에 따른 PSS-PT-PZ 세라믹의 유전 및 압전특성)

  • Kang, Jeong-Min;Lee, Sung-Gap;Lee, Sang-Heon;Bae, Seon-Gi;Lee, Young-Hie
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.296-299
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    • 2003
  • In this paper, $0.10Pb(Sb_{1/2}Sn_{1/2})O_3-0.25PbTiO_3-0.65PbZrO_3$ ceramics were fabricated by the mixed-oxide method. The sintering temperature and time were $1230^{\circ}C$ and 2[hr], respectively. The structural, dielectric and piezoelectric properties with addition of NiO were studied. The crystal structure of a specimen was rhombohedral. As a result of SEM, the average grain size were decreased with increasing the contents of NiO. But the grains of the specimens doped with 0.4wt% NiO were increased, due to deposits of excess NiO at grain boundaries in the liquid phase. Relative dielectric constant and dielectric loss of the specimen doped with 0.1wt% NiO were 701 and 0.026, respectively.

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